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KR910018176A - 광경화성 부재 및 그로 부터 제조된 플렉소그래픽 인쇄판 - Google Patents

광경화성 부재 및 그로 부터 제조된 플렉소그래픽 인쇄판 Download PDF

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Publication number
KR910018176A
KR910018176A KR1019910006899A KR910006899A KR910018176A KR 910018176 A KR910018176 A KR 910018176A KR 1019910006899 A KR1019910006899 A KR 1019910006899A KR 910006899 A KR910006899 A KR 910006899A KR 910018176 A KR910018176 A KR 910018176A
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South Korea
Prior art keywords
block copolymer
acrylonitrile
printing plate
butadiene
elastic
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KR1019910006899A
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English (en)
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KR100187940B1 (ko
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케이. 고스 윌리엄
양 마이클 더블유
Original Assignee
로날드 에이. 블리커
더블유. 알. 그레이스 앤드 컴패니-콘.
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Publication of KR910018176A publication Critical patent/KR910018176A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

내용 없음

Description

광경화성 부재 및 그로부터 제조된 플렉소그래픽 인쇄판
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (24)

  1. 광경화성 베이스층 및 인접하는 광경화성 인쇄층을 포함하는 광경화성 부재에 있어서, 인쇄층이 블록 공중체, 광중합성 단량체 및 광개시제와 비혼화성이고 아크릴로니트릴/부타디엔 공중합체, 아크릴로니트릴/부타디엔/스티렌 공중합체, 아크릴로니트릴/이소프렌 공중합체, 카르복시화 아크릴로니트릴 중합체, 아크릴레이트 중합체 및 이들의 혼합물로부터 선정된 제2탄성 중합체 약 5 내지 60중량부와 탄성 블록 공중합체 약 40 내지 중량부를 포함하고; 베이스층이 탄성 중합체, 광중합성 단량체 및 광개시제를 포함하는 광경화성 부재.
  2. 제1항에 있어서, 인쇄층의 반대편에 있는 베이스층 표면에 배치된 지지체층을 더 포함하는 부재.
  3. 제1항에 있어서, 인쇄층이 블록 공중합체 약 50 내지 80부 및 제2탄성 중합체 약 20 내지 50부를 포함하는 부재.
  4. 제1항에 있어서, 탄성 블록 공중합체가 ABA 블록 공중합체이고 또 제2탄성 중합체가 아크릴로니트릴/부타디엔 공중합체인 부재.
  5. 제4항에 있어서, ABA 블록 공중합체가 폴리스티렌-폴리이소프렌-폴리스티렌 또는 폴리스티렌-폴리부타디엔-폴리스티렌인 부재.
  6. 제1항에 있어서, 제2탄성 중합체가 아크릴로니트릴/부타디엔 및 아크릴로니트릴/부타디엔/스티렌 공중합체의 혼합물인 부재.
  7. 제6항에 있어서, 아크릴로니트릴/부타디엔 공중합체가 혼합물의 50 중량% 이상을 포함하는 부재.
  8. 제1항에 있어서, 인쇄층에 있는 탄성 블록 공중합체가 광-가교성인 부재.
  9. 제1항에 있어서, 베이스층에 있는 탄성 중합체가 인쇄층에 있는 탄성 블록 공중합체와 동일한 부재.
  10. 제1항에 있어서, 탄성 블록 공중합체가 광-가교성 ABA 블록 공중합체인 부재.
  11. 제1항에 있어서, 인쇄층이 복사선에 대한 인쇄층의 감광성을 감소시키는 복사선 산란 및 흡수성 안료를 포함하는 부재.
  12. 제11항에 있어서, 인쇄층이 약 1 내지 10 중량%의 안료를 포함하는 부재.
  13. 제11항에 있어서, 안료가 프탈로시아닌 안료인 부재.
  14. 제1항에 있어서, 인쇄층이 약 5 내지 40 중량%의 광중합성 단량체 및 약 0.05 내지 3 중량%의 광개시제를 포함하는 부재.
  15. 제1항에 있어서, 비혼화성 제2탄성 중합체에 의해 형성된 중합체 영역이 약 5미크론 미만의 최대 치수를 갖는 부재.
  16. 제15항에 있어서, 중합체 영역이 약 0.5 내지 2.5 미크론 범위의 최대 치수를 갖는 부재.
  17. 광경화성 베이스층 및 베이스층과 인접하는 광경화성 인쇄층으로 부터 형성된 릴리이프상을 포함하는 릴리이프 인쇄판에 있어서, 인쇄층이 블록 공중합체, 광중합성 단량체 및 광개시제와 비혼화성이고 아크릴로니트릴/부타디엔/스티렌 공중합체, 아크릴로니트릴/부타디엔/스티렌 공중합체 아크릴로니트릴/이소프렌 공중합체, 카르복시화 아크릴로니트릴 중합체, 아크릴레이트 중합체 및 이들의 혼합물로부터 선정된 제2탄성 중합체 약 5 내지 60중량부와 탄성 블록 공중합체 약 40 내지 중량부를 포함하고; 베이스층이 탄성 중합체, 광중합성 단량체 및 광개시제를 포함하는 릴리이프 인쇄판.
  18. 제17항에 있어서, 인쇄층과 반대편에 있는 베이스층 표면에 배치된 지지체층을 포함하는 인쇄판.
  19. 제17항에 있어서, 인쇄판이 약 50 내지 80중량부의 블록 공중합체 및 약 20 내지 50중량부의 제2탄성 중합체를 포함하는 인쇄판.
  20. 제17항에 있어서, 탄성 블록 공중합체가 광- 가교된 폴리스티렌-폴리이소프렌-폴리스티렌 또는 폴리스티렌-폴리부타디엔-폴리스티렌 블록 공중합체 이고 또 제2탄성 중합체가 아크릴로니트릴/부타디엔 공중합체인 인쇄판.
  21. 제20항에 있어서, 제2탄성 중합체 성분이 아트릴로니트릴/부타디엔/스티렌 공중합체를 포함하는 인쇄판.
  22. 제17항에 있어서, 인쇄층이 복사선 산란 및 흡수성 안료를 포함하는 인쇄판.
  23. 제17항에 있어서, 비혼화성 제2탄성 중합체에 의해 형성된 중합체 영역이 약 5미크론 미만의 최대치수를 갖는 인쇄판.
  24. 제17항에 있어서, 중합체 영역이 약 0.5 내지 2.5 미크론 범위의 최대 치수를 갖는 인쇄판.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910006899A 1990-04-26 1991-04-25 광경화성 부재 및 그로부터 제조된 플렉소그래픽 인쇄판 KR100187940B1 (ko)

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Application Number Priority Date Filing Date Title
US51482590A 1990-04-26 1990-04-26
US514,825 1990-04-26
US68167191A 1991-04-10 1991-04-10
US681671 1991-04-10

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KR910018176A true KR910018176A (ko) 1991-11-30
KR100187940B1 KR100187940B1 (ko) 1999-06-01

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US (1) US5370968A (ko)
EP (1) EP0456336B1 (ko)
JP (1) JP2966960B2 (ko)
KR (1) KR100187940B1 (ko)
AR (1) AR247951A1 (ko)
AT (1) ATE154711T1 (ko)
AU (1) AU649247B2 (ko)
BR (1) BR9101694A (ko)
CA (1) CA2041023C (ko)
DE (1) DE69126566T2 (ko)
DK (1) DK0456336T3 (ko)
ES (1) ES2104656T3 (ko)
GR (1) GR3024482T3 (ko)
MX (1) MX170892B (ko)
NZ (1) NZ237919A (ko)

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BR9101694A (pt) 1991-12-10
GR3024482T3 (en) 1997-11-28
CA2041023C (en) 2002-03-12
AU7534491A (en) 1991-11-07
AU649247B2 (en) 1994-05-19
DE69126566D1 (de) 1997-07-24
EP0456336A2 (en) 1991-11-13
JPH04226459A (ja) 1992-08-17
US5370968A (en) 1994-12-06
DE69126566T2 (de) 1997-12-04
NZ237919A (en) 1994-09-27
ATE154711T1 (de) 1997-07-15
JP2966960B2 (ja) 1999-10-25
ES2104656T3 (es) 1997-10-16
CA2041023A1 (en) 1991-10-27
MX170892B (es) 1993-09-21
EP0456336A3 (en) 1991-12-27
DK0456336T3 (da) 1997-08-18
AR247951A1 (es) 1995-04-28
EP0456336B1 (en) 1997-06-18
KR100187940B1 (ko) 1999-06-01

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