[go: up one dir, main page]

DE69408707D1 - Lichtempfindliche Halbleitervorrichtung - Google Patents

Lichtempfindliche Halbleitervorrichtung

Info

Publication number
DE69408707D1
DE69408707D1 DE69408707T DE69408707T DE69408707D1 DE 69408707 D1 DE69408707 D1 DE 69408707D1 DE 69408707 T DE69408707 T DE 69408707T DE 69408707 T DE69408707 T DE 69408707T DE 69408707 D1 DE69408707 D1 DE 69408707D1
Authority
DE
Germany
Prior art keywords
semiconductor device
photosensitive semiconductor
photosensitive
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69408707T
Other languages
English (en)
Other versions
DE69408707T2 (de
Inventor
Motohiko Yamamoto
Masaru Kubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Application granted granted Critical
Publication of DE69408707D1 publication Critical patent/DE69408707D1/de
Publication of DE69408707T2 publication Critical patent/DE69408707T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/103Integrated devices the at least one element covered by H10F30/00 having potential barriers, e.g. integrated devices comprising photodiodes or phototransistors
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B20/00Use of materials as fillers for mortars, concrete or artificial stone according to more than one of groups C04B14/00 - C04B18/00 and characterised by shape or grain distribution; Treatment of materials according to more than one of the groups C04B14/00 - C04B18/00 specially adapted to enhance their filling properties in mortars, concrete or artificial stone; Expanding or defibrillating materials
    • C04B20/10Coating or impregnating
    • C04B20/1055Coating or impregnating with inorganic materials
    • C04B20/1077Cements, e.g. waterglass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/30Coatings
    • H10F77/306Coatings for devices having potential barriers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Light Receiving Elements (AREA)
  • Element Separation (AREA)
  • Photovoltaic Devices (AREA)
DE69408707T 1993-04-19 1994-04-19 Lichtempfindliche Halbleitervorrichtung Expired - Fee Related DE69408707T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5091269A JP2799540B2 (ja) 1993-04-19 1993-04-19 受光素子

Publications (2)

Publication Number Publication Date
DE69408707D1 true DE69408707D1 (de) 1998-04-09
DE69408707T2 DE69408707T2 (de) 1998-09-10

Family

ID=14021731

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69408707T Expired - Fee Related DE69408707T2 (de) 1993-04-19 1994-04-19 Lichtempfindliche Halbleitervorrichtung

Country Status (4)

Country Link
US (1) US5466962A (de)
EP (1) EP0621639B1 (de)
JP (1) JP2799540B2 (de)
DE (1) DE69408707T2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2731115B2 (ja) * 1994-07-14 1998-03-25 シャープ株式会社 分割型受光素子
DE69523285D1 (de) * 1995-02-27 2001-11-22 Cons Ric Microelettronica Halbleiterteilchendetektor und Verfahren zu seiner Herstellung
JP2833588B2 (ja) * 1996-07-30 1998-12-09 日本電気株式会社 フォトディテクタおよびその製造方法
JP3170463B2 (ja) * 1996-09-30 2001-05-28 シャープ株式会社 回路内蔵受光素子
TW423103B (en) * 1997-01-27 2001-02-21 Sharp Kk Divided photodiode
TW504849B (en) * 1997-02-25 2002-10-01 Matsushita Electric Ind Co Ltd Optical receiver
JP4131031B2 (ja) * 1998-03-17 2008-08-13 ソニー株式会社 受光素子を有する半導体装置、光学ピックアップ装置、および受光素子を有する半導体装置の製造方法
DE69933820D1 (de) * 1998-03-21 2006-12-14 Univ Liverpool John Moores Teilchenfoermiges Material zur Verwendung in der Bautechnik und Herstellungsverfahren
US6218691B1 (en) * 1998-06-30 2001-04-17 Hyundai Electronics Industries Co., Ltd. Image sensor with improved dynamic range by applying negative voltage to unit pixel
US6218719B1 (en) 1998-09-18 2001-04-17 Capella Microsystems, Inc. Photodetector and device employing the photodetector for converting an optical signal into an electrical signal
JP3370298B2 (ja) * 1999-07-27 2003-01-27 シャープ株式会社 回路内蔵受光素子
JP4131059B2 (ja) * 1999-08-23 2008-08-13 ソニー株式会社 受光素子を有する半導体装置、光学ピックアップ装置、および受光素子を有する半導体装置の製造方法
JP3900233B2 (ja) 1999-09-06 2007-04-04 シャープ株式会社 受光素子および回路内蔵型受光素子
JP3317942B2 (ja) 1999-11-08 2002-08-26 シャープ株式会社 半導体装置およびその製造方法
JP4208172B2 (ja) * 2000-10-31 2009-01-14 シャープ株式会社 フォトダイオードおよびそれを用いた回路内蔵受光素子
EP1564817A1 (de) * 2004-02-10 2005-08-17 Samsung Electronics Co., Ltd. Photodiode mit einer durch einen PN-Übergang getrennten lichtabsorbierenden Zone und Herstellungsverfahren dazu
JP4858443B2 (ja) * 2005-07-22 2012-01-18 株式会社ニコン デジタルカメラ
KR20080058841A (ko) * 2006-12-22 2008-06-26 동부일렉트로닉스 주식회사 수직형 시모스 이미지 센서 및 그 제조 방법
IT1392502B1 (it) * 2008-12-31 2012-03-09 St Microelectronics Srl Sensore comprendente almeno un fotodiodo a doppia giunzione verticale integrato su substrato semiconduttore e relativo processo di integrazione
US20100163759A1 (en) * 2008-12-31 2010-07-01 Stmicroelectronics S.R.L. Radiation sensor with photodiodes being integrated on a semiconductor substrate and corresponding integration process
JP2020009790A (ja) * 2016-11-09 2020-01-16 シャープ株式会社 アバランシェフォトダイオード

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4238760A (en) * 1978-10-06 1980-12-09 Recognition Equipment Incorporated Multi-spectrum photodiode devices
US4366377A (en) * 1980-09-29 1982-12-28 Mcdonnell Douglas Corporation Dual sensitivity optical sensor
JPS63138784A (ja) * 1986-11-29 1988-06-10 Sharp Corp 半導体受光素子
JPS63187426A (ja) * 1987-01-29 1988-08-03 Sharp Corp ピツクアツプ用受光素子
US5162887A (en) * 1988-10-31 1992-11-10 Texas Instruments Incorporated Buried junction photodiode
JP2717839B2 (ja) * 1989-03-20 1998-02-25 松下電子工業株式会社 光半導体装置
JP2670634B2 (ja) * 1990-03-12 1997-10-29 シャープ株式会社 回路内蔵受光素子
JP2678400B2 (ja) * 1990-11-14 1997-11-17 シャープ株式会社 回路内蔵受光素子

Also Published As

Publication number Publication date
JPH06302844A (ja) 1994-10-28
DE69408707T2 (de) 1998-09-10
US5466962A (en) 1995-11-14
EP0621639B1 (de) 1998-03-04
JP2799540B2 (ja) 1998-09-17
EP0621639A1 (de) 1994-10-26

Similar Documents

Publication Publication Date Title
DE69328743D1 (de) Halbleiteranordnung
DE69334253D1 (de) Halbleitervorrichtung
DE69325951D1 (de) Halbleitervorrichtung
DE69610457D1 (de) Halbleitervorrichtung
KR970004020A (ko) 반도체장치
KR970005998A (ko) 반도체 장치
DE69400694D1 (de) Halbleitervorrichtung
DE69427158D1 (de) Fixiervorrichtung
DE69631940D1 (de) Halbleitervorrichtung
DE69408707D1 (de) Lichtempfindliche Halbleitervorrichtung
DE69334166D1 (de) Entwicklungsvorrichtung
DE59607521D1 (de) Halbleiter-Bauelement-Konfiguration
DE69411239D1 (de) Lichtempfangendes Halbleiter-Bauelement
DE69217160D1 (de) Entwicklungsvorrichtung
EP0723292A3 (de) Halbleiteranordnung
DE69430466D1 (de) Entwicklungsvorrichtung
EP0730347A3 (de) Halbleitervorrichtung
EP0720295A3 (de) Halbleitervorrichtung
DE69417788D1 (de) Entwicklervorrichtung
DE69124399D1 (de) Halbleitervorrichtung
DE69226742D1 (de) Halbleitervorrichtung
DE19681689T1 (de) Gesichertes Halbleiterbauelement
KR930009747U (ko) 반도체장치
DE4496282T1 (de) Halbleiter-Einrichtung
DE69332214D1 (de) Entwicklungsvorrichtung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee