KR20170129301A - 솔더, 스퍼터링 타겟 물질, 및 스퍼터링 타겟 물질의 제조 방법 - Google Patents
솔더, 스퍼터링 타겟 물질, 및 스퍼터링 타겟 물질의 제조 방법 Download PDFInfo
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- KR20170129301A KR20170129301A KR1020160016209A KR20160016209A KR20170129301A KR 20170129301 A KR20170129301 A KR 20170129301A KR 1020160016209 A KR1020160016209 A KR 1020160016209A KR 20160016209 A KR20160016209 A KR 20160016209A KR 20170129301 A KR20170129301 A KR 20170129301A
- Authority
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- South Korea
- Prior art keywords
- target material
- solder
- backing plate
- material layer
- indium
- Prior art date
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- 239000013077 target material Substances 0.000 title claims abstract description 102
- 229910000679 solder Inorganic materials 0.000 title claims abstract description 73
- 238000005477 sputtering target Methods 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims description 21
- 229910052738 indium Inorganic materials 0.000 claims abstract description 35
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910052718 tin Inorganic materials 0.000 claims abstract description 25
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 claims abstract description 16
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000010949 copper Substances 0.000 claims description 33
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 29
- 229910052802 copper Inorganic materials 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 239000011701 zinc Substances 0.000 claims description 12
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052725 zinc Inorganic materials 0.000 claims description 11
- 238000002844 melting Methods 0.000 claims description 5
- 230000008018 melting Effects 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims description 2
- 238000005304 joining Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 abstract description 8
- 229910045601 alloy Inorganic materials 0.000 description 18
- 239000000956 alloy Substances 0.000 description 18
- WGCXSIWGFOQDEG-UHFFFAOYSA-N [Zn].[Sn].[In] Chemical compound [Zn].[Sn].[In] WGCXSIWGFOQDEG-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 230000004907 flux Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- -1 Prommium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- RJMMFJHMVBOLGY-UHFFFAOYSA-N indium(3+) Chemical compound [In+3] RJMMFJHMVBOLGY-UHFFFAOYSA-N 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
- B23K35/262—Sn as the principal constituent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/002—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating specially adapted for particular articles or work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
샘플 | 사용한 연성 플럭스 | 인장강도(N/㎟) | 인장강도(Kg/㎟) |
실시예1 | Sn-Zn-2In | 21.8 | 2.22 |
실시예2 | Sn-Zn-2In | 24 | 2.45 |
실시예3 | Sn-Zn-2In | 18.1 | 1.85 |
비교예1 | In | 13.73 | 1.40 |
비교예2 | In | 13.46 | 1.37 |
비교예3 | In | 11 | 1.12 |
Claims (10)
- 스퍼터링 타겟 물질(Sputtering Target Material)의 제조시 타겟 물질층(target material layer)과 백킹 플레이트(backing plate)를 접합시키기 위한 솔더(solder)에 있어서,
중량%가 8 내지 9인 아연, 중량%가 82 내지 91.5인 주석 및 중량%가 0.5 내지 10인 인듐을 포함하고; 주석과 인듐의 총 함량은 91 중량%보다 작거나 같은 것을 특징으로 하는 솔더. - 제1항에 있어서,
상기 솔더 중에서, 아연의 중량%는 9이고, 주석의 중량%는 89이며, 인듐의 중량%는 2인 것을 특징으로 하는 솔더. - 제1항에 있어서,
상기 솔더는 금속 타겟 물질층과, 구리 함유 백킹 플레이트를 접합하기 위한 것을 특징으로 하는 솔더. - 제1항에 있어서,
상기 솔더는 알루미늄 함유 타겟 물질층과 구리 함유 백킹 플레이트를 접합하기 위한 것을 특징으로 하는 솔더. - 타겟 물질층;
백킹 플레이트; 및
상기 타겟 물질층과 상기 백킹 플레이트를 접합하기 위한 솔더를 포함하고,
상기 솔더는 중량%가 8 내지 9인 아연, 중량%가 82 내지 91.5인 주석 및 중량%가 0.5 내지 10인 인듐을 포함하고; 주석과 인듐의 총 함량은 91 중량%보다 작거나 같은 것을 특징으로 하는 스퍼터링 타겟 물질. - 제5항에 있어서,
상기 솔더 중에서, 아연의 중량%는 9이고, 주석의 중량%는 89이며, 인듐의 중량%는 2인 것을 특징으로 하는 스퍼터링 타겟 물질. - 제5항에 있어서,
상기 타겟 물질층은 금속 타겟 물질층이고, 상기 백킹 플레이트는 구리 함유 백킹 플레이트인 것을 특징으로 하는 스퍼터링 타겟 물질. - 제5항에 있어서,
상기 타겟 물질층은 알루미늄 함유 타겟 물질층이고, 상기 백킹 플레이트는 구리 함유 백킹 플레이트인 것을 특징으로 하는 스퍼터링 타겟 물질. - 중량%가 8 내지 9인 아연(Zn), 중량%가 82 내지 91.5인 주석 및 중량%가 0.5 내지 10인 인듐을 포함하고, 주석과 인듐의 총 함량은 91 중량%보다 작거나 같은 솔더를 제공하는 단계;
상기 솔더를 백킹 플레이트와 타겟 물질층 사이에 위치시키는 단계; 및
상기 솔더에 의해 상기 백킹 플레이트와 상기 타겟 물질층을 접합시키도록 압착 공정을 진행하는 단계를 포함하는 것을 특징으로 하는 스퍼터링 타겟 물질의 제조 방법. - 제9항에 있어서,
상기 솔더를 상기 백킹 플레이트와 상기 타겟 물질층 사이에 위치시키는 단계는,
상기 백킹 플레이트 또는 상기 타겟 물질층을 상기 솔더의 용융점(melting point) 온도 이상에 도달할 때까지 가열하는 단계;
상기 솔더를 상기 백킹 플레이트와 상기 타겟 물질층 중 어느 하나에 도포하는 단계; 및
상기 백킹 플레이트와 상기 타겟 물질층 중 다른 하나를 상기 솔더와 대면시키는 단계를 포함하는 것을 특징으로 하는 스퍼터링 타겟 물질의 제조 방법.
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TW104131380 | 2015-09-23 | ||
TW104131380A TWI612025B (zh) | 2015-09-23 | 2015-09-23 | 製作濺鍍靶材的銲料及其應用方法 |
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KR20170129301A true KR20170129301A (ko) | 2017-11-27 |
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TW (1) | TWI612025B (ko) |
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CN112077477A (zh) * | 2020-09-10 | 2020-12-15 | 哈尔滨理工大学 | 一种高稳定低熔点纤料及其制备方法 |
CN112091343A (zh) * | 2020-09-11 | 2020-12-18 | 宁波江丰电子材料股份有限公司 | 一种钼靶材与背板的钎焊方法 |
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JPH0994687A (ja) * | 1995-09-29 | 1997-04-08 | Senju Metal Ind Co Ltd | 鉛フリーはんだ合金 |
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CN101543924A (zh) * | 2009-03-12 | 2009-09-30 | 宁波江丰电子材料有限公司 | 靶材与背板的焊接方法 |
CN102133669A (zh) * | 2011-01-26 | 2011-07-27 | 宁波江丰电子材料有限公司 | 靶材与背板的焊接方法 |
CN102409299B (zh) * | 2011-09-07 | 2014-08-06 | 三峡大学 | 一种氧化物陶瓷溅射靶的制备方法 |
CN103567583B (zh) * | 2012-07-30 | 2015-12-02 | 宁波江丰电子材料股份有限公司 | 铝靶材组件的焊接方法 |
CN103785911B (zh) * | 2012-10-30 | 2016-03-09 | 宁波江丰电子材料股份有限公司 | 靶材组件的焊接方法 |
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2015
- 2015-09-23 TW TW104131380A patent/TWI612025B/zh active
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2016
- 2016-01-14 CN CN201610023433.8A patent/CN106541220A/zh active Pending
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CN102409300A (zh) * | 2011-09-07 | 2012-04-11 | 三峡大学 | 氧化物陶瓷溅射靶及其制备方法和所用的钎焊合金 |
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