KR20070001117A - 제조 방법 및 시스템, 조성물, 계면활성제, 모노머 유닛,금속 착체, 포스페이트 에스테르, 글리콜, 수성 막 형성발포제, 및 발포 안정제 - Google Patents
제조 방법 및 시스템, 조성물, 계면활성제, 모노머 유닛,금속 착체, 포스페이트 에스테르, 글리콜, 수성 막 형성발포제, 및 발포 안정제 Download PDFInfo
- Publication number
- KR20070001117A KR20070001117A KR1020067015478A KR20067015478A KR20070001117A KR 20070001117 A KR20070001117 A KR 20070001117A KR 1020067015478 A KR1020067015478 A KR 1020067015478A KR 20067015478 A KR20067015478 A KR 20067015478A KR 20070001117 A KR20070001117 A KR 20070001117A
- Authority
- KR
- South Korea
- Prior art keywords
- mixture
- grams
- surfactant composition
- trifluoromethyl
- tetrafluoro
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 406
- 239000004094 surface-active agent Substances 0.000 title claims abstract description 116
- 239000000178 monomer Substances 0.000 title abstract description 62
- 229910052751 metal Inorganic materials 0.000 title abstract description 20
- 239000002184 metal Substances 0.000 title abstract description 20
- 239000003381 stabilizer Substances 0.000 title abstract description 11
- 239000004088 foaming agent Substances 0.000 title abstract description 6
- 150000003014 phosphoric acid esters Chemical class 0.000 title description 10
- 238000002360 preparation method Methods 0.000 title description 9
- 150000002334 glycols Chemical class 0.000 title description 7
- 238000005187 foaming Methods 0.000 title description 3
- 238000000034 method Methods 0.000 claims abstract description 83
- 150000001875 compounds Chemical class 0.000 claims abstract description 53
- 239000003973 paint Substances 0.000 claims abstract description 5
- 239000000080 wetting agent Substances 0.000 claims abstract description 5
- 239000000853 adhesive Substances 0.000 claims abstract description 4
- 230000001070 adhesive effect Effects 0.000 claims abstract description 4
- 239000003599 detergent Substances 0.000 claims abstract description 4
- 239000003995 emulsifying agent Substances 0.000 claims abstract description 4
- 239000002518 antifoaming agent Substances 0.000 claims abstract description 3
- 230000008569 process Effects 0.000 claims description 18
- 230000002209 hydrophobic effect Effects 0.000 claims description 15
- 229910052736 halogen Inorganic materials 0.000 claims description 10
- 150000002367 halogens Chemical group 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000004604 Blowing Agent Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 11
- 239000000543 intermediate Substances 0.000 abstract description 203
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 173
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 123
- 229910001868 water Inorganic materials 0.000 abstract description 79
- 239000000758 substrate Substances 0.000 abstract description 35
- 229920000642 polymer Polymers 0.000 abstract description 24
- 239000000376 reactant Substances 0.000 abstract description 23
- 150000001336 alkenes Chemical class 0.000 abstract description 15
- 229920006395 saturated elastomer Polymers 0.000 abstract description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 8
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 abstract description 8
- 239000006260 foam Substances 0.000 abstract description 7
- 229920005989 resin Polymers 0.000 abstract description 4
- 239000011347 resin Substances 0.000 abstract description 4
- 239000000976 ink Substances 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 105
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 72
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 70
- 238000005481 NMR spectroscopy Methods 0.000 description 67
- 239000007787 solid Substances 0.000 description 57
- -1 tiles Substances 0.000 description 52
- 238000006243 chemical reaction Methods 0.000 description 51
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 47
- 239000012044 organic layer Substances 0.000 description 46
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 42
- 239000003153 chemical reaction reagent Substances 0.000 description 38
- 238000010586 diagram Methods 0.000 description 37
- 238000004817 gas chromatography Methods 0.000 description 36
- 239000000047 product Substances 0.000 description 36
- 238000010992 reflux Methods 0.000 description 36
- 239000008367 deionised water Substances 0.000 description 35
- 229910021641 deionized water Inorganic materials 0.000 description 35
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 33
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 32
- 238000009472 formulation Methods 0.000 description 30
- 239000007788 liquid Substances 0.000 description 30
- 239000003921 oil Substances 0.000 description 29
- 235000019198 oils Nutrition 0.000 description 29
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 24
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 24
- 229960001701 chloroform Drugs 0.000 description 24
- 150000002148 esters Chemical class 0.000 description 24
- 239000003999 initiator Substances 0.000 description 24
- 230000003797 telogen phase Effects 0.000 description 24
- 239000000460 chlorine Substances 0.000 description 23
- DVQRFCKQKDQEER-UHFFFAOYSA-N 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pent-1-ene Chemical compound FC(F)(F)C(F)(C(F)(F)F)CC=C DVQRFCKQKDQEER-UHFFFAOYSA-N 0.000 description 22
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 21
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 21
- 235000019341 magnesium sulphate Nutrition 0.000 description 21
- 239000000463 material Substances 0.000 description 21
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 20
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 238000004458 analytical method Methods 0.000 description 18
- 239000000706 filtrate Substances 0.000 description 17
- BBZVTTKMXRPMHZ-UHFFFAOYSA-N 1,1,1,2,3,3,3-heptafluoro-2-iodopropane Chemical compound FC(F)(F)C(F)(I)C(F)(F)F BBZVTTKMXRPMHZ-UHFFFAOYSA-N 0.000 description 16
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 16
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 16
- VCOYOPKEJYAJCN-UHFFFAOYSA-N 4,5,5,5-tetrafluoro-2-iodo-4-(trifluoromethyl)pentan-1-ol Chemical compound OCC(I)CC(F)(C(F)(F)F)C(F)(F)F VCOYOPKEJYAJCN-UHFFFAOYSA-N 0.000 description 15
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 15
- 229910052801 chlorine Inorganic materials 0.000 description 15
- 229910052731 fluorine Inorganic materials 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 15
- 238000003756 stirring Methods 0.000 description 15
- 125000000217 alkyl group Chemical group 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 13
- 239000000123 paper Substances 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 12
- 239000002253 acid Substances 0.000 description 12
- 239000011737 fluorine Substances 0.000 description 12
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 12
- 150000003839 salts Chemical class 0.000 description 12
- FDRCDNZGSXJAFP-UHFFFAOYSA-M sodium chloroacetate Chemical compound [Na+].[O-]C(=O)CCl FDRCDNZGSXJAFP-UHFFFAOYSA-M 0.000 description 12
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 11
- 239000012267 brine Substances 0.000 description 11
- 229910052799 carbon Inorganic materials 0.000 description 11
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 11
- 239000011521 glass Substances 0.000 description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 11
- 239000011734 sodium Substances 0.000 description 11
- 229910052938 sodium sulfate Inorganic materials 0.000 description 11
- 235000011152 sodium sulphate Nutrition 0.000 description 11
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 10
- 229910019142 PO4 Inorganic materials 0.000 description 10
- 150000001298 alcohols Chemical class 0.000 description 10
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 10
- 239000012065 filter cake Substances 0.000 description 10
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- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 150000001412 amines Chemical class 0.000 description 9
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 9
- DQEUYIQDSMINEY-UHFFFAOYSA-M magnesium;prop-1-ene;bromide Chemical compound [Mg+2].[Br-].[CH2-]C=C DQEUYIQDSMINEY-UHFFFAOYSA-M 0.000 description 9
- 229940116357 potassium thiocyanate Drugs 0.000 description 9
- 239000011701 zinc Substances 0.000 description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 8
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 8
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- 239000008241 heterogeneous mixture Substances 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- GQNNGJBGSUPSEI-UHFFFAOYSA-N n-[3-(dimethylamino)propyl]-3,4,4,4-tetrafluoro-3-(trifluoromethyl)butane-1-sulfonamide Chemical compound CN(C)CCCNS(=O)(=O)CCC(F)(C(F)(F)F)C(F)(F)F GQNNGJBGSUPSEI-UHFFFAOYSA-N 0.000 description 8
- 150000002978 peroxides Chemical class 0.000 description 8
- 239000007858 starting material Substances 0.000 description 8
- NMPABPRKIBGSGW-UHFFFAOYSA-N 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentan-1-ol Chemical compound OCCCC(F)(C(F)(F)F)C(F)(F)F NMPABPRKIBGSGW-UHFFFAOYSA-N 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 7
- QZYXLUGTMZBCGV-UHFFFAOYSA-N [4,5,5,5-tetrafluoro-2-iodo-4-(trifluoromethyl)pentyl] acetate Chemical compound CC(=O)OCC(I)CC(F)(C(F)(F)F)C(F)(F)F QZYXLUGTMZBCGV-UHFFFAOYSA-N 0.000 description 7
- 239000003638 chemical reducing agent Substances 0.000 description 7
- 230000002140 halogenating effect Effects 0.000 description 7
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 7
- 239000010452 phosphate Substances 0.000 description 7
- 235000021317 phosphate Nutrition 0.000 description 7
- 238000011282 treatment Methods 0.000 description 7
- IFPFCMSUTLBECN-UHFFFAOYSA-N 1,1,1,2,5,5,5-heptafluoro-4-iodo-2-(trifluoromethyl)pentane Chemical compound FC(F)(F)C(I)CC(F)(C(F)(F)F)C(F)(F)F IFPFCMSUTLBECN-UHFFFAOYSA-N 0.000 description 6
- NRVDKMYDLZBFEH-UHFFFAOYSA-N 1,1,1,2-tetrafluoro-4-iodo-2-(trifluoromethyl)butane Chemical compound FC(F)(F)C(F)(C(F)(F)F)CCI NRVDKMYDLZBFEH-UHFFFAOYSA-N 0.000 description 6
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 6
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- 239000007864 aqueous solution Substances 0.000 description 6
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- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 239000011630 iodine Substances 0.000 description 6
- 229910052740 iodine Inorganic materials 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 6
- 239000004753 textile Substances 0.000 description 6
- KFYRJJBUHYILSO-YFKPBYRVSA-N (2s)-2-amino-3-dimethylarsanylsulfanyl-3-methylbutanoic acid Chemical compound C[As](C)SC(C)(C)[C@@H](N)C(O)=O KFYRJJBUHYILSO-YFKPBYRVSA-N 0.000 description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 5
- FDMFUZHCIRHGRG-UHFFFAOYSA-N 3,3,3-trifluoroprop-1-ene Chemical compound FC(F)(F)C=C FDMFUZHCIRHGRG-UHFFFAOYSA-N 0.000 description 5
- 235000019502 Orange oil Nutrition 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 5
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- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 5
- 239000012230 colorless oil Substances 0.000 description 5
- 238000002485 combustion reaction Methods 0.000 description 5
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- 238000004821 distillation Methods 0.000 description 5
- 150000004676 glycans Chemical class 0.000 description 5
- 229910000856 hastalloy Inorganic materials 0.000 description 5
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 5
- 239000003446 ligand Substances 0.000 description 5
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- 229920001282 polysaccharide Polymers 0.000 description 5
- 239000005017 polysaccharide Substances 0.000 description 5
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- 239000000523 sample Substances 0.000 description 5
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- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 4
- WWAKYXYJMRXUKE-UHFFFAOYSA-N 5,5,5-trifluoro-4-(trifluoromethyl)penta-1,3-diene Chemical compound FC(F)(F)C(C(F)(F)F)=CC=C WWAKYXYJMRXUKE-UHFFFAOYSA-N 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 4
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 4
- 239000012359 Methanesulfonyl chloride Substances 0.000 description 4
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
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- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
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- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical compound FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
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- 150000003254 radicals Chemical class 0.000 description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 description 4
- 150000003673 urethanes Chemical class 0.000 description 4
- 239000002023 wood Substances 0.000 description 4
- 0 *C(CC(CO)I)(C(F)(F)F)C(F)(F)F Chemical compound *C(CC(CO)I)(C(F)(F)F)C(F)(F)F 0.000 description 3
- GPNCNRMRQFUGDT-UHFFFAOYSA-N 6,7,7,7-tetrafluoro-4-[2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl]-6-(trifluoromethyl)hept-1-ene Chemical compound FC(F)(F)C(F)(C(F)(F)F)CC(CC=C)CC(F)(C(F)(F)F)C(F)(F)F GPNCNRMRQFUGDT-UHFFFAOYSA-N 0.000 description 3
- HCACURHGMBCMJC-UHFFFAOYSA-N 6,7,7,7-tetrafluoro-6-(trifluoromethyl)hept-1-ene Chemical compound FC(F)(F)C(F)(C(F)(F)F)CCCC=C HCACURHGMBCMJC-UHFFFAOYSA-N 0.000 description 3
- ONLBKDBGDNFQSO-UHFFFAOYSA-N 7,8,8,8-tetrafluoro-5-iodo-7-(trifluoromethyl)oct-1-ene Chemical compound FC(F)(F)C(F)(C(F)(F)F)CC(I)CCC=C ONLBKDBGDNFQSO-UHFFFAOYSA-N 0.000 description 3
- MAQVXJIGLHJWQG-UHFFFAOYSA-N 7,8,8,8-tetrafluoro-7-(trifluoromethyl)oct-1-ene Chemical compound FC(F)(F)C(F)(C(F)(F)F)CCCCC=C MAQVXJIGLHJWQG-UHFFFAOYSA-N 0.000 description 3
- YYZYRAWXNHRXPF-UHFFFAOYSA-N 8-bromo-1,1,1,2-tetrafluoro-2-(trifluoromethyl)octane Chemical compound FC(F)(F)C(F)(C(F)(F)F)CCCCCCBr YYZYRAWXNHRXPF-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N DMSO Substances CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
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- IPILPUZVTYHGIL-UHFFFAOYSA-M tributyl(methyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](C)(CCCC)CCCC IPILPUZVTYHGIL-UHFFFAOYSA-M 0.000 description 1
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 1
- 238000007704 wet chemistry method Methods 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
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- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
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- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
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- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/40—Specific cleaning or washing processes
- C11D2111/42—Application of foam or a temporary coating on the surface to be cleaned
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Abstract
Description
Claims (64)
- RF-QS를 포함하는 계면활성제 조성물로서, 여기서 RF는 적어도 두 부분을 갖는 시스템의 제 1 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 제 2 부분에 대해 RF보다 큰 친화성을 가지고; RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 계면활성제 조성물.
- 제 1 항에 있어서, RF는 QS에 비해 소수성인 것을 특징으로 하는 계면활성제 조성물.
- 제 1 항에 있어서, QS는 RF에 비해 친수성인 것을 특징으로 하는 계면활성제 조성물.
- 제 1 항에 있어서, RF는 소수성이고, QS는 친수성인 것을 특징으로 하는 계면활성제 조성물.
- 제 1 항에 있어서, RF는 적어도 하나의 -CH2- 기를 포함하는 것을 특징으로 하는 계면활성제 조성물.
- 제 1 항에 있어서, RF는 적어도 하나의 고리 기를 포함하는 것을 특징으로 하는 계면활성제 조성물.
- 제 1 항에 있어서, RF는 적어도 하나의 고리 기를 포함하는 것을 특징으로 하는 계면활성제 조성물.
- 제 7 항에 있어서, 고리 기는 방향족 기를 포함하는 것을 특징으로 하는 계면활성제 조성물.
- 제 1 항에 있어서, RF는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 계면활성제 조성물.
- 제 1 항에 있어서, RF는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 계면활성제 조성물.
- 제 1 항에 있어서, RF는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 계면활성제 조성물.
- 제 1 항에 있어서, RF는 적어도 4개의 탄소를 포함하며, 이 4개 탄소 중 하나는 -CH2- 기를 포함하는 것을 특징으로 하는 계면활성제 조성물.
- 계면활성제 조성물을 포함하는 세제로서, 계면활성제 조성물은 RF-QS를 포함하고, 여기서 RF는 적어도 두 부분을 갖는 시스템의 제 1 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 제 2 부분에 대해 RF보다 큰 친화성을 가지고; RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 세제.
- 계면활성제 조성물을 포함하는 유화제로서, 계면활성제 조성물은 RF-QS를 포함하고, 여기서 RF는 적어도 두 부분을 갖는 시스템의 제 1 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 제 2 부분에 대해 RF보다 큰 친화성을 가지고; RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 유화제.
- 계면활성제 조성물을 포함하는 도료로서, 계면활성제 조성물은 RF-QS를 포함하고, 여기서 RF는 적어도 두 부분을 갖는 시스템의 제 1 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 제 2 부분에 대해 RF보다 큰 친화성을 가지고; RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 도료.
- 계면활성제 조성물을 포함하는 접착제로서, 계면활성제 조성물은 RF-QS를 포함하고, 여기서 RF는 적어도 두 부분을 갖는 시스템의 제 1 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 제 2 부분에 대해 RF보다 큰 친화성을 가지고; RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 접착제.
- 계면활성제 조성물을 포함하는 잉크로서, 계면활성제 조성물은 RF-QS를 포함하고, 여기서 RF는 적어도 두 부분을 갖는 시스템의 제 1 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 제 2 부분에 대해 RF보다 큰 친화성을 가지고; RF 는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 잉크.
- 계면활성제 조성물을 포함하는 습윤제로서, 계면활성제 조성물은 RF-QS를 포함하고, 여기서 RF는 적어도 두 부분을 갖는 시스템의 제 1 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 제 2 부분에 대해 RF보다 큰 친화성을 가지고; RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 습윤제.
- 계면활성제 조성물을 포함하는 발포제로서, 계면활성제 조성물은 RF-QS를 포함하고, 여기서 RF는 적어도 두 부분을 갖는 시스템의 제 1 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 제 2 부분에 대해 RF보다 큰 친화성을 가지고; RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 발포제.
- 계면활성제 조성물을 포함하는 소포제로서, 계면활성제 조성물은 RF-QS를 포함하고, 여기서 RF는 적어도 두 부분을 갖는 시스템의 제 1 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 제 2 부분에 대해 RF보다 큰 친화성을 가지고; RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 소포제.
- 적어도 2개의 -CF3 기와 2개의 수소를 포함하는 제 1 화합물로서, 제 1 화합물의 일부가 RF-QS 계면활성제의 RF를 표시하는 제 1 화합물을 제공하는 단계; 및 RF에 QS를 부가하여 RF-QS 계면활성제를 형성하는 단계를 포함하는 제조 방법으로서, 여기서 RF는 적어도 두 부분을 갖는 시스템의 제 1 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 제 2 부분에 대해 RF보다 큰 친화성을 가지고; RF는 2개의 -CF3 기와 2개의 수소를 포함하는 것을 특징으로 하는 제조 방법.
- 제 44 항에 있어서, RF는 QS에 비해 소수성인 것을 특징으로 하는 제조 방법.
- 제 44 항에 있어서, QS는 RF에 비해 친수성인 것을 특징으로 하는 제조 방법.
- 제 44 항에 있어서, RF는 소수성이고, QS는 친수성인 것을 특징으로 하는 제조 방법.
- 제 44 항에 있어서, RF는 적어도 하나의 -CH2- 기를 포함하는 것을 특징으로 하는 제조 방법.
- 제 44 항에 있어서, RF는 적어도 하나의 고리 기를 포함하는 것을 특징으로 하는 제조 방법.
- 제 49 항에 있어서, 고리 기는 방향족 기를 포함하는 것을 특징으로 하는 제조 방법.
- 제 44 항에 있어서, RF는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 제조 방법.
- 제 44 항에 있어서, RF는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 제조 방법.
- 제 44 항에 있어서, RF는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 제조 방법.
- 제 44 항에 있어서, RF는 적어도 4개의 탄소를 포함하며, 이 4개 탄소 중 하나는 -CH2- 기를 포함하는 것을 특징으로 하는 제조 방법.
- RF-QS를 포함하는 계면활성제 조성물을 시스템의 일부에 가하는 단계를 포함하는 적어도 두 부분을 갖는 시스템의 한 부분의 표면장력을 변경하는 방법으로서, 여기서 RF는 이 시스템의 한 부분에 대해 QS보다 큰 친화성을 가지고; QS는 이 시스템의 다른 부분에 대해 RF보다 큰 친화성을 가지고; RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 방법.
- 제 55 항에 있어서, RF는 QS에 비해 소수성인 것을 특징으로 하는 방법.
- 제 55 항에 있어서, QS는 RF에 비해 친수성인 것을 특징으로 하는 방법.
- 제 55 항에 있어서, RF는 소수성이고, QS는 친수성인 것을 특징으로 하는 방 법.
- 제 55 항에 있어서, RF는 적어도 하나의 -CH2- 기를 포함하는 것을 특징으로 하는 방법.
- 제 55 항에 있어서, RF는 적어도 하나의 고리 기를 포함하는 것을 특징으로 하는 방법.
- 제 60 항에 있어서, 고리 기는 방향족 기를 포함하는 것을 특징으로 하는 방법.
- 제 55 항에 있어서, RF는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 방법.
- 제 55 항에 있어서, RF는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 방법.
- 제 55 항에 있어서, RF는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으 로 하는 방법.
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-
2005
- 2005-01-28 CA CA002554029A patent/CA2554029A1/en not_active Abandoned
- 2005-01-28 KR KR1020077029701A patent/KR20080009760A/ko not_active Application Discontinuation
- 2005-01-28 EP EP05712170A patent/EP1718587A4/en not_active Withdrawn
- 2005-01-28 KR KR1020067015480A patent/KR20060132889A/ko not_active Application Discontinuation
- 2005-01-28 KR KR1020067015478A patent/KR20070001117A/ko not_active Application Discontinuation
- 2005-01-28 KR KR1020077029422A patent/KR20080012974A/ko not_active Application Discontinuation
- 2005-01-28 WO PCT/US2005/002617 patent/WO2005074528A2/en active Application Filing
- 2005-01-28 US US10/587,344 patent/US20070276167A1/en not_active Abandoned
- 2005-01-28 JP JP2006551480A patent/JP2007522287A/ja active Pending
- 2005-01-28 CN CNA2005800108072A patent/CN1960958A/zh active Pending
- 2005-01-28 CN CNA2005800107506A patent/CN1965067A/zh active Pending
- 2005-01-28 CN CNA2005800107135A patent/CN1957078A/zh active Pending
- 2005-01-28 KR KR1020077021382A patent/KR20070101402A/ko not_active Application Discontinuation
- 2005-01-31 AR ARP050100356A patent/AR048402A1/es not_active Application Discontinuation
- 2005-01-31 AR ARP050100357A patent/AR048062A1/es not_active Application Discontinuation
-
2007
- 2007-11-20 US US11/986,222 patent/US20080076948A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1718587A4 (en) | 2008-02-20 |
JP2007522287A (ja) | 2007-08-09 |
CN1957078A (zh) | 2007-05-02 |
EP1718587A2 (en) | 2006-11-08 |
CN1960958A (zh) | 2007-05-09 |
KR20080009760A (ko) | 2008-01-29 |
CA2554029A1 (en) | 2005-08-18 |
KR20060132889A (ko) | 2006-12-22 |
US20070276167A1 (en) | 2007-11-29 |
US20080076948A1 (en) | 2008-03-27 |
CN1965067A (zh) | 2007-05-16 |
WO2005074528A3 (en) | 2005-12-22 |
KR20080012974A (ko) | 2008-02-12 |
WO2005074528A2 (en) | 2005-08-18 |
AR048402A1 (es) | 2006-04-26 |
AR048062A1 (es) | 2006-03-29 |
KR20070101402A (ko) | 2007-10-16 |
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