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KR970058797A - 펠리클 - Google Patents

펠리클 Download PDF

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Publication number
KR970058797A
KR970058797A KR1019970002210A KR19970002210A KR970058797A KR 970058797 A KR970058797 A KR 970058797A KR 1019970002210 A KR1019970002210 A KR 1019970002210A KR 19970002210 A KR19970002210 A KR 19970002210A KR 970058797 A KR970058797 A KR 970058797A
Authority
KR
South Korea
Prior art keywords
frame
face
sensitive adhesive
pressure
adhesive layer
Prior art date
Application number
KR1019970002210A
Other languages
English (en)
Other versions
KR100240566B1 (ko
Inventor
메구루 가시다
Original Assignee
가나가와 지히로
신에츠 가가꾸 고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가나가와 지히로, 신에츠 가가꾸 고교 가부시키가이샤 filed Critical 가나가와 지히로
Publication of KR970058797A publication Critical patent/KR970058797A/ko
Application granted granted Critical
Publication of KR100240566B1 publication Critical patent/KR100240566B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24132—Structurally defined web or sheet [e.g., overall dimension, etc.] including grain, strips, or filamentary elements in different layers or components parallel

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Prevention Of Fouling (AREA)
  • Adhesive Tapes (AREA)

Abstract

본 발명은 일단면과 타단면을 갖는 프레임 및 일단면측에서 프레임상으로 확대된 막으로 이루어지는 펠리클을 제공한다. 채널은 프레임의 타단면에 형성된다. 채널은 가열 및/또는 광조사시 발포가능한 점착제층으로 채워지는데 점착제층은 비발포 상태에서 프레임의 타단면 밖으로 비어져 나오지 않고, 반대로 발포될 때는 프레임의 타단면 밖으로 비어져 나온다. 점착제층에 부착된 라이너는 없다.

Description

펠리클
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 발포전의 점착제층을 나타내는 본 발명의 한 구체예에 따른 한쪽 펠리클의 개략 단면도이다,
제2도는 발포후의 점착제층을 나타내는 제1도에 대한 유사도이다.

Claims (2)

  1. 일단면과 타단면을 갖는 프레임, 일단면을 갖는 프레임, 일단면 측에서 상기 프레임상으로 확대된 막, 상기 프레임의 타단면에 형성된 채널, 그리고 비발포 상태에서는 프레임의 타단면 밖으로 비어져 나오지 않고, 반대로 발포시에는 프레임의 타단면 밖으로 비어져 나오게 상기 채널에 채워진 가열 및/또는 광조사시 발포가능한 점착제층으로 이루어지며 점착제층에 라이너가 부착되지 않은 펠리클.
  2. 제1항에 있어서, 상기 점착제는 발포성 실리콘 점착제인 것을 특징으로 하는 펠리클.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970002210A 1996-01-30 1997-01-27 펠리클 KR100240566B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3553696A JP3209073B2 (ja) 1996-01-30 1996-01-30 ペリクル
JP96-35536 1996-01-30

Publications (2)

Publication Number Publication Date
KR970058797A true KR970058797A (ko) 1997-08-12
KR100240566B1 KR100240566B1 (ko) 2000-01-15

Family

ID=12444465

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970002210A KR100240566B1 (ko) 1996-01-30 1997-01-27 펠리클

Country Status (6)

Country Link
US (1) US5729325A (ko)
EP (1) EP0788028B1 (ko)
JP (1) JP3209073B2 (ko)
KR (1) KR100240566B1 (ko)
DE (1) DE69700845T2 (ko)
TW (1) TW322449B (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002182373A (ja) * 2000-12-18 2002-06-26 Shin Etsu Chem Co Ltd ペリクル及びその製造方法及びフォトマスク
US20020089656A1 (en) * 2001-01-09 2002-07-11 Cheng Guo Containers for lithography mask and method of use
US7351503B2 (en) * 2001-01-22 2008-04-01 Photronics, Inc. Fused silica pellicle in intimate contact with the surface of a photomask
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
US6544693B2 (en) 2001-01-26 2003-04-08 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle
US6623893B1 (en) 2001-01-26 2003-09-23 Advanced Micro Devices, Inc. Pellicle for use in EUV lithography and a method of making such a pellicle
US6593035B1 (en) 2001-01-26 2003-07-15 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films
US7138640B1 (en) 2002-10-17 2006-11-21 Kla-Tencor Technologies, Corporation Method and apparatus for protecting surfaces of optical components
JP4358683B2 (ja) * 2004-05-31 2009-11-04 信越化学工業株式会社 ペリクルフレーム及びフォトリソグラフィー用ペリクル
KR101524104B1 (ko) * 2008-05-13 2015-05-29 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클의 박리 방법 및 이 방법에 사용하는 박리 장치
JP2011028091A (ja) * 2009-07-28 2011-02-10 Shin-Etsu Chemical Co Ltd ペリクル
JP5199217B2 (ja) * 2009-11-02 2013-05-15 信越化学工業株式会社 ペリクル
JP2011113033A (ja) * 2009-11-30 2011-06-09 Shin-Etsu Chemical Co Ltd ペリクル膜の製造方法および装置
US8945799B2 (en) * 2010-07-09 2015-02-03 Mitsui Chemicals, Inc. Pellicle and mask adhesive agent for use in same
JP6519190B2 (ja) 2015-01-16 2019-05-29 日本軽金属株式会社 ペリクル用支持枠
JP2016139103A (ja) * 2015-01-29 2016-08-04 日本軽金属株式会社 ペリクル用支持枠

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0325442A (ja) * 1989-06-22 1991-02-04 Matsushita Electron Corp ペリクルフレーム
DE4021863A1 (de) * 1990-07-09 1992-01-16 Buchtal Gmbh Verfahren zur verlegung eines fussbodenbelags, insbesondere fussbodenplatten, sowie fussbodenbelag
JPH05289314A (ja) * 1992-04-08 1993-11-05 Fujitsu Ltd ペリクル
JPH0619124A (ja) * 1992-07-01 1994-01-28 Seiko Epson Corp ペリクルフレーム及び半導体装置の製造方法
JP3071348B2 (ja) * 1993-10-21 2000-07-31 信越化学工業株式会社 ペリクルおよびその剥離方法
US5529819A (en) * 1995-04-17 1996-06-25 Inko Industrial Corporation Pellicle assembly with vent structure

Also Published As

Publication number Publication date
EP0788028A2 (en) 1997-08-06
EP0788028A3 (ko) 1997-08-27
TW322449B (ko) 1997-12-11
KR100240566B1 (ko) 2000-01-15
US5729325A (en) 1998-03-17
DE69700845D1 (de) 2000-01-05
JP3209073B2 (ja) 2001-09-17
EP0788028B1 (en) 1999-12-01
JPH09206723A (ja) 1997-08-12
DE69700845T2 (de) 2000-05-18

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