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DE69408761D1 - Strahlungsempfindliche Zusammensetzung - Google Patents

Strahlungsempfindliche Zusammensetzung

Info

Publication number
DE69408761D1
DE69408761D1 DE69408761T DE69408761T DE69408761D1 DE 69408761 D1 DE69408761 D1 DE 69408761D1 DE 69408761 T DE69408761 T DE 69408761T DE 69408761 T DE69408761 T DE 69408761T DE 69408761 D1 DE69408761 D1 DE 69408761D1
Authority
DE
Germany
Prior art keywords
radiation sensitive
sensitive composition
composition
radiation
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69408761T
Other languages
English (en)
Other versions
DE69408761T2 (de
Inventor
Yusuke Tajima
Nobuo Bessho
Hiroaki Nemoto
Fumine Shitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Publication of DE69408761D1 publication Critical patent/DE69408761D1/de
Application granted granted Critical
Publication of DE69408761T2 publication Critical patent/DE69408761T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE69408761T 1993-09-24 1994-09-22 Strahlungsempfindliche Zusammensetzung Expired - Fee Related DE69408761T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26187793 1993-09-24

Publications (2)

Publication Number Publication Date
DE69408761D1 true DE69408761D1 (de) 1998-04-09
DE69408761T2 DE69408761T2 (de) 1998-08-27

Family

ID=17368008

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69408761T Expired - Fee Related DE69408761T2 (de) 1993-09-24 1994-09-22 Strahlungsempfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US5847015A (de)
EP (1) EP0645678B1 (de)
KR (1) KR100332326B1 (de)
DE (1) DE69408761T2 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3824285B2 (ja) * 1997-03-14 2006-09-20 富士写真フイルム株式会社 感放射線性着色組成物
EP1033626A1 (de) * 1997-07-24 2000-09-06 JSR Corporation Lichtempfindliche Zusammensetzung
US6642963B1 (en) * 1998-06-29 2003-11-04 Intel Corporation Silylation layer for optical devices
US6162842A (en) * 1999-05-18 2000-12-19 The Goodyear Tire & Rubber Company Radiation curable coating composition
US20040058276A1 (en) * 2002-09-23 2004-03-25 Dueber Thomas E. Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto
JP2005228997A (ja) * 2004-02-13 2005-08-25 Matsushita Electric Ind Co Ltd 固体撮像装置およびその製造方法
KR100839046B1 (ko) * 2006-12-14 2008-06-19 제일모직주식회사 액정표시소자용 감광성 수지 조성물, 이를　이용하여제조된 칼럼 스페이서 및 그 칼럼 스페이서를 포함하는디스플레이 장치
US20110123929A1 (en) 2007-01-23 2011-05-26 Fujifilm Corporation Oxime compound, photosensitive composition, color filter, production method for the color filter, and liquid crystal display element
JP2008241744A (ja) 2007-03-23 2008-10-09 Fujifilm Corp カラーフィルタの製造方法
US8524425B2 (en) 2007-05-11 2013-09-03 Basf Se Oxime ester photoinitiators
JP5535063B2 (ja) 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光重合開始剤
US20090086064A1 (en) * 2007-09-27 2009-04-02 Micron Technology, Inc. Dynamic adaptive color filter array
JP5642150B2 (ja) 2009-03-23 2014-12-17 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ フォトレジスト組成物
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
CN103153952B (zh) 2010-10-05 2016-07-13 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途
EP2668156B1 (de) 2011-01-28 2018-10-31 Basf Se Polymerisierbare zusammensetzung mit einem oximsulfonat als thermisches härtungsmittel
CN103998427A (zh) 2011-12-07 2014-08-20 巴斯夫欧洲公司 肟酯光敏引发剂
KR101968462B1 (ko) 2012-05-09 2019-04-11 바스프 에스이 옥심 에스테르 광개시제
KR101961219B1 (ko) 2013-01-08 2019-03-22 동우 화인켐 주식회사 착색 감광성 수지 조성물
EP3019473B1 (de) 2013-07-08 2020-02-19 Basf Se Oximester-photoinitiatoren
US9957258B2 (en) 2013-09-10 2018-05-01 Basf Se Oxime ester photoinitiators
JP6664383B2 (ja) 2014-08-29 2020-03-13 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムスルホネート誘導体
TWI675907B (zh) 2015-01-21 2019-11-01 日商Ｊｓｒ股份有限公司 固體攝像裝置
KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도
US10272426B2 (en) 2015-04-21 2019-04-30 Jsr Corporation Method of producing microfluidic device, microfluidic device, and photosensitive resin composition
KR101986408B1 (ko) 2016-11-08 2019-06-05 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR20190107370A (ko) 2018-03-12 2019-09-20 동우 화인켐 주식회사 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
TW202138351A (zh) 2020-03-04 2021-10-16 德商巴地斯顏料化工廠 肟酯光起始劑

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3759875A (en) * 1971-10-12 1973-09-18 J Guthrie Curable liquid pigment composition and method
JPS543482B2 (de) * 1972-10-14 1979-02-23
US4673705A (en) * 1985-04-05 1987-06-16 Desoto, Inc. Radiation-curable coatings containing reactive pigment dispersants
DE3706561A1 (de) * 1987-02-28 1988-09-08 Basf Ag Lichtempfindliches aufzeichnungsmaterial mit erhoehter flexibilitaet
WO1989001186A1 (en) * 1987-07-28 1989-02-09 Nippon Kayaku Kabushiki Kaisha Photosensitive resin composition and color filter
US5096801A (en) * 1989-04-03 1992-03-17 Fuji Photo Film Co., Ltd. Color image recording method
US5368976A (en) * 1992-03-27 1994-11-29 Japan Synthetic Rubber Co., Ltd. Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder
JP3094403B2 (ja) * 1992-03-27 2000-10-03 ジェイエスアール株式会社 顔料分散型カラーフィルター用組成物

Also Published As

Publication number Publication date
KR100332326B1 (ko) 2002-11-30
US5847015A (en) 1998-12-08
KR950009350A (ko) 1995-04-21
EP0645678A1 (de) 1995-03-29
EP0645678B1 (de) 1998-03-04
DE69408761T2 (de) 1998-08-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: JSR CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee