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KR102763788B1 - Addition-curable silicone composition and semiconductor device - Google Patents

Addition-curable silicone composition and semiconductor device Download PDF

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KR102763788B1
KR102763788B1 KR1020190103419A KR20190103419A KR102763788B1 KR 102763788 B1 KR102763788 B1 KR 102763788B1 KR 1020190103419 A KR1020190103419 A KR 1020190103419A KR 20190103419 A KR20190103419 A KR 20190103419A KR 102763788 B1 KR102763788 B1 KR 102763788B1
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도시유키 오자이
신지 기무라
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신에쓰 가가꾸 고교 가부시끼가이샤
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Abstract

[과제] 경화가 빠르고, 광투과율이 높고, 고온 내구성이 우수한 경화물을 부여하는 부가 경화형 실리콘 조성물, 및 이것을 사용한 반도체 장치를 제공한다.
[해결수단] (A) 하기 평균 단위식 (1)로 표시되는 오르가노폴리실록산,
(R1SiO3/2)a1(R1 3SiO1/2)b1(X1O1/2)c1 … (1)
(B) 하기 평균 단위식 (2)로 표시되는 오르가노폴리실록산,
(R2 2SiO)a2(R2 3SiO1/2)b2 … (2)
(C) 하기 평균 조성식 (3)으로 표시되는, 1분자 중에 적어도 2개의 Si-H 결합을 갖는 오르가노하이드로겐폴리실록산,
R3 dHeSiO[(4-d-e)/2] … (3)

(D) 히드로실릴화 반응 촉매
를 함유하는 것임을 특징으로 하는 부가 경화형 실리콘 조성물.
[Project] To provide an addition-curable silicone composition that provides a cured product having fast curing, high light transmittance, and excellent high-temperature durability, and a semiconductor device using the same.
[Solution] (A) Organopolysiloxane represented by the average unit formula (1) below,
(R 1 SiO 3/2 ) a1 (R 1 3 SiO 1/2 ) b1 (X 1 O 1/2 ) c1 … (1)
(B) Organopolysiloxane represented by the average unit formula (2) below,
(R 2 2 SiO) a2 (R 2 3 SiO 1/2 ) b2 … (2)
(C) Organohydrogenpolysiloxane having at least two Si-H bonds in one molecule, represented by the average composition formula (3) below.
R 3 d H e SiO [(4-de)/2] … (3)
and
(D) Hydrosilylation reaction catalyst
An addition-curing silicone composition characterized by containing .

Description

부가 경화형 실리콘 조성물 및 반도체 장치{ADDITION-CURABLE SILICONE COMPOSITION AND SEMICONDUCTOR DEVICE}Addition-curable silicone composition and semiconductor device {ADDITION-CURABLE SILICONE COMPOSITION AND SEMICONDUCTOR DEVICE}

본 발명은 부가 경화형 실리콘 조성물 및 해당 조성물의 경화물에 의해 반도체 소자가 피복된 반도체 장치에 관한 것이다.The present invention relates to a semiconductor device having a semiconductor element coated with an addition-curable silicone composition and a cured product of the composition.

히드로실릴화 반응에 의해 경화되는 부가 경화형 실리콘 조성물은, 포토커플러, 발광 다이오드, 고체 촬상 소자 등의 광학용 반도체 장치에 있어서의 반도체 소자의 보호 코팅제로서 사용되고 있다. 이러한 반도체 소자의 보호 코팅제는, 반도체 소자로부터 발생하는 열이나 광에 의해, 경도나 투명성이 변화하는 경우가 있다. 이 변화를 억제하기 위해서, 종래는 Q 단위(SiO2)를 분자 내에 도입하거나(특허문헌 1 내지 4), 또한 소프트 세그먼트를 조성 중에 도입하는 것으로 대응해 왔다(특허문헌 5). 그러나, 이러한 대응 방법으로는 항구적인 재료의 경도 변화에 대응할 수는 없었다. 또한 주변 소자가 열에 약한 수지를 사용하기 위해, 20 내지 80℃ 등 낮은 온도에서 경화시킨 경우에, 일반적으로는 경화 촉매를 증량해서 대응하기 때문에, 경제적이지 않다고 하는 결점이 있었다.Addition-curable silicone compositions that are cured by a hydrosilylation reaction are used as protective coating agents for semiconductor elements in optical semiconductor devices such as photocouplers, light-emitting diodes, and solid-state imaging elements. Such protective coating agents for semiconductor elements sometimes change in hardness or transparency due to heat or light generated from the semiconductor elements. In order to suppress this change, conventional methods have been used by introducing Q units (SiO 2 ) into the molecule (Patent Documents 1 to 4) or introducing soft segments during the composition (Patent Document 5). However, these methods were unable to respond to permanent changes in the hardness of the material. In addition, since the surrounding elements use resins that are weak to heat and are cured at low temperatures such as 20 to 80°C, the method generally increases the amount of the curing catalyst, which is uneconomical.

일본특허공개 평7-252419호 공보Japanese Patent Publication No. 7-252419 일본특허공개 제2011-252175호 공보Japanese Patent Publication No. 2011-252175 일본특허공개 제2013-067683호 공보Japanese Patent Publication No. 2013-067683 일본특허공개 제2009-052038호 공보Japanese Patent Publication No. 2009-052038 일본특허공개 제2007-63538호 공보Japanese Patent Publication No. 2007-63538

본 발명은, 상기 사정을 감안하여 이루어진 것으로, 경화가 빠르고, 광투과율이 높고, 고온 내구성이 우수한 경화물을 부여하는 부가 경화형 실리콘 조성물, 및 이것을 사용한 반도체 장치를 제공하는 것을 목적으로 한다.The present invention has been made in consideration of the above circumstances, and has as its object the provision of an addition-curable silicone composition which provides a cured product having rapid curing, high light transmittance, and excellent high-temperature durability, and a semiconductor device using the same.

상기 과제를 해결하기 위해서, 본 발명에서는,In order to solve the above problem, in the present invention,

부가 경화형 실리콘 조성물로서,As an additive-curable silicone composition,

(A) 하기 평균 단위식 (1)로 표시되는 오르가노폴리실록산,(A) Organopolysiloxane represented by the average unit formula (1) below,

(R1SiO3/2)a1(R1 3SiO1/2)b1(X1O1/2)c1 … (1)(R 1 SiO 3/2 ) a1 (R 1 3 SiO 1/2 ) b1 (X 1 O 1/2 ) c1 … (1)

(식 중, R1은 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 지방족 1가 탄화수소기이며, 전체 R1 중 0.1 내지 50%는 알케닐기이다. X1은 수소 원자 또는 알킬기이다. a1, b1, c1은 0.1≤a1≤1, 0≤b1≤0.75, 0≤c1≤0.1, 또한 a1+b1+c1=1을 충족하는 수이다.)(In the formula, R 1 is a substituted or unsubstituted aliphatic monovalent hydrocarbon group, which may be the same or different, and 0.1 to 50% of the total R 1 is an alkenyl group. X 1 is a hydrogen atom or an alkyl group. a1, b1, and c1 are numbers satisfying 0.1≤a1≤1, 0≤b1≤0.75, 0≤c1≤0.1, and also a1+b1+c1=1.)

(B) 하기 평균 단위식 (2)로 표시되는 오르가노폴리실록산: (A) 성분 100질량부에 대하여 0 내지 5,000질량부,(B) Organopolysiloxane represented by the average unit formula (2) below: 0 to 5,000 parts by mass per 100 parts by mass of component (A),

(R2 2SiO)a2(R2 3SiO1/2)b2 … (2)(R 2 2 SiO) a2 (R 2 3 SiO 1/2 ) b2 … (2)

(식 중, R2는 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 지방족 1가 탄화수소기이며, 전체 R2 중 0.01 내지 25몰%는 알케닐기이다. a2, b2는 0.33≤a2≤0.999, 0.001≤b2≤0.67, 또한 a2+b2=1을 충족하는 양수이다.)(In the formula, R 2 is a substituted or unsubstituted aliphatic monovalent hydrocarbon group, which may be the same or different, and 0.01 to 25 mol% of the total R 2 is an alkenyl group. a2 and b2 are positive numbers satisfying 0.33≤a2≤0.999, 0.001≤b2≤0.67, and a2+b2=1.)

(C) 하기 평균 조성식 (3)으로 표시되는, 1분자 중에 적어도 2개의 Si-H 결합을 갖는 오르가노하이드로겐폴리실록산: (A) 성분과 (B) 성분의 합계 100질량부에 대하여 1 내지 200질량부,(C) Organohydrogenpolysiloxane having at least two Si-H bonds in one molecule, represented by the average composition formula (3) below: 1 to 200 parts by mass per 100 parts by mass of the total of components (A) and (B),

R3 dHeSiO[(4-d-e)/2] … (3)R 3 d H e SiO [(4-de)/2] … (3)

(식 중, R3은 지방족 불포화 탄화수소기를 제외한, 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 1가 탄화수소기이다. d, e는 0.7≤d≤2.1, 0.01≤e≤1.0, 또한 0.8≤d+e≤2.7을 충족하는 양수이다.)(In the formula, R 3 is a substituted or unsubstituted monovalent hydrocarbon group, which may be the same or different, excluding an aliphatic unsaturated hydrocarbon group. d and e are positive numbers satisfying 0.7≤d≤2.1, 0.01≤e≤1.0, and also 0.8≤d+e≤2.7.)

and

(D) 히드로실릴화 반응 촉매: 조성물 전체에 대하여, 금속 원자의 질량 환산으로 0.01 내지 500ppm이 되는 양(D) Hydrosilylation reaction catalyst: an amount of 0.01 to 500 ppm in terms of the mass of metal atoms for the entire composition

을 함유하는 것임을 특징으로 하는 부가 경화형 실리콘 조성물을 제공한다.The present invention provides an additive-curable silicone composition characterized by containing:

이러한 본 발명의 부가 경화형 실리콘 조성물을 포함하는 경화물은, 경화가 빠르고, 광투과율이 높고, 고온 내구성이 우수하기 때문에, 광반사 재료, 예를 들어 발광 장치용, 특히 발광 다이오드용 밀봉 재료로서 유용하다.A cured product comprising the additive-curable silicone composition of the present invention is useful as a light-reflecting material, for example, a sealing material for a light-emitting device, particularly a light-emitting diode, because it has fast curing, high light transmittance, and excellent high-temperature durability.

또한, 상기 (A) 성분에 있어서, 상기 평균 단위식 (1) 중 R1이, 탄소수 1 내지 3의 알킬기를 포함하는 것임이 바람직하다.In addition, in the above component (A), it is preferable that R 1 in the average unit formula (1) contains an alkyl group having 1 to 3 carbon atoms.

이러한 것이면, 보다 내열성 및 경화성이 우수한 경화물을 얻을 수 있다.In this case, a cured product with better heat resistance and curing properties can be obtained.

또한, 상기 (A) 성분에 있어서, 상기 평균 단위식 (1) 중 R1 중, 메틸기의 함유율이 80몰% 이상이고, 나머지가 비닐기인 것이 바람직하다.In addition, in the above (A) component, it is preferable that among R 1 in the above average unit formula (1), the content of methyl groups is 80 mol% or more and the remainder is vinyl groups.

이러한 것이면, 보다 내열성 및 경화성이 우수한 경화물을 얻을 수 있다.In this case, a cured product with better heat resistance and curing properties can be obtained.

또한, 추가로, (E) 에폭시기를 함유하는 오르가노실란 화합물 및 오르가노폴리실록산 중 어느 하나 또는 그 양쪽을, (A) 성분과 (B) 성분의 합계 100질량부에 대하여 0.01 내지 3질량부 함유하는 것이 바람직하다.In addition, it is preferable to additionally contain 0.01 to 3 parts by mass of either or both of an organosilane compound and an organopolysiloxane containing an epoxy group (E) per 100 parts by mass of the total of component (A) and component (B).

이와 같이, (E) 성분을 포함하는 것으로 함으로써, 접착성을 향상시킬 수 있다.In this way, by including component (E), the adhesiveness can be improved.

또한, 본 발명은, 상기 기재된 부가 경화형 실리콘 조성물의 경화물에 의해 반도체 소자가 피복된 것임을 특징으로 하는 반도체 장치를 제공한다.In addition, the present invention provides a semiconductor device characterized in that a semiconductor element is coated with a cured product of the above-described additive-curable silicone composition.

이러한 반도체 장치이면, 상기와 같이 경화가 빠르고, 광투과율이 높고, 고온 내구성이 우수한 경화물로 이루어지기 때문에, 신뢰성이 우수한 반도체 장치가 된다.Since these semiconductor devices are made of a cured material that is fast curing, has high light transmittance, and has excellent high-temperature durability, they become semiconductor devices with excellent reliability.

본 발명의 부가 경화형 실리콘 조성물을 포함하는 경화물은, 경화가 빠르고, 광투과율이 높고, 고온 내구성이 우수하기 때문에, 광반사 재료, 예를 들어 발광 장치용, 특히 발광 다이오드용 밀봉 재료로서 유용하다.A cured product comprising the addition-curable silicone composition of the present invention is useful as a light-reflecting material, for example, a sealing material for a light-emitting device, particularly a light-emitting diode, because it has fast curing, high light transmittance, and excellent high-temperature durability.

도 1은 본 발명의 반도체 장치의 일례를 도시하는 개략 단면도이다.FIG. 1 is a schematic cross-sectional view illustrating an example of a semiconductor device of the present invention.

본 발명자들은, 상기 과제에 대해서 예의 검토를 거듭한 결과, 특정한 구조를 갖는 오르가노폴리실록산을 함유하는 부가 경화형 실리콘 조성물이, 경화성, 투명성, 내열성이 우수한 경화물을 부여하는 것을 발견하고, 본 발명을 완성시켰다.The inventors of the present invention, after careful examination of the above-mentioned problem, discovered that an addition-curable silicone composition containing an organopolysiloxane having a specific structure provides a cured product having excellent curability, transparency, and heat resistance, and completed the present invention.

즉, 본 발명은,That is, the present invention,

부가 경화형 실리콘 조성물로서,As an additive-curable silicone composition,

(A) 하기 평균 단위식 (1)로 표시되는 오르가노폴리실록산,(A) Organopolysiloxane represented by the average unit formula (1) below,

(R1SiO3/2)a1(R1 3SiO1/2)b1(X1O1/2)c1 … (1)(R 1 SiO 3/2 ) a1 (R 1 3 SiO 1/2 ) b1 (X 1 O 1/2 ) c1 … (1)

(식 중, R1은 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 지방족 1가 탄화수소기이며, 전체 R1 중 0.1 내지 50%는 알케닐기이다. X1은 수소 원자 또는 알킬기이다. a1, b1, c1은 0.1≤a1≤1, 0≤b1≤0.75, 0≤c1≤0.1, 또한 a1+b1+c1=1을 충족하는 수이다.)(In the formula, R 1 is a substituted or unsubstituted aliphatic monovalent hydrocarbon group, which may be the same or different, and 0.1 to 50% of the total R 1 is an alkenyl group. X 1 is a hydrogen atom or an alkyl group. a1, b1, and c1 are numbers satisfying 0.1≤a1≤1, 0≤b1≤0.75, 0≤c1≤0.1, and also a1+b1+c1=1.)

(B) 하기 평균 단위식 (2)로 표시되는 오르가노폴리실록산: (A) 성분 100질량부에 대하여 0 내지 5,000질량부,(B) Organopolysiloxane represented by the average unit formula (2) below: 0 to 5,000 parts by mass per 100 parts by mass of component (A),

(R2 2SiO)a2(R2 3SiO1/2)b2 … (2)(R 2 2 SiO) a2 (R 2 3 SiO 1/2 ) b2 … (2)

(식 중, R2는 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 지방족 1가 탄화수소기이며, 전체 R2 중 0.01 내지 25몰%는 알케닐기이다. a2, b2는 0.33≤a2≤0.999, 0.001≤b2≤0.67, 또한 a2+b2=1을 충족하는 양수이다.)(In the formula, R 2 is a substituted or unsubstituted aliphatic monovalent hydrocarbon group, which may be the same or different, and 0.01 to 25 mol% of the total R 2 is an alkenyl group. a2 and b2 are positive numbers satisfying 0.33≤a2≤0.999, 0.001≤b2≤0.67, and a2+b2=1.)

(C) 하기 평균 조성식 (3)으로 표시되는, 1분자 중에 적어도 2개의 Si-H 결합을 갖는 오르가노하이드로겐폴리실록산: (A) 성분과 (B) 성분의 합계 100질량부에 대하여 1 내지 200질량부,(C) Organohydrogenpolysiloxane having at least two Si-H bonds in one molecule, represented by the average composition formula (3) below: 1 to 200 parts by mass per 100 parts by mass of the total of components (A) and (B),

R3 dHeSiO[(4-d-e)/2] … (3)R 3 d H e SiO [(4-de)/2] … (3)

(식 중, R3은 지방족 불포화 탄화수소기를 제외한, 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 1가 탄화수소기이다. d, e는 0.7≤d≤2.1, 0.01≤e≤1.0, 또한 0.8≤d+e≤2.7을 충족하는 양수이다.)(In the formula, R 3 is a substituted or unsubstituted monovalent hydrocarbon group, which may be the same or different, excluding an aliphatic unsaturated hydrocarbon group. d and e are positive numbers satisfying 0.7≤d≤2.1, 0.01≤e≤1.0, and also 0.8≤d+e≤2.7.)

and

(D) 히드로실릴화 반응 촉매: 조성물 전체에 대하여, 금속 원자의 질량 환산으로 0.01 내지 500ppm이 되는 양을 함유하는 부가 경화형 실리콘 조성물이다.(D) Hydrosilylation reaction catalyst: An addition-curable silicone composition containing an amount of 0.01 to 500 ppm in terms of the mass of metal atoms relative to the entire composition.

이하, 본 발명에 대해서 상세히 설명하지만, 본 발명은 이들에 한정되는 것은 아니다. 또한, 본 명세서에 있어서, 점도는 회전 점도계에 의해 측정한 값이다.Hereinafter, the present invention will be described in detail, but the present invention is not limited thereto. In addition, in this specification, viscosity is a value measured by a rotational viscometer.

<부가 경화형 실리콘 조성물><Additional curing silicone composition>

본 발명의 부가 경화형 실리콘 조성물은, 하기의 (A) 내지 (D) 성분을 함유하여 이루어진다. 이하, 각 성분에 대해서 상세히 설명한다.The addition-curable silicone composition of the present invention is composed of the following components (A) to (D). Each component is described in detail below.

[(A) 성분][(A) Component]

(A) 성분은, 하기 평균 단위식 (1)로 표시되는 오르가노폴리실록산이다.(A) The component is an organopolysiloxane represented by the following average unit formula (1).

(R1SiO3/2)a1(R1 3SiO1/2)b1(X1O1/2)c1 … (1)(R 1 SiO 3/2 ) a1 (R 1 3 SiO 1/2 ) b1 (X 1 O 1/2 ) c1 … (1)

(식 중, R1은 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 지방족 1가 탄화수소기이며, 전체 R1 중 0.1 내지 50%는 알케닐기이다. X1은 수소 원자 또는 알킬기이다. a1, b1, c1은 0.1≤a1≤1, 0≤b1≤0.75, 0≤c1≤0.1, 또한 a1+b1+c1=1을 충족하는 수이다.)(In the formula, R 1 is a substituted or unsubstituted aliphatic monovalent hydrocarbon group, which may be the same or different, and 0.1 to 50% of the total R 1 is an alkenyl group. X 1 is a hydrogen atom or an alkyl group. a1, b1, and c1 are numbers satisfying 0.1≤a1≤1, 0≤b1≤0.75, 0≤c1≤0.1, and also a1+b1+c1=1.)

R1 중 알케닐기로서, 바람직하게는 비닐기, 알릴기, 부테닐기, 펜테닐기, 헥세닐기가 예시되고, 비닐기인 것이 특히 바람직하다. R1 중, 알케닐기의 함유율은, 0.1 내지 50몰%, 바람직하게는 0.1 내지 30몰%, 특히 바람직하게는 0.3 내지 20몰%이다. 0.1몰% 미만이면, 조성물의 경화성이 불충분해지고, 50몰%을 초과하면 경화물이 무르게 된다.Among the alkenyl groups in R 1 , preferably, a vinyl group, an allyl group, a butenyl group, a pentenyl group, and a hexenyl group are exemplified, and a vinyl group is particularly preferable. Among R 1 , the content of the alkenyl group is 0.1 to 50 mol%, preferably 0.1 to 30 mol%, and particularly preferably 0.3 to 20 mol%. When it is less than 0.1 mol%, the curability of the composition becomes insufficient, and when it exceeds 50 mol%, the cured product becomes soft.

또한, R1 중 알케닐기 이외의 규소 원자 결합 유기기로서는, 메틸기, 에틸기, 프로필기, 부틸기, 펜틸기, 헥실기, 헵틸기 등의 알킬기; 클로로메틸기, 3-클로로프로필기, 3,3,3-트리플루오로프로필기 등의 할로겐화알킬 치환 또는 비치환된 지방족 1가 탄화수소기가 예시되고, 그 중에서도 내열성의 면에서 메틸기가 가장 바람직하다. R1 중, 이들 알케닐기 이외의 규소 원자 결합 유기기의 함유율로서 20몰% 이상이면, 안정된 내열성을 부여할 수 있기 때문에 바람직하고, 보다 바람직하게는 40몰% 이상이다.In addition, examples of the silicon atom-bonded organic group other than the alkenyl group in R 1 include alkyl groups such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, and a heptyl group; and halogenated alkyl-substituted or unsubstituted aliphatic monovalent hydrocarbon groups such as a chloromethyl group, a 3-chloropropyl group, and a 3,3,3-trifluoropropyl group, and among these, a methyl group is most preferable in terms of heat resistance. It is preferable that the content of the silicon atom-bonded organic group other than these alkenyl groups in R 1 be 20 mol% or more, and more preferably 40 mol% or more, because stable heat resistance can be imparted.

(A) 성분에 있어서, 상기 평균 단위식 (1)에 있어서의 R1이, 탄소수 1 내지 3의 알킬기를 포함하는 것이면, 내열성 및 경화성이 우수한 경화물이 얻어지기 때문에 특히 바람직하다.(A) In the component, if R 1 in the average unit formula (1) contains an alkyl group having 1 to 3 carbon atoms, this is particularly preferable because a cured product having excellent heat resistance and curability is obtained.

또한, (A) 성분에 있어서, 상기 평균 단위식 (1)에 있어서의 R1 중, 메틸기의 함유율이 80몰% 이상이고, 나머지가 비닐기이면, 내열성 및 경화성이 우수한 경화물이 얻어지기 때문에 특히 바람직하다.In addition, in the (A) component, if the content of methyl groups among R 1 in the average unit formula (1) is 80 mol% or more and the remainder is vinyl groups, a cured product having excellent heat resistance and curability is obtained, which is particularly preferable.

X1은 수소 원자 또는 알킬기이며, 이 알킬기로서는, R1로서 예시한 것과 마찬가지인 기를 들 수 있고, 특히 메틸기 또는 에틸기인 것이 바람직하다.X 1 is a hydrogen atom or an alkyl group, and as the alkyl group, groups similar to those exemplified as R 1 can be mentioned, and in particular, a methyl group or an ethyl group is preferable.

a1은 0.1 내지 1이고, b1은 0 내지 0.75이고, c1은 0 내지 0.1이고, a1+b1+c1은 1이다. a1, b1 및 c1이 상기 범위 밖이면, 얻어지는 경화물의 경도 및/또는 강도가 불충분해진다.a1 is 0.1 to 1, b1 is 0 to 0.75, c1 is 0 to 0.1, and a1+b1+c1 is 1. If a1, b1, and c1 are outside the above ranges, the hardness and/or strength of the obtained cured product becomes insufficient.

a1은 바람직하게는 0.15 내지 0.9, 특히 바람직하게는 0.2 내지 0.8이고, b1은 바람직하게는 0 내지 0.5, 특히 바람직하게는 0 내지 0.4이고, c1은 바람직하게는 0 내지 0.05이다.a1 is preferably 0.15 to 0.9, particularly preferably 0.2 to 0.8, b1 is preferably 0 to 0.5, particularly preferably 0 to 0.4, and c1 is preferably 0 to 0.05.

(A) 성분의 분자량은 한정되지 않지만, THF 용매를 사용한 겔 침투 크로마토그래피(GPC) 측정에 의한 표준 폴리스티렌 환산의 중량 평균 분자량(Mw)이 500 내지 20,000인 것이 바람직하고, 보다 바람직하게는 700 내지 15,000, 특히 바람직하게는, 1,000 내지 10,000이다.(A) The molecular weight of the component is not limited, but the weight average molecular weight (Mw) converted to standard polystyrene by gel permeation chromatography (GPC) measurement using a THF solvent is preferably 500 to 20,000, more preferably 700 to 15,000, and particularly preferably 1,000 to 10,000.

[(B) 성분][(B) Component]

(B) 성분은 하기 평균 단위식 (2)로 표시되는 오르가노폴리실록산이다.(B) The component is an organopolysiloxane represented by the following average unit formula (2).

(R2 2SiO)a2(R2 3SiO1/2)b2 … (2)(R 2 2 SiO) a2 (R 2 3 SiO 1/2 ) b2 … (2)

(식 중, R2는 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 지방족 1가 탄화수소기이며, 전체 R2 중 0.01 내지 25몰%는 알케닐기이다. a2, b2는 0.33≤a2≤0.999, 0.001≤b2≤0.67, 또한 a2+b2=1을 충족하는 양수이다.)(In the formula, R 2 is a substituted or unsubstituted aliphatic monovalent hydrocarbon group, which may be the same or different, and 0.01 to 25 mol% of the total R 2 is an alkenyl group. a2 and b2 are positive numbers satisfying 0.33≤a2≤0.999, 0.001≤b2≤0.67, and a2+b2=1.)

R2는 (A) 성분에 있어서의 R1과 마찬가지의 것을 들 수 있고, R2 중 알케닐기로서, 바람직하게는 비닐기, 알릴기, 부테닐기, 펜테닐기, 헥세닐기가 예시되고, 비닐기인 것이 특히 바람직하다. R2 중, 알케닐기의 함유율은, 0.01 내지 25몰%, 바람직하게는 0.1 내지 20몰%, 특히 바람직하게는 0.3 내지 20몰%이다. 0.01몰% 미만이면, 조성물의 경화성이 불충분해지고, 25몰%를 초과하면 경화물이 무르게 된다.R 2 may be the same as R 1 in component (A), and among R 2 , an alkenyl group is preferably exemplified by a vinyl group, an allyl group, a butenyl group, a pentenyl group, and a hexenyl group, and a vinyl group is particularly preferable. Among R 2 , the content of the alkenyl group is 0.01 to 25 mol%, preferably 0.1 to 20 mol%, and particularly preferably 0.3 to 20 mol%. When it is less than 0.01 mol%, the curability of the composition becomes insufficient, and when it exceeds 25 mol%, the cured product becomes soft.

또한, R2 중 알케닐기 이외의 규소 원자 결합 유기기로서는, 메틸기, 에틸기, 프로필기, 부틸기, 펜틸기, 헥실기, 헵틸기 등의 알킬기; 클로로메틸기, 3-클로로프로필기, 3,3,3-트리플루오로프로필기 등의 할로겐화알킬 치환 또는 비치환된 지방족 1가 탄화수소기가 예시되고, 그 중에서도 내열성의 면에서 메틸기가 가장 바람직하다. R2 중, 이들 지방족 1가 탄화수소기의 함유율로서 20몰% 이상이면, 안정된 내열성을 부여할 수 있기 때문에 바람직하고, 보다 바람직하게는 40몰% 이상이다.In addition, examples of silicon atom-bonded organic groups other than the alkenyl group in R 2 include alkyl groups such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, and a heptyl group; and halogenated alkyl substituted or unsubstituted aliphatic monovalent hydrocarbon groups such as a chloromethyl group, a 3-chloropropyl group, and a 3,3,3-trifluoropropyl group, and among these, a methyl group is most preferable in terms of heat resistance. It is preferable that the content of these aliphatic monovalent hydrocarbon groups in R 2 be 20 mol% or more, and more preferably 40 mol% or more, because stable heat resistance can be imparted.

a2는 0.33 내지 0.999이고, 바람직하게는 0.90 내지 0.998이고, 더욱 바람직하게는 0.956 내지 0.997이다. b2는 0.001 내지 0.67이고, 바람직하게는 0.002 내지 0.10이고, 더욱 바람직하게는 0.003 내지 0.044이다. a2 및 b2가 상기 범위 밖이면, 얻어지는 경화물의 경도 및/또는 강도가 불충분해진다.a2 is 0.33 to 0.999, preferably 0.90 to 0.998, and more preferably 0.956 to 0.997. b2 is 0.001 to 0.67, preferably 0.002 to 0.10, and more preferably 0.003 to 0.044. When a2 and b2 are out of the above ranges, the hardness and/or strength of the obtained cured product becomes insufficient.

상기 (B) 성분의 배합량은 (A) 성분 100질량부에 대하여 0 내지 5,000질량부, 바람직하게는 10 내지 3000질량부, 더욱 바람직하게는 20 내지 1,000질량부이다. 배합량이 5,000질량부를 초과하면 충분한 경도 및/또는 강도를 얻지 못한다.The blending amount of the above component (B) is 0 to 5,000 parts by mass, preferably 10 to 3,000 parts by mass, and more preferably 20 to 1,000 parts by mass, per 100 parts by mass of component (A). If the blending amount exceeds 5,000 parts by mass, sufficient hardness and/or strength cannot be obtained.

[(C) 성분][(C) Component]

(C) 성분은 하기 평균 조성식 (3)으로 표시되는 오르가노하이드로겐폴리실록산이다.(C) The component is an organohydrogenpolysiloxane represented by the following average composition formula (3).

R3 dHeSiO[(4-d-e)/2] … (3)R 3 d H e SiO [(4-de)/2] … (3)

(식 중, R3은 지방족 불포화 탄화수소기를 제외한, 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 1가 탄화수소기이다. d, e는 0.7≤d≤2.1, 0.01≤e≤1.0, 또한 0.8≤d+e≤2.7을 충족하는 양수이다.)(In the formula, R 3 is a substituted or unsubstituted monovalent hydrocarbon group, which may be the same or different, excluding an aliphatic unsaturated hydrocarbon group. d and e are positive numbers satisfying 0.7≤d≤2.1, 0.01≤e≤1.0, and also 0.8≤d+e≤2.7.)

(C) 성분은, 25℃에서의 점도가 바람직하게는 0.5 내지 1,000mPa·s이고, 1 내지 500mPa·s인 것이 보다 바람직하다.(C) The component has a viscosity at 25°C of preferably 0.5 to 1,000 mPa·s, more preferably 1 to 500 mPa·s.

R3으로 표시되는 1가 탄화수소기는, 탄소 원자수가 바람직하게는 1 내지 20, 보다 바람직하게는 1 내지 10이고, 이러한 탄화수소기로서는, 메틸기, 에틸기, 프로필기, 이소프로필기, 부틸기, tert-부틸기, 헥실기 등의 알킬기, 시클로헥실기 등의 시클로알킬기 등의 포화 탄화수소기, 페닐기, 톨릴기 등의 아릴기, 벤질기, 페닐에틸기 등의 아르알킬기, 3,3,3-트리플루오로프로필기 등의 할로겐 치환 탄화수소기, 시아노 치환 탄화수소기 등을 들 수 있고, 메틸기인 것이 바람직하다.The monovalent hydrocarbon group represented by R 3 preferably has 1 to 20 carbon atoms, more preferably 1 to 10, and examples of such hydrocarbon groups include saturated hydrocarbon groups such as alkyl groups such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a tert-butyl group, and a hexyl group; cycloalkyl groups such as a cyclohexyl group; aryl groups such as a phenyl group and a tolyl group; aralkyl groups such as a benzyl group and a phenylethyl group; halogen-substituted hydrocarbon groups such as a 3,3,3-trifluoropropyl group; and cyano-substituted hydrocarbon groups, with a methyl group being preferable.

(A) 성분과의 상용성 및 경화물의 물성 등의 점에서, 규소 원자에 결합한 전체 R3과 H(수소 원자) 중 20몰% 이상이 메틸기인 것이 바람직하고, 50몰% 이상이 메틸기인 것이 보다 바람직하다.(A) In terms of compatibility with components and physical properties of the cured product, it is preferable that 20 mol% or more of the total R 3 and H (hydrogen atoms) bonded to silicon atoms are methyl groups, and it is more preferable that 50 mol% or more are methyl groups.

(C) 성분은 1분자 중에 적어도 2개, 바람직하게는 3개 이상의 Si-H 결합(즉, 규소 원자에 결합한 수소 원자)을 갖고, 25℃에서의 점도가 바람직하게는 0.5 내지 1,000mPa·s이고, 1 내지 500mPa·s인 것이 보다 바람직하다.(C) The component has at least two, preferably three or more Si-H bonds (i.e., hydrogen atoms bonded to silicon atoms) per molecule, and has a viscosity at 25°C of preferably 0.5 to 1,000 mPa·s, more preferably 1 to 500 mPa·s.

(C) 성분의 실록산쇄의 구조로서는 특별히 한정되는 것은 아니지만, 바람직하게는 직쇄상 또는 환상의 오르가노하이드로겐폴리실록산이다.(C) The structure of the siloxane chain of the component is not particularly limited, but is preferably a linear or cyclic organohydrogenpolysiloxane.

d, e는 0.7≤d≤2.1, 0.01≤e≤1.0, 또한 0.8≤d+e≤2.7을 충족하는 양수이고, d, e가 상기 범위 밖이면, 얻어지는 경화물의 경도 및/또는 강도가 불충분해진다.d and e are positive numbers satisfying 0.7≤d≤2.1, 0.01≤e≤1.0, and also 0.8≤d+e≤2.7, and if d and e are outside the above ranges, the hardness and/or strength of the obtained cured product becomes insufficient.

d는 바람직하게는 1.0≤d≤1.8, e는 바람직하게는 0.02≤e≤1.0, 보다 바람직하게는 0.10≤e≤1.0, d+e는 바람직하게는 1.01≤d+e≤2.4, 보다 바람직하게는 1.6≤d+e≤2.2를 충족하는 양수이다.d is preferably a positive number satisfying 1.0≤d≤1.8, e is preferably 0.02≤e≤1.0, more preferably 0.10≤e≤1.0, and d+e is preferably 1.01≤d+e≤2.4, more preferably 1.6≤d+e≤2.2.

(C) 성분의 배합량은, (A) 성분 100질량부에 대하여 1 내지 200질량부, 바람직하게는 5 내지 80질량부이고, 배합량이 1질량부 미만이면, 경화성이 불충분해지고, 200질량부를 초과하면 충분한 경도 및/또는 강도를 얻지 못한다.(C) The blending amount of component is 1 to 200 parts by mass, preferably 5 to 80 parts by mass, per 100 parts by mass of component (A). If the blending amount is less than 1 part by mass, the curability becomes insufficient, and if it exceeds 200 parts by mass, sufficient hardness and/or strength cannot be obtained.

(C) 성분은, (A) 성분 및 (B) 성분 중 알케닐기 합계에 대한 (C) 성분 중의 규소 원자 결합 수소 원자(즉, SiH기)의 몰비가 0.5 내지 5몰/몰, 특히 1 내지 3몰/몰이 되는 양으로 배합하는 것이 보다 바람직하다.It is more preferable to mix component (C) in an amount such that the molar ratio of silicon atom-bonded hydrogen atoms (i.e., SiH groups) in component (C) to the sum of alkenyl groups in components (A) and (B) is 0.5 to 5 mol/mol, particularly 1 to 3 mol/mol.

[(D) 성분][(D) Component]

(D) 성분의 히드로실릴화 반응 촉매는, (A) 성분 및 (B) 성분 중 알케닐기와, (C) 성분 중 규소 원자 결합 수소 원자와의 히드로실릴화 반응을 촉진하기 위한 촉매이다. 이러한 (D) 성분으로서는, 백금계 촉매, 로듐계 촉매, 팔라듐계 촉매가 예시되고, 본 조성물의 경화를 현저하게 촉진할 수 있는 점에서 백금계 촉매인 것이 바람직하다. 이 백금계 촉매로서는, 백금 미분말, 염화 백금산, 염화 백금산의 알코올 용액, 백금-알케닐실록산 착체, 백금-올레핀 착체, 백금-카르보닐 착체가 예시되고, 특히 백금-알케닐실록산 착체인 것이 바람직하다. 알케닐실록산으로서는, 1,3-디비닐-1,1,3,3-테트라메틸디실록산, 1,3,5,7-테트라메틸-1,3,5,7-테트라비닐시클로테트라실록산, 이들 알케닐실록산의 메틸기의 일부를 에틸기, 페닐기 등의 기로 치환한 알케닐실록산, 이들 알케닐실록산의 비닐기를 알릴기, 헥세닐기 등의 기로 치환한 알케닐실록산이 예시된다. 특히, 이 백금-알케닐실록산 착체의 안정성이 양호한 점에서, 1,3-디비닐-1,1,3,3-테트라메틸디실록산인 것이 바람직하다.(D) The hydrosilylation reaction catalyst of component is a catalyst for promoting the hydrosilylation reaction between the alkenyl group of components (A) and (B) and the silicon atom-bonded hydrogen atom of component (C). As this (D) component, a platinum-based catalyst, a rhodium-based catalyst, and a palladium-based catalyst are exemplified, and a platinum-based catalyst is preferable because it can significantly promote the curing of the present composition. As the platinum-based catalyst, a platinum fine powder, chloroplatinic acid, an alcohol solution of chloroplatinic acid, a platinum-alkenylsiloxane complex, a platinum-olefin complex, and a platinum-carbonyl complex are exemplified, and a platinum-alkenylsiloxane complex is particularly preferable. Examples of the alkenylsiloxane include 1,3-divinyl-1,1,3,3-tetramethyldisiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane, alkenylsiloxanes in which some of the methyl groups of these alkenylsiloxanes are substituted with groups such as ethyl groups or phenyl groups, and alkenylsiloxanes in which the vinyl groups of these alkenylsiloxanes are substituted with groups such as allyl groups or hexenyl groups. In particular, 1,3-divinyl-1,1,3,3-tetramethyldisiloxane is preferable because the stability of this platinum-alkenylsiloxane complex is good.

또한, 이 백금-알케닐실록산 착체의 안정성을 향상시키기 위해서, 이 착체에 1,3-디비닐-1,1,3,3-테트라메틸디실록산, 1,3-디알릴-1,1,3,3-테트라메틸디실록산, 1,3-디비닐-1,3-디메틸-1,3-디페닐디실록산, 1,3-디비닐-1,1,3,3-테트라페닐디실록산, 1,3,5,7-테트라메틸-1,3,5,7-테트라비닐시클로테트라실록산 등의 알케닐실록산이나 디메틸실록산올리고머 등의 오르가노실록산 올리고머를 첨가하는 것이 바람직하고, 특히 알케닐실록산을 첨가하는 것이 바람직하다.In addition, in order to improve the stability of this platinum-alkenylsiloxane complex, it is preferable to add an alkenylsiloxane such as 1,3-divinyl-1,1,3,3-tetramethyldisiloxane, 1,3-diallyl-1,1,3,3-tetramethyldisiloxane, 1,3-divinyl-1,3-dimethyl-1,3-diphenyldisiloxane, 1,3-divinyl-1,1,3,3-tetraphenyldisiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane, or an organosiloxane oligomer such as a dimethylsiloxane oligomer, and it is particularly preferable to add an alkenylsiloxane.

(D) 성분의 함유량은, 본 조성물의 경화(히드로실릴화 반응)를 촉진하는 양이면 되지만, 구체적으로는, 본 조성물에 대하여, 본 성분 중의 금속 원자가 질량 단위로 0.01 내지 500ppm의 범위 내가 되는 양인 것이 바람직하고, 나아가, 0.05 내지 100ppm의 범위 내가 되는 양인 것이 바람직하고, 특히는, 0.01 내지 50ppm의 범위 내가 되는 양인 것이 바람직하다. (D) 성분의 함유량이 상기 범위 밖인 경우, 충분한 경화성을 얻지 못함과 함께, 착색 등의 문제가 일어나고, 나아가 경제적이지 않다.(D) The content of the component may be any amount that promotes curing (hydrosilylation reaction) of the composition. Specifically, the content of the metal atom in the component is preferably within the range of 0.01 to 500 ppm by mass unit with respect to the composition, more preferably within the range of 0.05 to 100 ppm, and particularly preferably within the range of 0.01 to 50 ppm. If the content of the component (D) is outside the above range, sufficient curability is not obtained, and problems such as discoloration occur, and furthermore, it is not economical.

[(E) 성분][(E) Component]

본 발명의 부가 경화형 실리콘 조성물은, 추가로 (E) 성분으로서 에폭시기를 함유하는 오르가노실란 화합물 또는 오르가노폴리실록산을 포함하고 있어도 된다. (E) 성분은, 은 도금, 알루미늄, 폴리프탈아미드, 알루미나세라믹스, 폴리시클로헥실렌디메틸렌테레프탈레이트에 대한 접착성을 향상시키기 위한 접착 보조제이며, 에폭시기로서, 구체적으로 예시하면, 3-글리시독시프로필기, 4-글리시독시부틸기 등의 글리시독시알킬기; 2-(3,4-에폭시시클로헥실)에틸기, 3-(3,4-에폭시시클로헥실)프로필기 등의 에폭시시클로헥실알킬기; 4-옥시라닐부틸기, 8-옥시라닐옥틸기 등의 옥시라닐알킬기 등의 에폭시기 함유 1가 유기기를 들 수 있다. 이들 1가 유기기를 함유하는 오르가노폴리실록산 및 오르가노실란 화합물을 이하에 예시한다.The addition-curable silicone composition of the present invention may further contain an organosilane compound or organopolysiloxane containing an epoxy group as component (E). Component (E) is an adhesion aid for improving adhesion to silver plating, aluminum, polyphthalamide, alumina ceramics, and polycyclohexylenedimethylene terephthalate, and specific examples of the epoxy group include a glycidoxyalkyl group such as a 3-glycidoxypropyl group or a 4-glycidoxybutyl group; an epoxycyclohexylalkyl group such as a 2-(3,4-epoxycyclohexyl)ethyl group or a 3-(3,4-epoxycyclohexyl)propyl group; an oxiranylalkyl group such as a 4-oxiranylbutyl group or an 8-oxiranyloctyl group, and the like, and an epoxy group-containing monovalent organic group. Organopolysiloxane and organosilane compounds containing these monovalent organic groups are exemplified below.

Figure 112019086653350-pat00001
Figure 112019086653350-pat00001

(E) 성분의 함유량은 (A) 성분 및 (B) 성분의 합계 100질량부에 대하여 0.01 내지 3질량부가 바람직하고, 보다 바람직하게는 0.03 내지 2질량부, 더욱 바람직하게는, 0.1 내지 1질량부이다. 이러한 범위 내이면, 내열성에 영향을 주지 않고 양호한 접착성이 얻어진다.The content of component (E) is preferably 0.01 to 3 parts by mass, more preferably 0.03 to 2 parts by mass, and even more preferably 0.1 to 1 part by mass, per 100 parts by mass of the total of component (A) and component (B). Within this range, good adhesiveness is obtained without affecting heat resistance.

[임의 성분][Optional ingredients]

본 조성물에는, 그 밖의 임의의 성분으로서, 에티닐시클로헥산올, 2-메틸-3-부틴-2-올, 3,5-디메틸-1-헥신-3-올, 2-페닐-3-부틴-2-올 등의 알킨알코올; 3-메틸-3-펜텐-1-인, 3,5-디메틸-3-헥센-1-인 등의 엔인 화합물; 1,3,5,7-테트라메틸-1,3,5,7-테트라비닐시클로테트라실록산, 1,3,5,7-테트라메틸-1,3,5,7-테트라헥세닐시클로테트라실록산, 벤조트리아졸 등의 반응 억제제를 함유해도 된다. 이 반응 억제제의 함유량은 한정되지 않지만, (A) 성분과 (B) 성분의 합계 100질량부에 대하여 0.0001 내지 5질량부의 범위 내인 것이 바람직하다.The composition may contain, as other optional components, alkyne alcohols such as ethynylcyclohexanol, 2-methyl-3-butyn-2-ol, 3,5-dimethyl-1-hexyn-3-ol, and 2-phenyl-3-butyn-2-ol; enyne compounds such as 3-methyl-3-penten-1-yne and 3,5-dimethyl-3-hexene-1-yne; reaction inhibitors such as 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetrahexenylcyclotetrasiloxane, and benzotriazole. The content of the reaction inhibitor is not limited, but is preferably within the range of 0.0001 to 5 parts by mass with respect to 100 parts by mass of the total of component (A) and component (B).

또한, 본 조성물에는, 그의 접착성을 향상시키기 위한 접착 부여제를 함유하고 있어도 된다. 이 접착 부여제로서는, 규소 원자에 결합한 알콕시기를 1분자 중에 적어도 1개, 바람직하게는 2개 이상 갖는 유기 규소 화합물인 것이 바람직하다. 이 알콕시기로서는, 메톡시기, 에톡시기, 프로폭시기, 부톡시기, 메톡시에톡시기가 예시되며, 특히 메톡시기인 것이 바람직하다. 또한, 이 유기 규소 화합물의 규소 원자에 결합하는 알콕시기 이외의 기로서는, R1 등으로서 예시한, 상기 알킬기, 상기 알케닐기, 상기 아릴기, 상기 아르알킬기, 상기 할로겐화알킬기 등의 치환 혹은 비치환된 1가 탄화수소기; 3-메타크릴옥시프로필기 등의 아크릴기 함유 1가 유기기; 수소 원자가 예시된다. 구체적으로는 (메트)아크릴기 함유 실란 커플링제 등의 실란 커플링제나 그의 부분 가수 분해 축합물(실란 커플링제의 올리고머) 등이 예시된다.In addition, the composition may contain an adhesion promoter for improving its adhesiveness. The adhesion promoter is preferably an organosilicon compound having at least 1, and preferably 2 or more, alkoxy groups bonded to silicon atoms per molecule. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, and a methoxyethoxy group, and a methoxy group is particularly preferable. In addition, examples of groups other than the alkoxy group bonded to the silicon atom of the organosilicon compound include substituted or unsubstituted monovalent hydrocarbon groups such as the alkyl group, the alkenyl group, the aryl group, the aralkyl group, and the halogenated alkyl group, which are exemplified as R 1 , and the like; monovalent organic groups containing an acrylic group such as a 3-methacryloxypropyl group; and hydrogen atoms. Specifically, examples thereof include silane coupling agents such as (meth)acrylic group-containing silane coupling agents and their partial hydrolysis condensation products (oligomers of silane coupling agents).

보다 구체적으로는, 3-메타크릴옥시프로필트리메톡시실란 등의 실란 화합물; 1분자 중에 규소 원자 결합 알케닐기 혹은 규소 원자 결합 수소 원자 및 규소 원자 결합 알콕시기를 각각 적어도 1개씩 갖는 실록산 화합물, 규소 원자 결합 알콕시기를 적어도 1개 갖는 실란 화합물 또는 실록산 화합물과 1분자 중에 규소 원자 결합 히드록시기와 규소 원자 결합 알케닐기를 각각 적어도 1개씩 갖는 실록산 화합물의 혼합물, 메틸폴리실리케이트, 에틸폴리실리케이트, 에폭시기 함유 에틸폴리실리케이트가 예시된다.More specifically, examples thereof include silane compounds such as 3-methacryloxypropyltrimethoxysilane; siloxane compounds having at least one silicon atom-bonded alkenyl group or one silicon atom-bonded hydrogen atom and one silicon atom-bonded alkoxy group per molecule; mixtures of a silane compound or siloxane compound having at least one silicon atom-bonded alkoxy group and a siloxane compound having at least one silicon atom-bonded hydroxy group and one silicon atom-bonded alkenyl group per molecule; methyl polysilicate, ethyl polysilicate, and epoxy group-containing ethyl polysilicate.

이 접착 부여제는 저점도 액상인 것이 바람직하고, 그의 점도는 한정되지 않지만, 25℃에 있어서 1 내지 500mPa·s의 범위 내인 것이 바람직하다.It is preferable that this adhesive agent be a low-viscosity liquid, and its viscosity is not limited, but is preferably within the range of 1 to 500 mPa·s at 25°C.

또한, 상기 조성물에 있어서, 이 접착 부여제의 함유량은 한정되지 않지만, (A) 성분 100질량부에 대하여 0.01 내지 10질량부인 것이 바람직하다.In addition, in the above composition, the content of the adhesive agent is not limited, but is preferably 0.01 to 10 parts by mass with respect to 100 parts by mass of component (A).

또한, 본 조성물에는, 그 밖의 임의의 성분으로서, 실리카, 유리, 알루미나, 산화아연 등의 무기질 충전제; 폴리메타크릴레이트 수지 등의 유기 수지 미분말; 내열제, 염료, 안료, 난연성 부여제, 용제 등을 함유해도 된다.In addition, the composition may contain other optional components, such as inorganic fillers such as silica, glass, alumina, and zinc oxide; organic resin fine powder such as polymethacrylate resin; heat-resistant agents, dyes, pigments, flame retardants, and solvents.

또한, 본 조성물은, 경화하여, JIS에 규정된 경도가 듀로미터 A로 10 이상, 특히 30 내지 90인 경화물을 형성하는 것이 바람직하다.In addition, it is preferable that the present composition, upon curing, forms a cured product having a hardness of 10 or more, particularly 30 to 90 in Durometer A as specified in JIS.

또한, 본 조성물은, 조성물의 경화물에 의해 피복된 반도체 소자를 갖는 반도체 장치에 충분한 신뢰성을 부여하기 위해, 경화해서 얻어지는 경화물의 가시광(589㎚)에 있어서의 굴절률(25℃)이 1.4 이상이고, 경화물의 광투과율(25℃)이 80% 이상인 것이 바람직하다.In addition, in order to provide sufficient reliability to a semiconductor device having a semiconductor element coated with a cured product of the composition, it is preferable that the cured product obtained by curing has a refractive index (25°C) in visible light (589 nm) of 1.4 or more and a light transmittance (25°C) of the cured product of 80% or more.

또한, 이 굴절률은, 예를 들어 아베식 굴절률계에 의해 측정할 수 있다. 이때, 아베식 굴절률계에 있어서의 광원의 파장을 바꿈으로써 임의의 파장에 있어서의 굴절률을 측정할 수 있다. 또한, 이 광투과율은, 예를 들어 광로 길이 2.0㎜의 경화물을 분광 광도계에 의해 측정함으로써 구할 수 있다.In addition, this refractive index can be measured, for example, by an Abbe refractometer. At this time, by changing the wavelength of the light source in the Abbe refractometer, the refractive index at an arbitrary wavelength can be measured. In addition, this light transmittance can be obtained, for example, by measuring a cured product with an optical path length of 2.0 mm by a spectrophotometer.

또한, 본 조성물을 경화해서 얻어지는 경화물의 200㎚ 내지 250㎚의 파장에 있어서의 자외선 투과율(25℃)이 10% 이하인 것이 바람직하다. 이것은, 본 조성물의 경화물에 의해 반도체 소자를 피복하여 이루어지는 반도체 장치가 200㎚ 내지 250㎚인 단파장의 자외선을 받은 경우에, 그 반도체 장치를 구성하는 재료의 열화를 방지하기 때문이다. 이 자외선 투과율은, 예를 들어 광로 길이 2.0㎜의 경화물을 분광 광도계에 의해 측정함으로써 구할 수 있다.In addition, it is preferable that the cured product obtained by curing the composition has an ultraviolet ray transmittance (25°C) of 10% or less at a wavelength of 200 nm to 250 nm. This is because, when a semiconductor device formed by covering a semiconductor element with the cured product of the composition is exposed to ultraviolet ray having a short wavelength of 200 nm to 250 nm, deterioration of the material constituting the semiconductor device is prevented. The ultraviolet ray transmittance can be obtained, for example, by measuring a cured product having an optical path length of 2.0 mm using a spectrophotometer.

본 조성물은, 실온 또는 가열에 의해 경화가 진행되지만, 신속히 경화시키기 위해서는 가열하는 것이 바람직하다. 이 가열 온도로서는, 50 내지 200℃의 범위내인 것이 바람직하다.The composition is cured at room temperature or by heating, but heating is preferable for rapid curing. The heating temperature is preferably in the range of 50 to 200°C.

본 조성물을 경화해서 얻어지는 경화물은 엘라스토머상, 예를 들어 겔상, 혹은 유연한 고무상으로부터 탄성을 갖는 수지상까지 얻어진다. 이러한 본 조성물은, 전기·전자용 접착제, 포팅제, 보호 코팅제, 언더필제로서 사용할 수 있고, 특히 광투과율이 높은 점에서, 광학 용도의 반도체 소자의 접착제, 포팅제, 보호 코팅제, 언더필제로서 적합하다.The cured product obtained by curing the present composition has an elastomer phase, for example, a gel phase, or a flexible rubber phase, and an elastic resin phase. The present composition can be used as an electrical and electronic adhesive, potting agent, protective coating agent, and underfill agent, and is particularly suitable as an adhesive, potting agent, protective coating agent, and underfill agent for semiconductor devices for optical purposes, because of its high light transmittance.

본 발명에서는 또한, 이러한 본 발명의 부가 경화형 실리콘 조성물을 사용한 반도체 장치를 제공한다.The present invention also provides a semiconductor device using the addition-curable silicone composition of the present invention.

이하, 도면을 참조로, 본 발명의 반도체 장치에 대해서 설명하지만, 본 발명은 이들에 한정되는 것은 아니다.Hereinafter, the semiconductor device of the present invention will be described with reference to the drawings, but the present invention is not limited thereto.

도 1은 본 발명의 반도체 장치의 일례(이 경우 LED(발광 다이오드))를 나타내는 개략 단면도이다.FIG. 1 is a schematic cross-sectional view showing an example of a semiconductor device of the present invention (in this case, an LED (light-emitting diode)).

본 발명의 반도체 장치(1)는, 은 도금 기판(2)이 형성된 패키지(3) 상에 반도체 칩(4)이 다이 본드되어 있고, 이 반도체 칩(4)은 본딩 와이어(5)에 의해 와이어 본딩되어 있다.In the semiconductor device (1) of the present invention, a semiconductor chip (4) is die bonded on a package (3) on which a silver-plated substrate (2) is formed, and the semiconductor chip (4) is wire bonded by a bonding wire (5).

그리고, 상술한 본 발명의 부가 경화형 실리콘 조성물의 경화물(6)에 의해, 반도체 칩(4)이 피복되어 있다.And, the semiconductor chip (4) is coated with the cured product (6) of the additional curable silicone composition of the present invention described above.

반도체 칩(4)의 피복은, 상술한 본 발명의 부가 경화형 실리콘 조성물(6)을 도포하고, 가열에 의해 부가 경화형 실리콘 조성물(6)을 경화시킴으로써 행해진다. 또한 그 밖의 공지된 경화 조건 하에서 공지된 경화 방법에 의해 경화시켜도 물론 무방하다.The coating of the semiconductor chip (4) is performed by applying the addition-curable silicone composition (6) of the present invention described above and curing the addition-curable silicone composition (6) by heating. In addition, it is of course also possible to cure by a known curing method under other known curing conditions.

또한, 이 경우, 외부 응력의 영향을 받기 어렵게 하고, 또 먼지 등의 부착을 최대한 억제한다고 하는 관점에서, 부가 경화형 실리콘 조성물(6)은, 경화에 의해, JIS에 규정된 경도가 듀로미터 A로 30 이상인 경화물을 형성하는 것임이 바람직하다.In addition, in this case, from the viewpoint of making it difficult to be affected by external stress and suppressing the adhesion of dust, etc. as much as possible, it is preferable that the addition-curing silicone composition (6) forms a cured product having a hardness of 30 or more in Durometer A as specified in JIS by curing.

본 발명의 부가 경화형 실리콘 조성물은, 광투과율이 높고, 기재에 대한 밀착성이 높고, 내균열성이 우수하고, 내열 후의 경도 변화가 작은 경화물을 형성하므로, 이러한 본 발명의 조성물을 사용한 본 발명의 반도체 장치는, 신뢰성이 우수하게 되어, 다이오드, LED 등으로서 특히 적합하다.The addition-curable silicone composition of the present invention forms a cured product having high light transmittance, high adhesion to a substrate, excellent crack resistance, and small change in hardness after heat resistance, and therefore, the semiconductor device of the present invention using the composition of the present invention has excellent reliability and is particularly suitable as a diode, LED, etc.

실시예Example

이하, 실시예와 비교예를 나타내고, 본 발명을 구체적으로 설명하지만, 본 발명은 하기의 실시예 등에 제한되는 것은 아니다.Hereinafter, examples and comparative examples are shown and the present invention is specifically described, but the present invention is not limited to the following examples, etc.

또한, 실시예 중의 점도는 회전 점도계를 사용하여 측정한 25℃에 있어서의 값이며, 중량 평균 분자량은 THF 용매를 사용한 겔 침투 크로마토그래피(GPC)에 의해 측정한 표준 폴리스티렌 환산의 값이다. 또한, 부가 경화형 실리콘 조성물, 및 그의 경화물의 특성은 다음과 같이 해서 평가하고, 결과를 표 1에 나타냈다.In addition, the viscosity in the examples is a value at 25°C measured using a rotational viscometer, and the weight average molecular weight is a value converted to standard polystyrene measured by gel permeation chromatography (GPC) using a THF solvent. In addition, the properties of the addition-curable silicone composition and its cured product were evaluated as follows, and the results are shown in Table 1.

[경화성][hardenability]

부가 경화형 실리콘 조성물을 알파 테크놀로지사제 레오미터 MDR2000을 사용해서 120℃에서 30분간 측정을 행하고, 종료 시와 비교해서 10%의 토크에 도달한 시간을 T10, 90% 토크에 도달한 시간을 T90이라 하여, 재료가 경화 상태에 도달하는 속도를 평가했다. T10과 T90 사이의 차가 작을수록 경화에 도달하는 시간이 빠른, 즉 경화성이 양호한 것을 나타내고 있다.The addition-curable silicone composition was measured at 120°C for 30 minutes using a rheometer MDR2000 manufactured by Alpha Technologies, Inc. The time at which 10% of the torque was reached compared to the end was designated as T10, and the time at which 90% of the torque was reached was designated as T90, to evaluate the speed at which the material reached a cured state. The smaller the difference between T10 and T90, the faster the time at which curing was reached, i.e., the better the curability.

[경도][hardness]

부가 경화형 실리콘 조성물을 열풍 순환식 오븐을 사용해서 150℃의 3시간 가열함으로써 경화물을 제작했다. 이 경화물의 경도를, 듀로미터 A 경도계를 사용해서 측정했다.A cured product was produced by heating the additive-curable silicone composition in a hot air circulation oven at 150°C for 3 hours. The hardness of the cured product was measured using a Durometer A durometer.

[광투과율][Light Transmittance]

부가 경화형 실리콘 조성물을 150℃의 열풍 순환식 오븐에서 3시간 가열함으로써 경화해서 제작한 경화물(광로 길이 2.0㎜)의 25℃에 있어서의 400㎚의 파장의 광투과율을 측정했다.The light transmittance at a wavelength of 400 nm at 25°C of a cured product (optical path length: 2.0 mm) produced by curing an additive-curable silicone composition by heating it in a hot air circulation oven at 150°C for 3 hours was measured.

[내균열성][Crack resistance]

도 1과 같이 제작해서 150℃×4시간의 가열로 경화한 패키지를, {-40℃(30분), 100℃(30분)}을 1사이클로 하는 열충격 시험기 안에 넣고, 100사이클 경과 후의 패키지를 광학 현미경으로 관찰하여, 경화물에 크랙이 보인 경우를 ×, 크랙이 보이지 않은 경우를 ○, 크랙의 유무가 명료하지 않은 경우를 △로 하였다.A package manufactured as in Fig. 1 and cured by heating at 150°C for 4 hours was placed in a thermal shock tester with one cycle of {-40°C (30 minutes), 100°C (30 minutes)}, and the package after 100 cycles was observed with an optical microscope. If cracks were observed in the cured product, they were marked as ×, if no cracks were observed, they were marked as ○, and if the presence or absence of cracks was not clear, they were marked as △.

[내열성(투명성)][Heat resistance (transparency)]

상기 광투과율 측정에서 사용한 경화물을, 180℃의 열풍 순환식 오븐에서 500시간 더 가열 후, 25℃에 있어서의 400㎚의 파장의 광투과율을 측정하고, 가열 전의 광투과율을 100으로 한 값으로 환산해서 평가했다.The cured product used in the above light transmittance measurement was further heated in a hot air circulation oven at 180°C for 500 hours, and then the light transmittance at a wavelength of 400 nm at 25°C was measured, and the value was converted to 100 for evaluation, with the light transmittance before heating being the value.

[내열성(경도)][Heat resistance (hardness)]

상기 경도 측정에서 사용한 경화물을, 180℃의 열풍 순환식 오븐에서 500시간 더 가열 후, 이 경화물의 경도를, 듀로미터 A 경도계를 사용해서 측정하고, 가열 전의 경도를 100으로 한 값으로 환산해서 평가했다. 측정값이 측정 한계 이상에 도달한 경우, 한계 이상이라 하였다.The cured product used in the above hardness measurement was further heated in a hot air circulation oven at 180℃ for 500 hours, and the hardness of the cured product was measured using a Durometer A hardness tester, and the hardness before heating was converted to a value set as 100 to evaluate the hardness. If the measured value reached or exceeded the measurement limit, it was considered to be above the limit.

[실시예 1][Example 1]

(A) 성분으로서 하기 평균 단위식 (I)로 표시되는 분지쇄상 오르가노폴리실록산{성상=고체상(25℃), 규소 원자 결합 전체 유기기 중 규소 원자 결합 비닐기의 함유율=4.0몰%, 규소 원자 결합 전체 유기기 중 규소 원자 결합 메틸기의 함유율=96몰%, 표준 폴리스티렌 환산의 중량 평균 분자량=13,000} 50질량부, (B) 성분으로서 분자쇄 말단 디메틸비닐실록시기 봉쇄 디메틸폴리실록산(규소 원자 결합 비닐기의 함유율=0.6몰%) 50질량부, (C) 성분으로서 하기 식 (II)로 표시되는 오르가노하이드로겐폴리실록산(점도 5,000mPa·s) 4.5질량부, (D) 성분으로서 백금의 1,3-디비닐-1,1,3,3-테트라메틸디실록산 착체를 조성물 전체에 대하여 백금 금속의 질량 환산으로 20ppm이 되는 양, 반응 억제제로서 에티닐시클로헥산올 0.1질량부, 접착 부여제로서 하기 구조식 (III)으로 표시되는 화합물 0.5질량부를 혼합하여, 점도 3,500mPa·s인 부가 경화형 실리콘 조성물을 제조했다.(A) 50 parts by mass of a branched-chain organopolysiloxane represented by the following average unit formula (I) as a component {property = solid phase (25°C), content of silicon atom-bonded vinyl groups out of all silicon atom-bonded organic groups = 4.0 mol%, content of silicon atom-bonded methyl groups out of all silicon atom-bonded organic groups = 96 mol%, weight average molecular weight in standard polystyrene conversion = 13,000}, (B) 50 parts by mass of a dimethylpolysiloxane capped with a molecular chain terminal dimethylvinylsiloxy group (content of silicon atom-bonded vinyl groups = 0.6 mol%), (C) 4.5 parts by mass of an organohydrogenpolysiloxane represented by the following formula (II) (viscosity: 5,000 mPa s), (D) a 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex of platinum as a component, in an amount of the mass of platinum metal relative to the entire composition. An addition-curable silicone composition having a viscosity of 3,500 mPa·s was prepared by mixing 0.1 mass part of ethynylcyclohexanol as a reaction inhibitor and 0.5 mass part of a compound represented by the following structural formula (III) as an adhesive agent in an amount of 20 ppm in conversion.

(CH3SiO3/2)0.7((CH3)3SiO1/2)0.236((CH2=CH)(CH3)2SiO1/2)0.064 (I)(CH 3 SiO 3/2 ) 0.7 ((CH 3 ) 3 SiO 1/2 ) 0.236 ((CH 2 =CH)(CH 3 ) 2 SiO 1/2 ) 0.064 (I)

(CH3)3SiO((H)(CH3)SiO)10Si(CH3)3 (II)(CH 3 ) 3 SiO((H)(CH 3 )SiO) 10 Si(CH 3 ) 3 (II)

Figure 112019086653350-pat00002
Figure 112019086653350-pat00002

[실시예 2][Example 2]

(A) 성분으로서 하기 평균 단위식 (IV)로 표시되는 분지쇄상 오르가노폴리실록산{성상=고체상(25℃), 규소 원자 결합 전체 유기기 중 규소 원자 결합 비닐기의 함유율=4.0몰%, 규소 원자 결합 전체 유기기 중 규소 원자 결합 메틸기의 함유율=96몰%, 중량 평균 분자량=15,000} 50질량부, (B) 성분으로서 분자쇄 말단 디메틸비닐실록시기 봉쇄 디메틸폴리실록산(점도 5,000mPa·s, 규소 원자 결합 비닐기의 함유율=0.6몰%) 50질량부, (C) 성분으로서 상기 식 (II)로 표시되는 오르가노하이드로겐폴리실록산 5.0질량부, (D) 성분으로서 백금의 1,3-디비닐-1,1,3,3-테트라메틸디실록산 착체를 조성물 전체에 대하여 백금 금속의 질량 환산으로 20ppm이 되는 양, 반응 억제제로서 에티닐시클로헥산올 0.1질량부, 접착 부여제로서 하기 구조식 (V)로 표시되는 화합물 1.0질량부를 혼합하여, 점도 3,500mPa·s인 부가 경화형 실리콘 조성물을 제조했다.(A) 50 parts by mass of a branched-chain organopolysiloxane represented by the average unit formula (IV) below as a component {property = solid phase (25°C), content of silicon atom-bonded vinyl groups out of all silicon atom-bonded organic groups = 4.0 mol%, content of silicon atom-bonded methyl groups out of all silicon atom-bonded organic groups = 96 mol%, weight average molecular weight = 15,000}, (B) 50 parts by mass of a dimethylpolysiloxane having a terminal dimethylvinylsiloxy group capped (viscosity 5,000 mPa s, content of silicon atom-bonded vinyl groups = 0.6 mol%) as a component, (C) 5.0 parts by mass of an organohydrogenpolysiloxane represented by the above formula (II) as a component, (D) a 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex of platinum as a component, in terms of the mass of platinum metal relative to the entire composition, By mixing 0.1 mass part of ethynylcyclohexanol as a reaction inhibitor and 1.0 mass part of a compound represented by the following structural formula (V) as an adhesive agent in an amount of 20 ppm, an addition-curable silicone composition having a viscosity of 3,500 mPa·s was produced.

(CH3SiO3/2)0.65((CH3)3SiO1/2)0.286((CH2=CH)(CH3)2SiO1/2)0.064 (IV)(CH 3 SiO 3/2 ) 0.65 ((CH 3 ) 3 SiO 1/2 ) 0.286 ((CH 2 =CH)(CH 3 ) 2 SiO 1/2 ) 0.064 (IV)

Figure 112019086653350-pat00003
Figure 112019086653350-pat00003

[비교예 1][Comparative Example 1]

하기 평균 단위식 (VI)으로 표시되는 분지쇄상의 오르가노폴리실록산{성상=고체상(25℃), 규소 원자 결합 전체 유기기 중 규소 원자 결합 비닐기의 함유율=7.4몰%, 규소 원자 결합 전체 유기기 중 규소 원자 결합 메틸기의 함유율=92.6몰%, 중량 평균 분자량=3,600} 50질량부, 분자쇄 말단 디메틸비닐실록시기 봉쇄 디메틸폴리실록산(점도 5,000mPa·s, 규소 원자 결합 비닐기의 함유율=0.6몰%) 50질량부, 상기 식 (II)로 표시되는 오르가노하이드로겐폴리실록산 4.0질량부, 백금의 1,3-디비닐-1,1,3,3-테트라메틸디실록산 착체를 조성물 전체에 대하여 백금 금속의 질량 환산으로 20ppm이 되는 양, 반응 억제제로서 에티닐시클로헥산올 0.1질량부, 접착 부여제로서 상기 구조식 (V)로 표시되는 화합물 2.0질량부를 혼합하여, 점도 6,500mPa·s인 부가 경화형 실리콘 조성물을 제조했다.50 parts by mass of a branched-chain organopolysiloxane represented by the average unit formula (VI) below {property = solid phase (25°C), content of silicon atom-bonded vinyl groups out of all silicon atom-bonded organic groups = 7.4 mol%, content of silicon atom-bonded methyl groups out of all silicon atom-bonded organic groups = 92.6 mol%, weight average molecular weight = 3,600}, 50 parts by mass of dimethylpolysiloxane having a terminal dimethylvinylsiloxy group capped (viscosity 5,000 mPa s, content of silicon atom-bonded vinyl groups = 0.6 mol%), 4.0 parts by mass of an organohydrogenpolysiloxane represented by the above formula (II), an amount of a 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex of platinum that is 20 ppm in mass conversion of platinum metal relative to the entire composition, and ethynylcyclohexanol as a reaction inhibitor. By mixing 0.1 mass part of a silicone adhesive and 2.0 mass parts of a compound represented by the structural formula (V) as an adhesive agent, an addition-curing silicone composition having a viscosity of 6,500 mPa·s was prepared.

(SiO2)0.55[(CH2=CH)(CH3)2SiO1/2]0.1((CH3)3SiO1/2)0.35 (VI)(SiO 2 ) 0.55 [(CH 2 =CH)(CH 3 ) 2 SiO 1/2 ] 0.1 ((CH 3 ) 3 SiO 1/2 ) 0.35 (VI)

[비교예 2][Comparative Example 2]

하기 평균 단위식 (VII)로 표시되는 분지쇄상의 오르가노폴리실록산{성상=고체상(25℃), 규소 원자 결합 전체 유기기 중 규소 원자 결합 비닐기의 함유율=6.3몰%, 규소 원자 결합 전체 유기기 중 규소 원자 결합 메틸기의 함유율=93.8몰%, 중량 평균 분자량=5,600} 50질량부, 분자쇄 말단 디메틸비닐실록시기 봉쇄 디메틸폴리실록산(점도 5,000mPa·s, 규소 원자 결합 비닐기의 함유율=0.6몰%) 50질량부, 상기 식 (II)로 표시되는 오르가노하이드로겐폴리실록산 4.0질량부, 백금의 1,3-디비닐-1,1,3,3-테트라메틸디실록산 착체를 조성물 전체에 대하여 백금 금속의 질량 환산으로 20ppm이 되는 양, 반응 억제제로서 에티닐시클로헥산올 0.1질량부, 접착 부여제로서 상기 구조식 (V)로 표시되는 화합물 2.0질량부를 혼합하여, 점도 6,500mPa·s인 부가 경화형 실리콘 조성물을 제조했다.50 parts by mass of a branched-chain organopolysiloxane represented by the average unit formula (VII) below {property = solid phase (25°C), content of silicon atom-bonded vinyl groups out of all silicon atom-bonded organic groups = 6.3 mol%, content of silicon atom-bonded methyl groups out of all silicon atom-bonded organic groups = 93.8 mol%, weight average molecular weight = 5,600}, 50 parts by mass of dimethylpolysiloxane having a terminal dimethylvinylsiloxy group capped (viscosity 5,000 mPa s, content of silicon atom-bonded vinyl groups = 0.6 mol%), 4.0 parts by mass of an organohydrogenpolysiloxane represented by the above formula (II), an amount of a 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex of platinum that is 20 ppm in mass conversion of platinum metal relative to the entire composition, and ethynylcyclohexanol as a reaction inhibitor. By mixing 0.1 mass part of a silicone adhesive and 2.0 mass parts of a compound represented by the structural formula (V) as an adhesive agent, an addition-curing silicone composition having a viscosity of 6,500 mPa·s was prepared.

(CH3SiO3/2)0.7[(CH2=CH)(CH3)SiO]0.1((CH3)3SiO1/2)0.2 (VII)(CH 3 SiO 3/2 ) 0.7 [(CH 2 =CH)(CH 3 )SiO] 0.1 ((CH 3 ) 3 SiO 1/2 ) 0.2 (VII)

[비교예 3][Comparative Example 3]

하기 평균 단위식 (VIII)으로 표시되는 분지쇄상의 오르가노폴리실록산{성상=고체상(25℃), 규소 원자 결합 전체 유기기 중 규소 원자 결합 비닐기의 함유율=20몰%, 규소 원자 결합 전체 유기기 중 규소 원자 결합 페닐기의 함유율=60몰%, 중량 평균 분자량=1,600} 45질량부, 분자쇄 양 말단 디메틸비닐실록시기 봉쇄 메틸페닐폴리실록산(점도 3,500mPa·s, 규소 원자 결합 비닐기의 함유율=0.20몰%, 규소 원자 결합 전체 유기기 중 규소 원자 결합 페닐기의 함유율=49몰%) 55질량부, 하기 식 (IX)로 표시되는 분자쇄 양 말단 디메틸하이드로겐실록시기 봉쇄 메틸페닐폴리실록산 24질량부, 백금의 1,3-디비닐-1,1,3,3-테트라메틸디실록산 착체를 조성물 전체에 대하여 백금 금속의 질량 환산으로 2.5ppm이 되는 양, 반응 억제제로서 에티닐시클로헥산올 0.1질량부, 접착 부여제로서 상기 구조식 (V)로 표시되는 화합물 2.0질량부를 혼합하여, 점도 1,700mPa·s인 부가 경화형 실리콘 조성물을 제조했다.45 parts by mass of a branched-chain organopolysiloxane represented by the following average unit formula (VIII) {property = solid phase (25°C), content of silicon atom-bonded vinyl groups out of all silicon atom-bonded organic groups = 20 mol%, content of silicon atom-bonded phenyl groups out of all silicon atom-bonded organic groups = 60 mol%, weight average molecular weight = 1,600}, 55 parts by mass of a methylphenylpolysiloxane having dimethylvinylsiloxy groups capped at both molecular terminals (viscosity 3,500 mPa s, content of silicon atom-bonded vinyl groups = 0.20 mol%, content of silicon atom-bonded phenyl groups out of all silicon atom-bonded organic groups = 49 mol%), 24 parts by mass of a methylphenylpolysiloxane having dimethylhydrogensiloxy groups capped at both molecular terminals represented by the following formula (IX), 1,3-divinyl-1,1,3,3-tetramethyldisiloxane of platinum An addition-curable silicone composition having a viscosity of 1,700 mPa·s was prepared by mixing 0.1 mass part of ethynylcyclohexanol as a reaction inhibitor and 2.0 mass parts of a compound represented by the structural formula (V) as an adhesive agent in an amount of 2.5 ppm based on the mass of platinum metal relative to the entire composition.

(C6H5SiO3/2)0.75[(CH2=CH)(CH3)2SiO1/2]0.25 (VIII)(C 6 H 5 SiO 3/2 ) 0.75 [(CH 2 =CH)(CH 3 ) 2 SiO 1/2 ] 0.25 (VIII)

H(CH3)2SiO[CH3(C6H5)SiO]4Si(CH3)2H (IX)H(CH 3 ) 2 SiO[CH 3 (C 6 H 5 )SiO] 4 Si(CH 3 ) 2 H (IX)

[비교예 4][Comparative Example 4]

실시예 1에 있어서, 상기 평균 단위식 (I)로 표시되는 분지쇄상 오르가노폴리실록산을 하기 평균 단위식 (X)으로 표시되는 분지쇄상의 오르가노폴리실록산{성상=고체상(25℃), 규소 원자 결합 전체 유기기 중 규소 원자 결합 비닐기의 함유율=16.7몰%, 규소 원자 결합 전체 유기기 중 규소 원자 결합 페닐기의 함유율=3.3몰%, 중량 평균 분자량 2,100}으로 한 것 이외에는 실시예 1과 마찬가지로 하여, 점도 2,300mPa·s인 부가 경화형 실리콘 조성물을 제조했다.In Example 1, except that the branched-chain organopolysiloxane represented by the above average unit formula (I) was changed to a branched-chain organopolysiloxane represented by the following average unit formula (X) {property = solid (25°C), content of silicon-atom-bonded vinyl groups out of all silicon-atom-bonded organic groups = 16.7 mol%, content of silicon-atom-bonded phenyl groups out of all silicon-atom-bonded organic groups = 3.3 mol%, weight average molecular weight 2,100}, an addition-curable silicone composition having a viscosity of 2,300 mPa·s was produced in the same manner as in Example 1.

(C6H5SiO3/2)0.05(CH3SiO3/2)0.70[(CH2=CH)(CH3)2SiO1/2]0.25 (X)(C 6 H 5 SiO 3/2 ) 0.05 (CH 3 SiO 3/2 ) 0.70 [(CH 2 =CH)(CH 3 ) 2 SiO 1/2 ] 0.25 (X)

Figure 112019086653350-pat00004
Figure 112019086653350-pat00004

표 1에 나타낸 바와 같이, 실시예 1 및 2는, 경화물의 경도도 충분하고, 경화물의 경화성, 광투과율 및 내열성도 양호하고, 경화물에 크랙의 발생도 보이지 않았다. 또한, 촉매독에 의한 박리도 발생하지 않고, 밀착성이 높은 것이었다.As shown in Table 1, Examples 1 and 2 had sufficient hardness of the cured product, good curability, light transmittance and heat resistance of the cured product, and no occurrence of cracks in the cured product. In addition, no peeling due to catalyst poison occurred, and the adhesion was high.

한편, 비교예 1, 3, 4에 있어서는, 경도는 충분했지만 크랙의 발생이 보이고, SiO2 단위를 갖는 비교예 1은 경화성이 나쁜 것이었다. 또한, SiO 단위를 갖는 비교예 2도, 크랙의 발생이 없었지만, 내열성이 떨어지는 것이었다. 또한 페닐기를 갖는 오르가노폴리실록산을 포함하는 비교예 3·4도 내열성이 떨어지는 것이었다. 또한, 촉매독에 의한 박리가 발생해버렸다.Meanwhile, in Comparative Examples 1, 3, and 4, although the hardness was sufficient, cracks were observed, and Comparative Example 1 having SiO 2 units had poor curing properties. In addition, Comparative Example 2 having SiO units also did not exhibit cracks, but had poor heat resistance. In addition, Comparative Examples 3 and 4 containing organopolysiloxane having phenyl groups also had poor heat resistance. In addition, peeling occurred due to catalyst poison.

이상의 점에서, 본 발명의 부가 경화형 실리콘 조성물이면, 광투과율이 높고, 기재에 대한 밀착성이 높고, 내열성·내균열성이 우수한 경화물을 형성하기 때문에, 각종 광학 용도 등에 적합한 것임이 실증되었다.In the above respects, it has been demonstrated that the additive-curable silicone composition of the present invention is suitable for various optical applications, etc., because it forms a cured product having high light transmittance, high adhesion to a substrate, and excellent heat resistance and crack resistance.

상기 실시예에서는, 반도체 소자의 포팅제로서 본 발명의 부가 경화형 실리콘 조성물을 사용했지만, 본 발명의 부가 경화형 실리콘 조성물은, 특히 광투과율이 높은 점에서, 그 밖에도 광학 용도의 반도체 소자의 접착제, 보호 코팅제, 언더필제 등으로서 적합하고, 또한 전기·전자용 접착제, 포팅제, 보호 코팅제, 언더필제 등으로서도 사용할 수 있다.In the above examples, the addition-curable silicone composition of the present invention was used as a potting agent for semiconductor devices; however, the addition-curable silicone composition of the present invention is also suitable as an adhesive, protective coating agent, underfill agent, etc. for semiconductor devices for optical purposes, particularly because of its high light transmittance, and can also be used as an adhesive, potting agent, protective coating agent, underfill agent, etc. for electrical and electronic purposes.

또한, 본 발명은 상기 실시 형태에 한정되는 것은 아니다. 상기 실시 형태는, 예시이며, 본 발명의 특허청구범위에 기재된 기술적 사상과 실질적으로 동일한 구성을 갖고, 마찬가지 작용 효과를 발휘하는 것은, 어떠한 것이든 본 발명의 기술적 범위에 포함된다.In addition, the present invention is not limited to the above embodiments. The above embodiments are examples, and anything that has substantially the same configuration as the technical idea described in the claims of the present invention and exhibits the same operational effects is included in the technical scope of the present invention.

1 : 반도체 장치
2 : 은 도금 기판
3 : 패키지
4 : 반도체 칩
5 : 본딩 와이어
6 : 부가 경화형 실리콘 조성물(의 경화물)
1: Semiconductor device
2: Silver plated substrate
3: Package
4: Semiconductor Chip
5: Bonding wire
6: Additive curing silicone composition (cured product)

Claims (5)

부가 경화형 실리콘 조성물로서,
(A) 하기 평균 단위식 (1)로 표시되는 오르가노폴리실록산,
(R1SiO3/2)a1(R1 3SiO1/2)b1(X1O1/2)c1 … (1)
(식 중, R1은 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 지방족 1가 탄화수소기이며, 전체 R1 중 0.1 내지 50%는 알케닐기이다. X1은 수소 원자 또는 알킬기이다. a1, b1, c1은 0.1≤a1≤1, 0≤b1≤0.75, 0≤c1≤0.1, 또한 a1+b1+c1=1을 충족하는 수이다.)
(B) 하기 평균 단위식 (2)로 표시되는 오르가노폴리실록산: (A) 성분 100질량부에 대하여 0질량부 초과 5,000질량부 이하,
(R2 2SiO)a2(R2 3SiO1/2)b2 … (2)
(식 중, R2는 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 지방족 1가 탄화수소기이며, 전체 R2 중 0.01 내지 25몰%는 알케닐기이다. a2, b2는 0.33≤a2≤0.999, 0.001≤b2≤0.67, 또한 a2+b2=1을 충족하는 양수이다.)
(C) 하기 평균 조성식 (3)으로 표시되는, 1분자 중에 적어도 2개의 Si-H 결합을 갖는 오르가노하이드로겐폴리실록산: (A) 성분과 (B) 성분의 합계 100질량부에 대하여 1 내지 200질량부,
R3 dHeSiO[(4-d-e)/2] … (3)
(식 중, R3은 지방족 불포화 탄화수소기를 제외한, 동일하거나 또는 상이해도 되는, 치환 또는 비치환된 1가 탄화수소기이다. d, e는 0.7≤d≤2.1, 0.01≤e≤1.0, 또한 0.8≤d+e≤2.7을 충족하는 양수이다.)

(D) 히드로실릴화 반응 촉매: 조성물 전체에 대하여, 금속 원자의 질량 환산으로 0.01 내지 500ppm이 되는 양
을 함유하는 것임을 특징으로 하는 부가 경화형 실리콘 조성물.
As an additive-curable silicone composition,
(A) Organopolysiloxane represented by the average unit formula (1) below,
(R 1 SiO 3/2 ) a1 (R 1 3 SiO 1/2 ) b1 (X 1 O 1/2 ) c1 … (1)
(In the formula, R 1 is a substituted or unsubstituted aliphatic monovalent hydrocarbon group, which may be the same or different, and 0.1 to 50% of the total R 1 is an alkenyl group. X 1 is a hydrogen atom or an alkyl group. a1, b1, and c1 are numbers satisfying 0.1≤a1≤1, 0≤b1≤0.75, 0≤c1≤0.1, and also a1+b1+c1=1.)
(B) Organopolysiloxane represented by the average unit formula (2) below: (A) More than 0 mass parts and 5,000 mass parts or less per 100 mass parts of component,
(R 2 2 SiO) a2 (R 2 3 SiO 1/2 ) b2 … (2)
(In the formula, R 2 is a substituted or unsubstituted aliphatic monovalent hydrocarbon group, which may be the same or different, and 0.01 to 25 mol% of the total R 2 is an alkenyl group. a2 and b2 are positive numbers satisfying 0.33≤a2≤0.999, 0.001≤b2≤0.67, and a2+b2=1.)
(C) Organohydrogenpolysiloxane having at least two Si-H bonds in one molecule, represented by the average composition formula (3) below: 1 to 200 parts by mass per 100 parts by mass of the total of components (A) and (B),
R 3 d H e SiO [(4-de)/2] … (3)
(In the formula, R 3 is a substituted or unsubstituted monovalent hydrocarbon group, which may be the same or different, excluding an aliphatic unsaturated hydrocarbon group. d and e are positive numbers satisfying 0.7≤d≤2.1, 0.01≤e≤1.0, and also 0.8≤d+e≤2.7.)
and
(D) Hydrosilylation reaction catalyst: an amount of 0.01 to 500 ppm in terms of the mass of metal atoms for the entire composition
An addition-curable silicone composition characterized by containing:
제1항에 있어서, 상기 (A) 성분에 있어서, 상기 평균 단위식 (1) 중 R1이 탄소수 1 내지 3의 알킬기를 포함하는 것임을 특징으로 하는 부가 경화형 실리콘 조성물.An addition-curable silicone composition, characterized in that in the first paragraph, in the component (A), R 1 in the average unit formula (1) contains an alkyl group having 1 to 3 carbon atoms. 제1항에 있어서, 상기 (A) 성분에 있어서, 상기 평균 단위식 (1) 중 R1 중, 메틸기의 함유율이 80몰% 이상이고, 나머지가 비닐기인 것을 특징으로 하는 부가 경화형 실리콘 조성물.An addition-curable silicone composition characterized in that in the first paragraph, in the component (A), among R 1 in the average unit formula (1), the content of methyl groups is 80 mol% or more and the remainder is vinyl groups. 제1항 내지 제3항 중 어느 한 항에 있어서, 추가로, (E) 에폭시기를 함유하는 오르가노실란 화합물 및 오르가노폴리실록산 중 어느 하나 또는 그 양쪽을, (A) 성분과 (B) 성분의 합계 100질량부에 대하여 0.01 내지 3질량부 함유하는 것을 특징으로 하는 부가 경화형 실리콘 조성물.An addition-curable silicone composition characterized in that, in any one of claims 1 to 3, further comprises 0.01 to 3 parts by mass of one or both of an organosilane compound and an organopolysiloxane containing an epoxy group (E) per 100 parts by mass of the total of component (A) and component (B). 제1항 내지 제3항 중 어느 한 항에 기재된 부가 경화형 실리콘 조성물의 경화물에 의해 반도체 소자가 피복된 것임을 특징으로 하는 반도체 장치.A semiconductor device characterized in that a semiconductor element is coated with a cured product of the additive-curable silicone composition described in any one of claims 1 to 3.
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