KR900004727B1 - Protection of intergrated circuit from electrostatic discharge - Google Patents
Protection of intergrated circuit from electrostatic dischargeInfo
- Publication number
- KR900004727B1 KR900004727B1 KR8770500A KR870700500A KR900004727B1 KR 900004727 B1 KR900004727 B1 KR 900004727B1 KR 8770500 A KR8770500 A KR 8770500A KR 870700500 A KR870700500 A KR 870700500A KR 900004727 B1 KR900004727 B1 KR 900004727B1
- Authority
- KR
- South Korea
- Prior art keywords
- protection
- electrostatic discharge
- intergrated circuit
- intergrated
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/113—Isolations within a component, i.e. internal isolations
- H10D62/114—PN junction isolations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/87—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of PN-junction gate FETs
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78776485A | 1985-10-15 | 1985-10-15 | |
US787764 | 1985-10-15 | ||
PCT/US1986/001974 WO1987002511A1 (en) | 1985-10-15 | 1986-09-22 | Protection of igfet integrated circuits from electrostatic discharge |
Publications (2)
Publication Number | Publication Date |
---|---|
KR880700466A KR880700466A (ko) | 1988-03-15 |
KR900004727B1 true KR900004727B1 (en) | 1990-07-05 |
Family
ID=25142455
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR8770500A Expired KR900004727B1 (en) | 1985-10-15 | 1987-06-12 | Protection of intergrated circuit from electrostatic discharge |
Country Status (8)
Country | Link |
---|---|
US (1) | US4821089A (ko) |
EP (1) | EP0242383B1 (ko) |
JP (1) | JPH0828426B2 (ko) |
KR (1) | KR900004727B1 (ko) |
CA (1) | CA1253631A (ko) |
DE (1) | DE3681160D1 (ko) |
ES (1) | ES2002851A6 (ko) |
WO (1) | WO1987002511A1 (ko) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2575333B1 (fr) * | 1984-12-21 | 1987-01-23 | Radiotechnique Compelec | Dispositif de protection d'un circuit integre contre les decharges electrostatiques |
FR2623018B1 (fr) * | 1987-11-06 | 1990-02-09 | Thomson Semiconducteurs | Circuit integre protege contre les decharges electrostatiques avec seuil de protection variable |
USRE37477E1 (en) * | 1987-11-06 | 2001-12-18 | Sgs-Thomson Microelectronics, Inc. | Integrated circuit protected against electrostatic discharges, with variable protection threshold |
US5182621A (en) * | 1988-06-14 | 1993-01-26 | Nec Corporation | Input protection circuit for analog/digital converting semiconductor |
JP2513010B2 (ja) * | 1988-12-27 | 1996-07-03 | 日本電気株式会社 | 半導体集積回路の入力保護装置 |
US5124877A (en) * | 1989-07-18 | 1992-06-23 | Gazelle Microcircuits, Inc. | Structure for providing electrostatic discharge protection |
US5304839A (en) * | 1990-12-04 | 1994-04-19 | At&T Bell Laboratories | Bipolar ESD protection for integrated circuits |
US5272586A (en) * | 1991-01-29 | 1993-12-21 | National Semiconductor Corporation | Technique for improving ESD immunity |
EP0517391A1 (en) * | 1991-06-05 | 1992-12-09 | STMicroelectronics, Inc. | ESD protection circuit |
US5264723A (en) * | 1992-04-09 | 1993-11-23 | At&T Bell Laboratories | Integrated circuit with MOS capacitor for improved ESD protection |
US5838033A (en) * | 1993-09-08 | 1998-11-17 | Lucent Technologies Inc. | Integrated circuit with gate conductor defined resistor |
JPH07176693A (ja) * | 1993-12-17 | 1995-07-14 | Fujitsu Ltd | 入力保護回路 |
JP2643904B2 (ja) * | 1995-04-20 | 1997-08-25 | 日本電気株式会社 | 静電保護素子 |
US5773338A (en) * | 1995-11-21 | 1998-06-30 | Lucent Technologies Inc. | Bipolar transistor with MOS-controlled protection for reverse-biased emitter-based junction |
KR100449180B1 (ko) * | 1997-12-31 | 2005-01-05 | 주식회사 하이닉스반도체 | 반도체소자의정전기방지회로용트랜지스터구조 |
US7251250B2 (en) * | 2000-02-08 | 2007-07-31 | Cingular Wireless Ii, Llc | Method and apparatus for efficient sharing of communication system resources |
US6489232B1 (en) * | 2000-05-31 | 2002-12-03 | Agere Systems, Inc. | ESD resistant device |
US6426263B1 (en) | 2000-08-11 | 2002-07-30 | Agere Systems Guardian Corp. | Method for making a merged contact window in a transistor to electrically connect the gate to either the source or the drain |
US6724601B2 (en) | 2001-03-16 | 2004-04-20 | Integrated Device Technology, Inc. | ESD protection circuit |
US7329926B2 (en) * | 2003-04-01 | 2008-02-12 | Agere Systems Inc. | Semiconductor device with constricted current passage |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1209271A (en) * | 1967-02-27 | 1970-10-21 | Hitachi Ltd | Improvements in semiconductor devices |
US3555374A (en) * | 1967-03-03 | 1971-01-12 | Hitachi Ltd | Field effect semiconductor device having a protective diode |
US3673427A (en) * | 1970-02-02 | 1972-06-27 | Electronic Arrays | Input circuit structure for mos integrated circuits |
US3676742A (en) * | 1971-05-24 | 1972-07-11 | Signetics Corp | Means including a spark gap for protecting an integrated circuit from electrical discharge |
GB1518984A (en) * | 1974-07-16 | 1978-07-26 | Nippon Electric Co | Integrated circuit |
FR2289051A1 (fr) * | 1974-10-22 | 1976-05-21 | Ibm | Dispositifs a semi-conducteur du genre transistors a effet de champ et a porte isolee et circuits de protection cotre les surtensions |
US4295176A (en) * | 1979-09-04 | 1981-10-13 | Bell Telephone Laboratories, Incorporated | Semiconductor integrated circuit protection arrangement |
JPS57164571A (en) * | 1981-04-02 | 1982-10-09 | Mitsubishi Electric Corp | Semiconductro integrated circuit device |
US4435896A (en) * | 1981-12-07 | 1984-03-13 | Bell Telephone Laboratories, Incorporated | Method for fabricating complementary field effect transistor devices |
JPS58202573A (ja) * | 1982-05-21 | 1983-11-25 | Fujitsu Ltd | 半導体集積回路装置 |
JPS6074677A (ja) * | 1983-09-30 | 1985-04-26 | Toshiba Corp | 複合型サイリスタ |
JPS61237472A (ja) * | 1985-04-15 | 1986-10-22 | Nec Corp | 半導体装置 |
JPH05263075A (ja) * | 1992-03-17 | 1993-10-12 | Toshiba Corp | 熱蛍光体 |
-
1986
- 1986-09-22 DE DE8686906135T patent/DE3681160D1/de not_active Expired - Lifetime
- 1986-09-22 JP JP61505026A patent/JPH0828426B2/ja not_active Expired - Lifetime
- 1986-09-22 WO PCT/US1986/001974 patent/WO1987002511A1/en active IP Right Grant
- 1986-09-22 EP EP86906135A patent/EP0242383B1/en not_active Expired - Lifetime
- 1986-10-14 ES ES8602596A patent/ES2002851A6/es not_active Expired
- 1986-10-14 CA CA000520428A patent/CA1253631A/en not_active Expired
-
1987
- 1987-06-04 US US07/059,194 patent/US4821089A/en not_active Expired - Lifetime
- 1987-06-12 KR KR8770500A patent/KR900004727B1/ko not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0242383B1 (en) | 1991-08-28 |
JPH0828426B2 (ja) | 1996-03-21 |
JPS63501112A (ja) | 1988-04-21 |
ES2002851A6 (es) | 1988-10-01 |
EP0242383A1 (en) | 1987-10-28 |
DE3681160D1 (de) | 1991-10-02 |
US4821089A (en) | 1989-04-11 |
WO1987002511A1 (en) | 1987-04-23 |
CA1253631A (en) | 1989-05-02 |
KR880700466A (ko) | 1988-03-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20050701 Year of fee payment: 16 |
|
LAPS | Lapse due to unpaid annual fee |