KR20210106166A - 자발광 감광성 수지 조성물, 이로부터 제조된 색변환층을 포함하는 컬러필터 및 화상표시장치 - Google Patents
자발광 감광성 수지 조성물, 이로부터 제조된 색변환층을 포함하는 컬러필터 및 화상표시장치 Download PDFInfo
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- KR20210106166A KR20210106166A KR1020200020984A KR20200020984A KR20210106166A KR 20210106166 A KR20210106166 A KR 20210106166A KR 1020200020984 A KR1020200020984 A KR 1020200020984A KR 20200020984 A KR20200020984 A KR 20200020984A KR 20210106166 A KR20210106166 A KR 20210106166A
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- 238000006243 chemical reaction Methods 0.000 title claims description 59
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- 238000004220 aggregation Methods 0.000 claims abstract description 16
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- 125000001072 heteroaryl group Chemical group 0.000 claims description 11
- 125000000524 functional group Chemical group 0.000 claims description 10
- 125000000623 heterocyclic group Chemical group 0.000 claims description 10
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 8
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
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- QBDSZLJBMIMQRS-UHFFFAOYSA-N p-Cumylphenol Chemical group C=1C=C(O)C=CC=1C(C)(C)C1=CC=CC=C1 QBDSZLJBMIMQRS-UHFFFAOYSA-N 0.000 description 4
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Images
Classifications
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0041—Optical brightening agents, organic pigments
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3495—Six-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/549—Silicon-containing compounds containing silicon in a ring
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
- Optical Filters (AREA)
Abstract
Description
(단위: 중량%) | 실시예 | 비교예 | ||||||||||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 | 12 | 13 | 1 | 2 | 3 | 4 | ||
형광염료 (A) |
A-1 | - | - | - | - | - | - | - | - | - | - | - | - | - | - | - | 0.7 | - |
A-2 | - | - | - | - | - | - | - | - | - | - | - | - | - | - | - | - | 0.7 | |
A-3 | 0.1 | 0.2 | 0.4 | 0.5 | 0.6 | 0.7 | 0.9 | - | - | - | - | 0.7 | 0.7 | 1 | - | - | - | |
A-4 | - | - | - | - | - | - | 0.1 | 0.7 | - | - | - | - | - | - | - | - | ||
A-5 | - | - | - | - | - | - | - | - | - | 0.7 | - | - | - | - | - | - | - | |
A-6 | - | - | - | - | - | - | - | - | - | - | 0.7 | - | - | - | - | - | - | |
A-7 | 0.9 | 0.8 | 0.6 | 0.5 | 0.4 | 0.3 | 0.1 | 0.9 | 0.3 | 0.3 | 0.3 | - | - | - | 1 | 0.3 | 0.3 | |
A-8 | - | - | - | - | - | - | - | - | - | - | - | 0.3 | - | - | - | - | - | |
A-9 | - | - | - | - | - | - | - | - | - | - | - | - | 0.3 | - | - | - | - | |
알칼리 가용성 수지(B) | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | 8.5 | |
광중합성 화합물(C) | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | 5.5 | |
광중합개시제 (D) |
D-1 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 | 0.83 |
D-2 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | 0.33 | |
용매(E) | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | |
A-1: 루모겐(Lumogen) F(Y083, BASF사 제조) A-2: 쿠마린(Coumarin) 153 A-3: 화학식 1-1의 응집 유도 발광 녹색 염료 A-4: 화학식 1-2의 응집 유도 발광 녹색 염료 A-5: 화학식 1-3의 응집 유도 발광 녹색 염료 A-6: 화학식 1-4의 응집 유도 발광 녹색 염료 A-7: 적색계열 염료(화학식 2-4의 화합물) A-8: 적색계열 염료(화학식 2-8의 화합물) A-9: 적색계열 염료(화학식 2-11의 화합물) B: 합성예 2의 알칼리 가용성 수지 C: 디펜타에리트리톨헥사아크릴레이트(Kayarad DPHA, 닛본 카야꾸㈜ 제조) D-1: 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온 (Irgacure 369; Ciba Specialty Chemical사 제조) D-2: 4,4'-디(N,N'-디메틸아미노)-벤조페논(EAB-F; 호도가야 카가쿠㈜제조) E: 프로필렌글리콜모노메틸에테르아세테이트 |
발광 강도(λmax: 610) | 내열성 평가 | 내광성 평가 | |
실시예 1 | 3500 | ○ | ○ |
실시예 2 | 3700 | ○ | ○ |
실시예 3 | 4000 | ○ | ○ |
실시예 4 | 4200 | ○ | ○ |
실시예 5 | 4400 | ○ | ○ |
실시예 6 | 4600 | ○ | ○ |
실시예 7 | 4100 | ○ | ○ |
실시예 8 | 3600 | ○ | ○ |
실시예 9 | 5000 | ○ | ○ |
실시예 10 | 4800 | ○ | ○ |
실시예 11 | 4500 | ○ | ○ |
실시예 12 | 4700 | ○ | ○ |
실시예 13 | 4800 | ○ | ○ |
비교예 1 | 1500 | ○ | ○ |
비교예 2 | 3000 | ○ | ○ |
비교예 3 | 4000 | × | × |
비교예 4 | 4100 | × | × |
20: 색변환층
30: 패턴층
Claims (15)
- 응집 유도 발광 녹색 염료 및 퍼릴렌 비스 이미드계 적색 염료를 함유하는 착색제; 알칼리 가용성 수지; 광중합성 화합물; 광중합 개시제; 및 용제를 포함하는 자발광 감광성 수지 조성물.
- 제1항에 있어서,
상기 응집 유도 발광 녹색 염료는 분자 구조 내에 실롤 구조를 포함하는 화합물인 것을 특징으로 하는 자발광 감광성 수지 조성물. - 제2항에 있어서,
상기 실롤 구조를 포함하는 화합물은 하기 화학식 1로 표시되는 화합물인 것을 특징으로 하는 자발광 감광성 수지 조성물.
[화학식 1]
(상기 화학식 1에서,
R1 및 R2는 각각 독립적으로 치환 또는 비치환된, C1 내지 C21의 알킬기, C6 내지 C26의 아릴기 또는 헤테로 아릴기이고,
R3 내지 R6은 각각 독립적으로 치환 또는 비치환된, C6 내지 C26의 아릴기, C6 내지 C26의 헤테로 아릴기, , 또는 이며,
상기 R7은 각각 독립적으로 치환 또는 비치환된, C1 내지 C100의 알킬기 또는 C6 내지 C26의 아릴기이며,
상기 n은 1 내지 3의 정수이고, 상기 m은 1 내지 100의 정수이다). - 제1항에 있어서,
상기 퍼릴렌 비스 이미드계 적색 염료는 하기 화학식 2의 구조를 포함하는 화합물인 것을 특징으로 하는 자발광 감광성 수지 조성물.
[화학식 2]
(상기 화학식 2에서,
상기 R8 및 R9는 각각 독립적으로 C6 내지 C20의 아릴기, C3 내지 C10의 헤테로 고리기 또는 C1 내지 C10의 알킬기이고,
상기 R10 내지 R13은 각각 독립적으로 수소원자, 할로겐원자, 히드록시기, C1 내지 C10의 알콕시기 또는 하기 구조식 1로 표시되는 작용기이다.)
[구조식 1]
(상기 구조식 1에서,
상기 R14는 각각 독립적으로 C1 내지 C10의 알킬기, 할로겐 원자, C6 내지 C18의 아릴기, C7 내지 C18의 아릴알킬기, 히드록시기, C1 내지 C10의 알콕시기, C1 내지 C10의 에스터기, 아민기 또는 원자수 3 내지 30의 복소환기이고,
x는 1 내지 5의 정수이며,
x중 어느 하나 이상이 2 이상인 경우, 그에 해당하는 R14 각각의 작용기는 서로 동일하거나 상이할 수 있다.) - 제6항에 있어서,
상기 화학식 2의 구조를 포함하는 화합물은 하기 화학식 2-2 의 구조를 포함하는 화합물인 것을 특징으로 하는 자발광 감광성 수지 조성물.
[화학식 2-2]
(상기 화학식 2-2에서,
R8 및 R9는 각각 독립적으로 C1 내지 C10의 알킬기로 치환 또는 비치환된 C6 내지 C18의 아릴기이고,
R14는 각각 독립적으로 수소, C1 내지 C10의 알킬기, C6 내지 C18의 아릴기, C7 내지 C18의 아릴알킬기, C1 내지 C18의 알콕시기, 원자수 3 내지 30의 복소환기 또는 할로겐기이며,
x는 각각 독립적으로 1 내지 5의 정수이고,
x중 어느 하나 이상이 2 이상인 경우, 그에 해당하는 R14 각각의 작용기는 서로 동일하거나 상이하다.) - 제1항에 있어서,
상기 착색제는 이를 포함하는 자발광 감광성 수지 조성물 중 고형분 전체 중량에 대하여, 0.01 내지 30중량%로 포함되는 것을 특징으로 하는 자발광 감광성 수지 조성물. - 제1항에 있어서,
상기 녹색 염료 대 적색 염료의 중량비는 1:99 내지 99:1인 것을 특징으로 하는 자발광 감광성 수지 조성물. - 제11항에 있어서,
상기 녹색 염료 대 적색 염료의 중량비는 2:8 내지 9:1인 것을 특징으로 하는 자발광 감광성 수지 조성물. - 제1항 내지 제12항 중 어느 한 항의 자발광 감광성 수지 조성물의 경화물을 포함하는 색변환층.
- 제13항의 색변환층을 포함하는 컬러필터.
- 제14항의 컬러필터를 포함하는 화상표시장치.
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