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CN101689018B - Frame of large pellicle and grasping method of frame - Google Patents

Frame of large pellicle and grasping method of frame Download PDF

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Publication number
CN101689018B
CN101689018B CN200880023582.8A CN200880023582A CN101689018B CN 101689018 B CN101689018 B CN 101689018B CN 200880023582 A CN200880023582 A CN 200880023582A CN 101689018 B CN101689018 B CN 101689018B
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Prior art keywords
framework
pellicle member
large pellicle
groove
usefulness
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CN101689018A (en
Inventor
谷村彰浩
前田拓郎
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Mitsui Chemicals Inc
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Asahi Chemical Co Ltd
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Priority to CN201210140722.8A priority Critical patent/CN102681334B/en
Publication of CN101689018A publication Critical patent/CN101689018A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274Photolithographic processes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70783Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70791Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983Optical system protection, e.g. pellicles or removable covers for protection of mask

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Sustainable Development (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)

Abstract

本发明提供大型表膜构件的框体以及该框体的把持方法。该框体具有由多条边构成的多边形形状的框体、由粘接在该框体的上缘面的表膜和涂敷在该框体的下缘面的粘合材料构成,在把持上述框体的最长边的长度为1m以上的大型表膜构件的上述框体时,上述框体在所有的边部上分别具有把持用的凸部或凹部,通过在上述框体的各边部上分别同时把持至少1处以上的把持用的凸部或凹部,能够可靠地把持框体,而且在将表膜构件粘贴于光掩模时不会产生歪斜、挠曲而简单地将表膜构件从容纳容器取出。

Figure 200880023582

The present invention provides a frame body of a large surface film member and a method for holding the frame body. The frame body has a polygonal frame body composed of many sides, and is composed of a surface film bonded to the upper edge surface of the frame body and an adhesive material coated on the lower edge surface of the frame body. When the length of the longest side of the frame is the above-mentioned frame of a large-scale surface film member, the above-mentioned frame has a protrusion or a concave portion for holding on all the sides, and through each side of the above-mentioned frame At least one protrusion or recess for holding on the top can be held at the same time, the frame can be reliably held, and the surface film member can be easily attached without skewing or bending when sticking the film member to the photomask. Remove from holding container.

Figure 200880023582

Description

The framework of large pellicle member and the holding method of this framework
Technical field
The present invention relates to the framework as the member of formation of pellicle member (pellicle), this pellicle member is used for preventing adhering to foreign matter in photomask that the photo-mask process when making the thin film transistor (TFT) (TFT) that consists of LSI, liquid crystal display (LCD), color filter (CF) etc. uses, the reticle mask (reticle).Particularly relate to as liquid crystal with the member of formation of large pellicle member, namely be the framework of the member of formation of the large pellicle member more than the 1m as long edge lengths.
Background technology
The present invention relates to the technology as the framework of the member of formation of pellicle member, at first the instruction card film structural component.
, in the manufacturing of semiconductor device, formed in the photo-mask process of circuit pattern at wafer in the past, usually prevented with the dust proof member that is known as the pellicle member that foreign matter was attached to photomask, reticle mask.The pellicle member be conform to the shape of photomask or reticle mask in shape, thickness is that the upper limb face of the framework of several millimeter is sprawled and bonding thickness is that transparent polymeric membrane such as cellulose nitrate, cellulose derivative (cellulose derivative) or fluorine-based polymer etc. below the 10 μ m (below be called " pellicle ") forms.Usually, the pellicle member is greatly mainly with in the lower edge face of this framework coating jointing material and stacked diaphragm forms on this bonding material layer Product Status shipment.
Above-mentioned bonding material layer is used for the pellicle member is adhered to photomask or reticle mask, and said protection film is protected the bonding plane of this bonding material layer in order to keep the bonding force of jointing material before this bonding material layer is used to such use.
This pellicle member offers the fabricator that makes photomask or reticle mask (below be called " mask maker ") by pellicle member fabricator usually.Mask maker is peeled off said protection film from the pellicle member; utilize bonding material layer that the pellicle member is pasted on after photomask or the reticle mask, this mask or reticle mask are offered fabricator, for example semiconductor device fabricator or the liquid crystal panel fabricator who carries out photoetching.
As aspect the characteristic of dust proof member, the processing of this pellicle member need to be treated to non-cohesive dust at the pellicle member.Usually, when the processing list film structural component, usually control by in the hole that is formed on the framework lateral surface, inserting pin-shaped instrument, make staff can directly not contact pellicle member (for example with reference to patent documentation 1) by controlling tool body.In addition, the instrument that has also proposed to be formed for having for the groove that swingle inserts by the lateral surface in framework swingle is controlled, and makes staff can directly not contact pellicle member (for example with reference to patent documentation 2) by the main body of controlling this instrument.
In addition, when the pellicle member is transported to mask maker from pellicle member fabricator, for non-cohesive dust, usually the pellicle member is put into have and carried holding in the container of sealing.Certainly, owing to require the pellicle member to be fixed on reliably to hold in the container, therefore, also proposed by in the hole that is formed on the framework lateral surface, inserting pin-shaped merit tool the pellicle member is fixed in the method (for example with reference to patent documentation 3) of holding in the container.
In addition, also proposed by be fixed in the method (for example with reference to patent documentation 4 or 5) of holding container by consisting of that the pallet that holds container and lid clip the horizontal teat that is formed on the framework lateral surface and with the pellicle member.
And, not only be directed to the controlling of the teat, groove or the hole his-and-hers watches film structural component that are formed on the framework lateral surface, fixed function, go back the framework shape of his-and-hers watches film structural component and also carried out various researchs.For example, in order to ensure the gas penetration potential of pellicle component inside with the outside, proposed setting and extended through medial surface with the hole (for example with reference to patent documentation 6) of filtrator from the framework lateral surface.
In addition, stretch out (for example with reference to patent documentation 10 or 11), the step (for example with reference to patent documentation 12) that forms the mask jointing material, the pressurised zone (for example with reference to patent documentation 13) when guaranteeing to be pasted on photomask for what control distance (stand-off) (for example with reference to patent documentation 7~9) from the pattern plane of photomask to pellicle, control mask jointing material, proposed the various shapes of establishing groove, projection, step at upper limb face or the lower edge face of framework.
In recent years, along with the maximization of LCD, the pellicle member of photomask and use thereof also maximizes, and the length of longest edge has emerged greater than the pellicle member of 1m.It is generally acknowledged that from now on, for the maximization of tackling LCD, enhance productivity, the maximization of photomask also will be absolutely necessary.
In the situation of large-scale photomask, raw material is synthetic quartz substrate mostly, and fee of material is very expensive.Therefore, with respect to the effective exposure area size of setting, the photomask size designs minimumly usually.
To be pasted in the situation of the large pellicle member on the large-scale photomask, restriction in view of the photomask size, also there is restriction in framework width for the table mould between the outer circumference end that is secured at from the effective exposure area to the photomask, even the pellicle member maximizes, the width of framework in fact also can't increase.
And, because the distance (stand-off) from the pattern plane of photomask to pellicle is exposed the optical system restriction of machine, therefore, also there is restriction for the height of framework, even the pellicle member maximizes, the height of framework in fact also can't increase.
On the other hand, be 1000cm as the area that suppresses pellicle 2The method of the framework deflection of above large pellicle member has proposed to make the long hem width degree of framework greater than minor face width (for example with reference to patent documentation 14).
In addition; in recent years; the fabricator of mask etc. is in order directly to be installed on mask with the pellicle member after holding the container taking-up; employing when holding container and take out the pellicle member, the method for under the state that diaphragm is pasted on pallet, taking out the pellicle member from the interface of diaphragm and jointing material, require when taking out, can not make the pellicle member with the method (for example with reference to patent documentation 15) of its taking-up with producing the distortion deflection.
Patent documentation 1: Japanese kokai publication hei 9-204039 communique
Patent documentation 2: TOHKEMY 2005-326634 communique
Patent documentation 3: TOHKEMY 2006-267179 communique
Patent documentation 4: Japanese kokai publication hei 10-48812 communique
Patent documentation 5: Japanese kokai publication hei 10-48811 communique
Patent documentation 6: TOHKEMY 2001-133960 communique
Patent documentation 7: TOHKEMY 2002-182373 communique
Patent documentation 8: TOHKEMY 2002-182371 communique
Patent documentation 9: TOHKEMY 2000-298333 communique
Patent documentation 10: TOHKEMY 2005-338722 communique
Patent documentation 11: TOHKEMY 2000-292910 communique
Patent documentation 12: TOHKEMY 2006-163035 communique, Fig. 6
Patent documentation 13: TOHKEMY 2005-308901 communique
Patent documentation 14: TOHKEMY 2001-109135 communique
Patent documentation 15: TOHKEMY 2007-017811 communique
As mentioned above, in the large pellicle member, because the restriction of the width of framework, height, the deflection meeting of framework limit section becomes large along with the maximization of pellicle member.So the inventor is that the making of the large pellicle member of 1.4m~2.0m is studied to the size of longest edge, found that employing method in the past extremely difficulty control framework.
Namely, as described in above-mentioned patent documentation 1~5, employing is controlled or fixing previous methods by inserting the instruments such as pin, slide block in the groove on two the relative limit lateral surfaces that are formed on framework, the hole, exist the deflection owing to framework limit section to be easy to cause the instruments such as pin, slide block to break away from from groove, hole, the situation that adopts groove, the hole of framework lateral surface can't control, fixes.For example, insert the method (patent documentation 1) of pin at Xiang Kongzhong, insert in the groove in the situation of method (patent documentation 2) of swingle, because more roughly the supporting of each limit of framework, therefore, load is easy to concentrate, and the deflection because of framework limit section breaks away from easily sometimes.
The high rigidization of being realized by the change of the raw material of framework also is considered countermeasure, but in view of the desired quality such as dustless of pellicle member, in fact can't easily change the raw material of framework.
So far, as mentioned above, the framework shape has been carried out various imaginations, but basically be in the framework that is restricted width, the height scope in the design framework shape (for example with reference to patent documentation 6~12), therefore, the high rigidization that does not extremely help framework.
In addition, also be studied (for example with reference to patent documentation 4 or 5) for design framework shape outside the scope of the width of framework, height.It can be described as good technology to the restriction of framework at that time with respect to application.Namely, in the application of patent documentation 4 or 5 at that time, the pellicle member of LSI purposes is main flow, the photomask size of LSI purposes is 5~7 inch (127~178mm) usually on one side, large-scale photomask size less than liquid crystal display (LCD) purposes (is 330~1400mm) on one side, therefore, compare with large-scale photomask size, can make the photomask size greater than the pellicle scantling.Therefore, design framework shape is not problem outside the scope of the width of framework, height.
But, from now on, the problem of considering to come to the surface for popularizing along with more large-scale pellicle member, namely to come for the expectation that the table mould maximizes owing to do one's utmost to reduce the photomask size correspondingly to make the width of framework, highly increase to problem such more than the required degree, need improve the holding method of pellicle member.
For removing method, for example also exist on one side and utilize pellicle member retainer tool to keep pellicle member described later and detect load that the his-and-hers watches film structural component keeps utensil to apply, make the maintenance utensil and hold the method that container spaces out to peel off the pellicle member; Aforesaid pellicle member is to be fixed in the pellicle member with the label (pressing part) that splicing tape will be equivalent to be configured near the diaphragm the central portion on limit of rectangle framework to hold (for example with reference to the patent documentation 13) that container forms.But, it is generally acknowledged, adopt the method, in the situation of large pellicle member, owing to remaining in, the label (pressing part) that will be configured in the central portion on limit with splicing tape holds container, therefore, even peel off the deflection (with reference to Fig. 9 of patent documentation 13) that also can't avoid framework while detect load.
That is, the framework of pellicle member requires on a kind of basis controlling reliably, can not make framework produce deflection, the method for taking-up when container takes out the pellicle member from holding subsequently with reversing.And; particularly become large, process also the comparatively large pellicle member of difficulty for pellicle member own wt; holding, carrying, requiring when taking care of a kind of such method; namely; keep reliably being unnecessary to mention; and when holding container and take out, in order after taking out, it directly to be pasted on the mask etc., make the pellicle member can from the crooked deflection of the generation of interfaces of diaphragm and jointing material taking-up.
Summary of the invention
That is, the invention provides a kind of when the processing of pellicle member framework, hold, carry, can control reliably during keeping framework and can not produce crooked, deflection on the pellicle member being pasted on photomask etc. the time and can be simply with the framework of pellicle member from the pellicle member that holds container and take out.A kind of holding method of large pellicle member of the framework of using this pellicle member also is provided in addition.
The inventor etc. carry out deep research in order to solve above-mentioned problem, found that, in order not to be subject to the restriction of photomask, by form respectively protuberance or the recess of controlling usefulness in all limit sections of pellicle member framework, can solve the length of controlling longest edge is the so above-mentioned problem of large pellicle member of 1.4m~2.0m.Based on found that of research, the length that the method also can be used for longest edge effectively is the above large pellicle member of 1m, thereby has finished the present invention.That is, the present invention is as follows.
1. the framework of a large pellicle member, this framework has the polygonal shape that is made of many limits, the pellicle and the jointing material that is coated in the lower edge face of this framework that can comprise the upper limb face that is bonded in this framework, the length of the longest edge of above-mentioned framework is more than the 1m, wherein, above-mentioned framework has respectively protuberance or the recess of the usefulness of controlling in all limit sections.
2. according to the framework of above-mentioned 1 described large pellicle member, wherein, control on the protuberance of usefulness or the lateral surface that recess is in framework.
3. according to the framework of above-mentioned 2 described large pellicle members, wherein, control on the protuberance of usefulness or the lateral surface that recess is in framework, from position that upper limb face and lower edge face leave.
4. according to the framework of each described large pellicle member in above-mentioned 1~3, wherein, protuberance or the recess of controlling usefulness are groove or hole.
5. according to the framework of above-mentioned 4 described large pellicle members, wherein, protuberance or the recess of controlling usefulness are groove or the holes with the spatial portion that inwardly broadens.
6. according to the framework of above-mentioned 4 described large pellicle members, wherein, protuberance or the recess of controlling usefulness are groove or the holes with the spatial portion that inwardly narrows down.
7. according to the framework of each described large pellicle member in above-mentioned 1~6, wherein, control the protuberance of usefulness or recess on each limit of framework, this controls the protuberance of usefulness or more than 10% of length that the shared length of recess is respectively the limit.
8. according to the framework of above-mentioned 7 described large pellicle members, wherein, control the groove on the complete cycle of the protuberance of usefulness or all limit sections that recess is provided in a side of framework.
9. according to the framework of above-mentioned 7 described large pellicle members, wherein, control the protuberance of usefulness or recess and be the part and be located at groove in the limit section of framework.
10. according to the framework of each described large pellicle member in above-mentioned 1~6, wherein, protuberance or the recess of controlling usefulness are respectively to be provided with a plurality of holes in all limit sections of framework.
11. a large pellicle member, this large pellicle member is made of the framework of each described large pellicle member in above-mentioned 1~10, the jointing material that is adhered to the pellicle on the upper limb face of this framework and is coated in the lower edge face of this framework.
12. according to above-mentioned 11 described large pellicle members, wherein, the length of the longest edge of framework is 1.4m~2.0m.
13. according to each described large pellicle member in above-mentioned 11~12, wherein, the width of framework is 1.5~4.0 with the ratio of height.
14. the holding method of the framework of a large pellicle member, the framework of this large pellicle member is as in above-mentioned 1~10 as described in each, wherein, in all limit sections of the framework of above-mentioned large pellicle member, control respectively the protuberance of controlling usefulness or recess more than at least 1 place.
15. according to the holding method of the framework of above-mentioned 13 described large pellicle members, wherein, control all protuberance of controlling usefulness or recess in all limit sections of the framework of large pellicle member.
16. the antidote of the framework shape of a large pellicle member, this antidote is for the framework shape of correcting above-mentioned 11~13 each described large pellicle members, wherein, in all limit sections of the framework of above-mentioned large pellicle member, control respectively the protuberance of controlling usefulness or recess more than at least 1 place, reduce the distortion of this framework at least by 1 place's stress application to the framework of above-mentioned large pellicle member.
17. according to the framework of each described large pellicle member in above-mentioned 1~3, wherein, protuberance or the recess of controlling usefulness are the teats that loads and unloads in the limit section of freely being fixed in framework.
18. according to the framework of each described large pellicle member in above-mentioned 1~3 and 17, wherein, protuberance or the recess of controlling usefulness are tabular teat or bar-shaped teat.
19. according to the framework of each described large pellicle member in above-mentioned 1~3 and 17, wherein, protuberance or the recess of controlling usefulness are tabular, and are that the overhang of this teat becomes large teat from the central portion of four bights towards the limit of framework.
20. according to the framework of each described large pellicle member in above-mentioned 1~3 and 17~19, wherein, protuberance or the recess of controlling usefulness are the teats that front end forms hook shape.
21. the framework according to each described large pellicle member in above-mentioned 1~3 and 17~20, wherein, control the protuberance of usefulness or recess be form when the pellicle member is pasted on photomask, with the circumferential lateral surface of photomask and/or be formed at the teat that the groove on the photomask contacts.
22. the framework according to each described large pellicle member in above-mentioned 1~3 and 17~21, wherein, control the protuberance of usefulness or recess be form when the pellicle member is pasted on photomask, by with another part combination and can utilize physical method framework to be fixed in the teat of this photomask.
23. according to the framework of above-mentioned 7 described large pellicle members, wherein, control the tabular teat on the complete cycle of the protuberance of usefulness or all limit sections that recess is arranged on framework.
24. according to the framework of above-mentioned 7 described large pellicle members, wherein, control the protuberance of usefulness or recess and be the tabular teat in the limit section that the part is arranged at framework.
25. according to the framework of each described large pellicle member in above-mentioned 1~3 and 17~18, wherein, protuberance or the recess of controlling usefulness are respectively to be provided with a plurality of bar-shaped teats in all limit sections of framework.
26. a large pellicle member, wherein, this large pellicle member is made of the framework of each described large pellicle member in above-mentioned 17~25, the jointing material that is adhered to the pellicle on the upper limb face of this framework and is coated in the lower edge face of this framework.
27. according to above-mentioned 26 described large pellicle members, wherein, the length of the longest edge of framework is 1.4m~2.0m.
28. according to each described large pellicle member in above-mentioned 26~27, wherein, the width of framework is 1.5~4.0 with the ratio of height.
29. the holding method of the framework of a large pellicle member, the framework of this large pellicle member is as in above-mentioned 17~25 as described in each, wherein, in all limit sections of the framework of above-mentioned large pellicle member, control respectively the protuberance of controlling usefulness or recess more than at least 1 place.
30. according to the holding method of the framework of above-mentioned 29 described large pellicle members, wherein, control all protuberance of controlling usefulness or recess in all limit sections of the framework of large pellicle member.
31. the antidote of the framework shape of a large pellicle member, this antidote is for the framework shape of correcting above-mentioned 26~28 each described large pellicle members, wherein, in all limit sections of the framework of above-mentioned large pellicle member, control respectively the protuberance of controlling usefulness or recess more than at least 1 place, reduce the distortion of this framework at least by 1 place's stress application to the framework of above-mentioned large pellicle member.
Adopt the holding method of framework and this framework of large pellicle member of the present invention, when the processing of pellicle member, hold, carry, can control reliably framework during keeping and when the pellicle member is pasted on photomask, can not produce crooked, deflection and can simply the pellicle member be taken out from holding container.
Description of drawings
Figure 1A is that expression is adhered to the large pellicle member of photomask for the stereographic map of a mode (recess of controlling usefulness is groove) of the framework of the large pellicle member of explanation present embodiment.
Figure 1B is the figure for a mode (recess of controlling usefulness is groove) of the framework of the large pellicle member of explanation present embodiment, and expression comprises the part of framework and amplifies longitudinal section.
Fig. 1 C is the figure for a mode (recess of controlling usefulness is groove) of the framework of the large pellicle member of explanation present embodiment, the framework of expression large pellicle member.
Fig. 1 D is that expression is adhered to the large pellicle member of photomask for the stereographic map of a mode (protuberance of controlling usefulness is tabular) of the framework of the large pellicle member of explanation present embodiment.
Fig. 1 E is the figure for a mode (protuberance of controlling usefulness is tabular) of the framework of the large pellicle member of explanation present embodiment, and expression comprises the part of framework and amplifies longitudinal section.
Fig. 1 F is the figure for a mode (protuberance of controlling usefulness is tabular) of the framework of the large pellicle member of explanation present embodiment, the framework of expression large pellicle member.
Fig. 2 A is that expression is adhered to the pellicle of photomask for the stereographic map of a mode of the framework of explanation mini table film structural component in the past.
Fig. 2 B is the figure for a mode of the framework of explanation mini table film structural component in the past, and expression comprises the part of the groove of framework and amplifies longitudinal section.
Fig. 2 C is the figure for a mode of the framework of explanation mini table film structural component in the past, the framework of expression pellicle member.
Fig. 3 A is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that lateral surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 3 B is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that lateral surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 3 C is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that lateral surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 3 D is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that lateral surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 3 E is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that lateral surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 3 F is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that lateral surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 3 G is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that lateral surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 4 A is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that upper limb face from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 4 B is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that upper limb face from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 5 A is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that lower edge face from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 5 B is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that upper limb face from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 6 A is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that medial surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 6 B is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that medial surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 6 C is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that medial surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 6 D is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that medial surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 6 E is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that medial surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 6 F is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that medial surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 6 G is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is that medial surface from framework excavates and controls the groove of usefulness or the mode example in hole.
Fig. 7 A is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is to be provided with a plurality of groove of usefulness or mode examples in hole of controlling.
Fig. 7 B is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is to be provided with a plurality of groove of usefulness or mode examples in hole of controlling.
Fig. 7 C is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is to be provided with a plurality of groove of usefulness or mode examples in hole of controlling.
Fig. 8 A is the skeleton diagram for direction configuration, that see pellicle of the groove of controlling usefulness on the framework of the large pellicle member of explanation present embodiment.
Fig. 8 B is the skeleton diagram for direction configuration, that see pellicle of the groove of controlling usefulness on the framework of the large pellicle member of explanation present embodiment.
Fig. 8 C is the skeleton diagram for direction configuration, that see pellicle of the groove of controlling usefulness on the framework of the large pellicle member of explanation present embodiment.
Fig. 8 D is the skeleton diagram for direction configuration, that see pellicle of the groove of controlling usefulness on the framework of the large pellicle member of explanation present embodiment.
Fig. 9 A is the skeleton diagram for direction configuration, that see pellicle of the groove of controlling usefulness on the framework of the large pellicle member of explanation present embodiment.
Fig. 9 B is the skeleton diagram for direction configuration, that see pellicle of the groove of controlling usefulness on the framework of the large pellicle member of explanation present embodiment.
Fig. 9 C is the skeleton diagram for direction configuration, that see pellicle of the groove of controlling usefulness on the framework of the large pellicle member of explanation present embodiment.
Figure 10 A is for the skeleton diagram configuration of the groove of controlling usefulness on the framework of large pellicle member of explanation present embodiment, that see from the side surface direction of framework.
Figure 10 B is for the skeleton diagram configuration of the groove of controlling usefulness on the framework of large pellicle member of explanation present embodiment, that see from the side surface direction of framework.
Figure 11 A is that member is controlled, the fixing part amplification longitudinal section of a mode example the during framework of the large pellicle member of present embodiment with controlling for explanation.
Figure 11 B is that member is controlled, the fixing part amplification longitudinal section of a mode example the during framework of the large pellicle member of present embodiment with controlling for explanation.
Figure 11 C is that member is controlled, the fixing part amplification longitudinal section of a mode example the during framework of the large pellicle member of present embodiment with controlling for explanation.
Figure 11 D is that member is controlled, the fixing part amplification longitudinal section of a mode example the during framework of the large pellicle member of present embodiment with controlling for explanation.
Figure 11 E is that member is controlled, the fixing part amplification longitudinal section of a mode example the during framework of the large pellicle member of present embodiment with controlling for explanation.
Figure 12 A is for the local skeleton diagram mode example of the groove of controlling usefulness on the framework of large pellicle member of explanation present embodiment, that see from the lateral surface direction of framework.
Figure 12 B is for the local skeleton diagram mode example of the groove of controlling usefulness on the framework of large pellicle member of explanation present embodiment, that see from the direction of seeing pellicle.
Figure 12 C is for the local skeleton diagram mode example of the groove of controlling usefulness on the framework of large pellicle member of explanation present embodiment, that see from the direction of seeing pellicle.
Figure 12 D is for the local skeleton diagram mode example of the groove of controlling usefulness on the framework of large pellicle member of explanation present embodiment, that see from the direction of seeing pellicle.
Figure 13 A is the figure for the configuration in hole on the framework of explanation large pellicle member, that be arranged at corner part, is the local skeleton diagram of seeing from the lateral surface direction of framework.
Figure 13 B is the figure for the configuration in hole on the framework of explanation large pellicle member, that be arranged at corner part, is the local skeleton diagram of seeing from the direction of seeing pellicle.
Figure 14 A is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lateral surface of framework.
Figure 14 B is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lateral surface of framework.
Figure 14 C is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lateral surface of framework.
Figure 14 D is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lateral surface of framework.
Figure 14 E is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lateral surface of framework.
Figure 14 F is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lateral surface of framework.
Figure 14 G is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lateral surface of framework.
Figure 15 A is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the upper limb face of framework.
Figure 15 B is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the upper limb face of framework.
Figure 15 C is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the upper limb face of framework.
Figure 15 D is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the upper limb face of framework.
Figure 16 A is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lower edge face of framework.
Figure 16 B is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lower edge face of framework.
Figure 16 C is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lower edge face of framework.
Figure 16 D is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the lower edge face of framework.
Figure 17 A is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the medial surface of framework.
Figure 17 B is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the medial surface of framework.
Figure 17 C is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the medial surface of framework.
Figure 17 D is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the medial surface of framework.
Figure 17 E is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the medial surface of framework.
Figure 17 F is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the medial surface of framework.
Figure 17 G is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with teat at the medial surface of framework.
Figure 18 A is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with a plurality of teats.
Figure 18 B is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with a plurality of teats.
Figure 18 C is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with a plurality of teats.
Figure 18 D is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with a plurality of teats.
Figure 18 E is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with a plurality of teats.
Figure 18 F is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with a plurality of teats.
Figure 18 G is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, is the mode example that is provided with a plurality of teats.
Figure 19 A is for the skeleton diagram of explanation in direction configuration, that see pellicle of the framework teat of the large pellicle member of present embodiment.
Figure 19 B is for the skeleton diagram of explanation in direction configuration, that see pellicle of the framework teat of the large pellicle member of present embodiment.
Figure 19 C is for the skeleton diagram of explanation in direction configuration, that see pellicle of the framework teat of the large pellicle member of present embodiment.
Figure 19 D is for the skeleton diagram of explanation in direction configuration, that see pellicle of the framework teat of the large pellicle member of present embodiment.
Figure 20 A is for the skeleton diagram of explanation in direction configuration, that see pellicle of the framework teat of the large pellicle member of present embodiment.
Figure 20 B is for the skeleton diagram of explanation in direction configuration, that see pellicle of the framework teat of the large pellicle member of present embodiment.
Figure 20 C is the skeleton diagram for direction configuration, that see pellicle of the teat on the framework of the large pellicle member of explanation present embodiment.
Figure 20 D is the skeleton diagram for direction configuration, that see pellicle of the teat on the framework of the large pellicle member of explanation present embodiment.
Figure 20 E is the skeleton diagram for direction configuration, that see pellicle of the teat on the framework of the large pellicle member of explanation present embodiment.
Figure 21 A is that longitudinal section is amplified in the part when being arranged at teat loading and unloading on the framework of large pellicle member and freely being fixed in the mode of framework limit section, and the expression screw thread is fixed.
Figure 21 B is that longitudinal section is amplified in the part when being arranged at teat loading and unloading on the framework of large pellicle member and freely being fixed in the mode of framework limit section, and expression utilizes fixing that unitor carries out.
Figure 21 C is that longitudinal section is amplified in the part when being arranged at teat loading and unloading on the framework of large pellicle member and freely being fixed in the mode of framework limit section, and expression utilizes fixing that elastic body carries out.
Figure 21 D is that longitudinal section is amplified in the part when being arranged at teat loading and unloading on the framework of large pellicle member and freely being fixed in the mode of framework limit section, and expression is by sandwiching carry out fixing.
Figure 22 A is that expression is adhered to the large pellicle member of photomask for the stereographic map of the another way (teat is bar-shaped) of the framework of the large pellicle member of explanation present embodiment.
Figure 22 B is the stereographic map for the another way (teat is bar-shaped) of the framework of the large pellicle member of explanation present embodiment, the framework of expression large pellicle member.
Figure 23 A is the skeleton diagram for direction configuration, that see pellicle of the bar-shaped teat on the framework of large pellicle member of explanation present embodiment, is that the mode with Figure 12 is identical, respectively is provided with respectively the situation of 3 teats on minor face and long limit.
Figure 23 B is the skeleton diagram for direction configuration, that see pellicle of the bar-shaped teat on the framework of large pellicle member of explanation present embodiment, is that the mode with Figure 12 is identical, respectively is provided with respectively 1 teat on minor face and long limit and respectively is provided with the situation of 1 teat at 4 angles.
Figure 23 C is the skeleton diagram for direction configuration, that see pellicle of the bar-shaped teat on the framework of large pellicle member of explanation present embodiment, the integrated situation of teat that be that the mode with Figure 12 is identical, makes each limit among Figure 23 A.
Figure 24 A is that longitudinal section is amplified in the part that comprises the teat in the framework that is arranged at the large pellicle member, and the expression teat is the mode that the limit section of L font, front end bending contacts with photomask.
Figure 24 B is that longitudinal section is amplified in the part that comprises the teat in the framework that is arranged at the large pellicle member, and the expression teat is that L font, front end penetrate into the mode in the groove that is arranged on the photomask.
Figure 25 be the teat on the framework that is arranged at the large pellicle member make up another member and fixedly the part during the large pellicle member amplify longitudinal section.
Figure 26 A is that member is controlled, fixedly longitudinal section is amplified in the part of the situation the during framework of the large pellicle member of present embodiment with controlling for explanation, represents to control, constant cross-section is the mode of the teat of rectangle.
Figure 26 B is that member is controlled, fixedly longitudinal section is amplified in the part of the situation the during framework of the large pellicle member of present embodiment with controlling for explanation, represent to control, be fixedly installed on the lateral surface of framework teat, be that the cross section is the mode of the teat of L font.
Figure 26 C is that member is controlled, fixedly longitudinal section is amplified in the part of the situation the during framework of the large pellicle member of present embodiment with controlling for explanation, represent to control, be fixedly installed on the upper limb face of framework teat, be that the cross section is the mode of the teat of L font.
Figure 26 D is that member is controlled, fixedly longitudinal section is amplified in the part of the situation the during framework of the large pellicle member of present embodiment with controlling for explanation, represents to control, be fixedly installed on the teat of the medial surface of framework, the i.e. mode of the teat of 2 rectangles.
Figure 27 is the synoptic diagram of the flat shape of the diaphragm that uses of expression embodiment 1.
Description of reference numerals
1, pellicle frame; 2, mask jointing material; 3, the upper limb face of framework; 4, the lower edge face of framework; 5, the lateral surface of framework; 6, the medial surface of framework; 7, control groove or hole or the teat of usefulness; The inner space that has inwardly broadened in 7a, the groove of controlling usefulness or hole or control the leading section of the teat of usefulness; 7b, control the peristome of the groove of usefulness; 7c, control the deep of the groove of usefulness; 9, photomask; 10,20, framework; 11, diaphragm; 11a, pressing part; 11b, pressing part; 15, another member; 16, control member; 21, groove; 30, framework (in the past product).
Embodiment
With reference to the description of drawings embodiments of the present invention.Below the embodiment of explanation is configuration example of the present invention, and the present invention is not limited to following embodiment.As long as play effect of the present invention, also can carry out the change of variety of way.
The framework of large pellicle member of the present invention is the framework with the polygonal shape that is made of many limits, this framework can comprise the pellicle of the upper limb face that is adhered to this framework and be coated on the jointing material of the lower edge face of this framework, length at the longest edge of above-mentioned framework is in the above-mentioned framework of the large pellicle member more than the 1m, and above-mentioned framework has respectively protuberance or the recess that keeps usefulness in all limit sections.At this, the polygonal shape of framework is quadrilateral shape roughly normally, but also can be the polygonal shape that has breach, arc sections (R section) in the bight.
Figure 1A is the stereographic map for an embodiment of the framework of the large pellicle member of explanation present embodiment, Figure 1A and Fig. 1 D represent to be adhered to the large pellicle member of photomask, Figure 1B and Fig. 1 E represent to comprise the part amplification longitudinal section of framework, and Fig. 1 C and Fig. 1 F represent the framework of large pellicle member.Fig. 2 is the stereographic map for an embodiment (for example type of patent documentation 2) of explanation mini table film structural component framework in the past, Fig. 2 A represents to be adhered to the pellicle member of photomask, Fig. 2 B represents to comprise the part of the groove of framework and amplifies longitudinal section, and Fig. 2 C represents the framework of pellicle member.
For example, as shown in Figure 1, the large pellicle member is made of framework 10, the pellicle 1 that is adhered to the upper limb face 3 of framework 10, the jointing material 2 that is coated on the lower edge face 4 of framework 10.At this, pellicle 1 is adhered to the upper limb face 3 of framework 10 by bonding agent (not shown).In addition, in Figure 1A and Figure 1B, pellicle member framework 10 is adhered to photomask 9 by jointing material 2.The large pellicle member had the structure that is bonded with diaphragm (not shown) at the lower edge face 4 of framework 10 by jointing material 2 before being adhered to photomask 9.
The material of the material of the material of pellicle 1, jointing material 2, shape, bonding agent, the material of diaphragm, shape can be used material, the shape that in the past usually adopted.
As pellicle, can use transparent polymeric membrane, for example cellulose nitrate, cellulose derivative or fluorine-based polymer.The thickness consideration light transmittance of pellicle, film strength are set, and for example are preferably 0.1 μ m~10 μ m.When pellicle being adhered to the upper limb face of framework, can use bonding agent, such as acryl resin bonding agent, epoxy resin adhesive, silicone adhesive or the fluorine-containing fluorine-based polymers such as silicon bonding agent.
As jointing material, can use the hot-melt adhesive material, silicon class jointing material, acrylic compounds jointing material of styrene ethylene butylene styrene, styrene ethylene acrylonitrile-styrol or olefines etc. or with the adhesive strip of foaming body as base material.The thickness of bonding material layer is, framework thickness and jointing material thickness are aggregated in the scope of the film that is no more than regulation and the distance between the mask and set, and for example are preferably 0.01mm~10mm.
As diaphragm, can use the film that is consisted of by polyethylene terephthalate or polyvinyl resin.In addition, also can release agent, for example silicon class release agent or fluorine class release agent be coated in according to the bounding force of jointing material the surface of diaphragm.The thickness of diaphragm for example is preferably 0.01mm~1mm.
As long as the material of framework 10 can keep physical strength, there is no particular limitation.For example metal, resin, compound substance be can enumerate, more particularly, aluminium or its alloy for example duralumin, iron or iron class alloy, for example stainless steel, engineering plastics, fiber-reinforced plastic (FRP) and carbon fiber reinforced plastic (CFRP) preferably adopted.In addition, consider by maximization to cause deadweight to increase preferred light weight and the material with rigidity, for example preferred aluminium or its alloy.
Framework 10 is that the method for making of in the past usually carrying out gets final product.For example, the plate with the one thing cuts off, cut gets final product.In addition, in the situation of the plate that is difficult to prepare the one thing along with the maximization of pellicle member, except cutting off, also can enumerating welding processing, processing and forming (if metal then is die cast, if resin then is injection-molded moulding) the cut.At this moment, protuberance or the recess that preferably will control usefulness are one-body molded, as described later, in the situation that is protuberance, also preferably are shaped to detachable part, install afterwards again.
In addition, in order to prevent reflection, also can implement the black processing such as black chromium plating, black alumite, black application to the surface of framework.In addition, in order to catch foreign matter, also can be at the medial surface coating jointing material of framework.
The framework 10 of the large pellicle member of present embodiment with the longest edge of framework 10 (below be also referred to as " long limit ".Equally the minor face with framework is also referred to as " minor face ") length be that the framework of the above large pellicle member of 1m is as object.The width of framework (w of Figure 1B and Fig. 1 E), highly (h of Figure 1B and Fig. 1 E) less with respect to the ratio of the length of such framework, the limit of framework (long edge lengths L, the bond length S of Figure 1A and Fig. 1 D), its rigidity has to be lower than the framework of mini table film structural component.
Be 1m when above at the long edge lengths L of framework 10, see significantly the tendency that rigidity reduces.In the framework 30 of the mini table film structural component that in the past LSI shown in Figure 2 uses, long edge lengths L mostly is below the 15cm most, and bond length S mostly is below the 13cm most, and the width w of framework 30 is (w/h)=0.3~0.8 with the ratio of height h.But in the framework of the present invention as the large pellicle member of object, long edge lengths L is more than the 1m, also has the situation that reaches 2m, also may have from now on situation about more maximizing.In addition, in minor face, bond length S also for example is more than the 75cm.In addition, because the ratio of width w and the height h of the framework in the framework of large pellicle member is greatly to for example (w/h)=1.5~4.0, therefore, the reduction of rigidity is larger, and in the framework of (w/h)=2.3~4.0, the reduction of rigidity is large especially.In addition, owing to more maximize, also may exist (w/h) greater than 4 situation.
Thereby, in the framework of the present invention as the large pellicle member of object, to compare with framework in the past, the deflection on the pellicle normal to a surface direction is very large.Like this, the deflection mode of the framework of large pellicle member is fully different from the deflection mode of in the past mini table film structural component.And, on the ratio (w/h) of the width w of framework and the height h basis greater than the width w of framework in the past and the ratio (w/h) of height h, the limit of framework itself is just very long, therefore, tension force according to pellicle is different, and the deflection of the direction parallel with the surface of pellicle also can become large.In the framework of the large pellicle member of present embodiment, also can utilize the protuberance of controlling usefulness or recess to correct the distortion of the framework that the tension force by pellicle causes.This point sees below to be stated.
The rectangle that framework of the present invention is normally similar to mask shape, but corresponding with the various shapes of mask etc., so long as polygonal framework gets final product, there is no particular limitation.In addition, in the present invention, be that framework more than the 1m is as object with long edge lengths, but be shaped as in framework in the situation of (1) rectangle, with long edge lengths be framework more than the 1m as object, be shaped as in framework in (2) foursquare situation, be that framework more than the 1m is as object with an edge lengths, being shaped as in framework in (3) polygonal situation, is that framework more than the 1m is as object with longest edge length.In the present invention, just can play larger effect if satisfy the condition of following explanation, therefore, below describe.
The first, be to describe in the mode of framework that all limit sections have respectively a recess of the usefulness of controlling to above-mentioned framework.As this recess, there are groove or hole.In addition, in the present invention, the circumferencial direction length that groove refers to be formed on the peristome of the recess of lateral surface, medial surface, upper limb face or lower edge face of framework and this recess in these faces is more than 1.5 times of short transverse length of this peristome, and the circumferencial direction length that the hole refers to this peristome is less than 1.5 times of the short transverse length of this peristome.
The groove of controlling usefulness or the hole that is formed on the framework described.Fig. 3 is that longitudinal section is amplified in the part of variety of way example of the large pellicle member framework of expression present embodiment, and Fig. 3 A~G excavates from the framework lateral surface to control the groove of usefulness or the mode example in hole.Fig. 4 is that longitudinal section is amplified in the part of variety of way example of the large pellicle member framework of expression present embodiment, and Fig. 4 A~B is that the upper limb face from framework excavates and controls the groove of usefulness or the mode example in hole.Fig. 5 is that longitudinal section is amplified in the part of variety of way example of the large pellicle member framework of expression present embodiment, and Fig. 5 A~B is that the lower edge face from framework excavates and controls the groove of usefulness or the mode example in hole.Fig. 6 is that longitudinal section is amplified in the part of variety of way example of the large pellicle member framework of expression present embodiment, and Fig. 6 A~G is that the medial surface from framework excavates and controls the groove of usefulness or the mode example in hole.
As shown in Figure 3, the framework 10 of the large pellicle member of present embodiment has from the lateral surface 5 of the framework groove of controlling usefulness or the hole 7 towards interior side direction.Below, do not having in the situation of special suggestion, do not distinguish groove and hole and illustrate as groove or the hole 7 of controlling usefulness.
In addition, as shown in Figure 4, the framework 10 of the large pellicle member of present embodiment also can have from the upper limb face 3 of the framework groove of controlling usefulness or the hole 7 towards the below.In addition, as shown in Figure 5, the framework 10 of the large pellicle member of present embodiment also can have from the lower edge face 4 of the framework groove of controlling usefulness or the hole 7 towards the top.In addition, as shown in Figure 6, the framework 10 of the large pellicle member of present embodiment also can have from the medial surface 6 of the framework toward the outer side groove of controlling usefulness or the hole 7 of direction.
To control the anchor clamps that can both be on the groove of usefulness or which face that the hole is arranged on framework and be used for controlling or the corresponding position of design of device, but consider preferably to be arranged on lateral surface at the design aspect of anchor clamps or device.In addition, be arranged in the groove that will control usefulness or hole in the situation of the lateral surface of framework or medial surface, in order when controlling, the bonding bonding material layer of the bond layer of pellicle or pellicle and mask not to be applied extra power, preferably be arranged on the position of leaving from upper limb face and lower edge face.Thereby, control on the groove of usefulness or the lateral surface that the hole more preferably is arranged on framework, from position that upper limb face and lower edge face leave.
From the upper limb face 3 of framework towards the groove of controlling usefulness of below or hole 7 except the mode of excavating along the normal direction of upper limb face 3, also can make the mode of excavating along the direction that tilts with respect to normal direction.From the lower edge face 4 of framework towards the groove of controlling usefulness of top or hole 7 except the mode of excavating along the normal direction of lower edge face 4, also can make the mode of excavating along the direction that tilts with respect to normal direction.The mode of excavating along the direction that tilts with respect to normal direction also can be made in the groove of controlling usefulness of direction or hole 7 except the mode of excavating along the normal direction of medial surface 6 toward the outer side from the medial surface 6 of framework.Be surface take framework as benchmark from lateral surface or in the situation in the groove that excavates of medial surface or hole 7, the degree of depth of controlling the groove of usefulness or hole 7 is preferably 0.01~0.9 times of framework width, more preferably 0.01~0.5 times, further preferred 0.01~0.3 times degree of depth.In addition, in the situation that is the groove that excavates from upper limb face or lower edge face or hole 7, the degree of depth of controlling the groove of usefulness or hole 7 is preferably 0.1~1 times (in addition, 1 times is situation about running through) of framework height, and more preferably 0.1~0.5 times, further preferred 0.1~0.3 times.
And as shown in Figure 7, the framework 10 of the large pellicle member of present embodiment also can have in each limit section of framework a plurality of groove or holes 7 of controlling usefulness.Fig. 7 is that longitudinal section is amplified in the part of variety of way example of the large pellicle member framework of expression present embodiment, and Fig. 7 A~C is provided with a plurality of groove of usefulness or mode examples in hole of controlling.As combination, exist have from the upper limb of framework facing to the groove of controlling usefulness of below or hole and from the lower edge of framework facing to the situation in the groove of controlling usefulness of top or these two kinds of grooves of hole or hole, have from the upper limb of framework facing to the groove of controlling usefulness of below or hole with from the medial surface of the framework toward the outer side groove of controlling usefulness of direction or the situation (for example Fig. 7 A) in these two kinds of grooves of hole or hole.In addition, also exist and have from the lower edge of framework facing to the groove of controlling usefulness of top or hole with from the medial surface of the framework toward the outer side groove of controlling usefulness of direction or the situation (for example Fig. 7 C) in these two kinds of grooves of hole or hole.
In the framework 10 of the large pellicle member of present embodiment, also can with respect to from the upper limb of framework facing to the groove of controlling usefulness of below or hole, from the lower edge of framework facing to the groove of controlling usefulness of top or hole or from the medial surface of the framework toward the outer side groove of controlling usefulness or the hole of direction, make up respectively from the lateral surface of the framework groove of controlling usefulness or the hole towards interior side direction.For example, exist have from the lateral surface of framework towards the groove of controlling usefulness of interior side direction or hole and from the upper limb of framework facing to the situation (for example Fig. 7 B) in the groove of controlling usefulness of below or these two kinds of grooves of hole or hole, have from the lateral surface of framework towards the groove of controlling usefulness of interior side direction or hole and from the lower edge of framework facing to the situation in the groove of controlling usefulness of top or these two kinds of grooves of hole or hole, have from the lateral surface of framework towards the groove of controlling usefulness of interior side direction or hole with from the medial surface of the framework toward the outer side groove of controlling usefulness of direction or the situation in these two kinds of grooves of hole or hole.
And, the groove that also exists from 4 surfaces of framework 3 surfaces to excavate to control usefulness or the mode in hole or all excavate the groove of controlling usefulness from 4 surfaces of framework or the mode in hole.Control groove or the hole of usefulness by a plurality of surfaces setting in framework, control, fix more reliable.In addition, with respect to the holding tool more than 2 kinds of the different surfaces of controlling framework, also have and to deal with such advantage with same framework.
In addition, except above-mentioned groove or hole 7 of controlling usefulness, the framework 10 of the large pellicle member of present embodiment also can have hole or the groove for other purposes such as the holes of ventilative usefulness (be used for when the pellicle member is installed on mask for by the space of pellicle member and mask sealing and outside ventilative hole).For the such hole or the groove that are used for other purposes are set, recess or the protuberance of controlling usefulness are groove or the holes that the part is arranged on framework limit section, process like this degree of freedom and raise, and be even more ideal.
Controlling the groove of usefulness or the cross sectional shape in hole 7 is rectangle (such as Fig. 6 A), trapezoidal (such as Fig. 4 A, Fig. 5 A, Fig. 6 E), polygon, circle, semicircle or ellipse (such as Fig. 6 B) etc., does not have special requirement.In addition, for example shown in Fig. 4 A, also can be the mode that the internal diameter in the width of the direction that deepens along groove or hole and groove or hole diminishes.Also curvature R, C face can be set in the bight in groove or hole as required.
In the framework of the large pellicle member of present embodiment, groove or the hole 7 of controlling usefulness preferably have the spatial portion 7a that inwardly broadens.For example be L font (for example Fig. 3 C, Fig. 4 B, Fig. 5 B, Fig. 6 C and G, Fig. 7 C), T font (for example Fig. 3 D, Fig. 6 D).Compare with the situation that does not have the spatial portion 7a that inwardly broadens, can hooking in controlling member, therefore, control, fixing more reliable.In addition, as the shape of the spatial portion that has inwardly broadened, as mentioned above, can be that the cross sectional shape of the Width of framework inwardly broadens, the cross sectional shape that can be the short transverse of framework inwardly broadens, and also can be that the cross sectional shape of the length direction of framework inwardly broadens.
In addition, groove or the hole of also preferably controlling usefulness have the spatial portion that inwardly narrows down.In this case, insert entrance than groove or hole less control member the time, control member by this and contact with the part that inwardly narrows down and be positioned, can control when member misplaces with respect to groove or hole preventing from controlling.Shape as the spatial portion that inwardly narrows down, shown in Fig. 3 B, Fig. 4 A, Fig. 5 A, the cross sectional shape that can be the Width of framework inwardly narrows down, and can be that the cross sectional shape of the short transverse of framework inwardly narrows down, and also can be that the cross sectional shape of the length direction of framework inwardly narrows down.
The example of cross sectional shape for inwardly narrowing down as the length direction of framework, can be set forth in the groove of the local circumferencial direction that exists of limit section, namely the circumferencial direction length of the peristome of this groove is greater than the groove (with reference to Figure 12) of the degree of depth of this groove (referring to the bee-line in the deep of the peristome of groove and groove).In addition, also can enumerate the circumferencial direction length of peristome of this groove less than the situation of the degree of depth of this groove.If have the framework of the handle part of this shape, the tabular holding tool that then front end can be narrowed down is positioned to utilize in this groove this holding tool to control.In addition, the circumferencial direction length of the peristome of groove is preferably 0.5~30 times with the ratio of the degree of depth of groove, more preferably 2~20 times, most preferably is 3~10 times.If should be than being then to be easy to more than 0.5 insert control member, if should be than being 30 to be difficult to pull down holding tool with next.
As shown in Figure 3, another embodiment of the framework of the large pellicle member of present embodiment is to have the following groove of controlling usefulness or the form in hole 7, the above-mentioned groove of controlling usefulness or hole 7 towards interior side direction, and have the spatial portion 7a that has inwardly broadened from the lateral surface 5 of framework 10.At this, from the lateral surface 5 of framework towards the groove of controlling usefulness of interior side direction or hole 7 except the mode of excavating along the normal direction of lateral surface 5, also can make the mode of excavating along the direction that tilts with respect to normal direction.The shape of spatial portion 7a framework, that inwardly broaden of the large pellicle member of present embodiment for example is L font (for example Fig. 3 C and G), T font (for example Fig. 3 D).Compare with the situation that does not have the spatial portion 7a that inwardly broadens, can hooking in controlling member, therefore control more reliable.
Fig. 8 and Fig. 9 are the skeleton diagrams for direction configuration, that see pellicle in groove on the framework of the large pellicle member of explanation present embodiment, that control usefulness or hole 7.Such as Fig. 8 A, C and D and shown in Figure 9, control the groove of usefulness or the configuration in hole 7 and need only the recess that on 4 limits, all has the usefulness of controlling, can be configured on the limit section complete cycle of framework 10 (Fig. 8 A), also can local configuration in the limit of framework 10 one (on Fig. 8 C~D, Fig. 9 A~C).In the situation of local configuration, also can correspondingly control groove or the hole of usefulness in the appointed part configuration of framework with the position that instrument, device etc. is controlled member.Control in local configuration in the situation of groove of usefulness, preferably be pre-configured in any limit section of framework.When controlling the framework of pellicle member, the load that can disperse equably to be produced by deadweight is setovered, thereby can suppress the generation of deflection.On the other hand, shown in the comparative example, only having in the mode (Fig. 8 B) of protuberance or the recess of the usefulness of controlling on 2 relative limits, can't fully suppress the generation of deflection as described later.
Recess on the framework of the large pellicle member of present embodiment, that control usefulness is in the situation of groove, this is controlled the shared length of the recess of usefulness and is respectively more than 10% with respect to the length on each limit, the load that can disperse equably to be produced by deadweight is setovered, and is more preferred.More preferably more than 20%, most preferably be more than 30%.In addition, need to leave in the situation of utilizing the leeway that is processed to form the part with the function except controlling in framework, preferably this is controlled the shared length of the recess of usefulness and is respectively below 90% with respect to the length on each limit.More preferably below 80%, most preferably be below 70%.If this recess of controlling usefulness, then can disperse the load biasing that produced by deadweight equably in each centrosymmetric mode with respect to each limit section of being configured to of each limit section, and is comparatively desirable.
Recess on the framework of the large pellicle member of present embodiment, that control usefulness is in the situation in hole, and its configuration is preferably all disposed a plurality of in advance in each limit section of framework.When controlling the framework of pellicle member, the load that can disperse equably to be produced by deadweight is setovered, thereby can suppress the generation of deflection.
In the framework of the large pellicle member of present embodiment, the groove 7 of controlling usefulness also can be the groove of the staged cutting shape that forms of a side of cutting slot sidewall.In addition, the hole 7 of controlling usefulness also can be the hole of the rip cutting tubular that forms of a side of the side wall surface of cutting hole.That is the side wall surface of, controlling the side wall surface of groove in the groove of usefulness or hole 7 or hole also can consist of the part on framework 10 surfaces.As such mode, the groove or the hole that for example exist the side wall surface in groove or hole to arrive the surface of framework, excavate the shape that the side wall surface in groove or hole forms from the surface of framework.In addition, in the hole of rip cutting cylinder, cut take the longitudinal section by main shaft, xsect is unnecessary to mention as the hole of semicircle, also comprises the hole of cutting by the longitudinal section of main shaft with not.If represent the example of its cross sectional shape, for example be Fig. 3 F and G, Fig. 6 F and G, Fig. 7 B.Particularly preferably the side wall surface in the side wall surface of groove or hole consists of the mode (for example Fig. 3 F and G, Fig. 6 F and G, Fig. 7 B) of the lower edge face part of framework 10.Lower edge face 4 in framework 10 is pasted with jointing material 2, but the distance between the surface of lower edge face 4 and photomask 9 only enlarges the amount of the thickness of jointing material 2, is easy to insert control member, and, can reduce the diameter in groove or hole, therefore, the possibility of framework strength decreased is less.But, to state in the use in the situation of framework of mode, the adhesive portion that need to be careful when controlling not jointing material, pellicle applies unnecessary power.
In the framework of the large pellicle member of present embodiment, in order to have prevented dirt, also can to groove or hole and control member contact site, groove or hole or at least one party that controls member implement certain surface treatment.Coat such as enumerating padded coamings such as utilizing silica gel.
Figure 10 is for the skeleton diagram configuration of the groove of controlling usefulness 7 on the framework of large pellicle member of explanation present embodiment, that see from the side surface direction of framework.Shown in Figure 10 A, from the side surface direction of framework, the groove 7 of controlling usefulness also can roll tiltedly configuration from upper limb face side direction lower edge face on edge direction.And, shown in Figure 10 B, from the side surface direction of framework, also can be on edge direction from upper limb face side direction lower edge face side, so repeatedly dispose from lower edge face side direction upper limb face side.
In addition, on the lateral surface of framework, also can the hole of running through along vergence direction shown in Figure 13 be set 4 angle parts.By such through hole is set, also bar-shaped instrument can be passed in this through hole and control.
In the framework of the large pellicle member of present embodiment, the width of each groove or the internal diameter in hole are less than width W or the height h of the framework that is provided with this groove or hole, for example be arranged in the situation of upper limb face 3 or lower edge face 4, the width of each groove or the internal diameter in hole are preferably 0.01~1 times of framework width, more preferably 0.01~0.5 times, more preferably 0.01~0.2 times.For example be arranged in the situation of lateral surface 5 or medial surface 6, the width of each groove or the internal diameter in hole are preferably 0.01~1 times of framework height, and more preferably 0.01~0.5 times, more preferably 0.01~0.2 times.In addition, in the larger situation of the degree of depth in groove or hole, for fear of the rigidity reduction of framework, the width of preferred groove or the internal diameter in hole are less.In the situation that is provided with the space 7a that broadens to the inside in the groove of controlling usefulness or hole 7, the width of the space 7a that broadens or internal diameter are less than width W or the height h of framework.
Control the groove of usefulness or the framework that hole 7 can be used for controlling the pellicle member (comprise and control the framework before the bonding pellicle and control these two kinds of frameworks after the bonding pellicle), can be when the processing list film structural component, the pellicle member is contained in when holding container, effectively utilizes when container takes out the pellicle member from holding.
Utilization controlled the groove of usefulness is controlled, fixedly controlled to member or the method in hole describes.Figure 11 controls member for explanation utilization to control, fixedly longitudinal section is amplified in the part of the situation the during framework of the large pellicle member of present embodiment, Figure 11 A represents to the cross section to be to insert in the groove of controlling usefulness of T font or the hole 7 and control, the mode of controlling member 16 that fixedly has the locking mechanism that is formed by elastic bodys such as plastics, Figure 11 B represents to being arranged on framework upper limb face, the cross section is to insert in the groove of controlling usefulness of L font or the hole 7 and control, the mode of controlling member 16 that fixedly has the hang part of L font, Figure 11 C represents to being arranged on the framework lateral surface, the cross section is the L font, insert and control in the groove of controlling usefulness of the surface part of side wall surface formation framework or the hole 7, the mode of controlling member 16 that fixedly has the hang part of L font, Figure 11 D represents to being arranged on framework lower edge face, the cross section is to insert in the trapezoidal groove of controlling usefulness or the hole 7 and control, the mode of the leading section of controlling member 16 of fixed L font, Figure 11 E represents to being arranged on the framework medial surface, the cross section is to insert in the groove of controlling usefulness of rectangle or the hole 7 and control, fixedly control the mode of member 16.In Figure 11 A~E, control member 16 and control reliably, be fixed in the groove or hole of controlling usefulness.
In the present invention, for the framework of above-mentioned large pellicle member, reduce deflection by control simultaneously respectively the protuberance of controlling usefulness more than at least 1 place or the mode of recess in each limit section of framework, therefore preferred.More preferably control simultaneously all protuberance of controlling usefulness or recess in each limit section of the framework of large pellicle member.
In addition, when peeling off the pellicle member from photomask, can after the groove of controlling usefulness or hole, peel off, when peeling off, can transmit reliably peeling force.
The second, above-mentioned framework is described in the form that all limit sections have respectively the protuberance of the usefulness of controlling.As this protuberance, there are tabular form or bar-shaped form.In addition, in the present invention, tabular protuberance refers to be formed on the protuberance of lateral surface, medial surface, upper limb face or the lower edge face of framework, and the circumferencial direction length of this protuberance in these faces is more than 1.5 times of short transverse length, and bar-shaped protuberance refers to that the length of circumferencial direction of this protuberance is less than 1.5 times of the short transverse length of this protuberance.
At first, the protuberance that is formed on the framework (below be also referred to as " teat ") is described.Figure 14 is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, and Figure 14 A~G is the mode example that is provided with teat at the lateral surface of framework.Figure 15 is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, and Figure 15 A~D is the mode example that is provided with teat at the upper limb face of framework.Figure 16 is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, and Figure 16 A~D is the mode example that is provided with teat at the lower edge face of framework.Figure 17 is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, and Figure 17 A~G is the mode example that is provided with teat at the medial surface of framework.
As shown in figure 14, the framework 10 of the large pellicle member of present embodiment has from the lateral surface 5 of the framework outstanding teat 7 of direction toward the outer side.In addition, as shown in figure 15, the framework 10 of the large pellicle member of present embodiment also can have from the upper limb face 3 of the framework teat 7 outstanding towards the top.In addition, as shown in figure 16, the framework 10 of the large pellicle member of present embodiment also can have from the lower edge face 4 of the framework teat 7 outstanding towards the below.In addition, as shown in figure 17, the framework 10 of the large pellicle member of present embodiment also can have the teat 7 of giving prominence to towards interior side direction from the medial surface 6 of framework.
At this,, except the mode outstanding along the normal direction of lateral surface 5, also can make along the outstanding mode of the direction that tilts with respect to normal direction from the lateral surface 5 of the framework teat 7 that direction is outstanding toward the outer side., except the mode outstanding along the normal direction of upper limb face 3, also can make along the outstanding mode of the direction that tilts with respect to normal direction from the upper limb face 3 of the framework teat outstanding towards the top., except the mode outstanding along the normal direction of lower edge face 4, also can make along the outstanding mode of the direction that tilts with respect to normal direction from the lower edge face 4 of the framework teat 7 outstanding towards the below.From the medial surface 6 of framework towards the outstanding teat 7 of interior side direction except the mode outstanding along the normal direction of medial surface 6, also can make along the outstanding mode of the direction that tilts with respect to normal direction.From the lateral surface of the framework teat that direction is outstanding toward the outer side and from the medial surface of framework towards the overhang of the outstanding teat of interior side direction take the surface of outstanding framework as benchmark, outstanding length is 0.1~10 times of framework width, be preferably 0.1~5 times, more preferably 0.1~3 times.In addition, from the upper limb of framework facing to the outstanding teat in top and from the lower edge of framework facing to the overhang of the outstanding teat in below take the surface of outstanding framework as benchmark, outstanding length is 0.1~10 times of framework width, is preferably 0.1~5 times, more preferably 0.1~3 times.
Be provided with from the upper limb face 3 of framework towards above outstanding teat 7 situation and be provided with from the lower edge face 4 of framework towards below in the situation of outstanding teat 7, except the reliabilization of controlling, fixing, teat 7 plays the effect of stiffening rib for the deflection of the normal to a surface direction of pellicle 1.
On the other hand, be provided with from the situation of the lateral surface 5 of the framework teat 7 that direction is outstanding toward the outer side and be provided with medial surface 6 from framework in the situation of the outstanding teat 7 of interior side direction, except control, the fixing reliabilization, for when sprawling pellicle 1 because to making framework play the effect of stiffening rib to the deflection of center direction with tension force that the surperficial parallel direction of pellicle 1 applies.
And as shown in figure 18, the framework 10 of the large pellicle member of present embodiment also can have a plurality of teats 7 in framework.Figure 18 is that longitudinal section is amplified in the part of variety of way example of framework of the large pellicle member of expression present embodiment, and Figure 18 A~G is the mode example that is provided with a plurality of teats.As combination, exist have from the lateral surface teat that direction is outstanding toward the outer side of framework and from the upper limb of framework facing to the situation of outstanding these the two kinds of teats of teat in top, have from the lateral surface teat that direction is outstanding toward the outer side of framework and from the lower edge of framework facing to the situation of outstanding these the two kinds of teats of teat in below, have from the lateral surface teat that direction is outstanding toward the outer side of framework with from the medial surface of the framework situation towards outstanding these the two kinds of teats of teat of interior side direction.In addition, also exist have from the upper limb of framework facing to the outstanding teat in top and from the lower edge of framework facing to the situation of outstanding these the two kinds of teats of teat in below, have from the upper limb of framework facing to the outstanding teat in top with from the medial surface of the framework situation towards outstanding these the two kinds of teats of teat of interior side direction.Also exist and have from the lower edge of framework facing to the outstanding teat in below with from the medial surface of the framework situation towards outstanding these the two kinds of teats of teat of interior side direction.And, also exist 3 surfaces in 4 surfaces of framework that the mode of teat is set or the mode of teat all be set on 4 surfaces of framework.By a plurality of surfaces in framework arrange teat make control, fixing more reliable, and, can increase the reinforcement direction of framework.In addition, with respect to the holding tool more than 2 kinds of the different surfaces of controlling framework, also have and to deal with such advantage with same framework.
The cross sectional shape of teat 7 is rectangle (such as Figure 14 A and B, Figure 15 A, Figure 16 A, Figure 17 A and B), trapezoidal (such as Figure 14 F, Figure 15 D, Figure 16 A, Figure 17 F), polygon, circle, semicircle (such as Figure 15 B, Figure 15 C) or ellipse (such as Figure 14 G, Figure 17 G) etc., does not have special requirement.Also curvature R, C face can be set in the bight as required.
Figure 19 and Figure 20 are the skeleton diagrams for direction configuration, that see pellicle on the framework of the large pellicle member of explanation present embodiment, teat.Such as Figure 19 A, C and D and shown in Figure 20, the configuration of teat 7 is as long as the protuberance that all has the usefulness of controlling on 4 limits, can be configured on the limit section complete cycle of framework 10 (Figure 19 A), also can local configuration in the limit of framework 10 one (on Figure 19 C~D, Figure 20 A~E).In the situation of local configuration, the alignment mark position of controlling in the time of also can be with photomask that process to paste, fixed position, photomask, controlling when photomask is fixed in exposure machine, fixed position are accordingly at the appointed part configuration teat of framework.In the situation of local configuration teat, preferably be pre-configured in any limit section of framework.Intensity is strengthened in deflection with respect to framework.
The protuberance of controlling usefulness in the framework of the large pellicle member of present embodiment is in the tabular situation, this is controlled the shared length of the protuberance of usefulness and is respectively more than 10% with respect to the length on each limit, the load that can disperse equably to be produced by deadweight is setovered, and is more preferred.More preferably more than 20%, most preferably be more than 30%.In addition, need to leave in framework in the situation in the leeway by being processed to form the part with the function except controlling, preferably this is controlled the shared length of the protuberance of usefulness and is respectively below 90% with respect to the length on each limit.More preferably below 80%, most preferably be below 70%.This protuberance of controlling usefulness is in each centrosymmetric mode with respect to each limit section of being configured to of each limit section, can disperse equably the load biasing that produced by deadweight, and is comparatively desirable.
The protuberance of controlling usefulness in the framework of the large pellicle member of present embodiment is that its configuration is preferably all disposed a plurality of in advance in each limit section of framework in the bar-shaped situation.When controlling the framework of pellicle member, the load that can disperse equably to be produced by deadweight is setovered, thereby can suppress the generation of deflection.
Figure 10 is for skeleton diagram configuration on the framework of large pellicle member of explanation present embodiment, teat, that see from the side surface direction of framework.Shown in Figure 10 A, from the side surface direction of framework, teat 7 also can roll tiltedly configuration from upper limb face side direction lower edge face on edge direction.And, shown in Figure 10 B, from the side surface direction of framework, also can be on edge direction from upper limb face side direction lower edge face side, so repeatedly dispose from lower edge face side direction upper limb face side.
Figure 21 is that longitudinal section is amplified in the part when being arranged at teat loading and unloading on the framework of large pellicle member and freely being fixed on the mode of framework limit section, Figure 21 A represents that screw thread fixes, Figure 21 B represents by fixing that unitor carries out, Figure 21 C represents that by fixing that elastic body carries out Figure 21 D is that expression is by fixing that clamping is carried out.As shown in figure 21, in the framework of the large pellicle member of present embodiment, the teat 7 preferred loading and unloading of framework 10 freely are fixed on the limit section of framework 10.The framework of pellicle member be glued to rigidity than the high photomask of the framework of pellicle member after owing to needn't worry the rigidity of the framework of pellicle member, therefore, be used for improving rigidity and the teat of fixing, controlling also can be pulled down.By such operation, the restriction of controlling in the time of also can avoiding being subject to processing photomask, fixed position, controlling when photomask is fixed in exposure machine, fixed position.
In addition, when peeling off the pellicle member from photomask, also teat can be installed in advance.By such operation, seek to improve the rigidity of the framework of pellicle member, can control, fixed salient, therefore, when peeling off, can transmit reliably peeling force.
Handling method so long as the fixing means of the machinery that can load and unload get final product.For example shown in Figure 21, can enumerate screw thread, unitor, elastomeric insertion, sandwich etc.In order to have prevented dirt, be preferably also and can implement in advance certain surface treatment to contact site.For example, can enumerate by padded coamings such as silicon rubber and coat.In the situation that teat can load and unload, teat also can be formed by the rigidity raw material higher than framework.Under the lateral surface or the situation of medial surface with teat of framework, the size (internal diameter) that the hole of teat or groove be used for to be installed is 0.01~1 times of framework height, be preferably 0.01~0.5 times of framework height, more preferably 0.01~0.2 of the framework height times.In addition, in the situation that upper limb face or the lower edge of framework are worn teat, the size (internal diameter) that the hole of teat or groove be used for to be installed is 0.01~1 times of framework width, is preferably 0.01~0.5 times of framework height, more preferably 0.01~0.2 of the framework height times.Rigidity for fear of framework reduces, and preferred hole or groove are less.
In the framework of the large pellicle member of present embodiment, Figure 19 or shown in Figure 20 for example, the teat shape of framework 10 is preferably tabular.The thickness of plate for example is preferably the thickness more than 0.01 times of the overhang of teat 7, more preferably the thickness more than 0.1 times less than width W or the height h of the framework that this plate is set.Make teat 7 in the situation of hook-type, the leading section 7a of the bending of hook-type also can be greater than width W or the height h of the framework that plate is set.At this, shown in Figure 20 (c), under teat 7 is tabular situation, also can increase continuously from four bights of framework the overhang of teat towards the central portion on limit.By like this, near the rigidity the weak limit central authorities of section of rigidity can be strengthened the rigidity in four bights of framework and the rigid uniform of limit section.
In the framework of the large pellicle member of present embodiment, for example shown in Figure 22, also can make the shape of the teat 7 of framework 20 bar-shaped.Figure 22 is that Figure 22 A represents to be adhered to the large pellicle member of photomask for the stereographic map of the another way (teat is bar-shaped) of the framework of the large pellicle member of explanation present embodiment, and Figure 22 B represents the framework of large pellicle member.The cross sectional shape of bar-shaped teat 7 is rectangle, trapezoidal, polygon, circle, ellipse etc., does not have special requirement.Also curvature R, C face can be set in the bight as required.Teat 7 also can be arranged on any face in upper limb face, lower edge face, lateral surface or the medial surface of framework 20.Figure 22 is the mode example that is provided with teat at lateral surface.For example, in the situation that is arranged at upper limb face 3 or lower edge face 4, the diameter of rod is preferably 0.1~2 times length of framework width, more preferably 0.1~0.5 times length.For example in the situation that is arranged at lateral surface 5 or medial surface 6, the diameter of rod is preferably 0.1~3 times length of framework height, more preferably 0.1~1 times length.Figure 23 is the skeleton diagram for direction configuration, that see pellicle on the framework of the large pellicle member of explanation present embodiment, bar-shaped teat, Figure 23 A is identical with the mode of Figure 22, it is the situation that respectively is provided with respectively 3 teats on minor face and long limit, Figure 23 B is the situation that respectively is provided with respectively 1 teat on minor face and long limit and respectively is provided with 1 teat at 4 angles, and Figure 23 C is the integrated situation of teat on each limit that makes among Figure 23 A.In Figure 23 C, because 3 bar-shaped teats 7 are integrated, therefore, except expectation raising intensity, workability is also better during dismounting.
In the framework of the large pellicle member of present embodiment, preferred its front end of teat is made hook-type.For example be L font (for example Figure 14 C and E, Figure 15 C, Figure 16 D, Figure 17 C and E), T font (for example Figure 14 D, Figure 17 D).Compare with the situation that does not have key, can hooking in controlling member, therefore, control, fixing more reliable.
In the framework of the large pellicle member of present embodiment, when the pellicle member was pasted on photomask, the teat of framework also can form with the circumferential lateral surface of photomask and contact.Perhaps, in the framework of the large pellicle member of present embodiment, when the pellicle member is pasted on photomask, the teat of framework also can form be formed at photomask on groove contact.Figure 24 is that longitudinal section is amplified in the part that comprises the teat on the framework that is arranged at the large pellicle member, Figure 24 A represents that teat is the mode that the limit section of L font, front end bending contacts with photomask, and Figure 24 B represents that teat is that L font, front end penetrate into the mode in the groove that is arranged on the photomask.Shown in Figure 24 A, in the outstanding situation of the lower surface of the leading section 7a self adhesive material 2 of the L font teat on the direction vertical with lower edge face 4, the leading section 7a of L font teat is configured to substantially contact with the lateral surface of photomask 9.Perhaps, shown in Figure 24 B, the leading section 7a of the L font teat on must the direction vertical with lower edge face 4 is configured in the lateral surface situation in the inner part than photomask 9, can be the shape identical with leading section 7a with the surfacing cut of photomask 9 also.In any situation of Figure 24 A and B, when the pellicle member is pasted on photomask, all play the effect that the paste position precision of pellicle member is simplified, improved in the contraposition that makes the pellicle member.
And in the framework of the large pellicle member of present embodiment, when the pellicle member was pasted on photomask, the teat of framework also can form with the circumferential lateral surface of photomask and the groove that is formed on the photomask and contact.For example, a teat in the teat about framework is formed with the circumferential lateral surface of photomask contact, with another teat form be formed at photomask on the mode that contacts of groove.Perhaps, be with the teat of framework make the F font, the part of front bending is formed with the circumferential lateral surface of photomask contact, with the part of front lateral bend form be formed at photomask on the mode that contacts of groove.Like this, as long as when the pellicle member is pasted on photomask, play the effect that the paste position precision of pellicle member is simplified, improved in the contraposition that makes the pellicle member, also mode can be out of shape.
Another part of combination in the teat of Figure 25 on the framework that is arranged at the large pellicle member and the fixing amplification of the part during large pellicle member longitudinal section.As shown in figure 25, in the framework of the large pellicle member of present embodiment, be preferably when the pellicle member is pasted on photomask 9, the teat 7 of framework and another part 15 combinations can utilize physical method that framework 10 is fixed in photomask 9 thereby form.By like this, the pellicle member can be installed on photomask reliably, can prevent from coming off etc.As the method that another part 15 is installed on the teat 7 of framework, can use that screw thread fastening, unitor, employing elastic body carry out chimeric, the various fixing meanss such as sandwich.
Teat also can be used for controlling, fixing, can be when the processing list film structural component, it is contained in when holding container, effectively utilizes when container takes out the pellicle member from holding.Member is controlled, the method for fixed salient by controlling in explanation.Figure 26 controls by controlling member for explanation, fixedly longitudinal section is amplified in the part of the situation the during framework of the large pellicle member of present embodiment, Figure 26 A represents to control, constant cross-section is the mode of the teat of rectangle, Figure 26 B represents to control, be fixedly installed on the teat of framework lateral surface, be that the cross section is the mode of the teat of L font, Figure 26 C represents to control, be fixedly installed on the teat of framework upper limb face, be that the cross section is the mode of the teat of L font, Figure 26 D represents to control, be fixedly installed on the teat of framework medial surface, the mode of the teat of 2 rectangles.In Figure 26 A and C, control that member 16 is controlled reliably, fixed salient.In Figure 26 B, L word leading section (hook portion) hooking of teat is controlled more reliably in controlling member 16, is fixed.In addition, in Figure 26 D, hooking is controlled member 16 and is controlled reliably, fixes between the teat of 2 rectangles.Form and framework for the above-described, framework has respectively a recess of the usefulness of controlling in all limit sections have respectively the form of the protuberance of the usefulness of controlling in all limit sections, self-evident, also can in a framework, will control the use that combines of the recess of usefulness and protuberance.Emphasizing to be preferably recess in the situation of space efficiency, in the situation of the stiffening effect of emphasizing framework, be preferably protuberance, but in the scope of above-mentioned various forms, can design in combination with the design of controlling member.
For the framework of controlling large pellicle member of the present invention, preferably control simultaneously respectively the protuberance of controlling usefulness or recess more than at least 1 place in each limit section of framework, more preferably control simultaneously respectively the protuberance of controlling usefulness or recess more than at least 2 places in each limit section of framework, most preferably control simultaneously all protuberance of controlling usefulness or recess in each limit section of framework.
The framework that is bonded with pellicle is applied the stress of the to the inside direction stretching of the tension force generation of being shunk by the pellicle wish.In the present embodiment, in the situation of the mode of excavating the groove of controlling usefulness or hole from the medial surface of framework, can be by being inserted into member applies the outside to the limit section of framework the stress of controlling in the groove of controlling usefulness or the hole.Thus, can correct the microdeformation of the framework that is produced by above-mentioned stress.And, in the mode of excavating the groove of controlling usefulness or hole from the upper limb face of framework, excavate the mode in the groove of controlling usefulness or hole or in the lateral surface of framework excavates any mode in the mode in the groove of controlling usefulness or hole from the lower edge face of framework, for example by the spatial portion that broadens to the inside in groove or hole is set, and at the leading section of the insertion of controlling member locking mechanism is set, all can correct the to the inside distortion that framework is produced by pellicle.Equally, for the protuberance that is formed on the framework, by controlling protuberance, also can correct the to the inside Direction distortion that framework is produced by pellicle.In addition, self-evident, the situation of the to the inside distortion of correcting method that above-mentioned framework is out of shape to the inside and causing except the shrink tension that can be applied to correct by pellicle, also can be applied to the situation of the distortion that caused by the deadweight of framework, external force outside the membrane removal tension force.
When correcting the framework shape of large pellicle member, preferably control simultaneously respectively the protuberance of controlling usefulness or recess more than at least 1 place in each limit section of the framework of above-mentioned large pellicle member, to at least 1 place's stress application of the framework of above-mentioned large pellicle member, thereby reduce the distortion of this framework.
Embodiment
The uses such as the inventor have the framework of the large pellicle member of the present invention of above-mentioned structure tests, and the result can obtain the good result shown in following examples.
Embodiment 1
Prepare long edge lengths and be 1600mm, bond length and be 1400mm, width and be 14mm, highly be the framework of the tetragonal aluminium alloy system of 6mm.Height at each limit lateral surface is the position of 3mm, by centered by the central authorities on each limit and the two ends 250mm on each limit 3, utilize the circumferencial direction length that forms respectively 3 place's peristomes on cut each limit in all 4 limits of framework to be the degree of depth of 1.5mm, the groove groove for 3mm for the height of 200mm, peristome.
At the lower edge face of framework, as bonding material layer and adhesive surface is coated with the foam polyethylene base material (thickness is 1mm) of acrylic-based adhesives.Then; the diaphragm of the frame shape that stacked and above-mentioned framework is identical on this bonding material layer; namely be coated with the diaphragm of the pet resin system of silicon class release agent on the surface, this diaphragm is set to stretch out the pressing part that is of a size of wide 10mm * long 900mm, stretch out the pressing part that is of a size of wide 10mm * long 750mm, stretch out the pressing part (with reference to Figure 27) of radius 10mm on four jiaos summits to the lateral direction of framework centered by the summit to the lateral direction of framework at the central portion of minor face to the lateral direction of framework at the central portion on long limit.
The framework with the large pellicle member of diaphragm that obtains in this wise carried utilizing on the vacuum-formed pallet that holds container of AB S resin material, (the band size: long limit 15mm * 940mm, minor face 15mm * 790mm, four jiaos 15mm * 60mm) 8 places with above-mentioned pressing part are adhesively fixed on pallet by adhesive strip.
Embodiment 2
Except long edge lengths is that 1800mm, bond length are that 1600mm, width are the 16mm, prepare the framework same with above-described embodiment 1, be fixed on the pallet similarly to Example 1.
Embodiment 3
Except long edge lengths is that 2000mm, bond length are that 1800mm, width are the 18mm, prepare the framework same with above-described embodiment 1, be fixed on the pallet similarly to Example 1.
Embodiment 4
Except being that 3mm, the degree of depth are the hole of circle of 3mm apart from 3 points of the central authorities on each limit and the two ends 150mm on each limit, at the diameter that forms respectively 3 place's peristomes on each limit in the lateral surface of framework, all 4 limits in framework, prepare the framework same with above-described embodiment 2, be fixed on the pallet similarly to Example 1.
Comparative example 1
Except the height that forms peristome at the complete cycle of minor face lateral surface be the degree of depth of 1.5mm, groove be 3mm groove, on long limit, do not form the handle part, prepare the framework same with above-described embodiment 2, be fixed on the pallet similarly to Example 1.
Embodiment 5
Except being that 3mm, the degree of depth are the hole of the circle of 3mm, are that 3mm, the degree of depth are the hole of circle of 3mm at the diameter that the lateral surface of the framework of minor face central authorities respectively forms 1 place's peristome in the position of the central authorities on distance limit and two ends 150mm, at the diameter that the lateral surface of framework respectively forms 3 place's peristomes, prepare the framework same with above-described embodiment 2, be fixed on the pallet similarly to Example 1.
The evaluation result of expression above-described embodiment 1~5 and comparative example 1 in the following table 1.
Framework his-and-hers watches film structural component framework before utilization is adhesively fixed on pallet is controlled evaluation reliably.In the situation of embodiment 1~3, as controlling member, preparation has tabular 12 groups of instruments of controlling member of the width 100mm, the thickness 0.75mm that are made by reinforced plastics, this is controlled in all grooves of controlling usefulness on each limit that member is inserted into framework control simultaneously, flatly lift framework.In addition, in the situation of comparative example 1, with identical instrument be inserted into by apart from the central authorities of two minor faces and the two ends 250mm of two minor faces amount at 6 centered by 6 places, flatly lift framework.In addition, in the situation of embodiment 4~5, as controlling member, prepare the rod of the diameter 2mm that made by reinforced plastics, this is controlled in all holes of controlling usefulness on each limit that member is inserted into framework control simultaneously, flatly lift framework.After flatly lifting, under horizontality, make it the height of 300mm 5 times up and down with per 1 second 1 time ratio, represent all situations that member is not all deviate from from all grooves of controlling usefulness or hole of controlling with " zero ", control member with " △ " expression part and control the groove of usefulness or the situation that deviate from the hole from the part of correspondence, represent all to control that member is deviate from from all grooves of controlling usefulness or hole and situation that pellicle member framework falls with " * ".
In addition, utilize across be adhesively fixed framework on the pallet of horizontal positioned of diaphragm and this pellicle member framework is carried out deflection prevent from estimating.In the situation of embodiment 1~3, as controlling member, preparation has tabular 12 groups of instruments of controlling member of the width 100mm, the thickness 0.75mm that are made by reinforced plastics, this is controlled in all grooves of controlling usefulness on each limit that member is inserted into framework control simultaneously, flatly lift framework.In addition, in the situation of comparative example 1, with identical instrument be inserted into by apart from the central authorities of two minor faces and the two ends 250mm of two minor faces amount at 6 centered by 6 places, flatly lift framework.In addition, in the situation of embodiment 4~5, as controlling member, prepare the rod of the diameter 2mm that made by reinforced plastics, this is controlled in all holes of controlling usefulness on each limit that member is inserted into framework control simultaneously, flatly lift framework.The speed of lifting is per second 1cm; be about to the deflection on limit of interface pellicle member framework before of complete strip off diaphragm and jointing material with " ◎ " expression less than the situation of 10mm; be about to the deflection on limit of interface pellicle member framework before of complete strip off diaphragm and jointing material with " zero " expression more than or equal to 10mm and less than the situation of 15mm; be about to the deflection on limit of the pellicle member framework before the interface of complete strip off diaphragm and jointing material with " △ " (in actual applications no problem threshold level) expression more than or equal to 15mm and less than the situation of 20mm, be about to the deflection on limit of interface pellicle member framework before of complete strip off diaphragm and jointing material with " * " (in actual applications in-problem level) expression more than or equal to the situation of 20mm.
Table 1
Figure G2008800235828D00441

Claims (13)

1. the framework of a large pellicle member, this framework has the polygonal shape that is made of many limits, can be at the bonding pellicle of upper limb face of this framework, at the lower edge face coating jointing material of this framework, the length of the longest edge of above-mentioned framework is more than the 1m, wherein,
Above-mentioned framework has respectively protuberance or the recess of the usefulness of controlling in all limit sections;
This protuberance or recess shared length on each limit of framework of controlling usefulness is more than 10% of each edge lengths;
Raised part or recess are in the position of leaving with upper limb face and lower edge face on the lateral surface of above-mentioned framework.
2. the framework of large pellicle member according to claim 1, wherein,
The recess of controlling usefulness is groove or hole.
3. the framework of large pellicle member according to claim 2, wherein,
The recess of controlling usefulness is groove or the hole with the spatial portion that inwardly broadens.
4. the framework of large pellicle member according to claim 2, wherein,
The recess of controlling usefulness is groove or the hole with the spatial portion that inwardly narrows down.
5. the framework of large pellicle member according to claim 2, wherein,
The recess of controlling usefulness is provided in a side of the groove on the complete cycle of all limit sections of framework.
6. the framework of large pellicle member according to claim 2, wherein,
The recess of controlling usefulness is the groove of being located on the part of limit section of framework.
7. the framework of each described large pellicle member according to claim 1~4, wherein,
The recess of controlling usefulness is respectively to be provided with a plurality of holes in all limit sections of framework.
8. large pellicle member, this large pellicle member is made of the framework of each described large pellicle member in the claim 1~7, the jointing material that is adhered to the pellicle on the upper limb face of this framework and is coated in the lower edge face of this framework.
9. large pellicle member according to claim 8, wherein,
The length of the longest edge of framework is 1.4m~2.0m.
10. according to claim 8 or 9 described large pellicle members, wherein,
The width of the frame of framework is 1.5~4.0 with the ratio of height.
11. the holding method of the framework of a large pellicle member, the framework of this large pellicle member are the frameworks of each described large pellicle member in the claim 1~7, wherein,
In all limit sections of the framework of above-mentioned large pellicle member, control respectively the protuberance of controlling usefulness or recess more than at least 1 place.
12. the holding method of the framework of large pellicle member according to claim 11, wherein,
The all protuberance of controlling usefulness or recess are controlled by all limit sections in the framework of large pellicle member.
13. the antidote of the framework shape of a large pellicle member, this antidote is used for correcting the framework shape of each described large pellicle member of claim 8~10, wherein,
In all limit sections of the framework of above-mentioned large pellicle member, control respectively the protuberance of controlling usefulness or recess more than at least 1 place, reduce the distortion of this framework at least by 1 position stress application to the framework of above-mentioned large pellicle member.
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Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5051840B2 (en) * 2007-11-22 2012-10-17 信越化学工業株式会社 Method for storing a pellicle in a pellicle storage container
JP5134436B2 (en) * 2008-05-27 2013-01-30 信越化学工業株式会社 Pellicle for lithography
TWI537674B (en) * 2008-09-12 2016-06-11 Asahi Kasei E Materials Corp Mask mask film, mask mask and mask mask the use of the box
JP5411596B2 (en) * 2009-06-24 2014-02-12 信越化学工業株式会社 Pellicle frame and lithography pellicle
JP5411595B2 (en) * 2009-06-24 2014-02-12 信越化学工業株式会社 Pellicle frame and lithography pellicle
JP2011034020A (en) * 2009-08-06 2011-02-17 Shin-Etsu Chemical Co Ltd Pellicle storage container
US8685598B2 (en) 2009-10-07 2014-04-01 Mitsui Chemicals, Inc. Pellicle and mask adhesive therefor
JP4879308B2 (en) * 2009-10-29 2012-02-22 信越化学工業株式会社 Pellicle stripping jig and stripping method
JP4951051B2 (en) * 2009-10-30 2012-06-13 信越化学工業株式会社 Pellicle frame and pellicle
JP5731147B2 (en) * 2010-09-01 2015-06-10 旭化成イーマテリアルズ株式会社 Pellicle frame and pellicle
JP5579545B2 (en) * 2010-09-03 2014-08-27 旭化成イーマテリアルズ株式会社 Large pellicle frame, large pellicle, and method for manufacturing large pellicle frame
JP2012093595A (en) * 2010-10-28 2012-05-17 Shin Etsu Chem Co Ltd Pellicle frame and pellicle
JP5722760B2 (en) * 2011-02-08 2015-05-27 信越化学工業株式会社 Pellicle manufacturing kit
JP5649134B2 (en) * 2011-02-08 2015-01-07 信越化学工業株式会社 Pellicle frame
JP5663376B2 (en) * 2011-04-04 2015-02-04 信越化学工業株式会社 Pellicle frame, manufacturing method thereof, and pellicle
JP5618888B2 (en) * 2011-04-04 2014-11-05 信越化学工業株式会社 Method for producing pellicle and pellicle film
JP5940283B2 (en) * 2011-11-04 2016-06-29 信越化学工業株式会社 Pellicle
JP2013195950A (en) * 2012-03-22 2013-09-30 Toppan Printing Co Ltd Pellicle and photomask
JP5795747B2 (en) * 2012-04-04 2015-10-14 信越化学工業株式会社 Pellicle frame and pellicle
US9658525B2 (en) 2012-08-02 2017-05-23 Mitsui Chemicals Inc. Pellicle
JP5864399B2 (en) * 2012-10-22 2016-02-17 信越化学工業株式会社 Pellicle storage container
JP5984187B2 (en) * 2013-04-22 2016-09-06 信越化学工業株式会社 Pellicle and photomask assembly
US10207459B2 (en) * 2013-06-21 2019-02-19 Mitsuiya Industrial Co., Ltd Working method for end portion of plate member, manufacturing method for plate member, working apparatus for end portion of plate member, and plate member
JP6389353B2 (en) * 2013-08-15 2018-09-12 旭化成株式会社 Pellicle frame and pellicle
KR101918687B1 (en) 2014-01-28 2018-11-14 삼성전자주식회사 Pellicle
US10216081B2 (en) * 2014-05-02 2019-02-26 Mitsui Chemicals, Inc. Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device
DE102014111995B4 (en) 2014-08-21 2022-10-13 Infineon Technologies Ag METHODS OF GRASPING, MOVING AND ELECTRICAL TESTING OF A SEMICONDUCTOR MODULE
WO2016043292A1 (en) * 2014-09-19 2016-03-24 三井化学株式会社 Pellicle, production method thereof, exposure method
EP3196700B1 (en) 2014-09-19 2019-01-30 Mitsui Chemicals, Inc. Pellicle, pellicle production method and exposure method using pellicle
JP6304884B2 (en) * 2014-09-22 2018-04-04 信越化学工業株式会社 Pellicle pasting method
CN117826520A (en) 2014-11-17 2024-04-05 Asml荷兰有限公司 Stud attachment apparatus and stud removal apparatus
KR102082784B1 (en) * 2014-12-11 2020-03-02 삼성디스플레이 주식회사 Mask frame assembly, manufacturing method of the same and manufacturing method of organic light emitting display device there used
JP6347741B2 (en) * 2014-12-25 2018-06-27 信越化学工業株式会社 Pellicle
JP6519190B2 (en) * 2015-01-16 2019-05-29 日本軽金属株式会社 Support frame for pellicle
JP2016139103A (en) * 2015-01-29 2016-08-04 日本軽金属株式会社 Supporting frame for pellicle
JP6564846B2 (en) * 2015-02-19 2019-08-21 株式会社ブイ・テクノロジー Pellicle frame gripping apparatus and pellicle frame gripping method
JP6376601B2 (en) * 2015-05-18 2018-08-22 信越化学工業株式会社 Pellicle support means, pellicle support apparatus and pellicle mounting method using the same
NL2017912B1 (en) * 2015-12-14 2018-01-11 Asml Netherlands Bv A membrane assembly
CN115202162A (en) 2015-12-14 2022-10-18 Asml荷兰有限公司 Method for manufacturing a diaphragm assembly
JP6559585B2 (en) * 2016-01-25 2019-08-14 日本特殊陶業株式会社 Pellicle frame and method for manufacturing pellicle frame
JP6604651B2 (en) * 2016-02-22 2019-11-13 信越化学工業株式会社 Pellicle storage container
JP6526588B2 (en) * 2016-03-10 2019-06-05 日本特殊陶業株式会社 Method of manufacturing pellicle frame and pellicle frame
JP6532428B2 (en) 2016-05-26 2019-06-19 信越化学工業株式会社 Pellicle
JP7017900B2 (en) * 2016-11-11 2022-02-09 旭化成株式会社 Pellicle structure, pellicle storage and fixing method
JP6706575B2 (en) * 2016-12-22 2020-06-10 信越化学工業株式会社 Pellicle frame and pellicle using the same
JP7357432B2 (en) * 2017-10-10 2023-10-06 信越化学工業株式会社 EUV pellicle frame, pellicle, exposure original plate with pellicle, exposure method, and semiconductor manufacturing method
KR20250036267A (en) 2017-10-27 2025-03-13 에이에스엠엘 네델란즈 비.브이. Pellicle frame and pellicle assembly
JP6899759B2 (en) * 2017-12-12 2021-07-07 日本軽金属株式会社 Pellicle frame for FPD (flat panel display) and its manufacturing method
WO2019172141A1 (en) * 2018-03-05 2019-09-12 三井化学株式会社 Pellicle, exposure master, exposure device and method for manufacturing semiconductor device
US10768534B2 (en) * 2018-08-14 2020-09-08 Taiwan Semiconductor Manufacturing Co., Ltd. Photolithography apparatus and method and method for handling wafer
JP7103252B2 (en) 2019-02-01 2022-07-20 信越化学工業株式会社 Pellicle frame, pellicle, pellicle frame with mask adhesive, exposure original plate with pellicle, exposure method and semiconductor manufacturing method
JP7347789B2 (en) * 2019-07-09 2023-09-20 三井化学株式会社 Pellicle frame and pellicle
TW202129404A (en) * 2020-01-21 2021-08-01 日商信越化學工業股份有限公司 Pellicle frame, pellicle, exposure original plate with pellicle, exposure method, and semiconductor or liquid-crystal-display manufacturing method
JP2024160514A (en) * 2023-05-01 2024-11-14 株式会社ブイ・イー・ティー Mask frame for deposition mask
KR102831319B1 (en) * 2024-10-10 2025-07-09 주식회사 이프럼 Assembly structure of furniture

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004240010A (en) * 2003-02-04 2004-08-26 Asahi Kasei Electronics Co Ltd Method of housing pellicle
JP2005308901A (en) * 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd Pellicle frame and pellicle for photolithography using the same
CN1836988A (en) * 2005-03-22 2006-09-27 信越化学工业株式会社 Container box for framed pellicle
CN1854891A (en) * 2005-04-25 2006-11-01 信越化学工业株式会社 Pellicle frame
US7205074B2 (en) * 2002-12-31 2007-04-17 Intel Corporation Venting of pellicle cavity for a mask

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
JP2595993B2 (en) * 1987-10-09 1997-04-02 株式会社ニコン Apparatus and method for producing original plate for exposure
JP3242693B2 (en) * 1992-05-15 2001-12-25 富士通株式会社 Pellicle sticking device
JPH095982A (en) * 1995-06-17 1997-01-10 Mitsui Petrochem Ind Ltd Mask protection device peeling method
JPH09106066A (en) * 1995-10-09 1997-04-22 Nikon Corp Pericle liner separating method
JPH1048811A (en) * 1996-08-07 1998-02-20 Mitsui Petrochem Ind Ltd Mask protector and pellicle frame
JP4007752B2 (en) * 1999-07-30 2007-11-14 旭化成エレクトロニクス株式会社 Large pellicle frame and large pellicle
JP2002131892A (en) * 2000-10-27 2002-05-09 Asahi Kasei Electronics Co Ltd Method for removing pellicle and apparatus for it
US6524754B2 (en) * 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
JP2003222990A (en) * 2001-11-21 2003-08-08 Asahi Glass Co Ltd Mounting structure of pellicle to photomask
JP4030888B2 (en) * 2003-02-05 2008-01-09 Smk株式会社 Module socket
JP4330377B2 (en) * 2003-05-15 2009-09-16 旭化成イーマテリアルズ株式会社 Large pellicle assembly method and large pellicle assembly apparatus
JP4497845B2 (en) * 2003-06-04 2010-07-07 旭化成イーマテリアルズ株式会社 Large pellicle storage method
JP2005202011A (en) * 2004-01-14 2005-07-28 Mitsui Chemicals Inc Pellicle
JP2005326634A (en) * 2004-05-14 2005-11-24 Mitsui Chemicals Inc Method for housing pellicle
JP2006146064A (en) * 2004-11-24 2006-06-08 Asahi Kasei Electronics Co Ltd Temporary frame for stripping large pellicle
WO2006113859A2 (en) * 2005-04-20 2006-10-26 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame
JP2006323178A (en) * 2005-05-19 2006-11-30 Shin Etsu Chem Co Ltd Pellicle for lithography and method for manufacturing the same
JP4677632B2 (en) * 2005-07-08 2011-04-27 レーザーテック株式会社 Pellicle liner or pellicle peeling apparatus, peeling method, and pattern substrate manufacturing method
JP2008083166A (en) * 2006-09-26 2008-04-10 Toppan Printing Co Ltd Pellicle frame
JP5052106B2 (en) * 2006-11-22 2012-10-17 旭化成イーマテリアルズ株式会社 How to store the pellicle

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7205074B2 (en) * 2002-12-31 2007-04-17 Intel Corporation Venting of pellicle cavity for a mask
JP2004240010A (en) * 2003-02-04 2004-08-26 Asahi Kasei Electronics Co Ltd Method of housing pellicle
JP2005308901A (en) * 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd Pellicle frame and pellicle for photolithography using the same
CN1836988A (en) * 2005-03-22 2006-09-27 信越化学工业株式会社 Container box for framed pellicle
CN1854891A (en) * 2005-04-25 2006-11-01 信越化学工业株式会社 Pellicle frame
JP2006301525A (en) * 2005-04-25 2006-11-02 Shin Etsu Chem Co Ltd Pellicle frame

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KR101264571B1 (en) 2013-05-14
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TWI498671B (en) 2015-09-01
CN102681334B (en) 2015-09-30

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