KR20000069630A - 방향족 폴리아미드 필름 및 그를 사용한 자기 기록 매체 - Google Patents
방향족 폴리아미드 필름 및 그를 사용한 자기 기록 매체 Download PDFInfo
- Publication number
- KR20000069630A KR20000069630A KR1019997005638A KR19997005638A KR20000069630A KR 20000069630 A KR20000069630 A KR 20000069630A KR 1019997005638 A KR1019997005638 A KR 1019997005638A KR 19997005638 A KR19997005638 A KR 19997005638A KR 20000069630 A KR20000069630 A KR 20000069630A
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- KR
- South Korea
- Prior art keywords
- film
- layer
- aromatic polyamide
- polymer
- recording medium
- Prior art date
Links
- 239000004760 aramid Substances 0.000 title claims abstract description 107
- 229920003235 aromatic polyamide Polymers 0.000 title claims abstract description 107
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 78
- 229920000140 heteropolymer Polymers 0.000 claims abstract description 21
- 238000000034 method Methods 0.000 claims description 47
- 229920000642 polymer Polymers 0.000 claims description 40
- 239000002245 particle Substances 0.000 claims description 32
- 239000010954 inorganic particle Substances 0.000 claims description 9
- 239000011146 organic particle Substances 0.000 claims description 7
- 239000004417 polycarbonate Substances 0.000 claims description 7
- 229920000515 polycarbonate Polymers 0.000 claims description 7
- 229920001721 polyimide Polymers 0.000 claims description 7
- 229920002492 poly(sulfone) Polymers 0.000 claims description 6
- 150000001408 amides Chemical class 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 239000004697 Polyetherimide Substances 0.000 claims description 2
- 229920001601 polyetherimide Polymers 0.000 claims description 2
- 229920001470 polyketone Polymers 0.000 claims description 2
- 239000002243 precursor Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims 1
- 229920013637 polyphenylene oxide polymer Polymers 0.000 claims 1
- 238000004804 winding Methods 0.000 abstract description 31
- 230000037303 wrinkles Effects 0.000 abstract description 20
- 238000005299 abrasion Methods 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 155
- 239000010410 layer Substances 0.000 description 96
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 54
- 239000000243 solution Substances 0.000 description 50
- 239000000377 silicon dioxide Substances 0.000 description 26
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 24
- 239000011164 primary particle Substances 0.000 description 21
- 239000002904 solvent Substances 0.000 description 15
- 238000006116 polymerization reaction Methods 0.000 description 14
- 125000003118 aryl group Chemical group 0.000 description 13
- 239000010409 thin film Substances 0.000 description 12
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 10
- 239000004695 Polyether sulfone Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 229920006393 polyether sulfone Polymers 0.000 description 10
- 238000001035 drying Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 239000004952 Polyamide Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 229920002647 polyamide Polymers 0.000 description 7
- -1 polyethylene terephthalate Polymers 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000005294 ferromagnetic effect Effects 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910018487 Ni—Cr Inorganic materials 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 3
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- QILCUDCYZVIAQH-UHFFFAOYSA-N 1-$l^{1}-oxidanyl-2,2,5,5-tetramethylpyrrole-3-carboxylic acid Chemical compound CC1(C)C=C(C(O)=O)C(C)(C)N1[O] QILCUDCYZVIAQH-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 2
- 229910002440 Co–Ni Inorganic materials 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229920006037 cross link polymer Polymers 0.000 description 2
- 238000013500 data storage Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000010583 slow cooling Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- MSWAXXJAPIGEGZ-UHFFFAOYSA-N 2-chlorobenzene-1,4-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C(Cl)=C1 MSWAXXJAPIGEGZ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 229910002549 Fe–Cu Inorganic materials 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 238000004807 desolvation Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 108010025899 gelatin film Proteins 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920001447 polyvinyl benzene Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/34—Layered products comprising a layer of synthetic resin comprising polyamides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73923—Organic polymer substrates
- G11B5/73925—Composite or coated non-esterified substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73923—Organic polymer substrates
- G11B5/73937—Substrates having an organic polymer comprising a ring structure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31725—Of polyamide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31725—Of polyamide
- Y10T428/31739—Nylon type
Landscapes
- Magnetic Record Carriers (AREA)
- Laminated Bodies (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
Description
Claims (9)
- 적어도 2층으로 이루어지는 적층 필름으로서, 이 필름의 최외층의 적어도 한쪽 층(A층)은 방향족 폴리아미드와 1종 이상의 이종 중합체를 함유하고, 이 이종 중합체의 함유량은 0.1 중량% 내지 10 중량%이며, 또한 A층의 두께를 d(㎛), 이종 중합체의 원둘레를 t(㎛), 장경을 L(㎛), 단경을 s(㎛)로 했을 때,0.01 ≤ t/d ≤0.5, 및0.05 ≤ s/L ≤ 1을 충족하는 것을 특징으로 하는 방향족 폴리아미드 필름.
- 제1항에 있어서, A층의 반대측 최외층을 형성하는 층(B층)의 평균 입경이 5 nm 내지 500 nm인 무기 입자 및(또는) 유기 입자를 0.05 중량% 내지 5 중량% 함유하는 방향족 폴리아미드 필름.
- 제1 또는 2항에 있어서, A층이 평균 입경 5 nm 내지 200 nm의 무기 입자 및(또는) 유기 입자를 0.001 중량% 내지 0.1 중량% 함유하는 방향족 폴리아미드 필름.
- 제1 내지 3항 중 어느 한 항에 있어서, 이종 중합체가 폴리술폰계 중합체, 폴리에테르이미드계 중합체, 폴리페닐렌옥시드계 중합체, 폴리에스테르계 중합체, 폴리케톤계 중합체, 폴리카르보네이트계 중합체, 폴리이미드계 중합체 및 그의 전구체 중에서 선택된 적어도 1종인 방향족 폴리아미드 필름.
- 제1 내지 4항 중 어느 한 항에 있어서, A층 표면에 높이 5 nm 이상의 돌기를 2 x 106개/㎟ 이상, 높이 30 nm 이상의 돌기를 5 x 103개/㎟ 이상 갖고, 또한 높이 50 nm 이상의 돌기를 5 x 104개/㎟ 이하로 갖는 방향족 폴리아미드 필름.
- 제1 내지 5항 중 어느 한 항에 있어서, A층의 필름 폭 방향의 두께 얼룩이 50 % 이하인 방향족 폴리아미드 필름.
- 제1 내지 6항 중 어느 한 항 기재의 방향족 폴리아미드 필름의 적어도 한면에 자성층을 갖는 자기 기록 매체.
- 폭이 2.3 내지 13 mm, 지지체 두께가 6.5 ㎛ 이하, 길이가 100 m/롤 이상, 자기 기록 매체로서의 기록 밀도가 8 킬로바이트/㎟ 이상인, 제7항 기재의 자기 기록 매체로 이루어지는 자기 테이프.
- 제8항에 있어서, 자기 기록 매체로 제조했을 때의 1 μsec/-8dB에서의 드롭 아웃수가 800개/분 이하인 자기 테이프.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29004797 | 1997-10-22 | ||
JP97-290047 | 1997-10-22 | ||
PCT/JP1998/004748 WO1999020463A1 (fr) | 1997-10-22 | 1998-10-20 | Feuil de polyamide aromatique et support d'enregistrement magnetique fabrique au moyen de ce feuil |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20000069630A true KR20000069630A (ko) | 2000-11-25 |
KR100561133B1 KR100561133B1 (ko) | 2006-03-16 |
Family
ID=17751107
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019997005638A KR100561133B1 (ko) | 1997-10-22 | 1998-10-20 | 방향족 폴리아미드 필름 및 그를 사용한 자기 기록 매체 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6358619B1 (ko) |
EP (1) | EP0947315B1 (ko) |
JP (1) | JP3882505B2 (ko) |
KR (1) | KR100561133B1 (ko) |
CN (1) | CN1095748C (ko) |
CA (1) | CA2279393A1 (ko) |
DE (1) | DE69839873D1 (ko) |
WO (1) | WO1999020463A1 (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6833173B1 (en) * | 1999-09-27 | 2004-12-21 | Fuji Photo Film Co., Ltd. | Floppy disk including a seed layer and a primer layer with specified relative properties |
JP2001202614A (ja) | 2000-01-18 | 2001-07-27 | Toray Ind Inc | 磁気記録媒体 |
JP2002003623A (ja) | 2000-06-22 | 2002-01-09 | Mitsubishi Polyester Film Copp | 二軸配向ポリエステルフィルム |
US7344786B2 (en) * | 2001-10-29 | 2008-03-18 | Fujifilm Corporation | Magnetic recording medium including a smooth coating layer on one side of the support |
KR100701641B1 (ko) * | 2004-08-02 | 2007-03-30 | 도레이새한 주식회사 | 진공증착에 의해 구리도금층을 형성하는 연성회로기판용 적층구조체의 제조방법 및 그 장치 |
JP5098188B2 (ja) * | 2006-03-06 | 2012-12-12 | 東レ株式会社 | 芳香族ポリアミド組成物の製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4631318A (en) * | 1983-03-08 | 1986-12-23 | Research Corporation | Polymeric molecular composites |
DE68929128T2 (de) * | 1988-06-08 | 2000-05-31 | Toray Industries, Inc. | Biaxial orientierte Verbundfolie |
CA2021918A1 (en) * | 1989-08-01 | 1991-02-02 | Vinodkumar Mehra | Thermoplastic barrier articles containing at least two barrier resins |
JP2897312B2 (ja) * | 1990-02-15 | 1999-05-31 | 東レ株式会社 | 耐熱性フィルム |
JP2870109B2 (ja) * | 1990-04-03 | 1999-03-10 | 東レ株式会社 | 積層フィルム |
JPH048763A (ja) * | 1990-04-27 | 1992-01-13 | Idemitsu Petrochem Co Ltd | ポリアミド―ポリエーテルスルホン組成物の製造方法 |
US5258461A (en) * | 1990-11-26 | 1993-11-02 | Xerox Corporation | Electrocodeposition of polymer blends for photoreceptor substrates |
JP3237135B2 (ja) | 1991-08-07 | 2001-12-10 | 三菱電機株式会社 | 車両用経路案内装置の経路探索装置及び車両用経路案内装置の経路探索方法 |
DE69227354T2 (de) * | 1991-11-18 | 1999-05-06 | Toray Industries, Inc., Tokio/Tokyo | Biaxial orientierter Film aus thermoplastischem Harz |
JPH08203064A (ja) * | 1995-01-24 | 1996-08-09 | Toray Ind Inc | 磁気記録媒体用フィルム |
JPH11322975A (ja) * | 1997-10-27 | 1999-11-26 | Teijin Ltd | 二軸配向全芳香族ポリアミドフィルムおよびそれをベースフィルムとする磁気記録媒体 |
-
1998
- 1998-10-20 JP JP2000516833A patent/JP3882505B2/ja not_active Expired - Lifetime
- 1998-10-20 DE DE69839873T patent/DE69839873D1/de not_active Expired - Lifetime
- 1998-10-20 WO PCT/JP1998/004748 patent/WO1999020463A1/ja active IP Right Grant
- 1998-10-20 KR KR1019997005638A patent/KR100561133B1/ko not_active IP Right Cessation
- 1998-10-20 CN CN98801560A patent/CN1095748C/zh not_active Expired - Lifetime
- 1998-10-20 US US09/331,511 patent/US6358619B1/en not_active Expired - Lifetime
- 1998-10-20 EP EP98947962A patent/EP0947315B1/en not_active Expired - Lifetime
- 1998-10-20 CA CA002279393A patent/CA2279393A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP0947315A4 (en) | 2002-03-06 |
DE69839873D1 (de) | 2008-09-25 |
EP0947315A1 (en) | 1999-10-06 |
EP0947315B1 (en) | 2008-08-13 |
CN1095748C (zh) | 2002-12-11 |
CN1242739A (zh) | 2000-01-26 |
KR100561133B1 (ko) | 2006-03-16 |
JP3882505B2 (ja) | 2007-02-21 |
CA2279393A1 (en) | 1999-04-29 |
WO1999020463A1 (fr) | 1999-04-29 |
US6358619B1 (en) | 2002-03-19 |
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