KR20070000463A - 제조 방법 및 시스템, 조성물, 계면활성제, 모노머 유닛,금속 착체, 포스페이트 에스테르, 글리콜, 수성 막 형성발포제, 및 발포 안정제 - Google Patents
제조 방법 및 시스템, 조성물, 계면활성제, 모노머 유닛,금속 착체, 포스페이트 에스테르, 글리콜, 수성 막 형성발포제, 및 발포 안정제 Download PDFInfo
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- KR20070000463A KR20070000463A KR1020067015476A KR20067015476A KR20070000463A KR 20070000463 A KR20070000463 A KR 20070000463A KR 1020067015476 A KR1020067015476 A KR 1020067015476A KR 20067015476 A KR20067015476 A KR 20067015476A KR 20070000463 A KR20070000463 A KR 20070000463A
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- 239000003795 chemical substances by application Substances 0.000 description 15
- 229910052801 chlorine Inorganic materials 0.000 description 15
- 229910052731 fluorine Inorganic materials 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 15
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- 238000003756 stirring Methods 0.000 description 15
- VCOYOPKEJYAJCN-UHFFFAOYSA-N 4,5,5,5-tetrafluoro-2-iodo-4-(trifluoromethyl)pentan-1-ol Chemical compound OCC(I)CC(F)(C(F)(F)F)C(F)(F)F VCOYOPKEJYAJCN-UHFFFAOYSA-N 0.000 description 14
- 125000000217 alkyl group Chemical group 0.000 description 14
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
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- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 12
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- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 12
- 150000003839 salts Chemical class 0.000 description 12
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- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 11
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- 229940116357 potassium thiocyanate Drugs 0.000 description 9
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- GPNCNRMRQFUGDT-UHFFFAOYSA-N 6,7,7,7-tetrafluoro-4-[2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl]-6-(trifluoromethyl)hept-1-ene Chemical compound FC(F)(F)C(F)(C(F)(F)F)CC(CC=C)CC(F)(C(F)(F)F)C(F)(F)F GPNCNRMRQFUGDT-UHFFFAOYSA-N 0.000 description 3
- HCACURHGMBCMJC-UHFFFAOYSA-N 6,7,7,7-tetrafluoro-6-(trifluoromethyl)hept-1-ene Chemical compound FC(F)(F)C(F)(C(F)(F)F)CCCC=C HCACURHGMBCMJC-UHFFFAOYSA-N 0.000 description 3
- ONLBKDBGDNFQSO-UHFFFAOYSA-N 7,8,8,8-tetrafluoro-5-iodo-7-(trifluoromethyl)oct-1-ene Chemical compound FC(F)(F)C(F)(C(F)(F)F)CC(I)CCC=C ONLBKDBGDNFQSO-UHFFFAOYSA-N 0.000 description 3
- MAQVXJIGLHJWQG-UHFFFAOYSA-N 7,8,8,8-tetrafluoro-7-(trifluoromethyl)oct-1-ene Chemical compound FC(F)(F)C(F)(C(F)(F)F)CCCCC=C MAQVXJIGLHJWQG-UHFFFAOYSA-N 0.000 description 3
- YYZYRAWXNHRXPF-UHFFFAOYSA-N 8-bromo-1,1,1,2-tetrafluoro-2-(trifluoromethyl)octane Chemical compound FC(F)(F)C(F)(C(F)(F)F)CCCCCCBr YYZYRAWXNHRXPF-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N DMSO Substances CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
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- KLGACCLNLNAILU-UHFFFAOYSA-N tert-butyl cyclohexyloxycarbonyl carbonate Chemical compound CC(C)(C)OC(=O)OC(=O)OC1CCCCC1 KLGACCLNLNAILU-UHFFFAOYSA-N 0.000 description 1
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- IPILPUZVTYHGIL-UHFFFAOYSA-M tributyl(methyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](C)(CCCC)CCCC IPILPUZVTYHGIL-UHFFFAOYSA-M 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/26—Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton
- C07C17/272—Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by addition reactions
- C07C17/278—Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by addition reactions of only halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C19/00—Acyclic saturated compounds containing halogen atoms
- C07C19/08—Acyclic saturated compounds containing halogen atoms containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C19/00—Acyclic saturated compounds containing halogen atoms
- C07C19/08—Acyclic saturated compounds containing halogen atoms containing fluorine
- C07C19/10—Acyclic saturated compounds containing halogen atoms containing fluorine and chlorine
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C19/00—Acyclic saturated compounds containing halogen atoms
- C07C19/08—Acyclic saturated compounds containing halogen atoms containing fluorine
- C07C19/14—Acyclic saturated compounds containing halogen atoms containing fluorine and bromine
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C19/00—Acyclic saturated compounds containing halogen atoms
- C07C19/08—Acyclic saturated compounds containing halogen atoms containing fluorine
- C07C19/16—Acyclic saturated compounds containing halogen atoms containing fluorine and iodine
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C21/00—Acyclic unsaturated compounds containing halogen atoms
- C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
- C07C21/18—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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Abstract
Description
Claims (121)
- RF-모노머를 포함하는 조성물로서, 여기서 RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 조성물.
- 제 1 항에 있어서, RF는 적어도 하나의 -CH2- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 1 항에 있어서, RF는 적어도 하나의 고리 기를 포함하는 것을 특징으로 하는 조성물.
- 제 1 항에 있어서, RF는 적어도 하나의 방향족 기를 포함하는 것을 특징으로 하는 조성물.
- 제 1 항에 있어서, RF는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 1 항에 있어서, RF는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 1 항에 있어서, RF는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 1 항에 있어서, RF는 적어도 4개의 탄소를 포함하며, 이 4개 탄소 중 하나는 -CH2- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 1 항에 있어서, RF-모노머는 RF-QM을 포함하고, 여기서 QM 부분은 다른 모노머와 반응하여 적어도 올리고머의 일부분을 형성하도록 구성된 기를 포함하는 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, QM 부분은 올레핀을 포함하는 것을 특징으로 하는 조성물.
- 제 10 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, QM 부분은 아크릴레이트를 포함하는 것을 특징으로 하는 조성물.
- 제 12 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 인 것을 특징으로 하는 조성물.
- 제 9 항에 있어서, RF-QM은 이고, 여기서 X는 할로겐을 표시하는 것을 특징으로 하는 조성물.
- RF-모노머 유닛을 포함하는 조성물로서, 여기서 RF는 모노머 유닛의 펜던트 기를 포함하고, 펜던트 기는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하는 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, RF-모노머 유닛은 RF-QMU를 포함하고, QMU는 모노머 유닛의 나머지를 포함하는 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, 펜던트 기는 적어도 하나의 -CH2- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, 펜던트 기는 적어도 하나의 고리 기를 포함하는 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, 펜던트 기는 적어도 하나의 방향족 기를 포함하는 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, 펜던트 기는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, 펜던트 기는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, 펜던트 기는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, 펜던트 기는 적어도 4개의 탄소를 포함하며, 이 4개 탄소 중 하나는 -CH2- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, 조성물은 아크릴을 포함하고, RF-QMU는 아크릴의 모노머 유닛인 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, 조성물은 수지를 포함하고, RF-QMU는 수지의 모노머 유닛인 것을 특징으로 하는 조성물.
- 제 40 항에 있어서, 수지는 폴리우레탄 수지를 포함하는 것을 특징으로 하는 조성물.
- 제 30 항에 있어서, 조성물은 폴리머를 포함하고, RF-QMU는 폴리머의 모노머 유닛인 것을 특징으로 하는 조성물.
- 제 42 항에 있어서, 폴리머는 코폴리머를 포함하는 것을 특징으로 하는 조성물.
- 제 42 항에 있어서, 폴리머는 블록 폴리머를 포함하는 것을 특징으로 하는 조성물.
- RF-금속 착체를 포함하는 조성물로서, RF는 적어도 2개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 45 항에 있어서, RF-금속 착체는 RF-QMC를 포함하고, QMC는 금속 착체의 나머지를 포함하는 것을 특징으로 하는 조성물.
- 제 46 항에 있어서, RF는 적어도 하나의 -CH2- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 46 항에 있어서, RF는 적어도 하나의 고리 기를 포함하는 것을 특징으로 하는 조성물.
- 제 46 항에 있어서, 고리 기는 방향족 기를 포함하는 것을 특징으로 하는 조성물.
- 제 46 항에 있어서, RF는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 46 항에 있어서, RF는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 46 항에 있어서, RF는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 46 항에 있어서, RF는 적어도 4개의 탄소를 포함하며, 이 4개 탄소 중 하나는 -CH2- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 45 항에 있어서, RF-QMC는 인 것을 특징으로 하는 조성물.
- 제 45 항에 있어서, 금속 착체는 금속과 리간드를 포함하고, 리간드는 RF-Qg를 포함하며, 여기서 RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하고, Qg는 착물의 금속과 배위된 것을 특징으로 하는 조성물.
- RF-포스페이트 에스테르를 포함하는 조성물로서, 여기서 RF는 적어도 2개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 56 항에 있어서, RF는 적어도 하나의 -CH2- 기를 더 포함하는 것을 특징으로 하는 조성물.
- 제 56 항에 있어서, RF는 적어도 하나의 고리 기를 더 포함하는 것을 특징으로 하는 조성물.
- 제 58 항에 있어서, 고리 기는 방향족 기를 포함하는 것을 특징으로 하는 조성물.
- 제 56 항에 있어서, RF는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 56 항에 있어서, RF는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 56 항에 있어서, RF는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 56 항에 있어서, RF는 적어도 4개의 탄소를 포함하며, 이 4개 탄소 중 하나는 -CH2- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 56 항에 있어서, RF-포스페이트 에스테르는 RF-QPE를 포함하고, QPE는 포스페이트 에스테르의 나머지를 포함하는 것을 특징으로 하는 조성물.
- 제 64 항에 있어서, RF-QPE는 인 것을 특징으로 하는 조성물.
- RF-글리콜을 포함하는 조성물로서, 여기서 RF는 적어도 2개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 66 항에 있어서, RF는 적어도 하나의 -CH2- 기를 더 포함하는 것을 특징으로 하는 조성물.
- 제 66 항에 있어서, RF는 적어도 하나의 고리 기를 더 포함하는 것을 특징으로 하는 조성물.
- 제 68 항에 있어서, 고리 기는 방향족 기를 포함하는 것을 특징으로 하는 조성물.
- 제 66 항에 있어서, RF는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 66 항에 있어서, RF는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 66 항에 있어서, RF는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 66 항에 있어서, RF는 적어도 4개의 탄소를 포함하며, 이 4개 탄소 중 하나는 -CH2- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 66 항에 있어서, RF-글리콜은 RF-QH를 포함하고, QH는 글리콜의 나머지를 포함하는 것을 특징으로 하는 조성물.
- 제 74 항에 있어서, RF-QH는 인 것을 특징으로 하는 조성물.
- RF-우레탄을 포함하는 조성물로서, 여기서 RF는 적어도 2개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 76 항에 있어서, RF는 적어도 하나의 고리 기를 더 포함하는 것을 특징으로 하는 조성물.
- 제 77 항에 있어서, 고리 기는 방향족 기를 포함하는 것을 특징으로 하는 조성물.
- 제 76 항에 있어서, RF는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 76 항에 있어서, RF는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 76 항에 있어서, RF는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 76 항에 있어서, RF는 적어도 4개의 탄소를 포함하며, 이 4개 탄소 중 하나는 -CH2- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 76 항에 있어서, RF-우레탄은 RF-QU를 포함하고, QU는 우레탄의 나머지를 포함하는 것을 특징으로 하는 조성물.
- 제 83 항에 있어서, RF-QU는 인 것을 특징으로 하는 조성물.
- 그 위에 RF-조성물을 갖는 기판을 포함하는 조성물로서, 여기서 RF는 적어도 2개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF는 적어도 하나의 고리 기를 더 포함하는 것을 특징으로 하는 조성물.
- 제 86 항에 있어서, 고리 기는 방향족 기를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF는 적어도 4개의 탄소를 포함하며, 이 4개 탄소 중 하나는 -CH2- 기를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF-조성물은 RF-모노머 유닛을 포함하는 것을 특징으로 하는 조성물.
- 제 92 항에 있어서, RF-모노머 유닛은 RF-QMU를 포함하고, QMU는 모노머 유닛의 나머지를 포함하는 것을 특징으로 하는 조성물.
- 제 93 항에 있어서, RF-조성물은 아크릴을 포함하고, RF-QMU는 아크릴의 모노머 유닛인 것을 특징으로 하는 조성물.
- 제 93 항에 있어서, RF-조성물은 수지를 포함하고, RF-QMU는 수지의 모노머 유닛인 것을 특징으로 하는 조성물.
- 제 95 항에 있어서, 수지는 폴리우레탄 수지를 포함하는 것을 특징으로 하는 조성물.
- 제 93 항에 있어서, RF-조성물은 폴리머를 포함하고, RF-QMU는 폴리머의 모노머 유닛인 것을 특징으로 하는 조성물.
- 제 97 항에 있어서, 폴리머는 코폴리머를 포함하는 것을 특징으로 하는 조성물.
- 제 97 항에 있어서, 폴리머는 블록 폴리머를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF-조성물은 RF-금속 착체를 포함하는 것을 특징으로 하는 조성물.
- 제 92 항에 있어서, RF-금속 착체는 RF-QMC를 포함하고, QMC는 금속 착체의 나머지를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF-조성물은 RF-포스페이트 에스테르를 포함하는 것을 특징으로 하는 조성물.
- 제 92 항에 있어서, RF-포스페이트 에스테르는 RF-QPE를 포함하고, QPE는 포스페이트 에스테르의 나머지를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF-조성물은 RF-글리콜을 포함하는 것을 특징으로 하는 조성물.
- 제 92 항에 있어서, RF-글리콜은 RF-QH를 포함하고, QH는 글리콜을 나머지를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF-조성물은 RF-우레탄을 포함하는 것을 특징으로 하는 조성물.
- 제 92 항에 있어서, RF-우레탄은 RF-QU를 포함하고, QU는 우레탄의 나머지를 포함하는 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, RF-조성물은 기판에 화학적으로 결합된 것을 특징으로 하는 조성물.
- 제 85 항에 있어서, 기판은 유리를 포함하는 것을 특징으로 하는 조성물.
- RF-QM을 포함하는 RF-모노머를 제공하는 단계; 및 RF-모노머와 적어도 다른 모노머를 화합시켜 올리고머를 형성하는 단계를 포함하는 제조 방법으로서, 여기서 RF는 적어도 2개의 -CF3 기와 적어도 2개의 수소를 포함하고, QM은 RF-모노머의 나머지를 포함하는 것을 특징으로 하는 방법.
- 제 110 항에 있어서, RF는 적어도 하나의 -CH2- 기를 포함하는 것을 특징으로 하는 방법.
- 제 110 항에 있어서, RF는 적어도 하나의 고리 기를 포함하는 것을 특징으로 하는 방법.
- 제 112 항에 있어서, 고리 기는 방향족 기를 포함하는 것을 특징으로 하는 방법.
- 제 110 항에 있어서, RF는 적어도 하나의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 방법.
- 제 110 항에 있어서, RF는 적어도 3개의 -CF3 기를 포함하는 것을 특징으로 하는 방법.
- 제 110 항에 있어서, RF는 적어도 2개의 (CF3)2CF- 기를 포함하는 것을 특징으로 하는 방법.
- 제 110 항에 있어서, RF는 적어도 4개의 탄소를 포함하며, 이 4개 탄소 중 하나는 -CH2- 기를 포함하는 것을 특징으로 하는 방법.
- 제 110 항에 있어서, QM은 아크릴레이트를 포함하는 것을 특징으로 하는 방법.
- 제 110 항에 있어서, QM은 올레핀을 포함하는 것을 특징으로 하는 방법.
- 제 110 항에 있어서, 다른 모노머는 RF-모노머와 동일하고, 올리고머는 호모폴리머를 포함하는 것을 특징으로 하는 방법.
- 제 110 항에 있어서, 다른 모노머는 RF-모노머와 동일하지 않고, 올리고머는 코폴리머를 포함하는 것을 특징으로 하는 방법.
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US54061204P | 2004-01-30 | 2004-01-30 | |
US60/540,612 | 2004-01-30 | ||
PCT/US2005/003137 WO2005074593A2 (en) | 2004-01-30 | 2005-01-28 | Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers |
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KR20060136433A KR20060136433A (ko) | 2007-01-02 |
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CN1922122A (zh) | 2007-02-28 |
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EP1718721A2 (en) | 2006-11-08 |
JP2007526360A (ja) | 2007-09-13 |
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US20070161537A1 (en) | 2007-07-12 |
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