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KR930011136A - Wafer storage method above atmospheric pressure and its device - Google Patents

Wafer storage method above atmospheric pressure and its device Download PDF

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Publication number
KR930011136A
KR930011136A KR1019910021093A KR910021093A KR930011136A KR 930011136 A KR930011136 A KR 930011136A KR 1019910021093 A KR1019910021093 A KR 1019910021093A KR 910021093 A KR910021093 A KR 910021093A KR 930011136 A KR930011136 A KR 930011136A
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KR
South Korea
Prior art keywords
atmospheric pressure
shoe
adjusting means
pressure
wafer storage
Prior art date
Application number
KR1019910021093A
Other languages
Korean (ko)
Other versions
KR940008315B1 (en
Inventor
박태훈
심태언
김영관
고용선
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019910021093A priority Critical patent/KR940008315B1/en
Publication of KR930011136A publication Critical patent/KR930011136A/en
Application granted granted Critical
Publication of KR940008315B1 publication Critical patent/KR940008315B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 확산공정전에 대기압 이상에서 웨이퍼를 보관토록 함으로써 자연 산화막의 성장을 방지하여 게이트옥사이드의 신뢰성을 높일 수 있는 웨이퍼 보관방법과 그 장치를 제공하는데 있다.The present invention provides a wafer storage method and apparatus for preventing the growth of a native oxide film to increase the reliability of the gate oxide by storing the wafer above atmospheric pressure before the diffusion process.

이를 실현하기 위하여 본 발명은, 웨이퍼가 담겨지는 슈의 입구측에 유입압 조절수단을 설치하고 그 반대측에 배출압 조절수단을 설치하여 슈내가 대기압 이상이 되도록 하여 대기의 유입을 방지하여 산화막 성장을 억제토록 함을 특징으로 하고 있다.In order to realize this, the present invention provides an inlet pressure adjusting means on the inlet side of the shoe in which the wafer is contained, and an outlet pressure adjusting means on the opposite side to prevent the inflow of the atmosphere by preventing the inflow of the atmosphere by allowing the shoe to be above the atmospheric pressure. It is characterized by suppression.

Description

대기압 이상에서의 웨이퍼 보관방법과 그 장치Wafer storage method above atmospheric pressure and its device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

도면은 본 발명에 의한 웨이퍼 보관장치의 횡단면도이다.The figure is a cross-sectional view of a wafer storage device according to the present invention.

Claims (2)

웨이퍼가 수용되는 슈의 입구측에 질소개스 유입압 조절수단을 설치하여 질소개스를 주입하고, 출구측에 배출압 조절수단을 설치하여 이들 조절수단으로 슈내의 질소개스압이 대기압보다 높은 상태로 유지되도록 함으로써 대기의 유입을 방지토록 함을 특징으로 하는 대기압 이상에서의 웨이퍼 보관방법.Nitrogen gas inlet pressure adjusting means is installed at the inlet side of the shoe where wafers are accommodated to inject nitrogen gas, and outlet pressure adjusting means is installed at the outlet side, and the nitrogen gas pressure in the shoe is maintained above atmospheric pressure by these adjusting means. Wafer storage method at or above atmospheric pressure, characterized in that to prevent the inflow of the atmosphere by ensuring that. 슈(1)의 일측에 입구측 체크밸브(4)와 연결되는 제1쳄버(6)를 설치하고, 이 제1쳄버(6)에 통로(7)를 개폐하는 밸브(10)를 스프링(11)으로 탄지하여 공급되는 개스압에 의해 작동하는 유입압 조절수단(2)을 설치함과 아울러 상기한 슈(1)의 반대측에 출구측 체크밸브(20)와 연결되는 제2쳄버(14)를 설치하여 배출압에 의해 통로(15)를 개폐하는 밸브(16)를 스프링(17)으로 탄지시켜 이루어지는 배출압 조절수단(3)으로 슈(1)내부가 대기압 이상이 되도록 구성한 것을 특징으로 하는 대기압 이상에서의 웨이퍼 보관장치.A first chamber 6 is provided on one side of the shoe 1 to be connected to the inlet check valve 4, and the valve 10, which opens and closes the passage 7, is connected to the first chamber 6. The second chamber 14 connected to the outlet check valve 20 on the opposite side of the shoe 1, Atmospheric pressure, characterized in that the inside of the shoe (1) is above the atmospheric pressure by the discharge pressure adjusting means (3) formed by holding the valve 16 for opening and closing the passage (15) by the spring pressure by the discharge pressure Wafer storage device as described above. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019910021093A 1991-11-25 1991-11-25 Wafer storage method above atmospheric pressure and its device KR940008315B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019910021093A KR940008315B1 (en) 1991-11-25 1991-11-25 Wafer storage method above atmospheric pressure and its device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019910021093A KR940008315B1 (en) 1991-11-25 1991-11-25 Wafer storage method above atmospheric pressure and its device

Publications (2)

Publication Number Publication Date
KR930011136A true KR930011136A (en) 1993-06-23
KR940008315B1 KR940008315B1 (en) 1994-09-12

Family

ID=19323402

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910021093A KR940008315B1 (en) 1991-11-25 1991-11-25 Wafer storage method above atmospheric pressure and its device

Country Status (1)

Country Link
KR (1) KR940008315B1 (en)

Also Published As

Publication number Publication date
KR940008315B1 (en) 1994-09-12

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