SE381575B - Forfarande for genomforande av kemiska reaktioner med hjelp av bagurladdning - Google Patents
Forfarande for genomforande av kemiska reaktioner med hjelp av bagurladdningInfo
- Publication number
- SE381575B SE381575B SE6917835A SE1783569A SE381575B SE 381575 B SE381575 B SE 381575B SE 6917835 A SE6917835 A SE 6917835A SE 1783569 A SE1783569 A SE 1783569A SE 381575 B SE381575 B SE 381575B
- Authority
- SE
- Sweden
- Prior art keywords
- procedure
- carrying
- chemical reactions
- out chemical
- back charging
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3405—Arrangements for stabilising or constricting the arc, e.g. by an additional gas flow
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/002—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
- C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
- C01B13/28—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides using a plasma or an electric discharge
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/0615—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium
- C01B21/0617—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium with vanadium, niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/02—Halides of titanium
- C01G23/026—Titanium trichloride
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/341—Arrangements for providing coaxial protecting fluids
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3468—Vortex generators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Carbon And Carbon Compounds (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Plasma Technology (AREA)
- Soil Working Implements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1925968A CH508412A (de) | 1968-12-24 | 1968-12-24 | Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen |
CH494969A CH525705A (de) | 1968-12-24 | 1969-04-01 | Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen |
Publications (1)
Publication Number | Publication Date |
---|---|
SE381575B true SE381575B (sv) | 1975-12-15 |
Family
ID=25696596
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE6917835A SE381575B (sv) | 1968-12-24 | 1969-12-23 | Forfarande for genomforande av kemiska reaktioner med hjelp av bagurladdning |
Country Status (10)
Country | Link |
---|---|
US (2) | US3658673A (sv) |
JP (1) | JPS5022986B1 (sv) |
BE (1) | BE743039A (sv) |
CH (1) | CH525705A (sv) |
DE (2) | DE1961339A1 (sv) |
FR (2) | FR2027085A1 (sv) |
GB (2) | GB1297388A (sv) |
NL (2) | NL6919179A (sv) |
NO (2) | NO127094B (sv) |
SE (1) | SE381575B (sv) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3938988A (en) * | 1971-01-04 | 1976-02-17 | Othmer Donald F | Method for producing aluminum metal from its salts |
BE791550A (fr) * | 1971-11-20 | 1973-03-16 | Max Planck Gesellschaft | Procede et dispositif pour le traitement d'un materiau au moyendu plasma d'un arc electrique |
US4206190A (en) * | 1974-03-11 | 1980-06-03 | Westinghouse Electric Corp. | Plasma arc production of silicon nitride |
US4022872A (en) * | 1975-11-12 | 1977-05-10 | Ppg Industries, Inc. | Process for preparing finely-divided refractory powders |
US4051043A (en) * | 1976-01-26 | 1977-09-27 | O-3 Company | Apparatus for fluid treatment by electron emission |
US4102764A (en) * | 1976-12-29 | 1978-07-25 | Westinghouse Electric Corp. | High purity silicon production by arc heater reduction of silicon intermediates |
US4102765A (en) * | 1977-01-06 | 1978-07-25 | Westinghouse Electric Corp. | Arc heater production of silicon involving alkali or alkaline-earth metals |
US4102766A (en) * | 1977-04-14 | 1978-07-25 | Westinghouse Electric Corp. | Process for doping high purity silicon in an arc heater |
US4102767A (en) * | 1977-04-14 | 1978-07-25 | Westinghouse Electric Corp. | Arc heater method for the production of single crystal silicon |
CH616348A5 (sv) * | 1977-04-29 | 1980-03-31 | Alusuisse | |
US4145403A (en) * | 1977-09-29 | 1979-03-20 | Fey Maurice G | Arc heater method for producing metal oxides |
US4292342A (en) * | 1980-05-09 | 1981-09-29 | Motorola, Inc. | High pressure plasma deposition of silicon |
JPS579890A (en) * | 1980-06-20 | 1982-01-19 | Inoue Japax Res Inc | Treatment of rare earth concentrate |
SE448509B (sv) * | 1982-02-15 | 1987-02-23 | Ceskoslovenska Akademie Ved | Forfarande for stabilisering av lagtemperaturplasma i en ljusbagsbrennare samt vetskestabiliserad plasmabrennare |
US6096109A (en) * | 1996-01-18 | 2000-08-01 | Molten Metal Technology, Inc. | Chemical component recovery from ligated-metals |
US5948294A (en) * | 1996-08-30 | 1999-09-07 | Mcdermott Technology, Inc. | Device for cathodic cleaning of wire |
US6579805B1 (en) * | 1999-01-05 | 2003-06-17 | Ronal Systems Corp. | In situ chemical generator and method |
US6846467B1 (en) | 2000-06-27 | 2005-01-25 | Mikhail Rudolfovich Predtechensky | Plasma-chemical reactor |
RU2200058C1 (ru) * | 2002-02-12 | 2003-03-10 | Открытое акционерное общество "ТВЭЛ" | Способ проведения гомогенных и гетерогенных химических реакций с использованием плазмы |
US7375035B2 (en) | 2003-04-29 | 2008-05-20 | Ronal Systems Corporation | Host and ancillary tool interface methodology for distributed processing |
US7429714B2 (en) * | 2003-06-20 | 2008-09-30 | Ronal Systems Corporation | Modular ICP torch assembly |
WO2007068085A1 (en) * | 2005-12-12 | 2007-06-21 | Albonia Innovative Technologies Ltd. | Method and apparatus for treating contaminated material |
US8276568B2 (en) | 2006-02-20 | 2012-10-02 | Aisan Kogyo Kabushiki Kaisha | Fuel supply apparatuses |
RU2532676C2 (ru) | 2011-11-28 | 2014-11-10 | Юрий Александрович Чивель | Способ плазмохимического синтеза и реактор плазмохимического синтеза для его осуществления |
WO2017119326A1 (ja) * | 2016-01-05 | 2017-07-13 | 株式会社Helix | 渦水流発生器、水プラズマ発生装置、分解処理装置、分解処理装置搭載車両及び分解処理方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1065385B (de) * | 1955-01-05 | 1959-09-17 | Chemische Werke Hüls Aktiengesellschaft, Marl (Kr, Recklinghausen) | Verfahren zur Durchführung chemischer und physikalischer Prozesse mit Hilfe elektrischer Entladungen |
US2854392A (en) * | 1955-09-22 | 1958-09-30 | Tokumoto Shin-Ichi | Arc discharge production of low valency halides of titanium |
CH357378A (de) * | 1956-04-02 | 1961-10-15 | Berghaus Elektrophysik Anst | Verfahren und Einrichtung zur Durchführung technischer Prozesse |
FR1294283A (fr) * | 1960-04-13 | 1962-05-26 | Ici Ltd | Procédé permettant de conduire des réactions chimiques dans des décharges électriques |
DE1206399B (de) * | 1963-04-27 | 1965-12-09 | Bayer Ag | Verfahren zur Durchfuehrung von Gasphasenreaktionen |
GB1066651A (en) * | 1965-01-18 | 1967-04-26 | British Titan Products | Oxides |
US3494762A (en) * | 1967-11-27 | 1970-02-10 | Iwatani & Co | Method of manufacturing microfine metal powder |
US3516921A (en) * | 1968-03-26 | 1970-06-23 | Allis Chalmers Mfg Co | Apparatus for magnetic stirring of discharge plasma in chemical synthesis |
-
1969
- 1969-04-01 CH CH494969A patent/CH525705A/de unknown
- 1969-12-05 NO NO04820/69A patent/NO127094B/no unknown
- 1969-12-06 DE DE19691961339 patent/DE1961339A1/de active Pending
- 1969-12-11 GB GB1297388D patent/GB1297388A/en not_active Expired
- 1969-12-12 BE BE743039D patent/BE743039A/xx unknown
- 1969-12-16 DE DE19691962989 patent/DE1962989A1/de active Pending
- 1969-12-17 US US885929A patent/US3658673A/en not_active Expired - Lifetime
- 1969-12-17 US US885927A patent/US3649497A/en not_active Expired - Lifetime
- 1969-12-22 NL NL6919179A patent/NL6919179A/xx unknown
- 1969-12-23 GB GB1297389D patent/GB1297389A/en not_active Expired
- 1969-12-23 SE SE6917835A patent/SE381575B/sv unknown
- 1969-12-23 NL NL6919285A patent/NL6919285A/xx unknown
- 1969-12-23 NO NO05095/69A patent/NO127095B/no unknown
- 1969-12-24 FR FR6945017A patent/FR2027085A1/fr not_active Withdrawn
- 1969-12-24 FR FR6945016A patent/FR2027608A1/fr not_active Withdrawn
- 1969-12-24 JP JP44103547A patent/JPS5022986B1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
CH525705A (de) | 1972-07-31 |
NL6919179A (sv) | 1970-06-26 |
DE1962989A1 (de) | 1970-07-09 |
US3649497A (en) | 1972-03-14 |
FR2027085A1 (sv) | 1970-09-25 |
NO127095B (sv) | 1973-05-07 |
JPS5022986B1 (sv) | 1975-08-04 |
GB1297388A (sv) | 1972-11-22 |
GB1297389A (sv) | 1972-11-22 |
DE1961339A1 (de) | 1970-06-25 |
FR2027608A1 (sv) | 1970-10-02 |
BE743039A (sv) | 1970-05-14 |
US3658673A (en) | 1972-04-25 |
NO127094B (sv) | 1973-05-07 |
NL6919285A (sv) | 1970-06-26 |
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