MX2011006554A - Generador de vapor industrial para la deposicion de un recubrimiento de aleacion en una banda metalica. - Google Patents
Generador de vapor industrial para la deposicion de un recubrimiento de aleacion en una banda metalica.Info
- Publication number
- MX2011006554A MX2011006554A MX2011006554A MX2011006554A MX2011006554A MX 2011006554 A MX2011006554 A MX 2011006554A MX 2011006554 A MX2011006554 A MX 2011006554A MX 2011006554 A MX2011006554 A MX 2011006554A MX 2011006554 A MX2011006554 A MX 2011006554A
- Authority
- MX
- Mexico
- Prior art keywords
- depositing
- substrate
- alloy coating
- mixer
- vapour
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Electric Cables (AREA)
Abstract
La presente invención se refiere a una instalación de deposición al vacío de un recubrimiento de aleación metálica en un sustrato (7), equipada con un generador/mezclador de vapor que contiene una cámara de vacío (6) en forma de un recipiente provisto de elementos para crear un estado de depresión en el mismo en relación con el medio exterior y provisto de elementos que permiten la entrada y la salida del sustrato (7), mientras sigue siendo esencialmente impermeable respecto del medio exterior, dicho recipiente incluye un cabezal de deposición de vapor, llamado eyector (3), configurado para crear un chorro de vapor de aleación metálica a velocidad sónica hacia la superficie del sustrato (7) y perpendicular a la misma, dicho eyector (3) se comunica de modo impermeable con un dispositivo mezclador distinto (14), conectado hacia arriba a por lo menos dos crisoles (11, 12) respectivamente, y que contienen metales diferentes Ml y M2, en forma líquida, cada crisol (11, 12) está conectado al mezclador (14) por un ducto propio (4, 4').
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08172179A EP2199425A1 (fr) | 2008-12-18 | 2008-12-18 | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II) |
PCT/EP2009/067448 WO2010070067A1 (fr) | 2008-12-18 | 2009-12-17 | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (ii) |
Publications (2)
Publication Number | Publication Date |
---|---|
MX2011006554A true MX2011006554A (es) | 2011-08-03 |
MX342910B MX342910B (es) | 2016-10-17 |
Family
ID=40636672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2011006554A MX342910B (es) | 2008-12-18 | 2009-12-17 | Generador de vapor industrial para la deposicion de un recubrimiento de aleacion en una banda metalica. |
Country Status (19)
Country | Link |
---|---|
US (2) | US20110281031A1 (es) |
EP (2) | EP2199425A1 (es) |
JP (1) | JP5599816B2 (es) |
KR (1) | KR101642364B1 (es) |
CN (1) | CN102257175B (es) |
AU (1) | AU2009327078B2 (es) |
BR (1) | BRPI0918113B1 (es) |
CA (1) | CA2746325C (es) |
DK (1) | DK2358921T3 (es) |
ES (1) | ES2397593T3 (es) |
HR (1) | HRP20121013T1 (es) |
MX (1) | MX342910B (es) |
PL (1) | PL2358921T3 (es) |
PT (1) | PT2358921E (es) |
RU (1) | RU2515875C2 (es) |
SI (1) | SI2358921T1 (es) |
UA (1) | UA104747C2 (es) |
WO (1) | WO2010070067A1 (es) |
ZA (1) | ZA201104315B (es) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2012206581B2 (en) * | 2011-01-14 | 2017-03-30 | Arcelormittal Investigacion Y Desarrollo | Automatic feeding device for an industrial metal-vapor generator |
JP6430528B2 (ja) * | 2013-11-05 | 2018-11-28 | タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップTata Steel Nederland Technology Bv | 蒸発器デバイス内の液体金属の組成を制御するための方法および装置 |
WO2015088523A1 (en) | 2013-12-11 | 2015-06-18 | ArcelorMittal Investigación y Desarrollo, S.L. | Cold rolled and annealed steel sheet |
JP6358446B2 (ja) * | 2014-03-11 | 2018-07-18 | 株式会社Joled | 蒸着装置及びその制御方法、蒸着装置を用いた蒸着方法、及びデバイスの製造方法 |
CN105925936B (zh) * | 2016-07-08 | 2018-04-20 | 武汉钢铁有限公司 | 一种高档门窗用轻金属复合镀层钢带的生产方法 |
WO2018020296A1 (en) * | 2016-07-27 | 2018-02-01 | Arcelormittal | Apparatus and method for vacuum deposition |
KR102098455B1 (ko) * | 2017-12-26 | 2020-04-07 | 주식회사 포스코 | 연속 증착 장치 및 연속 증착 방법 |
WO2019239184A1 (en) * | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
WO2019239186A1 (en) * | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
WO2019239185A1 (en) | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
CN110004411B (zh) * | 2019-03-29 | 2021-05-11 | 北京钢研新冶工程设计有限公司 | 一种合金镀膜方法 |
CN112553578B (zh) * | 2019-09-26 | 2022-01-14 | 宝山钢铁股份有限公司 | 一种具有抑流式喷嘴的真空镀膜装置 |
Family Cites Families (31)
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SU433252A1 (ru) * | 1971-07-16 | 1974-06-25 | В. В. Горбачев, В. Г. Дзевалтовский , Г. П. Жариков Ордена Ленина институт кибернетики | Испаритель |
SU788831A1 (ru) * | 1976-11-15 | 1989-07-15 | Предприятие П/Я В-8495 | Установка дл нанесени покрытий в вакууме |
JPS5834172A (ja) * | 1981-08-26 | 1983-02-28 | Mitsubishi Heavy Ind Ltd | 合金蒸着用蒸発源構造 |
JPS60251273A (ja) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | 真空蒸発装置の蒸発量制御方法 |
JPH068170B2 (ja) * | 1985-10-29 | 1994-02-02 | 宇部興産株式会社 | 高純度酸化マグネシウム微粉末の製造方法 |
US5002837A (en) | 1988-07-06 | 1991-03-26 | Kabushiki Kaisha Kobe Seiko Sho | Zn-Mg alloy vapor deposition plated metals of high corrosion resistance, as well as method of producing them |
JPH02125866A (ja) * | 1988-11-04 | 1990-05-14 | Kobe Steel Ltd | 合金蒸着めっき装置 |
SU1737924A1 (ru) * | 1989-09-27 | 1994-03-30 | Всесоюзный научно-исследовательский институт экспериментальной физики | Способ получения покрытия с градиентом плотности в вакууме |
JP3463693B2 (ja) * | 1992-10-29 | 2003-11-05 | 石川島播磨重工業株式会社 | 連続帯状物用真空蒸着装置 |
DE4310085A1 (de) * | 1993-03-27 | 1994-09-29 | Leybold Ag | Verfahren und Vorrichtung zur Erzeugung von Mustern auf Substraten |
JPH07268605A (ja) * | 1994-03-29 | 1995-10-17 | Nisshin Steel Co Ltd | 合金化Zn−Mg蒸着めっき鋼板の製造方法 |
US5776254A (en) * | 1994-12-28 | 1998-07-07 | Mitsubishi Denki Kabushiki Kaisha | Apparatus for forming thin film by chemical vapor deposition |
DE19527515C1 (de) | 1995-07-27 | 1996-11-28 | Fraunhofer Ges Forschung | Verfahren zur Herstellung von korrosionsgeschütztem Stahlblech |
BE1010351A6 (fr) | 1996-06-13 | 1998-06-02 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique. |
US6423144B1 (en) * | 1996-08-07 | 2002-07-23 | Matsushita Electric Industrial Co., Ltd. | Coating apparatus and coating method |
BE1010720A3 (fr) | 1996-10-30 | 1998-12-01 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'un alliage metallique en phase vapeur. |
US6409839B1 (en) * | 1997-06-02 | 2002-06-25 | Msp Corporation | Method and apparatus for vapor generation and film deposition |
US6399017B1 (en) * | 2000-06-01 | 2002-06-04 | Aemp Corporation | Method and apparatus for containing and ejecting a thixotropic metal slurry |
EP1174526A1 (en) * | 2000-07-17 | 2002-01-23 | Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO | Continuous vapour deposition |
DE10039375A1 (de) | 2000-08-11 | 2002-03-28 | Fraunhofer Ges Forschung | Korrosionsgeschütztes Stahlblech und Verfahren zu seiner Herstellung |
WO2003025071A1 (en) * | 2001-09-14 | 2003-03-27 | Showa Denko K.K. | Silica-coated mixed crystal oxide particle, production process thereof and cosmetic material using the same |
FR2843130B1 (fr) | 2002-08-05 | 2004-10-29 | Usinor | Procede de revetement de la surface d'un materiau metallique, dispositif pour sa mise en oeuvre et produit ainsi obtenu |
LV13383B (en) * | 2004-05-27 | 2006-02-20 | Sidrabe As | Method and device for vacuum vaporization metals or alloys |
WO2007005832A2 (en) * | 2005-06-30 | 2007-01-11 | University Of Virginia Patent Foundation | Reliant thermal barrier coating system and related methods and apparatus of making the same |
WO2008002559A2 (en) * | 2006-06-26 | 2008-01-03 | Precision Combustion, Inc. | Streamlined flow mixer |
CN101522943B (zh) * | 2006-10-10 | 2013-04-24 | Asm美国公司 | 前体输送系统 |
EP1972699A1 (fr) | 2007-03-20 | 2008-09-24 | ArcelorMittal France | Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique |
US20090251989A1 (en) * | 2007-06-26 | 2009-10-08 | Pfefferle William C | Streamlined flow mixer |
EP2048261A1 (fr) * | 2007-10-12 | 2009-04-15 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique |
US20090098280A1 (en) * | 2007-10-12 | 2009-04-16 | Jean-Pierre Tahon | Vapor deposition apparatus and method of vapor deposition making use thereof |
WO2009153865A1 (ja) * | 2008-06-18 | 2009-12-23 | 産機電業株式会社 | 微粉体の製造装置及び製造方法 |
-
2008
- 2008-12-18 EP EP08172179A patent/EP2199425A1/fr not_active Withdrawn
-
2009
- 2009-12-17 RU RU2011129058/02A patent/RU2515875C2/ru active
- 2009-12-17 EP EP09775223A patent/EP2358921B1/fr active Active
- 2009-12-17 DK DK09775223.2T patent/DK2358921T3/da active
- 2009-12-17 CN CN2009801507152A patent/CN102257175B/zh active Active
- 2009-12-17 PL PL09775223T patent/PL2358921T3/pl unknown
- 2009-12-17 WO PCT/EP2009/067448 patent/WO2010070067A1/fr active Application Filing
- 2009-12-17 US US13/140,061 patent/US20110281031A1/en not_active Abandoned
- 2009-12-17 KR KR1020117014038A patent/KR101642364B1/ko active Active
- 2009-12-17 BR BRPI0918113-0A patent/BRPI0918113B1/pt active IP Right Grant
- 2009-12-17 UA UAA201108931A patent/UA104747C2/ru unknown
- 2009-12-17 SI SI200930445T patent/SI2358921T1/sl unknown
- 2009-12-17 MX MX2011006554A patent/MX342910B/es active IP Right Grant
- 2009-12-17 AU AU2009327078A patent/AU2009327078B2/en active Active
- 2009-12-17 CA CA2746325A patent/CA2746325C/en active Active
- 2009-12-17 JP JP2011541453A patent/JP5599816B2/ja active Active
- 2009-12-17 ES ES09775223T patent/ES2397593T3/es active Active
- 2009-12-17 PT PT97752232T patent/PT2358921E/pt unknown
-
2011
- 2011-06-09 ZA ZA2011/04315A patent/ZA201104315B/en unknown
-
2012
- 2012-12-11 HR HRP20121013AT patent/HRP20121013T1/hr unknown
-
2018
- 2018-11-21 US US16/198,388 patent/US10711339B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2012512959A (ja) | 2012-06-07 |
CN102257175B (zh) | 2013-06-26 |
BRPI0918113B1 (pt) | 2019-07-09 |
US20190093210A1 (en) | 2019-03-28 |
AU2009327078B2 (en) | 2014-06-19 |
ES2397593T3 (es) | 2013-03-08 |
EP2358921A1 (fr) | 2011-08-24 |
BRPI0918113A2 (pt) | 2015-11-24 |
CA2746325A1 (en) | 2010-06-24 |
CA2746325C (en) | 2019-04-30 |
KR20110102886A (ko) | 2011-09-19 |
CN102257175A (zh) | 2011-11-23 |
SI2358921T1 (sl) | 2013-03-29 |
RU2515875C2 (ru) | 2014-05-20 |
WO2010070067A1 (fr) | 2010-06-24 |
JP5599816B2 (ja) | 2014-10-01 |
RU2011129058A (ru) | 2013-01-27 |
AU2009327078A1 (en) | 2011-07-07 |
PL2358921T3 (pl) | 2013-04-30 |
US10711339B2 (en) | 2020-07-14 |
EP2358921B1 (fr) | 2012-11-28 |
MX342910B (es) | 2016-10-17 |
EP2199425A1 (fr) | 2010-06-23 |
KR101642364B1 (ko) | 2016-08-10 |
US20110281031A1 (en) | 2011-11-17 |
UA104747C2 (ru) | 2014-03-11 |
HRP20121013T1 (hr) | 2013-01-31 |
PT2358921E (pt) | 2013-01-24 |
ZA201104315B (en) | 2012-11-28 |
DK2358921T3 (da) | 2013-01-02 |
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