KR20190132366A - 디페닐아민 및 헤테로고리 디페닐아민 유도체 기반의 효율적인 인 안정화제 - Google Patents
디페닐아민 및 헤테로고리 디페닐아민 유도체 기반의 효율적인 인 안정화제 Download PDFInfo
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- KR20190132366A KR20190132366A KR1020197026229A KR20197026229A KR20190132366A KR 20190132366 A KR20190132366 A KR 20190132366A KR 1020197026229 A KR1020197026229 A KR 1020197026229A KR 20197026229 A KR20197026229 A KR 20197026229A KR 20190132366 A KR20190132366 A KR 20190132366A
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- XFZRQAZGUOTJCS-UHFFFAOYSA-N phosphoric acid;1,3,5-triazine-2,4,6-triamine Chemical compound OP(O)(O)=O.NC1=NC(N)=NC(N)=N1 XFZRQAZGUOTJCS-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
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- 239000001294 propane Substances 0.000 description 1
- LRGQZEKJTHEMOJ-UHFFFAOYSA-N propane-1,2,3-triol;zinc Chemical compound [Zn].OCC(O)CO LRGQZEKJTHEMOJ-UHFFFAOYSA-N 0.000 description 1
- OJTDGPLHRSZIAV-UHFFFAOYSA-N propane-1,2-diol Chemical compound CC(O)CO.CC(O)CO OJTDGPLHRSZIAV-UHFFFAOYSA-N 0.000 description 1
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- 239000012744 reinforcing agent Substances 0.000 description 1
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- 229960001755 resorcinol Drugs 0.000 description 1
- 238000001175 rotational moulding Methods 0.000 description 1
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- 235000019355 sepiolite Nutrition 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- WXMKPNITSTVMEF-UHFFFAOYSA-M sodium benzoate Chemical compound [Na+].[O-]C(=O)C1=CC=CC=C1 WXMKPNITSTVMEF-UHFFFAOYSA-M 0.000 description 1
- 235000010234 sodium benzoate Nutrition 0.000 description 1
- 239000004299 sodium benzoate Substances 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
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- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
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- 238000003860 storage Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
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- FQZYTYWMLGAPFJ-OQKDUQJOSA-N tamoxifen citrate Chemical compound [H+].[H+].[H+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.C=1C=CC=CC=1C(/CC)=C(C=1C=CC(OCCN(C)C)=CC=1)/C1=CC=CC=C1 FQZYTYWMLGAPFJ-OQKDUQJOSA-N 0.000 description 1
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 1
- NZNAAUDJKMURFU-UHFFFAOYSA-N tetrakis(2,2,6,6-tetramethylpiperidin-4-yl) butane-1,2,3,4-tetracarboxylate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CC(C(=O)OC1CC(C)(C)NC(C)(C)C1)C(C(=O)OC1CC(C)(C)NC(C)(C)C1)CC(=O)OC1CC(C)(C)NC(C)(C)C1 NZNAAUDJKMURFU-UHFFFAOYSA-N 0.000 description 1
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- 229930003799 tocopherol Natural products 0.000 description 1
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- 235000019149 tocopherols Nutrition 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- VLCLHFYFMCKBRP-UHFFFAOYSA-N tricalcium;diborate Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]B([O-])[O-].[O-]B([O-])[O-] VLCLHFYFMCKBRP-UHFFFAOYSA-N 0.000 description 1
- CNUJLMSKURPSHE-UHFFFAOYSA-N trioctadecyl phosphite Chemical compound CCCCCCCCCCCCCCCCCCOP(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC CNUJLMSKURPSHE-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- BHYQWBKCXBXPKM-UHFFFAOYSA-N tris[3-bromo-2,2-bis(bromomethyl)propyl] phosphate Chemical compound BrCC(CBr)(CBr)COP(=O)(OCC(CBr)(CBr)CBr)OCC(CBr)(CBr)CBr BHYQWBKCXBXPKM-UHFFFAOYSA-N 0.000 description 1
- WMXBGWKUWMQWAL-UHFFFAOYSA-H trizinc 1,3,5-triazine-2,4,6-triamine diphosphate Chemical compound N1=C(N)N=C(N)N=C1N.P(=O)([O-])([O-])[O-].[Zn+2].P(=O)([O-])([O-])[O-].[Zn+2].[Zn+2] WMXBGWKUWMQWAL-UHFFFAOYSA-H 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
- 239000008158 vegetable oil Substances 0.000 description 1
- 229910052902 vermiculite Inorganic materials 0.000 description 1
- 239000010455 vermiculite Substances 0.000 description 1
- 235000019354 vermiculite Nutrition 0.000 description 1
- 235000019154 vitamin C Nutrition 0.000 description 1
- 239000011718 vitamin C Substances 0.000 description 1
- 235000019165 vitamin E Nutrition 0.000 description 1
- 239000011709 vitamin E Substances 0.000 description 1
- 229940046009 vitamin E Drugs 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical compound [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 description 1
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- BHTBHKFULNTCHQ-UHFFFAOYSA-H zinc;tin(4+);hexahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Zn+2].[Sn+4] BHTBHKFULNTCHQ-UHFFFAOYSA-H 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
- QUEDXNHFTDJVIY-UHFFFAOYSA-N γ-tocopherol Chemical class OC1=C(C)C(C)=C2OC(CCCC(C)CCCC(C)CCCC(C)C)(C)CCC2=C1 QUEDXNHFTDJVIY-UHFFFAOYSA-N 0.000 description 1
- 239000002446 δ-tocopherol Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6581—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and nitrogen atoms with or without oxygen or sulfur atoms, as ring hetero atoms
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6581—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and nitrogen atoms with or without oxygen or sulfur atoms, as ring hetero atoms
- C07F9/6584—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and nitrogen atoms with or without oxygen or sulfur atoms, as ring hetero atoms having one phosphorus atom as ring hetero atom
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/5399—Phosphorus bound to nitrogen
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/06—Phosphorus compounds without P—C bonds
- C07F9/22—Amides of acids of phosphorus
- C07F9/24—Esteramides
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/22—Amides of acids of phosphorus
- C07F9/24—Esteramides
- C07F9/2454—Esteramides the amide moiety containing a substituent or a structure which is considered as characteristic
- C07F9/247—Esteramides the amide moiety containing a substituent or a structure which is considered as characteristic of aromatic amines (N-C aromatic linkage)
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/30—Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
- C07F9/36—Amides thereof
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
- C07F9/44—Amides thereof
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- C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
- C07F9/44—Amides thereof
- C07F9/4461—Amides thereof the amide moiety containing a substituent or a structure which is considered as characteristic
- C07F9/4476—Amides thereof the amide moiety containing a substituent or a structure which is considered as characteristic of aromatic amines (N-C aromatic linkage)
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/46—Phosphinous acids [R2POH], [R2P(= O)H]: Thiophosphinous acids including[R2PSH]; [R2P(=S)H]; Aminophosphines [R2PNH2]; Derivatives thereof
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/48—Phosphonous acids [RP(OH)2] including [RHP(=O)(OH)]; Thiophosphonous acids including [RP(SH)2], [RHP(=S)(SH)]; Derivatives thereof
- C07F9/4883—Amides or esteramides thereof, e.g. RP(NR'2)2 or RP(XR')(NR''2) (X = O, S)
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- C07F9/50—Organo-phosphines
- C07F9/5022—Aromatic phosphines (P-C aromatic linkage)
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/535—Organo-phosphoranes
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/6544—Six-membered rings
- C07F9/6547—Six-membered rings condensed with carbocyclic rings or carbocyclic ring systems
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- C07F9/657154—Cyclic esteramides of oxyacids of phosphorus
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/657163—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms the ring phosphorus atom being bound to at least one carbon atom
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/657163—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms the ring phosphorus atom being bound to at least one carbon atom
- C07F9/657181—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms the ring phosphorus atom being bound to at least one carbon atom the ring phosphorus atom and, at least, one ring oxygen atom being part of a (thio)phosphonic acid derivative
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/65719—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms the ring phosphorus atom being bound to at least one carbon atom the ring phosphorus atom and, at least, one ring oxygen atom being part of a (thio)phosphonous acid derivative
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Abstract
Description
첨가제 |
30초 후의 힘
(N) |
60초 후의 힘
(N) |
120초 후의 힘
(N) |
180초 후의 힘
(N) |
300초 후의 힘
(N) |
600초 후의 힘
(N) |
- |
1830 |
1760 |
1660 |
1590 |
1430 |
1260 |
ADK-STAB A6110.2% Caesit AVe) 0.1% |
1800 |
1820 |
1720 |
1660 |
1540 |
1270 |
페노티아진-DOP0.2% | 2040 | 2030 | 1940 | 1960 | 1990 | 1930 |
페노티아진-DOP0.5% | 1980 | 1990 | 2000 | 1990 | 2010 | 1970 |
페노티아진-DOP1.0% | 2000 | 2010 | 1970 | 1980 | 1990 | 2050 |
페노티아진- DOPS0.5% | 2000 | 2040 | 1990 | 2060 | 2020 | 2010 |
페노티아진- DOPS1.0% | 2020 | 2000 | 1970 | 1920 | 1930 | 2010 |
첨가제 |
30초 후의 힘
(N) |
60초 후의 힘
(N) |
120초 후의 힘
(N) |
180초 후의 힘
(N) |
300초 후의 힘
(N) |
600초 후의 힘
(N) |
- |
550 |
530 |
510 |
480 |
460 |
450 |
Ceasit 0.2% |
640 |
600 |
580 |
560 |
540 |
520 |
ADK-STAB A6110.2% |
610 |
570 |
560 |
540 |
520 |
530 |
PhP(BDBDA)2 0.2%Ceasit AV 0.2% |
730 |
730 |
750 |
740 |
740 |
730 |
BDBDA-DDP0.2% |
600 |
600 |
610 |
600 |
590 |
580 |
노즐 | Zone 7 | Zone 6 | Zone 5 | Zone 4 | Zone 3 | Zone 2 |
210 | 230 | 230 | 230 | 230 | 220 | 210 |
첫 번째 압출 | 두 번째 압출 | 세 번째 압출 | |
속도/r.p.m. | 150 | 150 | 150 |
처리량/g/h | 456 | 516 | 552 |
용융 온도/℃ | 216-217 | 215-217 | 215-216 |
용융 압력/bar | 26-28 | 30-33 | 31-33 |
토크/ % | 27-29 | 35-39 | 36-41 |
토크/Nm | 3.1-3.3 | 4.2-4.6 | 4.4-5.0 |
토크/kW | 0.04-0.05 | 0.06-0.07 | 0.06-0.07 |
순수한 PP | 첫 번째 압출 | 두 번째 압출 | 세 번째 압출 |
속도/r.p.m. | 150 | 150 | 150 |
처리량/g/h | 468 | 576 | 552 |
용융 온도/℃ | 213-215 | 214-217 | 214-217 |
용융 압력/bar | 27-29 | 32-33 | 30-32 |
토크/ % | 28-30 | 37-40 | 33-37 |
토크/Nm | 3.4-3.6 | 4.4-4.8 | 3.9-4.4 |
토크/kW | 0.05 | 0.06-0.07 | 0.06-0.07 |
Sample | MVR/ ccm /10분 |
순수한 PP (과립, 압출되지 않음) | 1.1294 |
순수한 PP의 첫 번째 추출 | 1.2120 |
순수한 PP의 두 번째 추출 | 1.3073 |
순수한 PP의 세 번째 추출 | 1.3714 |
0.3% PTZ_DOPS를 갖는 PP의 첫 번째 추출 | 1.1311 |
0.3% PTZ_DOPS를 갖는 PP의 두 번째 추출 | 1.1179 |
0.3% PTZ_DOPS를 갖는 PP의 세 번째 추출 | 1.1524 |
Claims (15)
- 산화성 분해, 열 분해 및/또는 화학선 분해에 대하여 유기 물질을 안정화시키기 위한, 하기 일반식 I에 따른 화합물 또는 복수의 화합물의 혼합물의 용도로서,
일반식 I
상기 일반식 I에서,
상기 프래그먼트(fragment) A는 를 의미하며,
서로 독립적으로,
X는 황 원자이고;
n은 0 또는 1이며;
x는 0 또는 1이고;
Z1 및 Z2는 수소, 알킬 잔기(alkyl residues), 아릴 잔기(aryl residues), 알킬 아릴 잔기(alkyl aryl residue), 아릴 알킬 잔기(aryl alkyl residues), 헤테로고리 잔기(heterocyclic residues)를 포함하는 그룹으로부터 선택되며, 하나 이상의 추가 프래그먼트 A 및/또는 B가 상기 잔기들에 결합될 수 있고;
그루핑(grouping) -O-Z3에서, Z3는 알킬 잔기, 아릴 잔기, 알킬 아릴 잔기, 아릴 알킬 잔기 및 헤테로고리 잔기로부터 선택되고;
그루핑 -S-Z4에서, Z4는 알킬 잔기, 아릴 잔기, 알킬 아릴 잔기, 아릴 알킬 잔기 및 헤테로고리 잔기로부터 선택되며;
x = 1의 경우, 상기 잔기 Z1 및 Z2는 인 원자와 함께, 하나 이상의 추가 프래그먼트 A 및/또는 B가 결합될 수 있는 고리 시스템을 형성할 수 있고;
상기 프래그먼트 B는 를 의미하며,
각각 서로 독립적으로,
상기 R1 내지 R10은 수소, 알킬 잔기, 아릴 잔기, 알킬 아릴 잔기, 아릴 알킬 잔기, 및 헤레토고리 잔기를 포함하는 그룹으로부터 선택되고, 상기 잔기 R1 및 R6는 페닐기를 연결하는 그룹핑 -Y-를 통해 연결될 수 있으며, 상기 Y는 S, O, NH, PH, 및 공유 결합을 포함하는 그룹으로부터 선택되고;
상기 프래그먼트 A 및 B는 인 원자와 질소 원자의 공유 결합에 의해 서로에 연결되며;
y는 1 또는 2이고,
x + y = 2인, 일반식 I에 따른 화합물 또는 복수의 화합물의 혼합물의 용도. - 제1항에 있어서,
플라스틱, 코팅체, 윤활유, 유압유, 엔진 오일, 터빈 오일, 트랜스미션 오일, 금속 가공 유체, 화학 약품 또는 모노머를 안정화시키기 위한, 일반식 I에 따른 화합물 또는 복수의 화합물의 혼합물의 용도. - 제1항 또는 제2항에 있어서,
상기 프래그먼트 A는 하기 잔기들로부터 선택되며:
여기에서, x = y = 1이고;
여기에서, x = 0이고, y = 2이며;
여기에서, x = y = 1이고; 또는
여기에서, x = y = 1이며;
서로 독립적으로,
R11은 수소, 알킬 잔기, 아릴 잔기, 알킬 아릴 잔기, 아릴 알킬 잔기 및 헤테로고리 잔기를 포함하는 그룹으로부터 선택되며;
R12는 수소, 알킬 잔기, 아릴 잔기, 알킬 아릴 잔기, 아릴 알킬 잔기 및 헤테로고리 잔기를 포함하는 그룹으로부터 선택되고, 상기 잔기들은 헤테로원자를 포함할 수 있으며, 및/또는 상기 잔기들 또는 복수의 추가 프래그먼트 A 및/또는 B에 결합될 수 있고;
X 및 n은 제1항에서 정의된 바와 같은 것을 특징으로 하는, 일반식 I에 따른 화합물 또는 복수의 화합물의 혼합물의 용도. - 제1항 내지 제8항 중 어느 한 항에 있어서,
상기 일반식 I에 따른 화합물 또는 상기 일반식 I에 따른 복수의 화합물의 혼합물의 경우, 상기 일반식 I에 따른 모든 화합물의 총량은 0.01 내지 10wt%, 바람직하게 0.05 내지 5wt%, 특히 바람직하게 0.1 내지 1.5wt%의 중량비로 상기 유기 물질에 포함되는 것을 특징으로 하는, 일반식 I에 따른 화합물 또는 복수의 화합물의 혼합물의 용도. - 제1항 내지 제9항 중 어느 한 항에 있어서,
상기 플라스틱은 다음을 포함하는 그룹으로부터 선택되는 것을 특징으로 하는, 일반식 I에 따른 화합물 또는 복수의 화합물의 혼합물의 용도:
a) 올레핀 또는 올레핀의 폴리머, 예를 들어 폴리에틸렌(LDPE, LLDPE, VLDPE, ULDPE, MDPE, HDPE, UHMWPE), 메탈로센-PE(metallocene-PE, m-PE), 폴리프로필렌(polypropylene), 폴리이소부틸렌(polyisobutylene), 폴리-4-메틸-펜텐-1(poly-4-methyl-pentene-1), 폴리부타디엔(polybutadiene), 폴리이소프렌(polyisoprene), 폴리사이클로옥텐(polycyclooctene), 폴리알킬렌 카본 모녹사이드 코폴리머(polyalkylene carbon monoxide copolymers); 및 정적 구조체 또는 블럭 구조체 형상의 코폴리머, 예를 들어 폴리프로필렌 폴리에틸렌(polypropylene-polyethylene, EP), EPM 또는 EPDM, 에틸렌 비닐아세테이트(ethylene-vinyl acetate, EVA), 에틸렌 부틸아크릴레이트(ethylene-butyl acrylate)와 에틸렌 아크릴산(ethylene-acrylic acid)과 이의 염(이오노머)과 같은 에틸렌 아크릴릭 에스테르(ethylene-acrylic ester); 및 터폴리머, 예를 들어 에틸렌 아크릴산 글리시딜(메타)아크릴레이트(ethylene-acrylic acid-glycidyl(meth)acrylate), 폴리프로필렌 그래프트 말레산 무수화물(polypropylene graft maleic acid anhydride)과 폴리프로필렌 그래프트 아크릴산(polypropylene graft acrylic acid)과 폴리에틸렌 그래프트 아크릴산(polyethylene graft acrylic acid)과 폴리에틸렌 폴리부틸아크릴레이트 그래프트 말레산 무수화물(polyethylene polybutylacrylate graft maleic acid anhydride)과 같은 그래프트 폴리머, 및 이의 블렌드,
b) 스티렌-부타디엔(styrene on butadiene), 말레산 무수화물-SBS(maleic acid anhydride on SBS) 또는 말레산 무수화물 SEBS(maleic acid anhydride on SEBS)와 같이 대응하는 그래프트 코폴리머, 및 메틸메타크릴레이트(methylmethacrylate), 스티렌 부타디엔(styrene butadiene), 및 ABS(MABS), 및 수화된 폴리스티렌 유도체(hydrated polystyrene derivatives)와 같은 그래프트 코폴리머를 포함하는, 폴리스티렌(polystyrene), 폴리메틸스티렌(polymethylstyrene), 폴리-알파-메틸스티렌(poly-alpha-methylstyrene), 폴리비닐 나프탈렌(polyvinyl naphthalene), 폴리비닐 비페닐(polyvinyl biphenyl), 폴리비닐 톨루올(polyvinyl toluol), 스티렌 부타디엔(styrene butadiene, SB), 스티렌 부타디엔 스티렌(styrene butadiene styrene, SBS), 스티렌 에틸렌 부틸렌 스티렌(styrene ethylene butylene styrene, SEBS), 스티렌 에틸렌 프로필렌 스티렌(styrene ethylene propylene styrene), 스티렌 이스프렌(styrene isoprene), 스티렌 이소프렌 스티렌(styrene isoprene styrene, SIS), 스티렌 부타디엔 아크릴로니트릴(styrene butadiene acrylonitrile, ABS), 스티렌 아크릴로니트릴(styrene acrylonitrile, SAN), 스티렌 아크릴로니트릴 아크릴레이트(styrene acrylonitrile acrylate, ASA), 스티렌 에틸렌(styrene ethylene), 스티렌 말레산 무수화물 폴리머(styrene maleic acid anhydride polymers);
c) 할로겐-함유 폴리머, 예를 들어 폴리비닐 클로라이드(polyvinyl chloride, PVC), 폴리클로로프렌(polychloroprene) 및 폴리비닐리덴 클로라이드(polyvinylidene chloride, PVDC), 비닐 클로라이드(vinyl chloride) 및 비닐리덴 클로라이드(vinylidene chloride)의 코폴리머 또는 비밀 클로라이드 및 비닐 아세테이트(vinyl acetate)의 코폴리머, 염소화된 폴리에틸렌(chlorinated polyethylene), 폴리비닐리덴 플루오라이드(polyvinylidene fluoride), 에피클로로히드린 호모폴리머(epichlorohydrin homopolymers) 및 이의 코폴리머;
d) 폴리아크릴레이트(polyacrylates) 및 폴리메타크릴레이트(polymethacrylates, PMMA)와 같은 불포화 에스테르의 코폴리머, 예를 들어 폴리부틸 아크릴레이트(polybutyl acrylate), 폴리라우릴 아크릴레이트(polylauryl acrylate), 폴리스테아릴 아크릴레이트(polystearyl acrylate), 폴리글리시딜 아크릴레이트(polyglycidyl acrylate), 폴리글리시딜 메타크릴레이트(polyglycidyl methacrylate), 폴리아크릴로니트릴(polyacrylonitrile), 폴리아크릴아미드(polyacrylamides), 폴리아크릴로니트릴-폴리 알킬 아크릴레이트(polyacrylonitrile-poly alkyl acrylate)와 같은 코폴리머;
e) 불포화 알코올 및 유도체의 폴리머, 예를 들어 폴리비닐 알코올(polyvinyl alcohol), 폴리비닐 아세테이트(polyvinyl acetate), 폴리비닐 부티랄(polyvinyl butyral), 폴리알릴 프탈레이트(polyallyl phthalate), 폴리알릴 멜라민(polyallyl melamine);
f) 폴리아세테이트(polyacetates), 예를 들어 폴리옥시메틸렌(polyoxymethlyene, POM), 또는 예를 들어 부탄알(butanal)과의 코폴리머;
g) 폴리페닐렌 옥사이드(polyphenylene oxides) 및 폴리스티렌(polystyrene) 또는 폴리아미드(polyamides)와의 블렌드;
h) 고리형 에테르의 폴리머, 예를 들어 폴리에틸렌 글리콜(polyethylene glycol), 폴리프로필렌 글리콜(polypropylene glycol), 폴리에틸렌 옥사이드(polyethylene oxide), 폴리프로필렌 옥사이드(polypropylene oxide), 폴리테트라하이드로퓨란(polytetrahydrofuran);
i) 하이드록시 말단 폴리에테르 또는 폴리에스테르 및 방향족 또는 지방족 이소시아네이트의 폴리우레탄, 특히 선형 폴리우레탄(linear polyurethanes, TPU), 폴리우레아(polyureas);
j) 폴리아미드-6, 6.6, 6.10, 4.6, 4.10, 6.12, 10.10, 10.12, 12.12, 폴리아미드 11, 폴리아미드 12와 같은 폴리아미드, 및 테레프탈산(terepththalic acid) 및/또는 이소프탈산(isophthalic acid)과 지방족 디아민(aliphatic diamines)으로부터 제조되거나 지방족 디카르복실산(aliphatic dicarboxylic acids), 예를 들어 아디프산(adipic acid) 또는 세바스산(sebacic acid)과 방향족 디아민(aromatic diamines), 예를 들어 1,4- 또는 1,3-디아미노벤졸로부터 제조된 폴리프탈아미드(polyphthalamides)와 같은 (부분) 방향족 폴리아미드, 다른 폴리아미드의 블렌드, 예를 들어 PA-6 및 PA 6.6의 블렌드, 및 PA/PP와 같은 폴리아미드와 폴리올레핀의 블렌드;
k) 폴리이미드(polyimides), 폴리아미드 이미드(polyamide imides), 폴리에테르 이미드(polyether imides), 폴리에스테르 이미드(polyester imides), 폴리(에테르)케톤(poly(ether)ketones), 폴리술폰(polysulfones), 폴리에테르 술폰(polyether sulfones), 폴리아릴 술폰(polyaryl sulfones), 폴리페닐렌 설파이드(polyphenylene sulfides), 폴리벤조이미다졸(polybenzimidazoles), 폴리히단토인(polyhydantoins);
l) 지방족 또는 방향족 디카르복실산과 디올의 폴리에스테르, 또는 하이드록시 카르복실산의 폴리에스테르, 예를 들어 폴리에틸렌 테레프탈레이트(polyethylene terephthalate, PET), 폴리부틸렌 테레프탈레이트(polybutylene terephthalate, PBT), 폴리프로필렌 테레프탈레이트(polypropylene terephthalate, PTT), 폴리에틸렌 나프탈레이트(polyethylene naphthalate, PEN), 폴리-1,4-디메틸올 사이클로헥산 테레프탈레이트(poly-1,4-dimethylol cyclohexane terephthalate), 폴리하이드록시 벤조에이트(polyhydroxy benzoate), 폴리하이드록시 나프탈레이트(polyhydroxy napththalate), 폴리 락산(poly lactic acid, PLA), 폴리하이드록시 부티레이트(polyhydroxy butyrate, PHB), 폴리하이드록시 발레르산(polyhydroxy valerate, PHV), 폴리에틸렌 숙시네이트(polyethylene succinate), 폴리테트라메틸렌 숙시네이트(polytetramethylene succinate), 폴리카프로락톤(polycaprolactone);
m) 폴리카보네이트(polycarbonates), 폴리에스테르 카보네이트(polyester carbonates) 및 PC/ABS, PC/PBT, PC/PET/PBT, PC/PA와 같은 블렌드;
n) 셀룰로오스 유도체, 예를 들어 셀룰로오스 니트레이트(cellulose derivatives), 셀룰로오스 아세테이트(cellulose acetate), 셀룰로오스 프로피오네이트(cellulose propionate), 셀룰로오스 부티레이트(cellulose butyrate);
o) 예를 들어 아민, 무수화물, 디시안디아미드(dicyandiamide), 메르캅탄(mercaptans), 이소시아네이트(isocyanates) 기반의 경화제 또는 촉매적으로 활성인 경화제(catalytically acting hardeners)와 조합된, 2관능 또는 다관능 에폭시 화합물을 포함하는 에폭시 수지(epoxy resins);
p) 페놀 수지(phenol resins), 예를 들어 페놀 포름알데히드 수지(phenol formaldehyde resins), 우레아 포름알데히드 수지(urea formaldehyde resins), 멜라민 포름알데히드 수지(melamine formaldehyde resins);
q) 비닐 화합물과 불포화 디카르복실산 및 디올의 불포화 폴리에스테르 수지(unsaturated polyester resins);
r) 실리콘; 및
s) 상기 폴리머들 중 둘 이상의 혼합물, 조합물 또는 블렌드. - 제1항 내지 제10항 중 어느 한 항에 있어서,
상기 플라스틱은, UV 흡수제(UV absorbers), 광 안정화제(light stabilizers), 하이드록실아민 기반의 안정화제(hydroxylamine based stabilizers), 벤조퓨란온 기반의 안정화제(benzofuranone based stabilizers), 핵 생성제(nucleation agents), 강인제(toughening agents), 가소제(plasticizers), 주형유(mold lubricants), 리올로지 개질제(rheology modifiers), 사슬 연장제(chain extenders), 가공 조제(processing aids), 안료(processing aids), 염료(dyestuffs), 형광 발광제(optical brighteners), 항 미생물제(antimicrobial agents), 정전기 방지제(antistatic agents), 슬립제(slip agents), 블로킹 방지제(anti-blocking agents), 커플링제(coupling agents), 분산제(dispersing agents), 상용화제(compatibilizers), 산소 제거제(oxygen scavengers), 산 제거제(acid scavengers), 마킹제(marking agents), 및 김서림 방지제(anti-fogging agents)를 포함하는 그룹으로부터 선택된 적어도 하나의 추가 첨가제를 포함하는 것을 특징으로 하는, 일반식 I에 따른 화합물 또는 복수의 화합물의 혼합물의 용도. - 제1항 내지 제11항 중 어느 한 항에 있어서,
적어도 하나의 추가 1차 및/또는 2차 항산화제, 특히 페놀성 산화방지제(phenolic antioxidants), 포스파이트(phosphites), 포스포나이트(phosphonites), 아민(amines), 하이드록실아민(hydroxylamines) 및 이의 혼합물 또는 조합물을 포함하는 그룹으로부터 선택된 적어도 하나의 추가 1차 항산화제 및/또는 2차 항산화제가 상기 일반식 I에 따른 화합물 외에 상기 유기 물질을 안정화하는데 사용되는 것을 특징으로 하는, 일반식 I에 따른 화합물 또는 복수의 화합물의 혼합물의 용도.
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- 2018-02-14 EP EP18705885.4A patent/EP3585833A1/de active Pending
- 2018-02-14 KR KR1020237002884A patent/KR102785653B1/ko active Active
- 2018-02-14 CN CN201880014166.5A patent/CN110573566B/zh active Active
- 2018-02-14 KR KR1020197026229A patent/KR20190132366A/ko not_active Ceased
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US11634560B2 (en) | 2023-04-25 |
EP3585833A1 (de) | 2020-01-01 |
WO2018153747A1 (de) | 2018-08-30 |
KR20230019220A (ko) | 2023-02-07 |
DE102017203164A1 (de) | 2018-08-30 |
KR102785653B1 (ko) | 2025-03-26 |
CN110573566B (zh) | 2021-07-30 |
CN110573566A (zh) | 2019-12-13 |
JP6896874B2 (ja) | 2021-06-30 |
US20210130582A1 (en) | 2021-05-06 |
JP2020510107A (ja) | 2020-04-02 |
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