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KR830002827A - 감작되어진 방향성의 요오드늄 또는 설포늄 화합물을 함유한 광중합성 조성물의 제조방법 - Google Patents

감작되어진 방향성의 요오드늄 또는 설포늄 화합물을 함유한 광중합성 조성물의 제조방법

Info

Publication number
KR830002827A
KR830002827A KR1019800001984A KR800001984A KR830002827A KR 830002827 A KR830002827 A KR 830002827A KR 1019800001984 A KR1019800001984 A KR 1019800001984A KR 800001984 A KR800001984 A KR 800001984A KR 830002827 A KR830002827 A KR 830002827A
Authority
KR
South Korea
Prior art keywords
composition containing
photopolymerizable composition
sulfonium compound
aromatic iodonium
containing sensitized
Prior art date
Application number
KR1019800001984A
Other languages
English (en)
Other versions
KR840000122B1 (ko
Inventor
헨리 스미스 조지
Original Assignee
로버트 맥크린 아담스
미네소타 마이닝 앤드 매뉴팩츄어링 컴페니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 로버트 맥크린 아담스, 미네소타 마이닝 앤드 매뉴팩츄어링 컴페니 filed Critical 로버트 맥크린 아담스
Publication of KR830002827A publication Critical patent/KR830002827A/ko
Application granted granted Critical
Publication of KR840000122B1 publication Critical patent/KR840000122B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/02—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit
    • F16K11/06—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements
    • F16K11/078—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with pivoted and linearly movable closure members
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86493—Multi-way valve unit
    • Y10T137/86549—Selective reciprocation or rotation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87917—Flow path with serial valves and/or closures
    • Y10T137/87981—Common actuator

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Polyethers (AREA)
  • Epoxy Resins (AREA)
  • Sealing Material Composition (AREA)

Abstract

내용없음

Description

감작되어진 방향성의 요오드늄 또는 설포늄 화합물을 함유한 광중합성 조성물의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (1)

  1. 내용없음
KR1019800001984A 1979-05-21 1980-05-20 감작되어진 방향성의 요오드늄 또는 설포늄 화합물을 함유하는 감광개시인자 조성물 KR840000122B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US040,645 1979-05-21
US06/040,645 US4250053A (en) 1979-05-21 1979-05-21 Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US040645 1979-05-21

Publications (2)

Publication Number Publication Date
KR830002827A true KR830002827A (ko) 1983-05-30
KR840000122B1 KR840000122B1 (ko) 1984-02-16

Family

ID=21912128

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019800001984A KR840000122B1 (ko) 1979-05-21 1980-05-20 감작되어진 방향성의 요오드늄 또는 설포늄 화합물을 함유하는 감광개시인자 조성물

Country Status (13)

Country Link
US (1) US4250053A (ko)
JP (1) JPS55155018A (ko)
KR (1) KR840000122B1 (ko)
AU (1) AU521591B2 (ko)
BE (1) BE883404A (ko)
CA (1) CA1113638A (ko)
DE (1) DE3019211A1 (ko)
ES (1) ES8106967A1 (ko)
FR (1) FR2457511B1 (ko)
GB (1) GB2053243B (ko)
IT (1) IT1133014B (ko)
SE (1) SE446780B (ko)
ZA (1) ZA802991B (ko)

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FR2457511A1 (fr) 1980-12-19
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JPS612081B2 (ko) 1986-01-22
GB2053243B (en) 1983-11-16
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AU5855980A (en) 1980-11-27
FR2457511B1 (fr) 1987-01-30
ZA802991B (en) 1981-08-26
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IT1133014B (it) 1986-07-09

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