KR20110047110A - Jig for peeling pellicle and peeling method - Google Patents

Abstract

PURPOSE: A jig for peeling a pellicle and peeling method hole the location of a pellicle on a photo mask during a process of eliminating a mask adhesive layer, thereby preventing the surface of the photo mask from being damaged by preventing the contact between the pellicle and the photo mask. CONSTITUTION: A jig(10) for peeling a pellicle are arranged on a pellicle(12) and a photo mask(11). A fixing member fixes the jig to the photo mask. The fixing member includes a first arm(14a) with a contact surface and a second arm(14b) with a pressurizing member. An adhesive layer(16) fixes the jig to the pellicle. An adhesive forming the adhesive layer uses a silicon resin.

Description

Jig for pellicle peeling and peeling method {JIG FOR PEELING PELLICLE AND PEELING METHOD}

TECHNICAL FIELD This invention relates to the pellicle used as a dust shield when manufacturing a semiconductor device, a printed board, a liquid crystal display, etc.

In the manufacture of semiconductors such as LSI and ultra LSI, or in the manufacture of liquid crystal displays, a pattern is produced by irradiating light onto a semiconductor wafer or a liquid crystal display plate. If dust adheres to a photomask such as a reticle used at this time, There is a problem that the size, quality, appearance, and the like are damaged, because the absorbed light is bent or the light is bent, so that the transferred pattern is deformed, the edge is not smoothed, and the lower limb is black.

For this reason, these operations are normally performed in a clean room, but it is still difficult to keep a photomask clean all the time. Therefore, exposure is performed after the pellicle is adhered to the photomask surface as a dust film. In this case, since the foreign matter does not directly adhere to the surface of the photomask, but adheres to the pellicle, when the focus is placed on the pattern of the photomask during lithography, the foreign matter on the pellicle becomes independent of the transfer.

Generally, a pellicle adhere | attaches a transparent pellicle film which consists of nitrocellulose, cellulose acetate, a fluorine resin, etc. which permeate | transmits light well to the upper surface of the pellicle frame which consists of aluminum, stainless steel, polyethylene, etc. with an adhesive agent. In addition, the lower end of the pellicle frame is a mask adhesive layer made of polybutene resin, polyvinyl acetate resin, acrylic resin, silicone resin, or the like for mounting on a photomask, and a release sheet for the purpose of protecting the adhesive layer ( Separator) is provided.

The pellicle is attached to the photomask by a dedicated device or jig. The basic operation is common in any apparatus, and the pellicle is adhered by adjusting the positional relationship between the pellicle and the photomask, and then pressing the pellicle frame in parallel with the photomask for a predetermined time.

The pellicle after adhering to a photomask should be peeled off if it needs to adhere newly for some reason. Conventionally, as shown in FIG. 3, the peeling jig which has a thin processus | protrusion at the front-end | tip is inserted in the mask adhesion layer 33 part between the pellicle frame 32 and the photomask 31, and the principle of a lever The pellicle frame 32 has been lifted and peeled off, or a pin-shaped jig is inserted into a round hole formed in the outer surface of the pellicle frame, and the pellicle frame 32 has been lifted and peeled off.

These methods are simple and can easily peel off the pellicle. However, since the pellicle is forcibly peeled from the photomask surface by applying a force more than the adhesive force of the photomask adhesive layer, the residue of the mask adhesive layer remaining on the photomask increases. There is a problem that subsequent cleaning becomes difficult. Moreover, when peeling a pellicle from on a photomask, a mask adhesion layer may shift | deviate and stick to the pattern of a photomask, and there exists a possibility of damaging or polluting a pattern. In addition, in the case of a large pellicle having a long side length of the pellicle, it cannot be peeled off all at once, but it must be peeled off partly, but the workability is bad because it must be considered so as not to stick again.

On the other hand, there is also a method of pulling out and removing the adhesive layer without breaking it (Patent Document 1). This method is preferable because the residue of the pressure-sensitive adhesive layer after peeling is preferable, but the applicable one is not only limited to the pressure-sensitive adhesive that is hard to break when pulled out, but also the pellicle frame is completely free when the pressure-sensitive adhesive layer is finally peeled off. Since it moves in the horizontal direction, there is a high possibility that the pattern surface is damaged by the pellicle frame.

Thus, in any pellicle peeling method, it is necessary to fix the pellicle frame so that the position does not shift when peeling. However, it is actually very difficult to fix the pellicle while fixing the position so that the position does not move. In case of pressing by hand, there is a problem in terms of workability as well as reliability.

Therefore, the apparatus which performs this peeling operation is also proposed (patent document 2). Secure the pellicle frame with a strong clamp and peel off from above the photomask. However, the device becomes very large. Therefore, until now, the method of peeling a pellicle carefully while pressing by hand has been the mainstream, and there exists a problem that the risk of photomask damage is large and productivity is very bad.

[Patent Document 1] Japanese Patent Application Laid-Open No. 09-068792 [Patent Document 2] Japanese Unexamined Patent Publication No. 2009-151306

The problem to be solved by the present invention is to provide a simple pellicle peeling jig and a peeling method that can peel the pellicle adhered to the photomask from the photomask in a short time safely and easily without damaging the pattern surface.

The pellicle peeling jig of this invention is provided with the fixing member for fixing a jig to a photomask, and the adhesion layer (henceforth "jig adhesion layer") for fixing a jig to a pellicle. It is characterized by the above-mentioned.

The fixing member for fixing the jig to the photomask includes a first arm having a contact surface in contact with the photomask and a second arm having a pressing member, wherein the pressing member of the second arm is configured to connect the photomask to the first arm. It is preferable that the jig is configured to be fixed to the photomask by pressing on the contact surface. It is preferable to use a screw member as the pressing member.

It is preferable that the adhesive which forms a jig adhesion layer is a silicone resin.

The pellicle peeling method of the present invention is a method of fixing the photomask and the pellicle with the pellicle peeling jig of the present invention described above, and then removing the mask adhesive layer between the pellicle and the photomask to remove the pellicle. .

By fixing the pellicle and the photomask together by the pellicle peeling jig of the present invention, the positional relationship between the pellicle and the photomask is fixed. In this state, the mask adhesion layer adhering the photomask and the pellicle is removed. Thereafter, the fixing between the photomask and the pellicle peeling jig is released, and the pellicle is separated from the photomask while being adhered to the jig adhesive layer.

According to the present invention, since the pellicle is held on the photomask during the removal operation of the mask adhesive layer, the pellicle does not come into contact with the pattern surface of the photomask and does not damage the pattern surface. In addition, after removing the mask adhesive layer, the fixing between the photomask and the pellicle peeling jig can be released, and the pellicle can be moved from the photomask to another place while adhering the pellicle to the jig. Even in this movement, the pellicle does not contact the pattern surface of the photomask. Therefore, according to the present invention, the pellicle can be removed safely and easily, and the work can be progressed in a short time without the need of a human hand.

In particular, when a silicone resin is used as the pressure-sensitive adhesive for forming the jig adhesive layer, even when the pellicle film is a fluorine resin, it can be adhered and fixed, and the residue after peeling when the jig adhesive layer of the pellicle peeling jig used once is replaced. You can almost eliminate (pool residue).

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows one Embodiment of the pellicle peeling jig of this invention, and its use state, (a) is a top view, (b) is sectional drawing along AA line, (c) is B enlarged view.
It is explanatory drawing which shows the peeling method of the pellicle of this invention.
It is explanatory drawing which shows an example of the peeling method of the conventional pellicle.

EMBODIMENT OF THE INVENTION Hereinafter, although the form for implementing this invention is demonstrated, this invention is not limited to this. Moreover, although this invention is especially effective in the large sized pellicle whose one side length exceeds 500 mm used for liquid crystal manufacturing use, it is applied to the small sized pellicle about 150 mm used for semiconductor use. Even if the effectiveness is high, its use is not particularly limited.

1 shows an embodiment of a pellicle peeling jig of the present invention and a state of use thereof.

As shown in Fig. 1B, the pellicle peeling jig 10 is disposed above the pellicle 12 and the photomask 11, and both ends of the base 13 of the pellicle peeling jig. The first arm 14a having a contact surface in contact with the outer circumference of the photomask 11 and the second arm 14b having a screw member 14c as a pressing member have a fixing member for fixing the jig to the photomask. Is prepared as. The first arm 14a serves as a reference for positioning the photomask, and the jig is applied to the photomask by the screw member 14c of the second arm 14b pressing the photomask against the contact surface of the first arm 14a. Fixed, the photomask is positioned.

In this embodiment, although the press member was comprised by the screw member 14c, as long as it is a member which can press | press a photomask, any mechanism can be used as a press member.

The jig adhesive layer 16 is formed in the surface which opposes the pellicle 12 of the base 13 via the base member 17, and the handle 15 is provided in the upper part of the base 13.

The base 13 may be prepared by using a material having rigidity such as engineering plastic or metal.

In this embodiment, the base 13 has a frame shape as shown in Fig. 1A, but it is possible to secure sufficient stiffness and adhesive area to fix and handle the pellicle 12 and the photomask 11. If possible, the shape of the base may be anything. For example, a flat member may be used as the base, or a flat member further attached under the frame member may be used as the base.

The jig adhesive layer 16 may be formed directly on the lower surface of the base without interposing the base member 17.

In addition, in this embodiment, although the photomask fixing member was arrange | positioned so that only the short-axis direction of a photomask might be fixed, you may fix only the long-axis direction or the bidirectional orthogonal direction.

Although the adhesive which comprises the jig adhesive layer 16 is not specifically limited, It is good to determine in consideration of the adhesiveness to the pellicle film 12a which is the object to adhere | attach, and acrylic resin, an epoxy resin, a silicone resin, etc. can be used, Among these, It is preferable to use a silicone resin.

The silicone resin can be adhered and fixed even when the pellicle film is a fluororesin. In addition, since the pellicle peeling jig adheres to the jig adhesive layer, the pellicle peeling jig used once needs to be peeled off and replaced with a new jig adhesive layer, but in the case of silicone resin, it is broken when pulled out. Since it is difficult, there can be almost no residue (paste residue) after peeling, and workability is very good.

As the formation method of the jig adhesive layer 16, although the adhesive may be apply | coated directly to the base 13, what is called a double-sided sheet-type thing which applied the adhesive to both surfaces of thin films, such as PET, and formed the adhesive layer previously is desired size. It is preferable from the viewpoint of workability to cut | disconnect and bond and use.

The base member 17 is a plate-shaped member provided for the purpose of height adjustment between the base and the pellicle frame 12b, damage prevention of the photomask 11 and the like, and adhesion adjustment. When the adhesiveness of the jig adhesive layer 16 with respect to the pellicle film 12a is bad, adhesiveness can be improved by using a soft resin like rubber as a plate-shaped member, and adhesive force can also be adjusted by adjusting size and shape. have. It is preferable that this base member 17 has antistatic property for the purpose of preventing the electrostatic destruction of the adjacent photomask.

Although the first arm and the second arm are of any material, they have sufficient rigidity, and are preferably made of resin so as not to injure the photomask by contact, and furthermore, make the foreign matter adhesion as small as possible, It is good to have antistatic performance from the viewpoint of preventing the electrostatic destruction of the pattern surface of a photomask, and conductive MC nylon, conductive PEEK, conductive HDPE, etc. can be used suitably.

All other members constituting the pellicle peeling jig, such as the base 13, the handle 15, and the jig adhesive layer, also have antistatic properties for the purpose of preventing electrostatic destruction of the photomask or preventing the charging of the operator. Preference is given to using materials.

Next, the pellicle peeling method using this pellicle peeling jig is demonstrated using FIG.

First, as shown in FIG. 2A, the screw member 14c of the second arm 14b is retracted, the handle 15 is held, and the first arm 14a is attached to one end of the photomask 11. It puts on the pellicle 12, making contact. Then, at the end, as shown in FIG. 2B, the jig adhesive layer 16 formed on the lower surface of the base 13 contacts the uppermost part of the pellicle 12, that is, the pellicle film 12a, and immediately adheres. In this state, the screw member 14c of the second arm 14b is tightened to fix the pellicle peeling jig 10 to the photomask 11.

Next, the mask adhesion layer 12c is removed. In embodiment of FIG.2 (c-1), the mask adhesion layer 12c is pulled out by the tweezers 28 from the outer side of the pellicle frame 12b. If it pulls out over the whole circumference as it is, an adhesive layer is removed completely. As another method, as shown in Fig. 2 (c-2), a pressure-sensitive adhesive layer outlet 29 having the adhesive substance 29b adhered to the surface of a thin plate 29a such as stainless steel or resin was fabricated. 12b) The method of inserting from the outer side, attaching the mask adhesive layer 12c, and drawing it outward is also effective. In addition, when the mask adhesion layer 12c is hard and cannot be pulled out, while softening the mask adhesion layer 12c using a hot air gun (not shown) etc., FIG. What is necessary is just to apply the method of (c-2).

In this way, even if all the mask adhesion layers 12c are removed completely, since the pellicle 12 is adhesively held by the jig adhesion layer 16 of the pellicle peeling jig 10, it does not move and the photomask 11 does not move. It stays afloat from. Thereafter, as shown in FIG. 2D, when the screw member 14c of the second arm 14b is retracted to release the fixing, the handle 15 is held, and the pellicle peeling jig 10 is lifted upward. The pellicle 12 is completely removed from the photomask 11 while being stuck to the pellicle peeling jig 10. During this series of operations, the pellicle 12 never comes in contact with the photomask 11, and damage to the photomask is completely prevented. Finally, when the pellicle 12 adhered to the jig adhesive layer 16 of the pellicle peeling jig 10 is peeled off at a safe place and the jig adhesive layer 16 is replaced, the preparation for the next work is completed. Equipped.

<Examples>

Although the Example of this invention is described below, this invention is not limited to this.

The pellicle peeling jig of the structure as shown in FIG. 1 was produced. The base 13 is made of an extruded hollow material of A6063 aluminum alloy having a cross section of 30 mm x 30 mm in the shape of a frame, and at both ends thereof, the first arm 14a and the second arm (made of antistatic ultra high molecular polyethylene) 14b) was attached. A screw member 14c made of antistatic MC nylon was attached to the second arm 14b. On the base 13, a handle 15 made of antistatic resin was attached.

And under the base 13, the base member 17 made from antistatic PVC was provided. Then, a silicone adhesive (trade name KR3700 / Shin-Etsu Chemical Co., Ltd.) was applied on both sides of a 100 μm-thick PET film so as to have a film thickness of 50 μm, and the heat-hardened material was cut to form the lower member 17. The adhesive layer 16 was formed by adhering to the lower surface of the base member 17.

The pellicle peeling jig 10 thus produced was fixed to the photomask 11 to which the pellicle 12 was bonded so as to be in the state of FIG. 1. Here, the photomask 11 is 1100 mm x 1620 mm x 17 mm of quartz glass, and the pellicle 12 has an outer dimension of 1068 mm x 1526 mm, an inner dimension of 1031 mm x 1490 mm, and a height of 8 mm. The material is a fluororesin, the pellicle frame is made of A5052 aluminum alloy, and the mask adhesive layer is composed of a silicone adhesive.

Fixing was started from the state which retracted the screw member 14c of the 2nd arm 14b, as shown to Fig.2 (a). After confirming that the jig adhesive layer 16 adheres firmly to the pellicle film 12a to fix the pellicle, the screw member 14c of the second arm 14b is tightened, and the pellicle peeling jig 10 is photomasked. It fixed about the external shape of (11). Next, as shown to (c-2) of FIG. 2, the adhesion layer lead-out port 29 which apply | coated the silicone adhesive 29b to the stainless steel thin plate 29a of thickness 0.5mm from the outer side of the mask adhesion layer 12c is carried out. It inserted and the mask adhesion layer 12c was stuck and taken out. Then, it pulled out continuously and rounded and removed all the adhesion layers.

At this time, when the extraction length of a mask adhesion layer is too long, it becomes difficult to handle, and it worked, cutting | disconnecting with scissors in length of 30 cm-40 cm. In addition, an ionizer was provided above these operations, and it was noted that in all operations, there was no electrostatic destruction of the photomask by charging.

And after completion | finish of a mask adhesion layer removal operation, the screw member 14c on the 1st arm 14a is loosened, the handle 15 is grasped by two people, it is pulled upwards slowly, and the pellicle 12 is fully photomasked. (11) removed from above.

Afterwards, the ambient light was turned off to darken and the photomask surface was inspected with a halogen lamp of 300,000 Lx of illuminance. However, no damage such as a wound was found except that the part where the mask adhesive layer was adhered was dirty. It was in a very clean state.

In addition, the adhered dirt (residue of the adhesive) could also be easily removed by simply infiltrating the wiper with an organic solvent (trade name: Isopar E, manufactured by Exxon Mobil). These operations were not only at risk of photomask damage at all, but were also able to work for a very large pellicle like this example in only 10 minutes, which was very efficient.

After the completion of all peeling operations, the pellicle 12 was removed from the pellicle peeling jig 10 at a safe place away from the photomask, and the jig adhesive layer 16 was replaced. It was about 5 minutes.

[Comparative Example]

The pellicle and photomask similar to the said Example were peeled off using the peeling jig 30 as shown in FIG. This peeling jig 30 is inserted in the lower end of the pellicle frame 32, and a pellicle is lifted and peeled. Since the mask adhesive layer 33 is peeled off from the surface of the photomask 31 by the operation of the peeling jig 30, the pellicle frame 32 is lifted up, but not all of them are peeled at once over the entire circumference of the frame. When the peeling jig 30 is returned, it will stick to the photomask 31 again. Therefore, the part which peeled off was made, inserting the small piece of a resin plate, and it peeled all over the whole pellicle continuously.

At this time, in order to prevent the pellicle frame 32 from moving on the photomask 31 and damaging the surface of the photomask 31, an operator is disposed at each corner portion (not shown) of the pellicle frame 32 to prevent misalignment. The operation was performed while pressing the pellicle frame 32. Then, after all of the mask adhesive layers 33 were peeled off, all of the workers took the breath and slowly lifted the pellicle frame 32 from above the photomask 31 and removed it to a safe place.

This work required a very low productivity of at least five of four agents pressing the pellicle in addition to one peeling worker, and the required time was approximately one hour. Moreover, there was a possibility that the pellicle would always come into contact with the photomask, and this was a very undesirable operation from the quality control point of view.

10: Jig for peeling pellicle 11: photomask
12: pellicle 12a: pellicle film
12b: pellicle frame 12c: mask adhesive layer
13: donation 14a: first arm
14b: second arm 14c: screw member
15: handle 16: jig adhesive layer
17: not absent 28: tweezers
29: adhesive layer outlet 29a: thin plate
29b: adhesive material 30: peeling jig
31: photomask 32: pellicle frame
33: mask adhesive layer

Claims (6)

A pellicle peeling jig used for peeling a pellicle from a photomask, said jig for pellicle peeling comprising a fixing member for fixing a jig to a photomask and an adhesive layer for fixing the jig to a pellicle. 2. The fixing member according to claim 1, wherein the fixing member includes a first arm having a contact surface in contact with the photomask and a second arm having a pressing member, wherein the pressing member of the second arm is configured to press the photomask. 1. A pellicle peeling jig, wherein the jig is fixed to the photomask by pressing on a contact surface of an arm. The pellicle peeling jig according to claim 2, wherein the pressing member is a screw member. The jig for pellicle peeling according to any one of claims 1 to 3, wherein the pressure-sensitive adhesive forming the pressure-sensitive adhesive layer is a silicone resin. A method of peeling a pellicle adhered to a photomask with a mask adhesive layer from the photomask, wherein the photomask and the pellicle are fixed by the pellicle peeling jig according to any one of claims 1 to 3, and then the mask A method for peeling a pellicle, wherein the adhesive layer is taken out and removed. A method of peeling a pellicle adhered to a photomask with a mask adhesive layer from a photomask, wherein the photomask and the pellicle are fixed by the pellicle peeling jig according to claim 4, and then the mask adhesive layer is drawn out and removed. A pellicle peeling method characterized by the above-mentioned.

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