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KR950021449U - 웨이퍼 이송장치의 웨이퍼 플래트 존 정렬장치 - Google Patents

웨이퍼 이송장치의 웨이퍼 플래트 존 정렬장치

Info

Publication number
KR950021449U
KR950021449U KR2019930030453U KR930030453U KR950021449U KR 950021449 U KR950021449 U KR 950021449U KR 2019930030453 U KR2019930030453 U KR 2019930030453U KR 930030453 U KR930030453 U KR 930030453U KR 950021449 U KR950021449 U KR 950021449U
Authority
KR
South Korea
Prior art keywords
wafer
plate zone
zone alignment
transfer device
alignment device
Prior art date
Application number
KR2019930030453U
Other languages
English (en)
Other versions
KR0113528Y1 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR93030453U priority Critical patent/KR0113528Y1/ko
Publication of KR950021449U publication Critical patent/KR950021449U/ko
Application granted granted Critical
Publication of KR0113528Y1 publication Critical patent/KR0113528Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR93030453U 1993-12-29 1993-12-29 Wafer flat zone apparatus KR0113528Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR93030453U KR0113528Y1 (en) 1993-12-29 1993-12-29 Wafer flat zone apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR93030453U KR0113528Y1 (en) 1993-12-29 1993-12-29 Wafer flat zone apparatus

Publications (2)

Publication Number Publication Date
KR950021449U true KR950021449U (ko) 1995-07-28
KR0113528Y1 KR0113528Y1 (en) 1998-04-16

Family

ID=19373461

Family Applications (1)

Application Number Title Priority Date Filing Date
KR93030453U KR0113528Y1 (en) 1993-12-29 1993-12-29 Wafer flat zone apparatus

Country Status (1)

Country Link
KR (1) KR0113528Y1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW344847B (en) * 1996-08-29 1998-11-11 Tokyo Electron Co Ltd Substrate treatment system, substrate transfer system, and substrate transfer method

Also Published As

Publication number Publication date
KR0113528Y1 (en) 1998-04-16

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Legal Events

Date Code Title Description
A201 Request for examination
UA0108 Application for utility model registration

Comment text: Application for Utility Model Registration

Patent event code: UA01011R08D

Patent event date: 19931229

UA0201 Request for examination

Patent event date: 19931229

Patent event code: UA02012R01D

Comment text: Request for Examination of Application

UG1501 Laying open of application
E902 Notification of reason for refusal
UE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event code: UE09021S01D

Patent event date: 19970429

E701 Decision to grant or registration of patent right
UE0701 Decision of registration

Patent event date: 19971031

Comment text: Decision to Grant Registration

Patent event code: UE07011S01D

REGI Registration of establishment
UR0701 Registration of establishment

Patent event date: 19971111

Patent event code: UR07011E01D

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UR1002 Payment of registration fee

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