MX9201104A - Composicion de capa protectora positiva - Google Patents
Composicion de capa protectora positivaInfo
- Publication number
- MX9201104A MX9201104A MX9201104A MX9201104A MX9201104A MX 9201104 A MX9201104 A MX 9201104A MX 9201104 A MX9201104 A MX 9201104A MX 9201104 A MX9201104 A MX 9201104A MX 9201104 A MX9201104 A MX 9201104A
- Authority
- MX
- Mexico
- Prior art keywords
- protective layer
- layer composition
- positive protective
- positive
- composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3049444A JPH04284454A (ja) | 1991-03-14 | 1991-03-14 | ポジ型レジスト組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX9201104A true MX9201104A (es) | 1992-12-21 |
Family
ID=12831300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX9201104A MX9201104A (es) | 1991-03-14 | 1992-03-13 | Composicion de capa protectora positiva |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0504724A1 (es) |
| JP (1) | JPH04284454A (es) |
| KR (1) | KR920018523A (es) |
| CA (1) | CA2062399A1 (es) |
| MX (1) | MX9201104A (es) |
| TW (1) | TW218924B (es) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1993018438A1 (en) * | 1992-03-06 | 1993-09-16 | Hoechst Celanese Corporation | Positive photoresist composition |
| TW421731B (en) * | 1994-10-24 | 2001-02-11 | Clariant Finance Bvi Ltd | Positive photoresist composition, photo-sensitive element comprising it, methods of using it, and photosensitizer therein |
| US5672459A (en) | 1995-03-31 | 1997-09-30 | Japan Synthetic Rubber Co., Ltd. | Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1337626C (en) * | 1988-07-07 | 1995-11-28 | Haruyoshi Osaki | Radiation-sensitive positive resist composition |
| JPH02222954A (ja) * | 1989-02-23 | 1990-09-05 | Chisso Corp | ポジ型フォトレジスト組成物およびレジストパターンの形成方法 |
| JP2571136B2 (ja) * | 1989-11-17 | 1997-01-16 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
-
1991
- 1991-03-14 JP JP3049444A patent/JPH04284454A/ja active Pending
-
1992
- 1992-03-04 TW TW081101654A patent/TW218924B/zh active
- 1992-03-05 CA CA002062399A patent/CA2062399A1/en not_active Abandoned
- 1992-03-11 EP EP92104167A patent/EP0504724A1/en not_active Withdrawn
- 1992-03-11 KR KR1019920004005A patent/KR920018523A/ko not_active Application Discontinuation
- 1992-03-13 MX MX9201104A patent/MX9201104A/es unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04284454A (ja) | 1992-10-09 |
| EP0504724A1 (en) | 1992-09-23 |
| TW218924B (es) | 1994-01-11 |
| KR920018523A (ko) | 1992-10-22 |
| CA2062399A1 (en) | 1992-09-15 |
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