DE69408707D1 - Lichtempfindliche Halbleitervorrichtung - Google Patents
Lichtempfindliche HalbleitervorrichtungInfo
- Publication number
- DE69408707D1 DE69408707D1 DE69408707T DE69408707T DE69408707D1 DE 69408707 D1 DE69408707 D1 DE 69408707D1 DE 69408707 T DE69408707 T DE 69408707T DE 69408707 T DE69408707 T DE 69408707T DE 69408707 D1 DE69408707 D1 DE 69408707D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor device
- photosensitive semiconductor
- photosensitive
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/103—Integrated devices the at least one element covered by H10F30/00 having potential barriers, e.g. integrated devices comprising photodiodes or phototransistors
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B20/00—Use of materials as fillers for mortars, concrete or artificial stone according to more than one of groups C04B14/00 - C04B18/00 and characterised by shape or grain distribution; Treatment of materials according to more than one of the groups C04B14/00 - C04B18/00 specially adapted to enhance their filling properties in mortars, concrete or artificial stone; Expanding or defibrillating materials
- C04B20/10—Coating or impregnating
- C04B20/1055—Coating or impregnating with inorganic materials
- C04B20/1077—Cements, e.g. waterglass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Light Receiving Elements (AREA)
- Element Separation (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5091269A JP2799540B2 (ja) | 1993-04-19 | 1993-04-19 | 受光素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69408707D1 true DE69408707D1 (de) | 1998-04-09 |
DE69408707T2 DE69408707T2 (de) | 1998-09-10 |
Family
ID=14021731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69408707T Expired - Fee Related DE69408707T2 (de) | 1993-04-19 | 1994-04-19 | Lichtempfindliche Halbleitervorrichtung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5466962A (de) |
EP (1) | EP0621639B1 (de) |
JP (1) | JP2799540B2 (de) |
DE (1) | DE69408707T2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2731115B2 (ja) * | 1994-07-14 | 1998-03-25 | シャープ株式会社 | 分割型受光素子 |
DE69523285D1 (de) * | 1995-02-27 | 2001-11-22 | Cons Ric Microelettronica | Halbleiterteilchendetektor und Verfahren zu seiner Herstellung |
JP2833588B2 (ja) * | 1996-07-30 | 1998-12-09 | 日本電気株式会社 | フォトディテクタおよびその製造方法 |
JP3170463B2 (ja) * | 1996-09-30 | 2001-05-28 | シャープ株式会社 | 回路内蔵受光素子 |
TW423103B (en) * | 1997-01-27 | 2001-02-21 | Sharp Kk | Divided photodiode |
TW504849B (en) * | 1997-02-25 | 2002-10-01 | Matsushita Electric Ind Co Ltd | Optical receiver |
JP4131031B2 (ja) * | 1998-03-17 | 2008-08-13 | ソニー株式会社 | 受光素子を有する半導体装置、光学ピックアップ装置、および受光素子を有する半導体装置の製造方法 |
DE69933820D1 (de) * | 1998-03-21 | 2006-12-14 | Univ Liverpool John Moores | Teilchenfoermiges Material zur Verwendung in der Bautechnik und Herstellungsverfahren |
US6218691B1 (en) * | 1998-06-30 | 2001-04-17 | Hyundai Electronics Industries Co., Ltd. | Image sensor with improved dynamic range by applying negative voltage to unit pixel |
US6218719B1 (en) | 1998-09-18 | 2001-04-17 | Capella Microsystems, Inc. | Photodetector and device employing the photodetector for converting an optical signal into an electrical signal |
JP3370298B2 (ja) * | 1999-07-27 | 2003-01-27 | シャープ株式会社 | 回路内蔵受光素子 |
JP4131059B2 (ja) * | 1999-08-23 | 2008-08-13 | ソニー株式会社 | 受光素子を有する半導体装置、光学ピックアップ装置、および受光素子を有する半導体装置の製造方法 |
JP3900233B2 (ja) | 1999-09-06 | 2007-04-04 | シャープ株式会社 | 受光素子および回路内蔵型受光素子 |
JP3317942B2 (ja) | 1999-11-08 | 2002-08-26 | シャープ株式会社 | 半導体装置およびその製造方法 |
JP4208172B2 (ja) * | 2000-10-31 | 2009-01-14 | シャープ株式会社 | フォトダイオードおよびそれを用いた回路内蔵受光素子 |
EP1564817A1 (de) * | 2004-02-10 | 2005-08-17 | Samsung Electronics Co., Ltd. | Photodiode mit einer durch einen PN-Übergang getrennten lichtabsorbierenden Zone und Herstellungsverfahren dazu |
JP4858443B2 (ja) * | 2005-07-22 | 2012-01-18 | 株式会社ニコン | デジタルカメラ |
KR20080058841A (ko) * | 2006-12-22 | 2008-06-26 | 동부일렉트로닉스 주식회사 | 수직형 시모스 이미지 센서 및 그 제조 방법 |
IT1392502B1 (it) * | 2008-12-31 | 2012-03-09 | St Microelectronics Srl | Sensore comprendente almeno un fotodiodo a doppia giunzione verticale integrato su substrato semiconduttore e relativo processo di integrazione |
US20100163759A1 (en) * | 2008-12-31 | 2010-07-01 | Stmicroelectronics S.R.L. | Radiation sensor with photodiodes being integrated on a semiconductor substrate and corresponding integration process |
JP2020009790A (ja) * | 2016-11-09 | 2020-01-16 | シャープ株式会社 | アバランシェフォトダイオード |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4238760A (en) * | 1978-10-06 | 1980-12-09 | Recognition Equipment Incorporated | Multi-spectrum photodiode devices |
US4366377A (en) * | 1980-09-29 | 1982-12-28 | Mcdonnell Douglas Corporation | Dual sensitivity optical sensor |
JPS63138784A (ja) * | 1986-11-29 | 1988-06-10 | Sharp Corp | 半導体受光素子 |
JPS63187426A (ja) * | 1987-01-29 | 1988-08-03 | Sharp Corp | ピツクアツプ用受光素子 |
US5162887A (en) * | 1988-10-31 | 1992-11-10 | Texas Instruments Incorporated | Buried junction photodiode |
JP2717839B2 (ja) * | 1989-03-20 | 1998-02-25 | 松下電子工業株式会社 | 光半導体装置 |
JP2670634B2 (ja) * | 1990-03-12 | 1997-10-29 | シャープ株式会社 | 回路内蔵受光素子 |
JP2678400B2 (ja) * | 1990-11-14 | 1997-11-17 | シャープ株式会社 | 回路内蔵受光素子 |
-
1993
- 1993-04-19 JP JP5091269A patent/JP2799540B2/ja not_active Expired - Fee Related
-
1994
- 1994-04-15 US US08/227,878 patent/US5466962A/en not_active Expired - Lifetime
- 1994-04-19 EP EP94302761A patent/EP0621639B1/de not_active Expired - Lifetime
- 1994-04-19 DE DE69408707T patent/DE69408707T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH06302844A (ja) | 1994-10-28 |
DE69408707T2 (de) | 1998-09-10 |
US5466962A (en) | 1995-11-14 |
EP0621639B1 (de) | 1998-03-04 |
JP2799540B2 (ja) | 1998-09-17 |
EP0621639A1 (de) | 1994-10-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |