MD4280B1 - Procedeu de creştere a structurii pInP-nCdS - Google Patents
Procedeu de creştere a structurii pInP-nCdSInfo
- Publication number
- MD4280B1 MD4280B1 MDA20130062A MD20130062A MD4280B1 MD 4280 B1 MD4280 B1 MD 4280B1 MD A20130062 A MDA20130062 A MD A20130062A MD 20130062 A MD20130062 A MD 20130062A MD 4280 B1 MD4280 B1 MD 4280B1
- Authority
- MD
- Moldova
- Prior art keywords
- ncds
- pinp
- substrate
- growth method
- cdcl2
- Prior art date
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Invenţia se referă la tehnologia semiconductorilor şi poate fi utilizată la fabricarea dispozitivelor de conversie a radiaţiei solare în energie electrică.Procedeul de creştere a structurii pInP-nCdS include amplasarea unui substrat de pInP, corodat preventiv, cu orientarea cristalografică (100) şi dezorientarea de 3…5° în direcţia (110) într-un reactor, încălzirea zonei de creştere a substratului şi stabilizarea temperaturii în diapazonul de 400…450°C, pulverizarea, în flux deschis de oxigen, a soluţiilor de CdCl2 şi SnCl4 cu formarea pe substrat a unui strat de Cd2SnO4, apoi pulverizarea soluţiilor de CdCl2 şi CS(NH2)2 cu formarea pe acesta a unui strat de nCdS.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
MDA20130062A MD4280C1 (ro) | 2013-09-04 | 2013-09-04 | Procedeu de creştere a structurii pInP-nCdS |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
MDA20130062A MD4280C1 (ro) | 2013-09-04 | 2013-09-04 | Procedeu de creştere a structurii pInP-nCdS |
Publications (2)
Publication Number | Publication Date |
---|---|
MD4280B1 true MD4280B1 (ro) | 2014-03-31 |
MD4280C1 MD4280C1 (ro) | 2014-10-31 |
Family
ID=50685394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MDA20130062A MD4280C1 (ro) | 2013-09-04 | 2013-09-04 | Procedeu de creştere a structurii pInP-nCdS |
Country Status (1)
Country | Link |
---|---|
MD (1) | MD4280C1 (ro) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MD4554B1 (ro) * | 2017-10-18 | 2018-02-28 | Государственный Университет Молд0 | Procedeu de majorare a eficienţei celulelor fotovoltaice pe baza p+InP-p-InP-n+CdS |
MD4510C1 (ro) * | 2016-06-23 | 2018-03-31 | Государственный Университет Молд0 | Procedeu de creştere a structurii n+-p-p+ InP pentru celule solare |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MD972Z (ro) * | 2015-02-19 | 2016-06-30 | Государственный Университет Молд0 | Procedeu de creştere a structurii p+InP-p-InP-n+CdS pentru celule fotovoltaice |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MD626G2 (ro) * | 1994-01-13 | 1997-06-30 | Государственный Университет Молд0 | Procedeu de preparare a heterojoncţiunilor p+ InP-pInP/CdS şi p+ GaAs-pGaAs/CdS |
MD673G2 (ro) * | 1994-05-24 | 1997-08-31 | Государственный Университет Молд0 | Procedeu de obţinere a straturilor InP |
WO1999010919A1 (en) * | 1997-08-27 | 1999-03-04 | Matsushita Electric Industrial Co., Ltd. | Silicon carbide substrate, process for producing the same, and semiconductor element containing silicon carbide substrate |
US6407014B1 (en) * | 1999-12-16 | 2002-06-18 | Philips Electronics North America Corporation | Method achieving higher inversion layer mobility in novel silicon carbide semiconductor devices |
JP3920103B2 (ja) * | 2002-01-31 | 2007-05-30 | 大阪府 | 絶縁層埋め込み型半導体炭化シリコン基板の製造方法及びその製造装置 |
EP1945840B1 (en) * | 2005-08-26 | 2017-03-08 | Smoltek AB | Integrated circuit comprising nanostructures |
MD151Z (ro) * | 2008-12-30 | 2010-09-30 | Государственный Университет Молд0 | Procedeu de creştere a straturilor epitaxiale GaAs într-un reactor orizontal |
-
2013
- 2013-09-04 MD MDA20130062A patent/MD4280C1/ro not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MD4510C1 (ro) * | 2016-06-23 | 2018-03-31 | Государственный Университет Молд0 | Procedeu de creştere a structurii n+-p-p+ InP pentru celule solare |
MD4554B1 (ro) * | 2017-10-18 | 2018-02-28 | Государственный Университет Молд0 | Procedeu de majorare a eficienţei celulelor fotovoltaice pe baza p+InP-p-InP-n+CdS |
Also Published As
Publication number | Publication date |
---|---|
MD4280C1 (ro) | 2014-10-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG4A | Patent for invention issued | ||
KA4A | Patent for invention lapsed due to non-payment of fees (with right of restoration) | ||
MM4A | Patent for invention definitely lapsed due to non-payment of fees |