KR930702152A - 니켈-코발트-붕소합금, 기구, 도금용액 및 이들의 제조방법 - Google Patents
니켈-코발트-붕소합금, 기구, 도금용액 및 이들의 제조방법Info
- Publication number
- KR930702152A KR930702152A KR1019930701107A KR930701107A KR930702152A KR 930702152 A KR930702152 A KR 930702152A KR 1019930701107 A KR1019930701107 A KR 1019930701107A KR 930701107 A KR930701107 A KR 930701107A KR 930702152 A KR930702152 A KR 930702152A
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- South Korea
- Prior art keywords
- nickel
- alloy
- cobalt
- substrate
- bath
- Prior art date
Links
- 238000007747 plating Methods 0.000 title claims abstract description 17
- 229910000521 B alloy Inorganic materials 0.000 title claims abstract 4
- 238000000034 method Methods 0.000 title claims description 14
- JJFNJZGXHWYGMQ-UHFFFAOYSA-N [Ni].B#[Co] Chemical compound [Ni].B#[Co] JJFNJZGXHWYGMQ-UHFFFAOYSA-N 0.000 title claims 2
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 229910045601 alloy Inorganic materials 0.000 claims abstract 30
- 239000000956 alloy Substances 0.000 claims abstract 30
- 239000010941 cobalt Substances 0.000 claims abstract 13
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract 13
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract 10
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract 8
- 238000000151 deposition Methods 0.000 claims abstract 5
- 229910052763 palladium Inorganic materials 0.000 claims abstract 4
- 229910000531 Co alloy Inorganic materials 0.000 claims abstract 2
- 229910000990 Ni alloy Inorganic materials 0.000 claims abstract 2
- 229910001429 cobalt ion Inorganic materials 0.000 claims abstract 2
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims abstract 2
- 230000008021 deposition Effects 0.000 claims abstract 2
- 229910001453 nickel ion Inorganic materials 0.000 claims abstract 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 31
- 229910052759 nickel Inorganic materials 0.000 claims 13
- 229910052796 boron Inorganic materials 0.000 claims 12
- 229910017052 cobalt Inorganic materials 0.000 claims 11
- 229910052751 metal Inorganic materials 0.000 claims 9
- 239000002184 metal Substances 0.000 claims 9
- TVJORGWKNPGCDW-UHFFFAOYSA-N aminoboron Chemical compound N[B] TVJORGWKNPGCDW-UHFFFAOYSA-N 0.000 claims 7
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims 6
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 6
- -1 Inconel-601 Substances 0.000 claims 5
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims 5
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims 5
- 239000004327 boric acid Substances 0.000 claims 5
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 4
- 239000011248 coating agent Substances 0.000 claims 4
- 238000000576 coating method Methods 0.000 claims 4
- 229910000361 cobalt sulfate Inorganic materials 0.000 claims 4
- 229940044175 cobalt sulfate Drugs 0.000 claims 4
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 claims 4
- 238000003756 stirring Methods 0.000 claims 4
- 239000010936 titanium Substances 0.000 claims 4
- 229910052719 titanium Inorganic materials 0.000 claims 4
- 229910001369 Brass Inorganic materials 0.000 claims 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 3
- 229910052782 aluminium Inorganic materials 0.000 claims 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 3
- 239000010951 brass Substances 0.000 claims 3
- 239000003795 chemical substances by application Substances 0.000 claims 3
- 239000000463 material Substances 0.000 claims 3
- 150000002736 metal compounds Chemical class 0.000 claims 3
- 239000004033 plastic Substances 0.000 claims 3
- 229920003023 plastic Polymers 0.000 claims 3
- 229910052697 platinum Inorganic materials 0.000 claims 3
- 229910052709 silver Inorganic materials 0.000 claims 3
- 239000004332 silver Substances 0.000 claims 3
- 239000010935 stainless steel Substances 0.000 claims 3
- 229910001220 stainless steel Inorganic materials 0.000 claims 3
- 229910000601 superalloy Inorganic materials 0.000 claims 3
- 239000011135 tin Substances 0.000 claims 3
- 229910052718 tin Inorganic materials 0.000 claims 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 3
- 229910052721 tungsten Inorganic materials 0.000 claims 3
- 239000010937 tungsten Substances 0.000 claims 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 3
- 229910052725 zinc Inorganic materials 0.000 claims 3
- 239000011701 zinc Substances 0.000 claims 3
- 229910020674 Co—B Inorganic materials 0.000 claims 2
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 claims 2
- 239000000919 ceramic Substances 0.000 claims 2
- 150000001868 cobalt Chemical class 0.000 claims 2
- YPTUAQWMBNZZRN-UHFFFAOYSA-N dimethylaminoboron Chemical compound [B]N(C)C YPTUAQWMBNZZRN-UHFFFAOYSA-N 0.000 claims 2
- 238000004070 electrodeposition Methods 0.000 claims 2
- 239000007888 film coating Substances 0.000 claims 2
- 238000009501 film coating Methods 0.000 claims 2
- 239000011521 glass Substances 0.000 claims 2
- 239000011159 matrix material Substances 0.000 claims 2
- 239000007769 metal material Substances 0.000 claims 2
- 150000002815 nickel Chemical class 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 239000000080 wetting agent Substances 0.000 claims 2
- 238000003287 bathing Methods 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 239000013078 crystal Substances 0.000 claims 1
- 238000007598 dipping method Methods 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- 239000002241 glass-ceramic Substances 0.000 claims 1
- 229910021472 group 8 element Inorganic materials 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 238000002156 mixing Methods 0.000 claims 1
- 229910052755 nonmetal Inorganic materials 0.000 claims 1
- 230000000737 periodic effect Effects 0.000 claims 1
- 238000005086 pumping Methods 0.000 claims 1
- 230000004936 stimulating effect Effects 0.000 claims 1
- 238000009736 wetting Methods 0.000 claims 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 abstract 1
- 230000004913 activation Effects 0.000 abstract 1
- KKAXNAVSOBXHTE-UHFFFAOYSA-N boranamine Chemical class NB KKAXNAVSOBXHTE-UHFFFAOYSA-N 0.000 abstract 1
- 239000008139 complexing agent Substances 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000003475 lamination Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
- H01S3/08068—Holes; Stepped surface; Special cross-section
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9335—Product by special process
- Y10S428/934—Electrical process
- Y10S428/935—Electroplating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12931—Co-, Fe-, or Ni-base components, alternative to each other
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12937—Co- or Ni-base component next to Fe-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12944—Ni-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12993—Surface feature [e.g., rough, mirror]
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Optical Elements Other Than Lenses (AREA)
- Electrodes Of Semiconductors (AREA)
- Chemically Coating (AREA)
- Laminated Bodies (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
본 발명은 치밀하고, 매끄럽고, 경질이고, 매우 반사성이 있고, 내식성, 내열성 및 내마모성이 있는 니켈, 코발트 및 붕소의 결정 합금을 제공하는 데에 있다. 합금이 펄스 구형파 전류의 사용으로 활성화 기판(16)상에 적층 용착된다.
적층 용착은 니켈 이온, 코발트 이온, 착화제 및 아미노 보란 화합물을 함유하는 전해욕(7)에서 완만한 낮은 pH 및 완만한 온도에서 일어난다. 불용성인 고체촉맨(18), 바람직하게는 팔라듐은 합금을 기판(16)의 표면으로 확산시키고 기판에 극성-공유 결합에 의해 결합되게 한다. 본 발명은 또한, 합금으로 피복된 기구 및 도금용액, 및 합금의 제조방법에 관한 것이다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 도금에 앞서 처리하는 데에 수반되는 단계를 설명하는 흐름도이다. 제2도는 도금공정을 위해 사용되는 탱크의 개략도이다. 제3도는 도금공정으로 기판의 내부 및 외부표면을 모두가 피복되는 것을 보여주는 원통형 튜브 또는 파이프 기판의 단면도이다. 제3A도는 제3도의 선(3a-3c)를 통해 취한 단면도이다.
Claims (36)
- 50 내지 83, 5중량%의 니켈, 16.5 내지 50중량%의 코발트 및 1 내지 5중량%의 붕소로 구성되는 용착 합금.
- 제1항에 있어서, 상기 합금이 합금의 최외곽 표면에서 50 내지 75중량%의 니켈, 25 내지 50중량%의 코발트 및 1 내지 5중량%의 붕소로 구성됨을 특징으로 하는 합금.
- 제1항에 있어서, 상기 합금이 결정구조로 50 내지 75중량%의 NiB 및 25 내지 50중량%의 Co2B로 구성되며, 상기 결정구조가 니켈-코발트의 매트릭스 내에 함유됨을 특징으로 하는 합금.
- 제3항에 있어서, 상기 합금이 상기 기판으로 부터 상기 용착 합금을 벗김으로써 박막으로서 형성됨을 특징으로 하는 합금.
- 제1항에 있어서, 상기 합금이 기판상에 적층 용착됨을 특징으로 하는 합금.
- 제5항에 있어서, 상기 합금이 합금과 기판 사이의 계면을 따라 기판내로 구조적으로 확산되고, 곡선 공유 결합에 의해 상기 기판에 결합됨을 특징으로 하는 합금.
- 제6항에 있어서, 상기 기판이 스테인레스강, 놋쇠, 인코넬-601, 티탄, 알루미늄, 주석, 아연, 백금, 팔라듐, 은, 텅스텐, 합금 또는 초합금으로 구성된 금속 화합물의 군, 또는 금속막 피복을 갖는 유리, 세라믹 및 플라스틱으로 구성된 비-금속 재료의 군으로 부터 선택됨을 특징으로 하는 합금
- 제7항에 있어서, 상기 합금이 전착에 의해 상기 기판상에 용착됨을 특징으로 하는 합금.
- 금속 표면을 갖는 기판 및 합금과 상기 금속 표면 사이의 계면을 따라 기판의 금속 표면상에 용착되고, 표면내로 확산되고, 극성 공유 결합에 의해 표면에 결합되는 니켈, 코발트 및 붕소로 구성되는 도금 합금으로 이루어지는 제품.
- 제9항에 있어서, 기판이 금속막 피복을 갖는 비금속 또는 금속 재료임을 특징으로 하는 제품.
- 제10항에 있어서, 금속이 스테인레스강, 놋쇠, 인코넬-601, 티탄, 알루미늄, 주석, 아연, 백금, 팔라듐, 은, 텅스텐, 합금 또는 초합금으로 구성된 금속 화합물의 군으로 부터 선택되고, 비금속 재료가 유리, 세라믹 플라스틱으로 구성된 군으로 부터 선택됨을 특징으로 하는 제품.
- 제9항에 있어서, 금속 기판이 내구성 기구임을 특징으로 하는 제품.
- 니켈, 코발트 및 붕소 이온의 도금욕을 제조하고, 주기율 표의 Ⅷ족 원소(니켈은 제외)로 구성된 군으로부터 선택된 촉매를 상기 금속욕에 넣고, 기판상의 피복으로서 니켈, 코발트 및 붕소 이온을 전착시키는 것으로 이루어지는 기판상에 니켈, 코발트 및 붕소 합금을 용착시키는 방법.
- 제13항에 있어서, 상기 도금욕을 연속적으로 교반시키고 여과시키는 것을 더 포함함을 특징으로 하는 방법.
- 제14항에 있어서, 상기 도금욕을 교반시키는 단계가 음극면을 공기와 교반시키고 양극면을 펌핑 작용에 의해 교반시키는 것을 이루어짐을 특징으로 하는 방법.
- 제15항에 있어서, 도금욕을 제조하는 단계가 도금욕 1ℓ당 1.00 내지 1.41몰의 니켈 염, 0.06 내지 0.125 몰의 코발트염, 0.5몰의 붕산 및 0.0125몰의 아미노-보란을 혼합시키는 것으로 이루어짐을 특징으로 하는 방법.
- 제16항에 있어서, 상기 코발트 염이 황산 코발트로 이루어지고 상기 니켈 염이 염화 니켈 및 황산 니켈로 이루어지며 상기 욕이 욕 1ℓ당 0.25 내지 0.31몰의 염화 니켈, 0.75 내지 1.1몰의 황산 니켈 및 0.06 내지 0.125몰의 황산 코발트를 포함함을 특징으로 하는 방법.
- 제17항에 있어서, 상기 아미노-보란이 디메틸아미노-보란으로 이루어짐을 특징으로 하는 방법.
- 제17항에 있어서, 상기 욕을 제조하는 상기 단계가, 적합한 양의 물을 150℉까지 가열시키고, 상기 물에 황산 니켈을 용해시키고, 상기 물에 염화니켈 및 황산 니켈을 용해시키고, 붕산을 욕에 첨가하고, 상기 욕이 32메쉬체를 통과할때 상기 욕을 100 내지 110℉까지 냉각시키고, 용해된 아미노-보란을 욕에 첨가하고, 욕을 150℉까지 가열하고 욕의 pH를 3.8 내지 4로 조정하고 습윤 및 응력 제거제를 첨가하는 것으로 이루어짐을 특징으로 하는 방법.
- 제13항에 있어서, 상기 기판상에 니켈, 코발트 및 붕소를 전착시키는 단계가, 0.018 내지 0.076amp/㎠의 평균 전류 밀도를 갖는 펄스 구형파 전류를 도금욕을 통해 통과시키면서, 상기 기판을 상기 욕에 침지시키는 것을 포함함을 특징으로 하는 방법.
- 니켈-코발트-붕소 합금으로 기판을 피복시키는 데에 사용하기 위한 황산 니켈, 염화 니켈, 황산 코발트, 붕산 및 아미노-보란을 포함하는 도금욕.
- 제21항에 있어서, 상기 욕이 욕 1ℓ당 1.0몰의 황산 니켈, 0.250 내지 0.31몰의 염화 니켈, 0.06 내지 0.0125몰의 황산 코발트, 0.5몰의 붕산 및 0.0125몰의 아미노-보란을 포함함을 특징으로 하는 도금욕.
- 제22항에 있어서, 상기 아미노-보란이 디메틸아미노-보란임을 특징으로 하는 도금욕.
- 제22항에 있어서, 상기 욕이 습윤제 및 응력 제거제를 더 포함함을 특징으로 하는 도금욕.
- 상기 기판을 도금욕에 넣기에 앞서 도금 기판을 양극적으로 세척하기 위한, NaOH, NaSiO3및 Na5P3O10으로 이루어진 용액.
- 금속막 피복을 갖는 스테인레스강, 놋쇠, 인코넬-601, 티탄, 알루미늄, 주석, 아연, 백금, 팔라듐, 은, 텅스텐, 합금 및 초합금으로 구성된 금속 화합물의 군, 또는 유리 세라믹 및 플라스틱으로 구성된 비금속 재료의 군으로 부터 선택된 기판상에 전착된 니켈, 코발트 및 붕소로 구성된 합금으로 이루어진 기구.
- 제26항에 있어서, 상기 기구가, 상기 기판을 니켈 및 코발트 이온, 붕산 및 아미노-보란으로 이루어진 도금욕내에 침지시키고, 욕을 통해 펄스 구형과 전류를 통과시킴으로써 상기 합금으로 피복됨을 특징으로 하는 기구.
- 제27항에 있어서, 상기 욕이 습윤제 및 응력 제거제를 더 포함함을 특징으로 하는 기구.
- 제26항에 있어서, 상기 피복이 50 내지 83.5중량%의 니켈, 16.5 내지 50중량%의 코발트 및 1 내지 5중량%의 붕소로 이루어짐을 특징으로 하는 기구.
- 제29항에 있어서, 상기 니켈, 코발트 및 붕소가 Ni3B 및 Co2B로서 존재함을 특징으로 하는 기구.
- 제30항에 있어서, 상기 합금이 55.05 내지 73.52중량%의 Ni2B 및 26.48 내지 44.95중량%의 Co2B로 이루어짐을 특징으로 하는 기구.
- 레이저 튜브의 반대 말단에 있는 한쌍의 레이저 거울, 및 레이저 튜브 내에서 이온을 자극하기 위한 에너지원을 구성된 레이저로서, 상기 레이저 거울이 그위에 다수의 딤플을 가짐을 특징으로 하는 레이저.
- 제32항에 있어서, 레이저 거울이 니켈-코발트의 매트릭스에서 50 내지 75%의 Ni2B 및 25 내지 50.9%의 Co2B로 이루어지는 Ni-Co-B합금으로 피복됨을 특징으로 하는 레이저.
- 저전도도를 갖는 비활성화 기판 및 니켈, 코발트 및 붕소를 전착시키는 것으로 이루어지는 Ni-Co-B박막을 생성시키는 방법.
- 제34항에 있어서, 상기 전착 단계가 상기 니켈, 코발트 및 붕소를 티탄 기판상에 용착시키는 것을 포함함을 특징으로 하는 방법.
- ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US594,570 | 1990-10-09 | ||
| US07/594,570 US5213907A (en) | 1990-10-09 | 1990-10-09 | Nickel-cobalt-boron-alloy deposited on a substrate |
| PCT/US1991/007413 WO1992005952A1 (en) | 1990-10-09 | 1991-10-07 | Nickel-cobalt-boron alloy, implement, plating solution and method for making |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR930702152A true KR930702152A (ko) | 1993-09-08 |
Family
ID=24379443
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019930701107A KR930702152A (ko) | 1990-10-09 | 1991-10-07 | 니켈-코발트-붕소합금, 기구, 도금용액 및 이들의 제조방법 |
Country Status (11)
| Country | Link |
|---|---|
| US (2) | US5213907A (ko) |
| EP (1) | EP0556341A4 (ko) |
| JP (1) | JP3324061B2 (ko) |
| KR (1) | KR930702152A (ko) |
| AU (1) | AU647345B2 (ko) |
| CA (1) | CA2094403A1 (ko) |
| DE (1) | DE556341T1 (ko) |
| ES (1) | ES2043579T1 (ko) |
| GR (1) | GR930300128T1 (ko) |
| MX (1) | MX9101502A (ko) |
| WO (1) | WO1992005952A1 (ko) |
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-
1990
- 1990-10-09 US US07/594,570 patent/US5213907A/en not_active Expired - Fee Related
-
1991
- 1991-10-07 ES ES92902559T patent/ES2043579T1/es active Pending
- 1991-10-07 EP EP19920902559 patent/EP0556341A4/en not_active Withdrawn
- 1991-10-07 AU AU89147/91A patent/AU647345B2/en not_active Ceased
- 1991-10-07 DE DE92902559T patent/DE556341T1/de active Pending
- 1991-10-07 KR KR1019930701107A patent/KR930702152A/ko not_active Application Discontinuation
- 1991-10-07 CA CA002094403A patent/CA2094403A1/en not_active Abandoned
- 1991-10-07 JP JP50067492A patent/JP3324061B2/ja not_active Expired - Fee Related
- 1991-10-07 WO PCT/US1991/007413 patent/WO1992005952A1/en not_active Application Discontinuation
- 1991-10-09 MX MX9101502A patent/MX9101502A/es unknown
-
1993
- 1993-04-09 US US08/045,977 patent/US5314608A/en not_active Expired - Fee Related
- 1993-12-30 GR GR930300128T patent/GR930300128T1/el unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO1992005952A1 (en) | 1992-04-16 |
| AU647345B2 (en) | 1994-03-17 |
| DE556341T1 (de) | 1994-02-03 |
| US5213907A (en) | 1993-05-25 |
| MX9101502A (es) | 1992-07-01 |
| EP0556341A1 (en) | 1993-08-25 |
| ES2043579T1 (es) | 1994-01-01 |
| JPH06504583A (ja) | 1994-05-26 |
| US5314608A (en) | 1994-05-24 |
| EP0556341A4 (en) | 1993-09-15 |
| GR930300128T1 (ko) | 1993-12-30 |
| JP3324061B2 (ja) | 2002-09-17 |
| CA2094403A1 (en) | 1992-04-10 |
| AU8914791A (en) | 1992-04-28 |
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