JP5377401B2 - Curable organopolysiloxane composition - Google Patents
Curable organopolysiloxane composition Download PDFInfo
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- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 50
- 239000000203 mixture Substances 0.000 title claims abstract description 43
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 47
- -1 polysiloxanes Polymers 0.000 claims abstract description 37
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 14
- 238000007259 addition reaction Methods 0.000 claims abstract description 9
- 239000007809 chemical reaction catalyst Substances 0.000 claims abstract description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 44
- 239000010703 silicon Substances 0.000 claims description 31
- 239000004065 semiconductor Substances 0.000 claims description 28
- 150000002430 hydrocarbons Chemical group 0.000 claims description 18
- 125000000962 organic group Chemical group 0.000 claims description 16
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 7
- 125000001931 aliphatic group Chemical group 0.000 claims description 5
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims description 5
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 230000003197 catalytic effect Effects 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 230000035939 shock Effects 0.000 abstract description 14
- 239000003054 catalyst Substances 0.000 abstract description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 2
- 239000001257 hydrogen Substances 0.000 abstract description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 21
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 20
- 150000001875 compounds Chemical class 0.000 description 12
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 12
- 239000003822 epoxy resin Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 229920000647 polyepoxide Polymers 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 229920002050 silicone resin Polymers 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000003566 sealing material Substances 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910004283 SiO 4 Inorganic materials 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- FSIJKGMIQTVTNP-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C=C)C=C FSIJKGMIQTVTNP-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000004382 potting Methods 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- JZUFKLXOESDKRF-UHFFFAOYSA-N Chlorothiazide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC2=C1NCNS2(=O)=O JZUFKLXOESDKRF-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Chemical group 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- YYDMZWOVFFRGGO-UHFFFAOYSA-N [bis(ethenyl)-phenylsilyl]-dimethyl-phenylsilane Chemical compound C[Si](C)(c1ccccc1)[Si](C=C)(C=C)c1ccccc1 YYDMZWOVFFRGGO-UHFFFAOYSA-N 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000979 retarding effect Effects 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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Abstract
Description
本発明は硬化性オルガノポリシロキサン組成物及び半導体装置に関して、詳しくは、高温/低温の温度サイクル条件下でもクラック耐性が良好な硬化物を形成する硬化性オルガノポリシロキサン組成物、及びこの硬化物により半導体素子が被覆され、信頼性が優れる半導体装置に関する。 The present invention relates to a curable organopolysiloxane composition and a semiconductor device. More specifically, the present invention relates to a curable organopolysiloxane composition that forms a cured product having good crack resistance even under high temperature / low temperature cycle conditions, and the cured product. The present invention relates to a semiconductor device that is covered with a semiconductor element and has excellent reliability.
半導体装置は様々な分野で用いられるため、それを構成する半導体素子等は様々な環境下に置かれ、時にその影響を大きく受けることになる。特に、LEDへの通電・点灯の際には急激な温度上昇が起こり、LED素子は熱衝撃を受けることが知られている。したがって、LED素子の点灯と消灯の繰り返しによりLED素子は過酷な温度サイクルに供されることになる。 Since semiconductor devices are used in various fields, semiconductor elements and the like constituting the semiconductor devices are placed in various environments and are sometimes greatly affected by them. In particular, it is known that when the LED is energized / lighted, a rapid temperature rise occurs and the LED element is subjected to thermal shock. Therefore, the LED element is subjected to a severe temperature cycle by repeatedly turning on and off the LED element.
こうしたLED素子を始めとする半導体素子の封止材料として一般的にエポキシ樹脂が用いられている。しかし、エポキシ樹脂の弾性率は高いためにボンディングワイヤーは温度サイクル等によるストレスを受け断線したりエポキシ樹脂にはクラックが発生することがある。また特に発光素子の封止材料として用いた場合、エポキシ樹脂がLEDチップに与えるストレスが原因で、半導体材料の結晶構造が崩れることによる発光効率の低下も懸念される。 Epoxy resin is generally used as a sealing material for semiconductor elements such as LED elements. However, since the elastic modulus of the epoxy resin is high, the bonding wire may be disconnected due to stress due to a temperature cycle or the like, or the epoxy resin may be cracked. In particular, when used as a sealing material for a light emitting element, there is a concern that the light emitting efficiency may be lowered due to the collapse of the crystal structure of the semiconductor material due to the stress applied to the LED chip by the epoxy resin.
その対策として、室温硬化型のシリコーンゴムをバッファー材として使用し、その外側をエポキシ樹脂で封止する方法が定法として定着している。しかしこの方法では、エポキシ樹脂がシリコーン樹脂に接着しないために、やはり温度サイクル等のストレスによりエポキシ樹脂とシリコーンゴムとの界面で剥離が発生したり、光取り出し効率が経時的に極端に低下することが知られている。 As a countermeasure, a method of using room temperature curable silicone rubber as a buffer material and sealing the outside with an epoxy resin has been established as a standard method. However, in this method, since the epoxy resin does not adhere to the silicone resin, peeling occurs at the interface between the epoxy resin and the silicone rubber due to stress such as a temperature cycle, and the light extraction efficiency decreases extremely with time. It has been known.
そこで、エポキシ樹脂に替わる材料としてシリコーン樹脂を使用することが提案されている(特許文献1、2及び3)。シリコーン樹脂は耐熱性、耐候性、耐変色性がエポキシ樹脂に比較して優れていることから、近年青色LED、白色LEDを中心に使用される例が増えてきている。
しかしこれらシリコーン樹脂はエポキシ樹脂に比較して弾性率は低いものの、曲げ強度等の機械特性も低いことからLEDへの通電・点灯の際に生じる熱衝撃によりクラックが発生しやすいという問題を有する。
Therefore, it has been proposed to use a silicone resin as a material replacing the epoxy resin (
However, although these silicone resins have a lower elastic modulus than epoxy resins, they also have a problem that cracks are likely to occur due to thermal shocks that occur during energization / lighting of the LED due to low mechanical properties such as bending strength.
本発明は上記事情に鑑みなされたもので、高透明性を有し、特に熱衝撃に対して高い耐性を有し過酷な温度サイクル下でもクラックが生じ難い硬化性オルガノポリシロキサン組成物を提供することを目的とする。 The present invention has been made in view of the above circumstances, and provides a curable organopolysiloxane composition having high transparency, particularly high resistance to thermal shock, and being less susceptible to cracking even under severe temperature cycles. For the purpose.
上記課題を解決するため、本発明は、少なくとも、
(A―I):1分子中に少なくとも2個のケイ素原子結合アルケニル基を有し、下記一般式(1)
RSiO3/2 (1)
(式中、Rは置換又は非置換の一価炭化水素基である)
で表されるシロキサン単位を5〜70モル%含有する分岐構造を有するオルガノポリシロキサン、
(A−II):1分子中に少なくとも2個のケイ素原子結合アルケニル基を有し、上記一般式(1)で表されるシロキサン単位を少なくとも70モル%を超えて含有する分岐構造を有するオルガノポリシロキサン 重量単位で(A―I)/(A−II)=1/99〜99/1となる量、
(B):下記平均組成式(2)
R1 aHbSiO(4−a−b)/2 (2)
(式中、R1は脂肪族不飽和炭化水素基を除く置換又は非置換の一価炭化水素基、a、bは0.7≦a≦2.1、0.01≦b≦1.0、かつ0.8≦a+b≦2.9を満たす正数である)
で表され、1分子中に少なくとも2個のケイ素原子結合水素原子を有し、かつ25℃での粘度が1000mPas以下である直鎖状のオルガノハイドロジェンポリシロキサン
そのケイ素原子に結合した水素原子数が、(A−I)及び(A−II)成分中のケイ素原子結合アルケニル基の合計数1個あたり0.3〜10個となる量、
(C):付加反応触媒 触媒量
を含有することを特徴とする硬化性オルガノポリシロキサン組成物を提供する。
In order to solve the above problems, the present invention provides at least
(AI): having at least two silicon-bonded alkenyl groups in one molecule, the following general formula (1)
RSiO 3/2 (1)
(Wherein R is a substituted or unsubstituted monovalent hydrocarbon group)
An organopolysiloxane having a branched structure containing 5 to 70 mol% of a siloxane unit represented by:
(A-II): Organo having a branched structure having at least two silicon atom-bonded alkenyl groups in one molecule and containing at least 70 mol% of the siloxane unit represented by the general formula (1) Polysiloxane in an amount of (AI) / (A-II) = 1/99 to 99/1 by weight unit,
(B): The following average composition formula (2)
R 1 a H b SiO (4-ab) / 2 (2)
(Wherein R 1 is a substituted or unsubstituted monovalent hydrocarbon group excluding an aliphatic unsaturated hydrocarbon group, a and b are 0.7 ≦ a ≦ 2.1 and 0.01 ≦ b ≦ 1.0. And a positive number satisfying 0.8 ≦ a + b ≦ 2.9)
A linear organohydrogenpolysiloxane having at least two silicon-bonded hydrogen atoms in one molecule and having a viscosity at 25 ° C. of 1000 mPas or less, the number of hydrogen atoms bonded to the silicon atom Is an amount such that 0.3 to 10 per one total number of silicon-bonded alkenyl groups in the components (AI) and (A-II),
(C): Addition reaction catalyst A curable organopolysiloxane composition containing a catalytic amount is provided.
このような本発明の硬化性オルガノポリシロキサン組成物は、耐変色性に優れているため高透明性を有しており、特に熱衝撃に対して高い耐性を有しているため過酷な温度サイクル下でもクラックや剥離が生じ難いものとなる。 Such a curable organopolysiloxane composition of the present invention has high transparency because of its excellent resistance to discoloration, and has a particularly severe temperature cycle because of its high resistance to thermal shock. Cracks and delamination are unlikely to occur even underneath.
この場合、前記(A―I)成分が25℃において液状であり、かつ、前記(A−II)成分が25℃において固体状であることが好ましい。
このように、25℃において、(A−I)成分が液状であり、(A−II)成分が固体状であれば、耐熱衝撃性及び強度を持たせることがより容易となる。
In this case, it is preferable that the (AI) component is liquid at 25 ° C. and the (A-II) component is solid at 25 ° C.
Thus, at 25 ° C., if the (AI) component is liquid and the (A-II) component is solid, it is easier to impart thermal shock resistance and strength.
また、この場合、前記(A―I)、(A−II)及び(B)の各成分が、1分子中に少なくとも1個のケイ素原子結合アリール基を有することが好ましい。
このように、(A−I)〜(B)各成分1分子中に少なくとも1個のケイ素原子結合アリール基を有するものであれば、シリコーン樹脂として必要な硬度・強度が得られると共に、硬化した被覆保護材の耐熱性や低温特性、透明性が特に良好になり、熱衝撃試験による信頼性も得られる。
In this case, the components (AI), (A-II), and (B) preferably have at least one silicon atom-bonded aryl group in one molecule.
As described above, (AI) to (B) each component having at least one silicon-bonded aryl group in one molecule can obtain the necessary hardness and strength as a silicone resin and is cured. The heat resistance, low-temperature characteristics, and transparency of the coating protective material are particularly good, and reliability by a thermal shock test is also obtained.
また、本発明は、前記硬化性オルガノポリシロキサン組成物の硬化物により半導体素子が被覆されていることを特徴とする半導体装置を提供する。
このように、特に耐熱衝撃性が高く、透明性に優れている本発明の硬化性オルガノポリシロキサン組成物を用いて半導体素子を被覆すれば、得られる半導体装置も様々な分野に適用可能で有用なものとなる。
The present invention also provides a semiconductor device wherein a semiconductor element is covered with a cured product of the curable organopolysiloxane composition.
Thus, if the semiconductor element is coated with the curable organopolysiloxane composition of the present invention having particularly high thermal shock resistance and excellent transparency, the resulting semiconductor device can be applied to various fields and useful. It will be something.
この場合、前記半導体素子が発光素子であることが好ましい。
本発明の硬化性オルガノポリシロキサン組成物は、特に熱衝撃に対して高い耐性を有しておりクラックが生じ難いものであるため、前述のように、過酷な温度サイクル下に供される発光素子を被覆する封止材料として、特に好適に用いることができる。
In this case, the semiconductor element is preferably a light emitting element.
The curable organopolysiloxane composition of the present invention has a particularly high resistance to thermal shock and is less prone to cracking. Therefore, as described above, a light emitting device that is subjected to a severe temperature cycle As a sealing material for covering the film, it can be particularly preferably used.
以上説明したように、本発明の硬化性オルガノポリシロキサン組成物は、硬化物の耐熱衝撃性が特に高く、透明性に優れる。よって、発光ダイオード素子その他の光学デバイス用又は光学部品用の材料として、更に電気・電子、OA機器、自動車、精密機器等の各種分野でのポッティング材料としても有用である。 As described above, the curable organopolysiloxane composition of the present invention has particularly high thermal shock resistance and excellent transparency. Therefore, it is also useful as a potting material in various fields such as electric / electronic, OA equipment, automobiles and precision equipment, as a material for light emitting diode elements and other optical devices or optical components.
以下、本発明につき更に詳しく説明する。
上述のように、従来用いられてきた半導体素子用の封止材料は、特にLEDへの通電・点灯の際に生じる熱衝撃によりクラックが発生しやすいという問題を有しており、過酷な温度サイクル下でもクラックや剥離が生じ難い封止材料が求められていた。
Hereinafter, the present invention will be described in more detail.
As described above, the conventionally used sealing materials for semiconductor elements have a problem that cracks are likely to occur due to thermal shock that occurs particularly during energization / lighting of the LED, and severe temperature cycling is required. There has been a demand for a sealing material that does not easily crack or peel off.
そこで本発明者らは、鋭意研究を行った結果、分岐単位含有量の異なる2種類の分岐構造を有するオルガノポリシロキサンを組み合わせることにより、上記課題を達成できることを見出し、硬化性オルガノポリシロキサン組成物を完成させるに至った。 Accordingly, the present inventors have conducted intensive research and found that the above-mentioned problems can be achieved by combining organopolysiloxanes having two types of branched structures having different branch unit contents, and a curable organopolysiloxane composition. It came to complete.
即ち、本発明の硬化性オルガノポリシロキサン組成物は、少なくとも、
(A―I):1分子中に少なくとも2個のケイ素原子結合アルケニル基を有し、下記一般式(1)
RSiO3/2 (1)
(式中、Rは置換又は非置換の一価炭化水素基である)
で表されるシロキサン単位を5〜70モル%含有する分岐構造を有するオルガノポリシロキサン、
(A−II):1分子中に少なくとも2個のケイ素原子結合アルケニル基を有し、上記一般式(1)で表されるシロキサン単位を少なくとも70モル%を超えて含有する分岐構造を有するオルガノポリシロキサン 重量単位で(A―I)/(A−II)=1/99〜99/1となる量、
(B):下記平均組成式(2)
R1 aHbSiO(4−a−b)/2 (2)
(式中、R1は脂肪族不飽和炭化水素基を除く置換又は非置換の一価炭化水素基、a、bは0.7≦a≦2.1、0.01≦b≦1.0、かつ0.8≦a+b≦2.9を満たす正数である)
で表され、1分子中に少なくとも2個のケイ素原子結合水素原子を有し、かつ25℃での粘度が1000mPas以下である直鎖状のオルガノハイドロジェンポリシロキサン
そのケイ素原子に結合した水素原子数が、(A−I)及び(A−II)成分中のケイ素原子結合アルケニル基の合計数1個あたり0.3〜10個となる量、
(C):付加反応触媒 触媒量
を含有することを特徴とする。
That is, the curable organopolysiloxane composition of the present invention has at least
(AI): having at least two silicon-bonded alkenyl groups in one molecule, the following general formula (1)
RSiO 3/2 (1)
(Wherein R is a substituted or unsubstituted monovalent hydrocarbon group)
An organopolysiloxane having a branched structure containing 5 to 70 mol% of a siloxane unit represented by:
(A-II): Organo having a branched structure having at least two silicon atom-bonded alkenyl groups in one molecule and containing at least 70 mol% of the siloxane unit represented by the general formula (1) Polysiloxane in an amount of (AI) / (A-II) = 1/99 to 99/1 by weight unit,
(B): The following average composition formula (2)
R 1 a H b SiO (4-ab) / 2 (2)
(Wherein R 1 is a substituted or unsubstituted monovalent hydrocarbon group excluding an aliphatic unsaturated hydrocarbon group, a and b are 0.7 ≦ a ≦ 2.1 and 0.01 ≦ b ≦ 1.0. And a positive number satisfying 0.8 ≦ a + b ≦ 2.9)
A linear organohydrogenpolysiloxane having at least two silicon-bonded hydrogen atoms in one molecule and having a viscosity at 25 ° C. of 1000 mPas or less, the number of hydrogen atoms bonded to the silicon atom Is an amount such that 0.3 to 10 per one total number of silicon-bonded alkenyl groups in the components (AI) and (A-II),
(C): Addition reaction catalyst A catalyst amount is contained.
以下、本発明の各成分につき、詳細に説明する。
尚、以下では(A−I)成分と(A−II)成分とを合わせて、単に(A)成分と呼ぶこともある。
<(A−I)成分>
(A−I)成分は1分子中に少なくとも2個のケイ素原子に結合したアルケニル基を有し、下記一般式(1)
RSiO3/2 (1)
で表されるシロキサン単位を5〜70モル%有する、好ましくは25℃において液状の分岐構造を有するオルガノポリシロキサンである。(A−I)成分は本発明組成物に、熱衝撃に対して高い耐性を有し過酷な温度サイクル下でもクラックが生じ難い特性を付与する成分である。そのためにこのRSiO3/2単位の含有量は5〜70モル%であり、より好ましくは20〜60モル%である。5モル%より少ないと硬化物の耐熱衝撃性が充分得られず、70モル%より多くなると25℃にて液状状態を良好に保つことが難しくなってしまう。
その他のシロキサン単位としては、R2SiO2/2単位、R3SiO1/2単位、SiO4/2単位が挙げられる(式中、Rは同一又は異種の置換又は非置換の一価炭化水素基である)。この場合、Rの一部が水酸基及び/又はアルコキシ基で置換されていてもよい。
これらの中で、R2SiO2/2単位及び/又はR3SiO1/2単位が好ましい。
Hereinafter, each component of the present invention will be described in detail.
Hereinafter, the (AI) component and the (A-II) component may be simply referred to as the (A) component.
<(AI) component>
The component (AI) has an alkenyl group bonded to at least two silicon atoms in one molecule, and has the following general formula (1)
RSiO 3/2 (1)
An organopolysiloxane having 5 to 70 mol% of siloxane units represented by the formula, preferably having a liquid branched structure at 25 ° C. The component (A-I) is a component that gives the composition of the present invention high resistance to thermal shock and is resistant to cracking even under severe temperature cycles. Therefore, the content of this RSiO 3/2 unit is 5 to 70 mol%, more preferably 20 to 60 mol%. If the amount is less than 5 mol%, sufficient thermal shock resistance of the cured product cannot be obtained, and if it exceeds 70 mol%, it becomes difficult to maintain a good liquid state at 25 ° C.
Other siloxane units include R 2 SiO 2/2 units, R 3 SiO 1/2 units, and SiO 4/2 units (wherein R is the same or different substituted or unsubstituted monovalent hydrocarbons). Group). In this case, a part of R may be substituted with a hydroxyl group and / or an alkoxy group.
Of these, R 2 SiO 2/2 units and / or R 3 SiO 1/2 units are preferred.
上記一般式(1)において、Rで示されるケイ素原子に結合した置換又は非置換の一価炭化水素基としては、通常、炭素数1〜20、特に好ましくは1〜10の非置換又は置換の一価炭化水素基であり、このような炭化水素基としては具体的には、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、シクロヘキシル基、ヘプチル基等のアルキル基;フェニル基、トリル基、キシリル基、ナフチル基等のアリール基;ベンジル基、フェネチル基等のアラルキル基;ビニル基、アリル基、ブテニル基、ペンテニル基、ヘキセニル基、ヘプテニル基等のアルケニル基等の不飽和炭化水素基;クロロメチル基、3−クロロプロピル基、3,3,3−トリフルオロプロピル基等のハロゲン化アルキル基等が挙げられる。 In the above general formula (1), the substituted or unsubstituted monovalent hydrocarbon group bonded to the silicon atom represented by R is usually an unsubstituted or substituted group having 1 to 20 carbon atoms, particularly preferably 1 to 10 carbon atoms. Specific examples of such hydrocarbon groups include monovalent hydrocarbon groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, cyclohexyl, and heptyl groups; phenyl Group, tolyl group, xylyl group, naphthyl group and other aryl groups; benzyl group, phenethyl group and other aralkyl groups; vinyl group, allyl group, butenyl group, pentenyl group, hexenyl group, heptenyl group and other alkenyl groups Hydrocarbon groups; halogenated alkyl groups such as chloromethyl group, 3-chloropropyl group, 3,3,3-trifluoropropyl group, and the like.
(A−I)成分1分子中には、ケイ素原子結合アルケニル基が少なくとも2つ含まれていることが必要であるが、更に、これら全Rのうち0.1〜20モル%、好ましくは0.5〜10モル%がアルケニル基であることが好ましい。アルケニル基の含有量が0.1〜20モル%であると、シリコーン樹脂としての好適な硬度が得られると共に耐クラック性がより優れたものとなる。
また、(A−I)成分のケイ素原子結合全有機基中にはケイ素原子結合アリール基を含有することが好ましく、より好ましくは5〜100モル%、特に好ましくは10〜100モル%である。アリール基としては、特にフェニル基であることが好ましい。
(A-I) Component 1 molecule must contain at least two silicon-bonded alkenyl groups. Further, 0.1 to 20 mol%, preferably 0 It is preferable that 5-10 mol% is an alkenyl group. When the content of the alkenyl group is 0.1 to 20 mol%, suitable hardness as a silicone resin can be obtained and crack resistance is further improved.
Further, it is preferable to contain silicon-bonded aryl groups in all silicon-bonded organic groups of (A-I) component, more preferably 5 to 100 mol%, particularly preferably 10 to 100 mol%. As the aryl group, a phenyl group is particularly preferable.
<(A−II)成分>
(A−II)成分は、1分子中に少なくとも2個のケイ素原子結合アルケニル基を有し、上記一般式(1)(RSiO3/2)で表されるシロキサン単位を少なくとも70モル%を超えて含有する、好ましくは25℃において固体状の分岐構造を有するオルガノポリシロキサンである。(A−II)成分は本発明組成物に強度を付与するものである。そのためにこのRSiO3/2単位は少なくとも70モル%を超える含有量が必要であり、好ましくは75モル%以上である。
その他のシロキサン単位としては、(A−I)成分同様、R2SiO2/2単位、R3SiO1/2単位、SiO4/2単位が挙げられる。また、式中Rは上記と同じである。
<(A-II) component>
The component (A-II) has at least two silicon-bonded alkenyl groups in one molecule and exceeds at least 70 mol% of the siloxane unit represented by the general formula (1) (RSiO 3/2 ). Preferably, it is an organopolysiloxane having a solid branched structure at 25 ° C. The component (A-II) imparts strength to the composition of the present invention. For this purpose, the RSiO 3/2 unit must have a content of at least 70 mol%, preferably 75 mol% or more.
Other siloxane units include R 2 SiO 2/2 units, R 3 SiO 1/2 units, and SiO 4/2 units as in the case of the component (AI). In the formula, R is the same as described above.
尚、(A−II)成分においても、(A−II)成分1分子中にケイ素原子結合アルケニル基が少なくとも2つ含まれていることが必要であるが、更に、全Rのうち1〜30モル%、好ましくは5〜20モル%がアルケニル基であることが好ましい。アルケニル基の含有量が1モル〜30モル%であると、特にシリコーン樹脂としての好適な硬度が得られると共に耐クラック性もより優れたものとなる。
また、(A−II)成分のケイ素原子結合全有機基中にはケイ素原子結合アリール基を含有することが好ましく、より好ましくは5〜100モル%、特に好ましくは10〜100モル%である。アリール基としては、特にフェニル基であることが好ましい。
これらの中で、R2SiO2/2単位及び/又はR3SiO1/2単位が好ましい。
In the component (A-II), it is necessary that at least two silicon atom-bonded alkenyl groups are contained in one molecule of the component (A-II). It is preferable that mol%, preferably 5 to 20 mol% is an alkenyl group. When the content of the alkenyl group is from 1 mol to 30 mol%, particularly suitable hardness as a silicone resin is obtained, and crack resistance is further improved.
Moreover, it is preferable to contain a silicon atom bond aryl group in the silicon atom bond all organic group of (A-II) component, More preferably, it is 5-100 mol%, Most preferably, it is 10-100 mol%. As the aryl group, a phenyl group is particularly preferable.
Of these, R 2 SiO 2/2 units and / or R 3 SiO 1/2 units are preferred.
(A−II)成分の配合量は(A−I)成分に対する本成分の含有量の比が重量単位で1/99〜99/1となる量であり、好ましくは10/90〜90/10となる量であり、特に好ましくは20/80〜80/20となる量である。これは(A−II)成分の含有量が上記範囲の下限未満であると、得られる硬化物の強度が低下する傾向にあるからである。一方、上記範囲の上限を超えると、得られる組成物の取り扱い作業性が低下したり、得られる硬化物が極めて硬いものとなる傾向があるからである。 The amount of component (A-II) is such that the ratio of the content of this component to component (AI) is 1/99 to 99/1 by weight, preferably 10/90 to 90/10. And is particularly preferably 20/80 to 80/20. This is because the strength of the resulting cured product tends to decrease when the content of the component (A-II) is less than the lower limit of the above range. On the other hand, when the upper limit of the above range is exceeded, the handling workability of the resulting composition tends to decrease, or the resulting cured product tends to be extremely hard.
尚、本発明において、上記一般式(1)で表されるシロキサン単位は、(A−I)成分に含有されるものと(A−II)成分に含有されるものとが、同一のものであっても、異なるものであっても良い。 In the present invention, the siloxane unit represented by the general formula (1) is the same as that contained in the component (AI) and that contained in the component (A-II). It may be different.
<(B)成分>
(B)成分のオルガノハイドロジェンポリシロキサンは、下記平均組成式(2)
R1 aHbSiO(4−a−b)/2 (2)
(式中、R1は脂肪族不飽和炭化水素基を除く置換又は非置換の一価炭化水素基、a、bは0.7≦a≦2.1、0.01≦b≦1.0、かつ0.8≦a+b≦2.9を満たす正数である)
で示される1分子中に少なくとも2個のケイ素原子結合水素原子を有し、かつ25℃での粘度が1000mPas以下、通常0.5〜1000mPas、好ましくは1〜500mPasである直鎖状のオルガノハイドロジェンポリシロキサンである。
<(B) component>
The organohydrogenpolysiloxane of component (B) has the following average composition formula (2)
R 1 a H b SiO (4-ab) / 2 (2)
(Wherein R 1 is a substituted or unsubstituted monovalent hydrocarbon group excluding an aliphatic unsaturated hydrocarbon group, a and b are 0.7 ≦ a ≦ 2.1 and 0.01 ≦ b ≦ 1.0. And a positive number satisfying 0.8 ≦ a + b ≦ 2.9)
A linear organohydro having at least two silicon-bonded hydrogen atoms in one molecule and having a viscosity at 25 ° C. of 1000 mPas or less, usually 0.5 to 1000 mPas, preferably 1 to 500 mPas. Genpolysiloxane.
ここで、R1は好ましくは炭素数1〜12、特に好ましくは炭素数1〜10程度の、脂肪族不飽和炭化水素基を除く置換又は非置換の一価炭化水素基であり、このような炭化水素基として具体的には、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、シクロヘキシル基、ヘプチル基等のアルキル基;フェニル基、トリル基、キシリル基、ナフチル基等のアリール基;ベンジル基、フェネチル基等のアラルキル基;クロロメチル基、3−クロロプロピル基、3,3,3−トリフルオロプロピル基等のハロゲン化アルキル基等が挙げられる。また、a、bは0.7≦a≦2.1、好ましくは1.0≦a≦2.0、0.01≦b≦1.0、好ましくは0.02≦b≦1.0、より好ましくは0.10≦b≦1.0かつ0.8≦a+b≦2.9、好ましくは1.01≦a+b≦2.8、より好ましくは1.6≦a+b≦2.7を満たす正数であり、bが0.01未満ではシリコーン樹脂として充分な硬度が得られなくなってしまう。 Here, R 1 is preferably a substituted or unsubstituted monovalent hydrocarbon group excluding an aliphatic unsaturated hydrocarbon group having 1 to 12 carbon atoms, particularly preferably about 1 to 10 carbon atoms. Specific examples of the hydrocarbon group include methyl groups, ethyl groups, propyl groups, butyl groups, pentyl groups, hexyl groups, cyclohexyl groups, heptyl groups and other alkyl groups; phenyl groups, tolyl groups, xylyl groups, naphthyl groups, and the like. Aryl groups; aralkyl groups such as benzyl group and phenethyl group; halogenated alkyl groups such as chloromethyl group, 3-chloropropyl group and 3,3,3-trifluoropropyl group. A and b are 0.7 ≦ a ≦ 2.1, preferably 1.0 ≦ a ≦ 2.0, 0.01 ≦ b ≦ 1.0, preferably 0.02 ≦ b ≦ 1.0, More preferably 0.10 ≦ b ≦ 1.0 and 0.8 ≦ a + b ≦ 2.9, preferably 1.01 ≦ a + b ≦ 2.8, more preferably 1.6 ≦ a + b ≦ 2.7. If b is less than 0.01, sufficient hardness as a silicone resin cannot be obtained.
このオルガノハイドロジェンポリシロキサンは、その分子構造は、特に制限されないが、直鎖状であることが好ましく、(A)成分との相溶性、硬化物の物性等の点から、ケイ素原子に結合したR1とH(水素原子)のうち5モル%以上、好ましくは10〜50モル%がフェニル基であるものが好適に用いられる。尚、R1においてフェニル基以外の場合は、メチル基であることが好ましい。
また(B)成分のオルガノハイドロジェンポリシロキサンの配合量は、そのケイ素原子に結合した水素原子数が、(A)成分中のケイ素原子に結合したアルケニル基の合計数1個あたり0.3〜10個になる割合で配合されていることが好ましい。0.3個未満では硬化が甘くなり、10個を越えると硬化物が脆くなりすぎるからである。好ましくは0.5〜5個である。
The molecular structure of the organohydrogenpolysiloxane is not particularly limited, but is preferably linear, and bonded to a silicon atom from the viewpoint of compatibility with the component (A) and physical properties of the cured product. Among R 1 and H (hydrogen atom), those in which 5 mol% or more, preferably 10 to 50 mol% are phenyl groups, are suitably used. In the case where R 1 is other than a phenyl group, a methyl group is preferable.
The blending amount of the organohydrogenpolysiloxane of component (B) is such that the number of hydrogen atoms bonded to silicon atoms is 0.3 to 1 per total number of alkenyl groups bonded to silicon atoms in component (A). It is preferable that 10 is mixed. If it is less than 0.3, the curing becomes sweet, and if it exceeds 10, the cured product becomes too brittle. Preferably it is 0.5-5.
<(C)成分>
(C)成分の付加反応触媒は、(A)成分と(B)成分との付加反応による架橋の触媒となるもので、その例としては、塩化白金酸、塩化白金酸と一価アルコールとの反応物、塩化白金酸のオレフィン錯体、塩化白金酸とビニルシロキサンの配位化合物、白金黒等の白金系触媒、更にパラジウム系触媒、ロジウム系触媒等が挙げられ、触媒効率の高さの面から通常白金触媒が使用される。また特に本用途においてエレクトロニクス分野である封止型LEDの作製に用いる場合には、金属を腐食させる恐れのない低塩素触媒が好ましく、中でも塩素成分を含有しないジビニルテトラメチルジシロキサン、ジビニルジフェニルジメチルジシロキサン等で変性されたものが好ましい。
これらの付加反応触媒は、一種単独で用いても二種以上を併用してもよい。
<(C) component>
The addition reaction catalyst for component (C) is a catalyst for crosslinking by addition reaction between component (A) and component (B). Examples thereof include chloroplatinic acid, chloroplatinic acid and monohydric alcohol. Examples include reactants, olefin complexes of chloroplatinic acid, coordination compounds of chloroplatinic acid and vinylsiloxane, platinum-based catalysts such as platinum black, palladium-based catalysts, rhodium-based catalysts, etc. Usually a platinum catalyst is used. In particular, a low chlorine catalyst that does not corrode metals is preferable when used in the production of a sealed LED in the electronics field in this application, and among them, divinyltetramethyldisiloxane and divinyldiphenyldimethyldisilane containing no chlorine component are preferable. Those modified with siloxane or the like are preferable.
These addition reaction catalysts may be used alone or in combination of two or more.
尚、この付加反応触媒の配合量は触媒として作用する有効量(触媒量)であり、好ましくは(A)成分と(B)成分の合計量に対して、1〜1000ppmである。1ppm以上であれば適度な速さで硬化が進み、1000ppm以下であれば作業可能な時間が短くなり過ぎることもなく、また硬化物が黄変し難いため経済的である。特に好ましくは5〜100ppmである。 The addition amount of the addition reaction catalyst is an effective amount (catalyst amount) that acts as a catalyst, and is preferably 1 to 1000 ppm with respect to the total amount of the components (A) and (B). If it is 1 ppm or more, curing proceeds at an appropriate speed, and if it is 1000 ppm or less, the workable time does not become too short, and the cured product is not easily yellowed, which is economical. Most preferably, it is 5-100 ppm.
<任意成分>
本発明の組成物において、上記の(A)〜(C)成分以外の任意の成分として、例えば、付加反応触媒に対して硬化抑制効果を持つ化合物とされている従来公知の制御剤化合物はすべて使用することができる。このような化合物としては、トリフェニルホスフィン等のリン含有化合物、トリブチルアミンやテトラメチルエチレンジアミン、ベンゾトリアゾール等の窒素含有化合物、硫黄含有化合物、アセチレン系化合物、アルケニル基を2個以上含む化合物、ハイドロパーオキシ化合物、マレイン酸誘導体等が例示される。制御剤化合物による硬化遅延効果の度合は、制御剤化合物の化学構造によって大きく異なるため、制御剤化合物の添加量は、使用する制御剤化合物の個々について最適な量に調整することが好ましく、一般的には、室温での長期貯蔵安定性が得られ、かつ硬化が阻害されない範囲程度の量、通常、(A−I)成分と(A−II)成分の合計100質量部に対して通常0.5質量部以下、好ましくは0.01〜0.3質量部の量で使用される。
<Optional component>
In the composition of the present invention, as the optional components other than the above components (A) to (C), for example, all conventionally known control agent compounds which are compounds having a curing inhibitory effect on the addition reaction catalyst are used. Can be used. Such compounds include phosphorus-containing compounds such as triphenylphosphine, nitrogen-containing compounds such as tributylamine, tetramethylethylenediamine, and benzotriazole, sulfur-containing compounds, acetylenic compounds, compounds containing two or more alkenyl groups, hydropar Examples include oxy compounds and maleic acid derivatives. Since the degree of cure retarding effect by the control agent compound varies greatly depending on the chemical structure of the control agent compound, it is preferable to adjust the addition amount of the control agent compound to an optimum amount for each of the control agent compounds used. Is an amount in such a range that long-term storage stability at room temperature can be obtained and curing is not hindered, and is usually 0.1 parts per 100 parts by mass in total of the components (A- I ) and (A- II ). It is used in an amount of 5 parts by mass or less, preferably 0.01 to 0.3 parts by mass.
また、本発明の組成物には、その接着性を向上させるための接着付与剤を含有してもよい。この接着付与剤としては、ケイ素原子に結合したアルコキシ基を1分子中に少なくとも1個有する有機ケイ素化合物であることが好ましい。このアルコキシ基としては、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基、メトキシエトキシ基が例示され、特にメトキシ基であることが好ましい。また、この有機ケイ素化合物のケイ素原子に結合するアルコキシ基以外の基としては、R基として例示したものと同じ、通常、炭素数1〜12、好ましくは炭素数1〜10程度の、非置換又はハロゲン置換の一価炭化水素基が挙げられるほか、γ−グリシドキシプロピル基、β−(3,4−エポキシシクロヘキシル)エチル基等のエポキシ官能性基置換アルキル基、水素原子等が挙げられ、好ましくは、メチル基、エチル基、プロピル基、フェニル基、ビニル基、水素原子、γ−グリシドキシプロピル基が挙げられる。 Moreover, you may contain the adhesion imparting agent for improving the adhesiveness in the composition of this invention. The adhesion-imparting agent is preferably an organosilicon compound having at least one alkoxy group bonded to a silicon atom in one molecule. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, and a methoxyethoxy group, and a methoxy group is particularly preferable. In addition, the group other than the alkoxy group bonded to the silicon atom of the organosilicon compound is the same as that exemplified as the R group, usually 1 to 12 carbon atoms, preferably about 1 to 10 carbon atoms, unsubstituted or In addition to halogen-substituted monovalent hydrocarbon groups, epoxy functional group-substituted alkyl groups such as γ-glycidoxypropyl group, β- (3,4-epoxycyclohexyl) ethyl group, hydrogen atoms, etc. Preferable examples include a methyl group, an ethyl group, a propyl group, a phenyl group, a vinyl group, a hydrogen atom, and a γ-glycidoxypropyl group.
また本発明は、上述した本発明の硬化性オルガノポリシロキサン組成物により被覆保護された半導体装置を提供する。
本発明の半導体装置の一例としては、図1に示すものが挙げられるが、これに限定されるものではない。ここで、図1において、1が筐体、2が発光素子、3、4がリード電極、5がダイボンド材、6が金線、7が封止樹脂(本発明の組成物)である。
このような本発明の半導体装置8は、装置の耐熱、耐湿、耐光性に優れ、装置が腐食することがないため、その結果、信頼性に優れる半導体装置を提供することが可能となり、産業上のメリットは多大である。
The present invention also provides a semiconductor device coated and protected with the above-described curable organopolysiloxane composition of the present invention.
An example of the semiconductor device of the present invention is shown in FIG. 1, but is not limited to this. Here, in FIG. 1, 1 is a housing | casing, 2 is a light emitting element, 3, 4 is a lead electrode, 5 is a die-bond material, 6 is a gold wire, 7 is sealing resin (composition of this invention).
Such a semiconductor device 8 of the present invention is excellent in heat resistance, moisture resistance and light resistance of the device, and the device does not corrode. As a result, it is possible to provide a semiconductor device having excellent reliability, and industrially. The benefits are great.
以下、実施例と比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例等に制限されるものではない。
[実施例1]
平均単位式:(PhSiO3/2)0.5[(CH2=CH)Me2SiO0.5]0.25(Me3SiO0.5)0.25で表される液状の分岐構造を有するオルガノポリシロキサン [25℃における粘度が3500mPas、ケイ素原子結合ビニル基の含有率=12.5モル%、ケイ素原子結合全有機基中のケイ素原子結合フェニル基の含有率=25モル%、標準スチレン換算の重量平均分子量=1200] 50質量部、(PhSiO3/2)0.8[(CH2=CH)Me2SiO0.5]0.2で表される固体状の分岐構造を有するオルガノポリシロキサン[ケイ素原子結合ビニル基の含有率=14.3モル%、ケイ素原子結合全有機基中のケイ素原子結合フェニル基の含有率=57モル%、標準スチレン換算の重量平均分子量=2350]50質量部、HMe2SiO(Ph2SiO)1SiMe2Hの構造を有し、粘度が4mPasであるオルガノハイドロジェンポリシロキサン30質量部、塩化白金酸/1,3−ジビニルテトラメチルジシロキサン錯体を白金原子含有量として1質量%含有するトルエン溶液0.06質量部、エチニルシクロヘキサノール0.05質量部、及びγ−グリシドキシプロピルトリメトキシシラン3質量部を均一混合して、シリコーン組成物(U)を調製した。このシリコーン組成物(U)を150℃で4時間加熱し硬化させたところ、硬さはShore Dで60であった。
EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example etc.
[Example 1]
Average unit formula: (PhSiO 3/2 ) 0.5 [(CH 2 ═CH) Me 2 SiO 0.5 ] 0.25 (Me 3 SiO 0.5 ) 0.25 Organopolysiloxane [Viscosity at 25 ° C. of 3500 mPas, silicon atom-bonded vinyl group content = 12.5 mol%, silicon atom-bonded phenyl group content in all silicon atom-bonded organic groups = 25 mol%, standard styrene Converted weight average molecular weight = 1200] 50 parts by mass, (PhSiO 3/2 ) 0.8 [(CH 2 ═CH) Me 2 SiO 0.5 ] 0.2 Organo having a solid branched structure Polysiloxane [content of silicon atom-bonded vinyl group = 14.3 mol%, content of silicon atom-bonded phenyl group in all silicon atom-bonded organic groups = 57 mol%, standard styrene conversion The weight average molecular weight of = 2350] 50 parts by weight, HMe 2 SiO (Ph 2 SiO ) has the structure of 1 SiMe 2 H, organohydrogenpolysiloxane 30 parts by weight a viscosity of 4MPas, chloroplatinic acid / 1,3 -Uniformity of 0.06 parts by mass of a toluene solution containing 1% by mass of a divinyltetramethyldisiloxane complex as a platinum atom content, 0.05 parts by mass of ethynylcyclohexanol, and 3 parts by mass of γ-glycidoxypropyltrimethoxysilane By mixing, a silicone composition (U) was prepared. When this silicone composition (U) was cured by heating at 150 ° C. for 4 hours, the hardness was 60 in Shore D.
[実施例2]
平均単位式:(PhSiO3/2)0.5[(CH2=CH)Me2SiO0.5]0.25(Me3SiO0.5)0.25で表される液状の分岐構造を有するオルガノポリシロキサン [25℃における粘度が3500mPas、ケイ素原子結合ビニル基の含有率=12.5モル%、ケイ素原子結合有機基中のケイ素原子結合フェニル基の含有量=25モル%、標準スチレン換算の重量平均分子量=1200]80質量部、(PhSiO3/2)0.75[(CH2=CH)Me2SiO0.5]0.25 で表される固体状の分岐構造を有するオルガノポリシロキサン [ケイ素原子結合ビニル基の含有率=17モル%、ケイ素原子結合全有機基中のケイ素原子結合フェニル基の含有率=50モル%、標準スチレン換算の重量平均分子量=1600]20質量部、ケイ素原子に結合した水素原子、フェニル基及びメチル基の合計に対してフェニル基を30モル%有する水素ガス発生量が140ml/gである粘度が20mPasのオルガノハイドロジェンポリシロキサン32質量部、塩化白金酸/1,3−ジビニルテトラメチルジシロキサン錯体を白金原子含有量として1質量%含有するトルエン溶液0.5質量部、エチニルシクロヘキサノール0.05質量部、及びγ−グリシドキシプロピルトリメトキシシラン3質量部を均一混合して、シリコーン組成物(V)を調製した。このシリコーン組成物(V)を150℃で4時間加熱し硬化させたところ、硬さはShore Dで65であった。
[Example 2]
Average unit formula: (PhSiO 3/2 ) 0.5 [(CH 2 ═CH) Me 2 SiO 0.5 ] 0.25 (Me 3 SiO 0.5 ) 0.25 Organopolysiloxane [Viscosity at 25 ° C. of 3500 mPas, content of silicon atom-bonded vinyl group = 12.5 mol%, content of silicon atom-bonded phenyl group in silicon atom-bonded organic group = 25 mol%, standard styrene conversion Weight average molecular weight = 1200] 80 parts by mass, (PhSiO 3/2 ) 0.75 [(CH 2 = CH) Me 2 SiO 0.5 ] 0.25 Organopoly having a solid branched structure Siloxane [Content of silicon atom-bonded vinyl group = 17 mol%, Content of silicon atom-bonded phenyl group in all silicon atom-bonded organic groups = 50 mol%, standard styrene conversion Weight average molecular weight = 1600] 20 parts by mass, organoatom having a viscosity of 20 mPas with a hydrogen gas generation rate of 140 ml / g having 30 mol% of phenyl groups based on the total of hydrogen atoms, phenyl groups and methyl groups bonded to silicon atoms 32 parts by mass of hydrogen polysiloxane, 0.5 parts by mass of a toluene solution containing 1% by mass of chloroplatinic acid / 1,3-divinyltetramethyldisiloxane complex as a platinum atom content, 0.05 parts by mass of ethynylcyclohexanol, And 3 parts by mass of γ-glycidoxypropyltrimethoxysilane were uniformly mixed to prepare a silicone composition (V). When the silicone composition (V) was cured by heating at 150 ° C. for 4 hours, the hardness was 65 in Shore D.
[実施例3]
平均単位式:(PhSiO3/2)0.17[(CH2=CH)Me2SiO0.5]0.5(Ph2SiO)0.33で表される液状の分岐構造を有するオルガノポリシロキサン [25℃における粘度が440mPas、ケイ素原子結合ビニル基の含有率=21.5モル%、ケイ素原子結合有機基中のケイ素原子結合フェニル基の含有量=35.6モル%、標準スチレン換算の重量平均分子量=1000]17質量部、(PhSiO3/2)0.75[(CH2=CH)Me2SiO0.5]0.25 で表される固体状の分岐構造を有するオルガノポリシロキサン [ケイ素原子結合ビニル基の含有率=17モル%、ケイ素原子結合前有機基中のケイ素原子結合フェニル基の含有率=50モル%、標準スチレン換算の重量平均分子量=1600]83質量部、HMe2SiO(Ph2SiO)1SiMe2Hの構造を有し、25℃における粘度が4mPasであるオルガノハイドロジェンポリシロキサン34.5質量部、塩化白金酸/1,3−ジビニルテトラメチルジシロキサン錯体を白金原子含有量として1質量%含有するトルエン溶液0.5質量部、エチニルシクロヘキサノール0.05質量部、及びγ−グリシドキシプロピルトリメトキシシラン3質量部を均一混合して、シリコーン組成物(W)を調製した。このシリコーン組成物(W)を150℃で4時間加熱し硬化させたところ、硬さはShore Dで46であった。
[Example 3]
Average unit formula: (PhSiO 3/2 ) 0.17 [(CH 2 ═CH) Me 2 SiO 0.5 ] 0.5 (Ph 2 SiO) Organopoly having a liquid branched structure represented by 0.33 Siloxane [Viscosity at 25 ° C. of 440 mPas, silicon atom-bonded vinyl group content = 21.5 mol%, silicon atom-bonded phenyl group content in silicon atom-bonded organic group = 35.6 mol%, in terms of standard styrene Weight average molecular weight = 1000] 17 parts by mass, (PhSiO 3/2 ) 0.75 [(CH 2 ═CH) Me 2 SiO 0.5 ] 0.25 Organopolysiloxane having a solid branched structure [Content of silicon atom-bonded vinyl group = 17 mol%, content of silicon atom-bonded phenyl group in organic group before silicon atom bonding = 50 mol%, weight in terms of standard styrene Average molecular weight = 1600] 83 parts by mass, 34.5 parts by mass of an organohydrogenpolysiloxane having a structure of HMe 2 SiO (Ph 2 SiO) 1 SiMe 2 H and a viscosity of 4 mPas at 25 ° C., chloroplatinic acid / 0.5 parts by mass of a toluene solution containing 1% by mass of a 1,3-divinyltetramethyldisiloxane complex as a platinum atom content, 0.05 parts by mass of ethynylcyclohexanol, and 3 parts by mass of γ-glycidoxypropyltrimethoxysilane Parts were uniformly mixed to prepare a silicone composition (W). When the silicone composition (W) was cured by heating at 150 ° C. for 4 hours, the hardness was 46 in Shore D.
[比較例1]
平均単位式:(PhSiO3/2)0.5[(CH2=CH)Me2SiO0.5]0.25(Me3SiO0.5)0.25で表される液状の分岐構造を有するオルガノポリシロキサン [粘度が3500mPas、ケイ素原子結合ビニル基の含有率=12.5モル%、ケイ素原子結合全有機基中のケイ素原子結合フェニル基の含有率=25モル%、標準スチレン換算の重量平均分子量=1200]に替わり、主鎖がジフェニルシロキサン単位のみからなり、粘度が0.4Pasの両末端メチルフェニルビニルシロキシ基封鎖ジフェニルシロキサン共重合体50質量部、HMe2SiO(Ph2SiO)1SiMe2Hの構造を有するオルガノハイドロジェンポリシロキサン29質量部を使用した以外は実施例1にしたがって組成物(X)を調製した。このシリコーン組成物(X)を150℃で4時間加熱し硬化させたところ、硬さはShore Dで56であった。
[Comparative Example 1]
Average unit formula: (PhSiO 3/2 ) 0.5 [(CH 2 ═CH) Me 2 SiO 0.5 ] 0.25 (Me 3 SiO 0.5 ) 0.25 Organopolysiloxane [viscosity 3500 mPas, silicon atom-bonded vinyl group content = 12.5 mol%, silicon atom-bonded phenyl group content in all silicon atom-bonded organic groups = 25 mol%, weight in terms of standard styrene In place of the average molecular weight = 1200], 50 parts by mass of a methylphenylvinylsiloxy group-blocked diphenylsiloxane copolymer having a main chain composed only of diphenylsiloxane units and a viscosity of 0.4 Pas, HMe 2 SiO (Ph 2 SiO) 1 Although except for using organohydrogenpolysiloxane 29 parts by weight having the
[比較例2]
平均単位式:(PhSiO3/2)0.5[(CH2=CH)Me2SiO0.5]0.25(Me3SiO0.5)0.25で表される液状の分岐構造を有するオルガノポリシロキサン [粘度が3500mPas、ケイ素原子結合ビニル基の含有率=12.5モル%、ケイ素原子結合全有機基中のケイ素原子結合フェニル基の含有率=25モル%、標準スチレン換算の重量平均分子量=1200]に替わり、主鎖がジフェニルシロキサン単位のみからなり、粘度が0.4Pasの両末端メチルフェニルビニルシロキシ基封鎖ジフェニルシロキサン共重合体80質量部、ケイ素原子に結合した水素原子、フェニル基及びメチル基の合計に対してフェニル基を30モル%有する水素ガス発生量が140ml/gである粘度が20mPasのオルガノハイドロジェンポリシロキサン31質量部を使用した以外は実施例2にしたがって組成物(Y)を調製した。このシリコーン組成物(Y)を150℃で4時間加熱し硬化させたところ、硬さはShore Dで60であった。
[Comparative Example 2]
Average unit formula: (PhSiO 3/2 ) 0.5 [(CH 2 ═CH) Me 2 SiO 0.5 ] 0.25 (Me 3 SiO 0.5 ) 0.25 Organopolysiloxane [viscosity 3500 mPas, silicon atom-bonded vinyl group content = 12.5 mol%, silicon atom-bonded phenyl group content in all silicon atom-bonded organic groups = 25 mol%, weight in terms of standard styrene Instead of the average molecular weight = 1200], the main chain is composed only of diphenylsiloxane units, and the viscosity is 0.4 Pas. Both ends of the methylphenylvinylsiloxy group-blocked diphenylsiloxane copolymer are 80 parts by mass, hydrogen atoms bonded to silicon atoms, phenyl The hydrogen gas generation amount having a phenyl group of 30 mol% with respect to the total of the group and methyl group is 140 ml / g, the viscosity is 20 m Except for using the organohydrogenpolysiloxane 31 parts by weight of as the composition of (Y) was prepared according to Example 2. When the silicone composition (Y) was cured by heating at 150 ° C. for 4 hours, the hardness was 60 in Shore D.
[比較例3]
平均単位式:(PhSiO3/2)0.17[(CH2=CH)Me2SiO0.5]0.5(Ph2SiO)0.33で表される液状の分岐構造を有するオルガノポリシロキサン [粘度が440mPas、ケイ素原子結合ビニル基の含有率=21.5モル%、ケイ素原子結合有機基中のケイ素原子結合フェニル基の含有量=35.6モル%、標準スチレン換算の重量平均分子量=1000]の代わりに主鎖がジフェニルシロキサン単位のみからなり、粘度が0.4Pasの両末端メチルフェニルビニルシロキシ基封鎖ジフェニルシロキサン共重合体26質量部、(PhSiO3/2)0.75[(CH2=CH)Me2SiO0.5]0.25 で表される固体状の分岐構造を有するオルガノポリシロキサン [ケイ素原子結合ビニル基の含有率=17モル%、ケイ素原子結合前有機基中のケイ素原子結合フェニル基の含有率=50モル%、標準スチレン換算の重量平均分子量=1600]74質量部、HMe2SiO(Ph2SiO)1SiMe2Hの構造を有し、25℃における粘度が4mPasであるオルガノハイドロジェンポリシロキサン31.6質量部を使用した以外は実施例3に従って組成物(Z)を調製した。このシリコーン組成物(Z)を150℃で4時間加熱し硬化させたところ、硬さはShore Dで40であった。
[Comparative Example 3]
Average unit formula: (PhSiO 3/2 ) 0.17 [(CH 2 ═CH) Me 2 SiO 0.5 ] 0.5 (Ph 2 SiO) Organopoly having a liquid branched structure represented by 0.33 Siloxane [viscosity: 440 mPas, silicon atom-bonded vinyl group content = 21.5 mol%, silicon atom-bonded phenyl group content in silicon atom-bonded organic group = 35.6 mol%, weight average molecular weight in terms of standard styrene = 1000], 26 parts by mass of a methylphenylvinylsiloxy group-blocked diphenylsiloxane copolymer having a main chain consisting only of diphenylsiloxane units and a viscosity of 0.4 Pas, (PhSiO 3/2 ) 0.75 [( CH 2 = CH) Me 2 SiO 0.5 ] Organopolysiloxane having a solid branched structure represented by 0.25 [silicon atom Bonded vinyl group content = 17 mol%, silicon atom bonded phenyl group content in organic group before silicon atom bonding = 50 mol%, weight average molecular weight in terms of standard styrene = 1600] 74 parts by mass, HMe 2 SiO ( A composition (Z) was prepared according to Example 3 except that 31.6 parts by mass of an organohydrogenpolysiloxane having a structure of (Ph 2 SiO) 1 SiMe 2 H and having a viscosity at 25 ° C. of 4 mPas was used. When this silicone composition (Z) was cured by heating at 150 ° C. for 4 hours, the hardness was 40 in Shore D.
上記実施例及び比較例で調製したシリコーン組成物(U)〜(Z)における評価方法を、下記の要領にて行った。
[評価方法]
発光半導体パッケージ
発光素子として、InGaNからなる発光層を有し、主発光ピークが470nmのLEDチップを搭載した、図1に示すような発光半導体装置8を使用した。封止樹脂7の硬化条件は150℃、4時間である。
The evaluation methods in the silicone compositions (U) to (Z) prepared in the above Examples and Comparative Examples were performed as follows.
[Evaluation method]
As the light emitting semiconductor package light emitting element, a light emitting semiconductor device 8 as shown in FIG. 1 having a light emitting layer made of InGaN and mounting an LED chip having a main light emission peak of 470 nm was used. The curing conditions for the sealing
耐湿及び赤外線リフローの試験方法
作製した発光半導体装置各10個を、85℃、85%の恒温恒湿室に24時間入れた後、赤外線リフロー装置(260℃)を3回通し、外観の変化を観察した。結果を表1に示す。尚、樹脂のクラックやLEDパッケージからの剥離が確認されたものをNGとしてカウントした。
Humidity resistance and infrared reflow test method 10 light emitting semiconductor devices each were placed in a constant temperature and humidity chamber at 85 ° C and 85% for 24 hours, and then passed through an infrared reflow device (260 ° C) three times to change the appearance. Observed. The results are shown in Table 1. In addition, the thing by which the crack of resin and the peeling from an LED package were confirmed was counted as NG.
表1に示されるように、実施例1〜3は、NG数がいずれも0であり、高温/低温の温度サイクル条件下でもクラック耐性が良好で、剥離も発生せず光取り出し効率が高いことがわかる。また、このようなシリコーン樹脂は、透明性にも優れたものであった。
一方、比較例1〜3は、半数以上に樹脂のクラックやLEDパッケージからの剥離が発生してしまった。これにより、封止材料として従来のものを用いた場合、LEDの生産性が悪くなってしまうことがわかる。
As shown in Table 1, in Examples 1 to 3, the NG number is 0, the crack resistance is good even under high temperature / low temperature cycle conditions, no peeling occurs, and the light extraction efficiency is high. I understand. Moreover, such a silicone resin was also excellent in transparency.
On the other hand, in Comparative Examples 1 to 3, cracks of the resin and peeling from the LED package occurred in more than half. Thereby, when a conventional thing is used as a sealing material, it turns out that productivity of LED will worsen.
以上のことから、本発明の硬化性オルガノポリシロキサン組成物であれば、特に熱衝撃に対して高い耐性を有するため、クラックが生じ難いうえ、高透明性を有しているため、光学デバイス用又は光学部品用の材料や各種分野でのポッティング材料として、特には過酷な温度サイクル下に供される発光素子用封止材料として有用なものであることが実証された。 From the above, the curable organopolysiloxane composition of the present invention has a particularly high resistance to thermal shock, so that it is difficult to generate cracks and has high transparency. In addition, it has been proved useful as a material for optical components and a potting material in various fields, particularly as a sealing material for light-emitting elements that are subjected to severe temperature cycles.
尚、本発明は、上記実施形態に限定されるものではない。上記実施形態は、例示であり、本発明の特許請求の範囲に記載された技術的思想と実質的に同一な構成を有し、同様な作用効果を奏するものは、いかなるものであっても本発明の技術的範囲に包含される。 The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.
1…筐体、 2…発光素子、 3、4…リード電極、 5…ダイボンド材、
6…金線、 7…封止樹脂、 8…半導体装置(発光半導体装置)。
DESCRIPTION OF SYMBOLS 1 ... Housing | casing 2 ...
6 ... gold wire, 7 ... sealing resin, 8 ... semiconductor device (light emitting semiconductor device).
Claims (4)
RSiO3/2 (1)
(式中、Rは置換又は非置換の一価炭化水素基である)
で表されるシロキサン単位を5〜70モル%含有する分岐構造を有し、25℃において液状であるオルガノポリシロキサン、
(A−II):1分子中に少なくとも2個のケイ素原子結合アルケニル基を有し、上記一般式(1)で表されるシロキサン単位を少なくとも70モル%を超えて含有する分岐構造を有し、25℃において固体状であるオルガノポリシロキサン 重量単位で(A―I)/(A−II)=17/83〜80/20となる量、
(B):下記平均組成式(2)
R1 aHbSiO(4−a−b)/2 (2)
(式中、R1は脂肪族不飽和炭化水素基を除く置換又は非置換の一価炭化水素基、a、bは0.7≦a≦2.1、0.01≦b≦1.0、かつ0.8≦a+b≦2.9を満たす正数である)
で表され、1分子中に少なくとも2個のケイ素原子結合水素原子を有し、かつ25℃での粘度が1000mPas以下である直鎖状のオルガノハイドロジェンポリシロキサン
そのケイ素原子に結合した水素原子数が、(A−I)及び(A−II)成分中のケイ素原子結合アルケニル基の合計数1個あたり0.3〜10個となる量、
(C):付加反応触媒 触媒量
を含有することを特徴とする硬化性オルガノポリシロキサン組成物。 (AI): having at least two silicon-bonded alkenyl groups in one molecule, the following general formula (1)
RSiO 3/2 (1)
(Wherein R is a substituted or unsubstituted monovalent hydrocarbon group)
In the siloxane units represented have a branched structure containing 5-70 mole%, the organopolysiloxane that is liquid at 25 ° C.,
(A-II): has at least two silicon-bonded alkenyl groups per molecule, have a branched structure containing more than at least 70 mol% of siloxane units represented by the above general formula (1) An organopolysiloxane that is solid at 25 ° C. in an amount of (AI) / (A-II) = 17 / 83-80 / 20 by weight unit,
(B): The following average composition formula (2)
R 1 a H b SiO (4-ab) / 2 (2)
(Wherein R 1 is a substituted or unsubstituted monovalent hydrocarbon group excluding an aliphatic unsaturated hydrocarbon group, a and b are 0.7 ≦ a ≦ 2.1 and 0.01 ≦ b ≦ 1.0. And a positive number satisfying 0.8 ≦ a + b ≦ 2.9)
A linear organohydrogenpolysiloxane having at least two silicon-bonded hydrogen atoms in one molecule and having a viscosity at 25 ° C. of 1000 mPas or less, the number of hydrogen atoms bonded to the silicon atom Is an amount such that 0.3 to 10 per one total number of silicon-bonded alkenyl groups in the components (AI) and (A-II),
(C): addition reaction catalyst A curable organopolysiloxane composition containing a catalytic amount.
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