KR20050043932A - 광학 부재, 및 이의 제조 방법, 이의 제조용 조성물 및 중합체 - Google Patents
광학 부재, 및 이의 제조 방법, 이의 제조용 조성물 및 중합체 Download PDFInfo
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- KR20050043932A KR20050043932A KR1020057003893A KR20057003893A KR20050043932A KR 20050043932 A KR20050043932 A KR 20050043932A KR 1020057003893 A KR1020057003893 A KR 1020057003893A KR 20057003893 A KR20057003893 A KR 20057003893A KR 20050043932 A KR20050043932 A KR 20050043932A
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- G02B1/045—Light guides
- G02B1/046—Light guides characterised by the core material
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
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- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
Claims (21)
- 하기에 나타낸 화학식 1 로 표시되는 화합물 (A) 및 하기에 나타낸 화학식 2 로 표시되는 화합물 (B) 를 포함하는 중합가능 단량체를 포함하는 중합가능 단량체 조성물; 및 중합가능 단량체 조성물의 중합을 개시할 수 있는 중합 개시제를 포함하는 중합가능 조성물:[화학식 1][화학식 2](식 중, X1 및 X2 는 각각 수소 (H) 또는 중수소 (D) 를 나타내고 두개의 X1 및 두개의 X2 는 서로 동일하거나 상이할 수 있고; Y1 및 Y2 는 각각 H, D, CH3, CD3 또는 플루오르 (F) 를 나타내고; R1 은 분지쇄 C3-8 알킬기이고; R2 는 1 내지 15 개의 플루오르 원자로 치환된 C1-7 플루오로알킬기이고; 화합물 (B) 에 대한 화합물 (A) 의 몰비는 1/100 이상 4/1 미만이다).
- 제 1 항에 있어서, 사슬 이동제를 추가로 포함하는 조성물.
- 제 1 항 또는 제 2 항에 있어서, 중합가능 단량체 조성물의 굴절률과 상이한 굴절률을 갖는 굴절률 조절제를 추가로 포함하는 조성물.
- 제 1 항 내지 제 3 항 중 어느 한 항의 조성물을 중합시켜 분포된 굴절률 (distributed refractive index) 을 갖는 영역을 형성하는 것을 포함하는 광학 부재의 제조 방법.
- 제 4 항에 있어서, 계면-겔 (interfacial-gel) 중합에 따라 중합을 수행하는 방법.
- 제 4 항 또는 제 5 항의 방법으로 제조되는 광학 부재.
- 제 1 항 내지 제 3 항 중 어느 한 항의 조성물의 중합에 의해 제조되는 분포된 굴절률을 갖는 코어 영역 및 상기 코어 영역을 클래딩 (cladding) 하는 클래드 영역을 포함하는 광학 부재.
- 본질적으로 하기 화학식 X 로 나타내는 공중합체로 형성된 광학 부재:[화학식 X](식 중, X1 및 X2 는 각각 수소 (H) 또는 중수소 (D) 를 나타내고 두개의 X1 및 X2 는 서로 동일하거나 상이할 수 있고; Y1 및 Y2 는 각각 H, D, CH3, CD3 또는 플루오르 (F) 를 나타내고; R1 은 분지쇄 C3-8 알킬기이고; R2 는 1 내지 15 개의 플루오르 원자로 치환된 C1-7 플루오로알킬기이고; m 및 n 은 각각 반복 단위의 몰비를 나타내는데, 단, m/n 은 1/100 이상 4/1 미만이다).
- 제 8 항에 있어서, 공중합체가 10,000 내지 1,000,000 의 범위 내의 중량-평균 몰 중량을 갖는 광학 부재.
- 제 8 항 또는 제 9 항에 있어서, 공중합체로 형성된 매트릭스를 포함하는 영역, 및 상기 영역이 화합물의 농도 분포를 갖는 매트릭스 내에 함유된 화합물을 포함함으로써 굴절률 내의 분포를 갖는 광학 부재.
- 제 6 항 내지 제 10 항 중 어느 한 항의 광학 부재를 드로잉 (drawing) 함으로써 제조되는 광섬유.
- 하기 화학식 3 으로 나타내는 화합물을 포함하는 중합가능 단량체 조성물; 중합가능 단량체 조성물의 개시용 중합 개시제; 및 중합가능 단량체 조성물의 굴절률과 상이한 굴절률을 갖는 화합물을 포함하는 중합가능 조성물을 공동 용기 (hollow vessel) 내에서 중합시켜, 용기의 내부 표면으로부터 중심 쪽으로 중합체를 형성하는 것을 포함하는 광학 부재의 제조 방법:[화학식 3](식 중, X3 은 수소 (H) 또는 중수소 (D) 를 나타내고 두개의 X3 은 서로 동일하거나 상이할 수 있고; Y3 은 H, D, CH3 또는 CD3 이고; R3 은 C7 -20 지환족 탄화수소기이다).
- 제 12 항에 있어서, 중합가능 단량체 조성물이 추가로 하기 화학식 4 로 나타내는 화합물을 포함하는 방법:[화학식 4](식 중, X4 는 H 또는 D 이고 두개의 X4 는 서로 동일하거나 상이할 수 있고; Y4 는 H, D, CH3 또는 CD3 이고; R4 는 1 내지 15 개의 플루오르 원자로 치환된 C1 -7 플루오로알킬기이다).
- 제 12 항 또는 제 13 항에 있어서, 중합가능 조성물의 중합이 계면-겔 중합에 따라 수행되는 방법.
- 하기 화학식 3 으로 나타내는 화합물을 포함하는 중합가능 단량체 조성물; 중합가능 단량체 조성물 개시용 중합 개시제; 및 중합가능 단량체 조성물의 굴절률과 상이한 굴절률을 갖는 화합물을 포함하는 중합가능 조성물을 중합시켜, 분포된 굴절률을 갖는 영역을 형성하는 것을 포함하는 광학 부재의 제조 방법:[화학식 3](식 중, X3 은 수소 (H) 또는 중수소 (D) 를 나타내고; 두개의 X3 은 서로 동일하거나 상이할 수 있으며; Y3 은 H, D, CH3 또는 CD3 이고; R3 은 C7-20 지환족 탄화수소기이다).
- 제 15 항에 있어서, 중합가능 단량체 조성물이 추가로 하기 화학식 4 로 나타내는 화합물을 포함하는 방법:[화학식 4](식 중, X4 는 H 또는 D 이고 두개의 X4 는 서로 동일하거나 상이할 수 있고; Y4 는 H, D, CH3 또는 CD3 이고; R4 는 1 내지 15 개의 플루오르 원자로 치환된 C1 -7 플루오로알킬기이다).
- 제 12 항 내지 제 16 항 중 어느 한 항의 방법으로 제조되는 광학 부재.
- 분자량이 10,000 내지 1000,000 이고 하기 화학식 X-1 으로 나타내는 반복 단위를 포함하는 중합체로 본질적으로 형성되는, 분포된 굴절률을 갖는 영역을 포함하는 광학 부재:[화학식 X-1](식 중, X3 은 수소 (H) 또는 중수소 (D) 를 나타내고 두개의 X3 은 서로 동일하거나 상이할 수 있고; Y3 은 H, D, CH3 또는 CD3 이고; R3 은 C7 -20 지환족 탄화수소기이다).
- 제 18 항에 있어서, 중합체가 하기 화학식 X-2 로 나타내는 반복 단위를 추가로 포함하는 광학 부재:[화학식 X-2](식 중, X4 는 H 또는 D 이고 두개의 X4 는 서로 동일하거나 상이할 수 있고; Y4 는 H, D, CH3 또는 CD3 이고; R4 는 1 내지 15 개의 플루오르 원자로 치환된 C1-7 플루오로알킬기이다).
- 제 18 항 또는 제 19 항에 있어서, 중합체로 형성된 매트릭스를 포함하는 영역, 및 상기 영역이 화합물의 농도 분포를 갖는 매트릭스 내에 함유된 화합물을 포함함으로써, 굴절률 내에 분포를 갖는 광학 부재.
- 제 17 항 내지 제 20 항 중 어느 한 항의 따른 광학 부재를 드로잉함으로써 제조되는 광섬유.
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JPJP-P-2002-00259862 | 2002-09-05 | ||
JP2002259862A JP2004099652A (ja) | 2002-09-05 | 2002-09-05 | 光学部材用重合性組成物、光学部材およびその製造方法 |
JPJP-P-2002-00259863 | 2002-09-05 | ||
JP2002259863 | 2002-09-05 | ||
JPJP-P-2002-00348128 | 2002-11-29 | ||
JP2002348128A JP2004151661A (ja) | 2002-09-05 | 2002-11-29 | 光学部材の製造方法および光学部材 |
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EP (1) | EP1534762A2 (ko) |
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TW200508257A (en) * | 2003-07-24 | 2005-03-01 | Fuji Photo Film Co Ltd | Heavy-hydrogenated (meth) acrylates, process for producing them, polymers thereof and optical members |
CN100376606C (zh) * | 2003-07-24 | 2008-03-26 | 富士胶片株式会社 | 重氢化(甲基)丙烯酸降冰片基酯、其制备方法、其聚合物以及光学元件 |
US7947792B2 (en) * | 2006-01-26 | 2011-05-24 | Fujifilm Corporation | Production method of optical transmission medium |
JP5192143B2 (ja) * | 2006-11-22 | 2013-05-08 | 出光興産株式会社 | シラップ用(メタ)アクリレート共重合体およびその樹脂組成物 |
US9669492B2 (en) | 2008-08-20 | 2017-06-06 | Foro Energy, Inc. | High power laser offshore decommissioning tool, system and methods of use |
US9664012B2 (en) | 2008-08-20 | 2017-05-30 | Foro Energy, Inc. | High power laser decomissioning of multistring and damaged wells |
US9347271B2 (en) * | 2008-10-17 | 2016-05-24 | Foro Energy, Inc. | Optical fiber cable for transmission of high power laser energy over great distances |
US9089928B2 (en) | 2008-08-20 | 2015-07-28 | Foro Energy, Inc. | Laser systems and methods for the removal of structures |
US8571368B2 (en) | 2010-07-21 | 2013-10-29 | Foro Energy, Inc. | Optical fiber configurations for transmission of laser energy over great distances |
US9244235B2 (en) | 2008-10-17 | 2016-01-26 | Foro Energy, Inc. | Systems and assemblies for transferring high power laser energy through a rotating junction |
US9027668B2 (en) | 2008-08-20 | 2015-05-12 | Foro Energy, Inc. | Control system for high power laser drilling workover and completion unit |
US8820434B2 (en) | 2008-08-20 | 2014-09-02 | Foro Energy, Inc. | Apparatus for advancing a wellbore using high power laser energy |
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US4381269A (en) * | 1980-11-11 | 1983-04-26 | Nippon Telegraph & Telephone Public Corporation | Fabrication of a low-loss plastic optical fiber |
DE3912149A1 (de) * | 1989-04-13 | 1990-10-18 | Hoechst Ag | Transparente thermoplastische formmasse |
US5187769A (en) * | 1991-02-26 | 1993-02-16 | Hoechst Aktiengesellschaft | Transparent thermoplastic molding composition, process for its preparation and its use |
US5344903A (en) * | 1993-04-14 | 1994-09-06 | E. I. Du Pont De Nemours And Company | Water- and oil-repellent fluoro(meth)acrylate copolymers |
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