KR102379013B1 - Liquid treatment module, apparatus and method for treating a substrate with the same - Google Patents

Abstract

The present invention provides a liquid processing module, and a substrate processing apparatus and method including the same. A first transport member that maintains the substrate horizontally and transports it in a first direction according to an embodiment of the present invention, and a oscillation that is located downstream of the first transport member and oscillates the substrate about an axis parallel to the first direction and a liquid treatment module including a transfer unit including a second transfer member transferred to the unit, and a first liquid supply member installed on the first transfer member and supplying a first liquid to a substrate.

Description

Liquid treatment module, substrate processing apparatus and method including the same

The present invention relates to a liquid processing module for processing a substrate, and a substrate processing apparatus and method including the same.

A liquid crystal display device (LCD), a plasma display panel (PDP) device, etc. are recently used in the manufacture of an image display device, and a substrate of a flat panel display device (FPD) is used.

In the process of manufacturing a flat panel display device, many processes such as a substrate manufacturing process, a cell manufacturing process, and a module manufacturing process are performed. In particular, in the substrate manufacturing process, a photo process for forming various patterns on the substrate is performed. In the photolithography process, a coating process of applying a photoresist such as photoresist on a substrate, an exposure process of forming a specific pattern on the applied photoresist film, and a developing process of developing an area corresponding to the exposed photoresist film are sequentially performed. Among them, a bake process of heat-treating the substrate is performed before and after each of the coating process and the developing process are performed.

In particular, during the process, a process of supplying a developing solution to the substrate for developing treatment is performed. In general, in the developing process, a developer is supplied to the upper portion of the substrate while the substrate is being transported. The developing process proceeds while the supplied developer is conveyed while being maintained on the top of the substrate. However, the pattern density of the substrate is changed due to the photoresist accumulated in the developer during the development process. The difference in the pattern density of the substrate causes the concentration difference of the supplied developer. This concentration imbalance has a problem in that the developing power and the developing speed are changed in the developing process.

An object of the present invention is to provide a liquid processing module for improving efficiency in a substrate processing process, and a substrate processing apparatus and method including the same.

Another object of the present invention is to provide a liquid processing module for preventing generation of a concentration difference of a liquid according to a pattern density of a substrate, and a substrate processing apparatus and method including the same.

The present invention provides a liquid treatment module for performing a liquid treatment process on a substrate.

According to an embodiment of the present invention, the liquid treatment module includes a first transport member that maintains the substrate horizontally and transports the substrate in a first direction, and is located downstream of the first transport member and moves the substrate parallel to the first direction. a conveying unit including a second conveying member conveying to the rocking unit which is oscillated about an axis; A first liquid supply member that is installed on the first carrying member and supplies the first liquid to the substrate may be included.

According to an embodiment, the liquid processing module may further include a second liquid supply member positioned downstream of the first liquid supply member and configured to supply a second liquid to the substrate.

According to an embodiment, the first liquid supply member includes a first nozzle for discharging the first liquid in a dropping method, and the second liquid supply member includes a second nozzle for discharging the second liquid by a spray method. may include

According to an embodiment, the second liquid supply member may include a nozzle driver that swings the second nozzle in a longitudinal direction thereof as an axis.

According to an embodiment, the first nozzle is provided along a second direction perpendicular to the first direction when its longitudinal direction is viewed from above, and the second nozzle has a longitudinal direction along the first direction. can be provided.

According to an embodiment, the first nozzle may include a front nozzle for supplying the first liquid to the substrate; A rear nozzle positioned downstream of the front nozzle and configured to supply the first liquid to the substrate may be included.

According to an embodiment, the front nozzle may be provided to be inclined downward in a direction away from the rear nozzle as it goes down, and the rear nozzle may be provided perpendicular to the first conveying member.

According to an embodiment, the discharge port of the front nozzle may be disposed at a lower position than the discharge port of the rear nozzle.

According to an embodiment, the second carrying member may include a plurality of shafts arranged in the first direction; a first frame supporting one end of the plurality of shafts; a second frame supporting the other ends of the plurality of shafts; a first guide roller in contact with one side of the substrate conveyed by the second conveying member; And it may include a second guide roller in contact with the other side of the substrate conveyed by the second conveying member.

According to an embodiment, the first guide roller may be fixed to the first frame and the second guide roller may be fixed to the second frame.

According to an embodiment, the rocking unit may include a driver for moving the first frame up and down.

According to an embodiment, the liquid processing module further includes a controller for controlling the driver, wherein the controller supplies the second liquid to the substrate so that the height of the first frame increases while the second frame is fixed. The driver may be controlled to repeat a state higher and lower than that of the second frame.

According to an embodiment, the controller may control the second inclination member to maintain the inclination of the substrate between 2 degrees and 8 degrees.

According to an embodiment, the transport unit may further include a third transport member positioned between the first transport member and the second transport member to transport the substrate.

According to an embodiment, the first liquid and the second liquid may be provided as the same liquid.

According to an embodiment, the first solution and the second solution may be provided as a developer.

The present invention provides an apparatus for processing a substrate.

According to an embodiment of the present invention, the substrate processing apparatus includes an index module through which a substrate is introduced or discharged; a coating module adjacent to one side of the index module, performing coating and baking processes on the substrate; a developing module that performs a developing process on a substrate and is adjacent to one side of the index module; an interface module that transports a substrate to the application module and the liquid processing module and is adjacent to the application module and the developing module; and an exposure module adjacent to one side of the interface module to perform an exposure process on the substrate, wherein the developing module maintains the substrate horizontally and transports the substrate in a first direction, and a first transport member downstream of the first transport member a conveying unit including a second conveying member positioned in the and configured to convey the substrate to the swinging unit for swinging the substrate based on an axis parallel to the first direction; A first liquid supply member that is installed on the first carrying member and supplies the first liquid to the substrate may be included.

According to an embodiment, the developing module may further include a second liquid supply member positioned downstream of the first liquid supply member and configured to supply a second liquid to the substrate.

According to an embodiment, the first liquid supply member includes a first nozzle for discharging the first liquid in a dropping method, and the second liquid supply member includes a second nozzle for discharging the second liquid by a spray method. may include

According to an embodiment, the second liquid supply member may include a nozzle driver that swings the second nozzle in a longitudinal direction thereof as an axis.

According to an embodiment, the first nozzle may include a front nozzle for supplying the first liquid to the substrate; A rear nozzle positioned downstream of the front nozzle and configured to supply the first liquid to the substrate may be included.

According to an embodiment, the second carrying member may include a plurality of shafts arranged in the first direction; a first frame supporting one end of the plurality of shafts; a second frame supporting the other ends of the plurality of shafts; a first guide roller in contact with one side of the substrate conveyed by the second conveying member; And it may include a second guide roller in contact with the other side of the substrate conveyed by the second conveying member.

According to an embodiment, the first guide roller may be fixed to the first frame and the second guide roller may be fixed to the second frame.

According to an embodiment, the rocking unit may include a driver for moving the first frame up and down.

According to an embodiment, the first solution and the second solution may be provided as a developer.

The present invention provides a method of processing a substrate.

According to an embodiment of the present invention, the substrate processing method includes a liquid supply step of supplying a first liquid to the substrate while maintaining the substrate in parallel; After the supplying of the liquid, a shaking step of rocking the substrate may be included.

In an embodiment, the liquid supply step and the shaking step may be performed while conveying the substrate in the first direction, and the position of the substrate in the shaking step may be downstream from the position of the substrate in the liquid supply step.

According to an embodiment, in the shaking step, the substrate may be rocked based on an axis parallel to the first direction.

According to an embodiment, the second liquid may be supplied in the shaking step.

According to an embodiment, the first liquid may be supplied by a drip method and the second liquid may be supplied by a spray method.

According to an embodiment, the second liquid may be supplied while swinging the second liquid supply member for supplying the second liquid in a longitudinal direction thereof.

According to an embodiment, the first liquid and the second liquid may be provided as the same liquid.

According to an embodiment, the first solution and the second solution may be provided as a developer.

1 is a view schematically showing a substrate processing apparatus according to an embodiment of the present invention.
FIG. 2 is a cross-sectional view illustrating the liquid treatment module of FIG. 1 .
3 to 5 are plan views illustrating the liquid treatment module of FIG. 2 .
6 is a perspective view schematically illustrating the liquid treatment module of FIG. 2 .
7 is a cross-sectional view illustrating a state in which a side surface and a lower portion of a substrate are supported by an inclined member.
8 to 10 are views sequentially illustrating a substrate processing method according to an embodiment of the present invention.
FIG. 11 is a view illustrating a state in which a first liquid is supplied to an upper surface of a substrate by the first liquid supply member of FIG. 2 .

Hereinafter, an embodiment of the present invention will be described in more detail with reference to the accompanying drawings. Embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed as being limited to the following embodiments. This embodiment is provided to more completely explain the present invention to those of ordinary skill in the art. Accordingly, the shapes of elements in the drawings are exaggerated to emphasize a clearer description.

1 is a view schematically showing a substrate processing apparatus according to an embodiment of the present invention. Referring to this, the substrate processing apparatus 1 includes an index module 10 , an application module 20 , an interface module 30 , an edge exposure apparatus 40 , a liquid processing module 50 , and an exposure module 60 . do.

In the index module 10 , the substrate W flows in or out. The index module 10 is disposed along the second direction 14 in its longitudinal direction. Here, the second direction 14 is a direction in which the index module 10 is disposed. When viewed from the top, a direction perpendicular to the second direction 14 is referred to as a first direction 12 . A direction perpendicular to both the first direction 12 and the second direction 14 is referred to as a third direction 16 .

As an example, the index module 10 may flow in or out the substrate W through a transport roll for transporting the substrate W or a separate transport robot.

The application module 20 performs an application process and the like on the substrate W. The application module 20 is provided adjacent to one side of the index module 10 . The application module 20 is disposed along the first direction 12 in its longitudinal direction. The application module 20 includes a cleaning unit 21 , a drying unit 22 , an application unit 23 , and a baking unit 24 . In the application module 20 , a cleaning process, a drying process, a coating process, and a baking process are sequentially performed. The cleaning unit 21 cleans the substrate W before the application process of the substrate W is performed. The cleaning unit 21 supplies a cleaning liquid to the substrate W to perform the process. For example, the cleaning unit 21 may supply a cleaning liquid from a cleaning liquid supplying means provided on the upper portion of the substrate W. For example, the washing liquid may be supplied as pure water.

The drying unit 22 dries the cleaning solution remaining on the substrate W after the cleaning process has been completed. For example, the drying unit 22 supplies air from an upper portion of the substrate W to perform a drying process. The device for supplying air may be provided as an air knife.

The application unit 23 performs the application process on the substrate (W). The substrate W after the coating process is transferred to the baking unit 24 . The bake unit 24 performs a bake process on the substrate W. For example, in the baking process, the substrate W may be heated by a heating means installed under the substrate W. As shown in FIG.

The substrate W on which the process is completed in the application module 20 moves to the interface module 30 . The interface module 30 transfers the substrate W to the application module 20 , the liquid processing module 50 , and the exposure module 60 . The interface module 30 is disposed adjacent to the application module 20 and the liquid treatment module 50 . The interface module 30 is disposed parallel to the index module 10 . The interface module 30 is disposed along the second direction 14 in its longitudinal direction. When transferring the substrate W from the interface module 30 , the substrate W may be transferred using a transfer robot.

The edge exposure apparatus 40 performs an edge exposure process of irradiating light to an edge region of the substrate W with respect to the substrate W. The edge exposure apparatus 40 is disposed between the interface module 30 and the liquid processing module 50 . Alternatively, the edge exposure apparatus 40 may be disposed on the application module 20 and the interface module 30 .

In the exposure module 60 , an exposure process is performed on the substrate W . The exposure module 60 is disposed adjacent to one side of the interface module 30 .

The liquid treatment module 50 may be provided as a developing module that performs a developing process on the substrate W. The index module 10 is disposed adjacent to one side of the liquid treatment module 50 . The liquid treatment module 50 is parallel to the application module 20 and its longitudinal direction is disposed along the first direction 12 .

The liquid treatment module 50 includes a liquid treatment unit 51 , a rinse unit 52 , a drying unit 53 , and an inspector 54 . In the liquid treatment module 50 , after the liquid treatment process in the liquid treatment unit 51 , the rinse unit 52 and the drying unit 53 perform a cleaning process and a drying process, and then, an inspection is performed by the inspector 54 . For example, the liquid treatment process may be a developing process. Hereinafter, the liquid treatment process will be described by taking the developing process as an example.

3 to 5 are plan views showing the liquid treatment module of FIG. 2 , FIG. 6 is a perspective view schematically showing the liquid treatment module of FIG. It is a cross section.

2 to 7 , the liquid processing unit 51 includes a chamber 150 , a transfer unit 101 , a liquid supply unit 200 , and a controller 400 .

The chamber 150 provides a space for processing the substrate (W). The chamber 150 may be provided in a rectangular parallelepiped shape. The chamber 150 has openings 151 and 153 formed on both sides thereof. The openings 151 and 153 are provided as passages through which the substrate W enters and exits. Two partition walls 155 and 157 are provided inside the chamber 150 . The partition walls 155 and 157 form openings at the same height as the openings 151 and 153 . The partition walls 155 and 157 separate the chamber 150 into three spaces.

The transfer unit 101 supports the substrate W from the lower side. The transfer unit 101 transfers the substrate W in the first direction 12 . The conveying unit 101 includes a first conveying member 100 , a second conveying member 300 , and a third conveying member 500 .

The first transport member 100 supports the substrate W from the lower side. The first transport member 100 transports the substrate W in the first direction 12 . The first conveying member 100 includes a conveying shaft 110 , a conveying roller 120 , and a rotation driving unit 130 .

Each of the transport shafts 110 is disposed in the second direction 14 of the substrate W in a longitudinal direction thereof, and the transport shafts 110 are disposed in parallel with each other in the first direction 12 . Both ends of the transport shafts 110 are rotatably supported by a bearing member (not shown). A plurality of conveying rollers 120 in contact with the substrate W are coupled to each conveying shaft 110 . The conveying rollers 120 are positioned to be spaced apart from each other in the longitudinal direction of the conveying shaft 110 of the substrate W. The conveying rollers 120 are fitted to the outer peripheral surface of the conveying shaft 110 . Each conveying roller 120 has a ring shape and rotates together with the conveying shaft 110 .

The rotation driving unit 130 is coupled to the conveying shaft 110 . The rotation driving unit 130 includes a plurality of pulleys 131 , a driving motor 132 , and a plurality of belts 133 . The pulley 131 is coupled to one side of the conveying shaft 110 , and a pulley 131 adjacent to the driving motor 132 among the plurality of pulleys 131 is connected to the driving motor 132 . The driving motor 132 generates a rotational force to provide the rotational force to the connected pulley 131 . The pulley 131 connected to the drive motor 132 provides rotational force to the connected conveying shaft 110 to rotate the conveying shaft 110 .

Two pulleys 131 adjacent to each other among the plurality of pulleys 131 are connected to each other by a belt 133 . The belts 133 connect the plurality of pulleys 131 to each other to transmit the rotational force provided from the pulley 131 connected to the driving motor 132 to the adjacent pulley 131 . Accordingly, the plurality of pulleys 131 rotate, and the plurality of conveying shafts 110 rotate by the rotational force of the plurality of pulleys 131 . In addition, the plurality of pulleys 131 and the plurality of belts 133 are also installed on the other side of the conveying shafts 110 .

The third conveying member 500 is located downstream of the first conveying member 100 . The third conveying member 500 is positioned between the first conveying member 100 and the second conveying member 300 . The third conveying member 500 is provided substantially the same as the first conveying member 100 . The third conveying member 500 includes a conveying shaft 510 , a conveying roller 520 , and a rotation driving unit 530 . The conveying shaft 510 , the conveying roller 520 , and the rotation driving unit 530 of the third conveying member 500 include the conveying shaft 110 , the conveying roller 120 and the rotation driving unit 130 of the first conveying member 100 . ) is provided in the same way as

The liquid supply unit 200 supplies a liquid to the substrate W. The liquid supply unit 200 is located above the transfer unit 101 . The liquid supply unit 200 includes a first liquid supply member 210 and a second liquid supply member 230 .

The first liquid supply member 210 supplies the first liquid to the substrate W. The first liquid supply member 210 is positioned above the conveying unit 100 . The lengthwise direction of the first liquid supply member 210 is provided along the second direction 14 . A plurality of first liquid supply members 210 are provided. Each of the first liquid supply members 210 is spaced apart from each other in the first direction 12 . Each of the first liquid supply members 210 supplies the first liquid to the substrate (W). For example, the first solution may be provided as a developer.

The first liquid supply member 210 includes a first nozzle 210a. The first nozzle 210a is provided along the second direction 14 . The first nozzle 210a discharges the first liquid in a dropwise manner and supplies it to the substrate W.

The first nozzle 210a includes a front nozzle 211 and a rear nozzle 212 . The front nozzle 211 is located above the first conveying member 100 . The longitudinal direction of the front nozzle 211 is provided along the second direction 14 . The front nozzle 211 supplies the first liquid to the substrate W. The front nozzle 211 is provided to be inclined in an upstream direction of the first direction 12 . The front nozzle 211 is provided to be inclined downward in a direction toward the rear nozzle 212 as it goes down. The front nozzle 211 discharges and supplies the first liquid to the upper portion of the substrate W at an inclined angle.

The rear nozzle 212 is located above the first conveying member 100 . The rear nozzle 212 is spaced apart from the front nozzle 211 in the first direction 12 . The rear nozzle 212 is located downstream of the front nozzle 211 . The rear nozzle 212 supplies the first liquid to the substrate W. The rear nozzle 212 is provided vertically of the first conveying member 100 . The rear nozzle 212 vertically discharges and supplies the first liquid to the upper portion of the substrate W.

The distance between the front nozzle 211 and the substrate W is provided to be lower than the distance between the rear nozzle 212 and the substrate W. The end of the rear nozzle 212 is provided farther to the first conveying member 100 than the end of the front nozzle 211 . The discharge port of the front nozzle 211 is disposed at a lower position than the discharge port of the rear nozzle 212 .

The second liquid supply member 230 supplies the second liquid to the substrate W. The second liquid supply member 230 is positioned above the conveying unit 100 . The second liquid supply member 230 is positioned downstream of the first liquid supply member 210 . The lengthwise direction of the second liquid supply member 230 is provided along the first direction 12 . A plurality of second liquid supply members 230 are provided. Each of the second liquid supply members 230 is provided to be spaced apart from each other in the second direction 14 .

The second liquid supply member 230 includes a second nozzle 231 , a nozzle support 233 , and a nozzle driver 235 .

A plurality of second nozzles 231 are provided. The plurality of second nozzles 231 are provided to be spaced apart from each other in the first direction 12 . Each of the second nozzles 231 is supplied to the substrate (W) by discharging the second liquid in a spray method. For example, the second solution may be provided as a developer. The second liquid may be provided as the same liquid as the first liquid. The first solution and the second solution may be provided as the same developer.

A plurality of second nozzles 231 are fixedly coupled to the nozzle support 233 . The plurality of second nozzles 231 are fixedly coupled to the lower surface of the nozzle support 233 . The nozzle support 233 is provided in its longitudinal direction along the first direction 12 .

The nozzle driver 235 may swing the second nozzle 231 . The nozzle driver 235 is connected to the nozzle support 233 . The nozzle driver 235 may swing the nozzle support 233 left and right.

The second conveying member 300 supports the substrate W from the lower side and inclines the substrate W. The second conveying member 300 inclines the substrate W up and down in a direction parallel to the first direction. The second conveying member 300 inclines the substrate W when the second liquid is supplied. The second conveying member 300 is located downstream of the third conveying member 500 .

The second conveying member 300 includes shafts 321 and 322 , a first frame 320 , a second frame 330 , a first guide roller 311 , a second guide roller 312 , and a driver 350 . .

The shafts 321 and 322 include a first shaft 321 and a second shaft 322 . The first shaft 321 and the second shaft 322 support the substrate W from the lower side. The first shaft 321 and the second shaft 322 are provided substantially the same as the conveying shaft 110 . The first shaft 321 and the second shaft 322 are provided with conveying rollers. The first shaft 321 is located upstream of the second shaft 322 . The first shaft 321 and the second shaft 322 are provided in parallel. The first shaft 321 and the second shaft 322 are provided to be spaced apart from each other in the first direction 12 . A plurality of shafts are provided between the first shaft 321 and the second shaft 322 . The plurality of shafts are provided substantially the same as the first shaft 321 .

The first frame 320 supports one end of the plurality of shafts. The first frame 320 is positioned on one side of the first shaft 321 and the second shaft 322 . The first frame 320 is provided perpendicular to the first shaft 321 and the second shaft 323 . The first frame 320 is provided in its longitudinal direction along the first direction 12 .

The second frame 330 supports the other ends of the plurality of shafts. It is positioned on the other side of the first shaft 321 and the second shaft 322 . The second frame 330 is provided perpendicular to the first shaft 321 and the second shaft 322 . The second frame 330 is provided in its longitudinal direction along the first direction 12 . A first shaft 321 , a second shaft 322 , and a plurality of shafts are provided between the first frame 320 and the second frame 330 . The second frame 330 is provided to face the first frame 320 . The first frame 320 and the second frame 330 are provided to be spaced apart along the second direction 14 .

The first guide roller 311 is in contact with one side of the substrate W conveyed by the second conveying member 300 . The first guide roller 311 is fixed to the first frame 320 . The first guide roller 311 is provided between the first shaft 321 and the second shaft 322 . A plurality of first guide rollers 311 are provided. The first guide rollers 311 are spaced apart from each other in the first direction 12 .

The second guide roller 312 is in contact with the other side of the substrate W conveyed by the second conveying member 300 . The second guide roller 312 is fixed to the second frame 330 . The second guide roller 312 is provided between the first shaft 321 and the second shaft 322 . A plurality of second guide rollers 312 are provided. The second guide rollers 312 are spaced apart from each other in the first direction 12 . The first guide roller 311 and the second guide roller 312 are positioned to face each other. The first guide roller 311 and the second guide roller 312 are spaced apart from each other in the second direction 14 .

The swinging unit 350 swings the substrate W based on an axis parallel to the first direction 12 . The rocking unit 350 is located downstream of the first conveying member 100 . The rocking unit 350 includes a driver 351 .

The driver 351 moves the first frame 320 up and down. The driver 351 is connected to the first frame 320 . Alternatively, the driver 351 may be connected to the second frame 330 . It may optionally be connected to the first frame 320 and the second frame 330 .

The controller 400 controls the second conveying member 300 and the second liquid supplying member 230 . When the second liquid is supplied to the second liquid supply member 230 , the controller 400 controls the nozzle driver 235 to swing the second nozzle 231 . When the second liquid is supplied to the substrate W, the controller 400 controls the driver 350 to change the heights of the first frame 320 and the second frame 330 . For example, the driver 350 is controlled to incline the first frame 320 and the second frame 330 upward. On the contrary, the driver 350 is controlled so that the first frame 320 and the second frame 330 are inclined downward. The controller 400 repeats a state in which the height of the first frame 320 is higher than that of the second frame 330 and a state lower than that of the second frame 330 while the second frame 330 is fixed when the second liquid is supplied to the substrate W. The driver 351 is controlled to make

The controller 400 controls the driver 351 of the second transport member 300 to maintain the inclination angle of the substrate W at 2 degrees to 8 degrees when the substrate W is inclined upwardly or downwardly.

Hereinafter, a substrate processing method using the substrate processing apparatus will be described. 8 to 10 are views sequentially illustrating a substrate processing method according to an embodiment of the present invention. 8 to 10 , the substrate processing method includes a liquid supply step and a rocking step.

The liquid supply step is a step of processing the substrate W by supplying the first liquid to the substrate W. The substrate W is transferred in the first direction 12 by the first transfer member 100 . The substrate W moves to the first position. The first liquid supply member 210 is positioned above the first position. The substrate W is supplied with the first liquid while maintaining a parallel state. The first liquid is supplied by dropping from the first nozzle 210a.

The shaking step is a step of processing the substrate W by supplying the second liquid to the substrate W. In the rocking step, the substrate W is rocked based on an axis parallel to the first direction 12 . The substrate W is transferred in the first direction 12 by the transfer unit 101 . After the liquid supply step, the substrate W is transferred to the second position under the second liquid supply member 230 . When the substrate W comes to the process position, the transfer unit 100 stops the transfer of the substrate W. After that, the first guide roller 311 and the second guide roller 312 are in contact with one side and the other side of the substrate (W). The second nozzle 231 supplies the second liquid by a spray method. When the second liquid is supplied, the second liquid supply member 230 is swing-moved by using the nozzle driver 235 . The controller 400 controls the nozzle driver 235 to supply the second liquid to the upper surface of the substrate W while swinging the nozzle support 233 left and right. At the same time, the controller 400 controls the second transfer member 300 to incline the substrate W.

The controller 400 controls the driver 350 to sequentially incline the substrate W upward or downward. For example, the controller 400 may fix the height of one end of the second conveying member and increase the height of the other end. Alternatively, the controller 400 may fix the height of one end of the second conveying member and lower the height of the other end.

The second liquid may be uniformly supplied to the upper surface of the substrate W by sequentially inclining the substrate W upward or downward and simultaneously supplying the second liquid from the upper portion in a spray manner. also. Since the second liquid can be uniformly supplied to the upper portions of the substrate W having different pattern densities, the difference in concentration of the second liquid can be minimized.

The above detailed description is illustrative of the present invention. In addition, the above description shows and describes preferred embodiments of the present invention, and the present invention can be used in various other combinations, modifications, and environments. That is, changes or modifications are possible within the scope of the concept of the invention disclosed herein, the scope equivalent to the written disclosure, and/or within the scope of skill or knowledge in the art. The written embodiment describes the best state for implementing the technical idea of the present invention, and various changes required in the specific application field and use of the present invention are possible. Therefore, the detailed description of the present invention is not intended to limit the present invention to the disclosed embodiments. Also, the appended claims should be construed as including other embodiments.

50: liquid treatment module 101: conveying unit
100: first conveying member 200: liquid supply unit
210: first liquid supply member 230: second liquid supply member
300: second conveying member 310: guide roller
400: controller 500: third conveying member

Claims (33)

A liquid treatment module for performing a liquid treatment process on a substrate, the liquid treatment module comprising:
a conveying unit including a first conveying member and a second conveying member;
a first liquid supply member installed on the first transfer member and supplying a first liquid to the substrate;
a second liquid supply member positioned downstream of the first liquid supply member and configured to supply a second liquid to the substrate;
The first conveying member maintains the substrate horizontally and conveys it in a first direction,
The second conveying member is rocked by the rocking unit, and is located downstream of the first conveying member to convey the substrate in the first direction;
The second liquid supply member,
a nozzle support provided on an upper portion of the second conveying member independently of the second conveying member, the longitudinal direction of which is provided along the first direction when viewed from above;
a second nozzle fixedly coupled to a lower surface of the nozzle support and having a longitudinal direction provided along the first direction when viewed from above;
Including a nozzle driver connected to the nozzle support,
The oscillation unit is
swinging the second conveying member about an axis parallel to the first direction,
The nozzle driver,
A liquid treatment module for swinging the nozzle support left and right with its longitudinal direction as an axis independently of the swinging unit. delete According to claim 1,
The first liquid supply member includes a first nozzle for discharging the first liquid in a dropping manner;
The second nozzle is a liquid treatment module for discharging the second liquid in a spray manner. delete 4. The method of claim 3,
The first nozzle is provided in a second direction perpendicular to the first direction when the longitudinal direction thereof is viewed from above. 4. The method of claim 3,
The first nozzle is
a front nozzle for supplying the first liquid to the substrate;
and a rear nozzle positioned downstream of the front nozzle and configured to supply the first liquid to a substrate. 7. The method of claim 6,
The front nozzle is provided to be inclined downward in a direction closer to the rear nozzle as it goes down,
The rear nozzle is a liquid treatment module provided vertically to the first conveying member. 8. The method of claim 7,
The discharge port of the front nozzle is disposed at a lower position than the discharge port of the rear nozzle. According to claim 1,
The second conveying member,
a plurality of shafts arranged along the first direction;
a first frame supporting one end of the plurality of shafts;
a second frame supporting the other ends of the plurality of shafts;
a first guide roller in contact with one side of the substrate conveyed by the second conveying member; And
and a second guide roller contacting the other side of the substrate conveyed by the second conveying member. 10. The method of claim 9,
The first guide roller is fixed to the first frame,
The second guide roller is a liquid treatment module fixed to the second frame. 10. The method of claim 9,
The rocking unit includes a driver for moving the first frame up and down. 12. The method of claim 11,
The liquid treatment module further comprises a controller for controlling the actuator,
The controller controls the driver to repeat a state in which the height of the first frame is higher and lower than that of the second frame while the second frame is fixed when the second liquid is supplied to the substrate. module. 13. The method of claim 12,
The controller is a liquid processing module for controlling the second conveying member to maintain the inclination of the substrate between 2 degrees to 8 degrees. 14. The method of any one of claims 1, 3, and 5-13,
The transfer unit is positioned between the first transfer member and the second transfer member and further includes a third transfer member for transferring the substrate. 14. The method of any one of claims 1, 3, and 5-13,
A liquid treatment module in which the first liquid and the second liquid are provided as the same liquid. 16. The method of claim 15,
The first solution and the second solution are provided as a developer solution. An apparatus for processing a substrate, comprising:
an index module through which the substrate flows in or out;
a coating module adjacent to one side of the index module and performing coating and baking processes on the substrate;
a developing module that performs a developing process on the substrate and is adjacent to one side of the index module;
an interface module for transferring a substrate to the application module and the developing module and adjacent to the application module and the developing module; And
performing an exposure process on the substrate and comprising an exposure module adjacent to one side of the interface module,
The developing module is
a conveying unit including a first conveying member and a second conveying member;
a first liquid supply member installed on the first transfer member and supplying a first liquid to the substrate;
a second liquid supply member positioned downstream of the first liquid supply member and configured to supply a second liquid to the substrate;
The first conveying member maintains the substrate horizontally and conveys it in a first direction,
The second conveying member is rocked by the rocking unit, and is located downstream of the first conveying member to convey the substrate in the first direction;
The second liquid supply member,
a nozzle support provided on an upper portion of the second conveying member independently of the second conveying member, the longitudinal direction of which is provided along the first direction when viewed from above;
a second nozzle fixedly coupled to a lower surface of the nozzle support and having a longitudinal direction provided along the first direction when viewed from above;
Including a nozzle driver connected to the nozzle support,
The oscillation unit is
swinging the second conveying member about an axis parallel to the first direction,
The nozzle driver,
A substrate processing apparatus for swinging the nozzle support left and right with a longitudinal direction as an axis independently of the swing unit. delete 18. The method of claim 17,
The first liquid supply member includes a first nozzle for discharging the first liquid in a dropping manner;
The second nozzle is a substrate processing apparatus for discharging the second liquid in a spray method. delete 20. The method of claim 19,
The first nozzle is
a front nozzle for supplying the first liquid to the substrate;
and a rear nozzle positioned downstream of the front nozzle and configured to supply the first liquid to the substrate. 18. The method of claim 17,
The second conveying member,
a plurality of shafts arranged along the first direction;
a first frame supporting one end of the plurality of shafts;
a second frame supporting the other ends of the plurality of shafts;
a first guide roller in contact with one side of the substrate conveyed by the second conveying member; And
and a second guide roller in contact with the other surface of the substrate conveyed by the second conveying member. 23. The method of claim 22,
The first guide roller is fixed to the first frame,
and the second guide roller is fixed to the second frame. 23. The method of claim 22,
The oscillation unit includes a driver for moving the first frame up and down. 25. The method of any one of claims 17, 19, and 21-24,
The first solution and the second solution are provided as a developer. A method for processing a substrate, comprising:
a liquid supply step of supplying a first liquid to the substrate; and
A rocking step of rocking the substrate after the liquid supply step; including,
In the liquid supply step,
supplying the first liquid to the substrate while the substrate is moved by a first transport member that maintains the substrate horizontally and moves it in a first direction,
In the oscillation step,
Supplying a second liquid to the substrate while moving the substrate to be rocked in the first direction by a second conveying member for swinging the substrate based on an axis parallel to the first direction,
A second liquid supply member for supplying the second liquid,
A substrate processing method for supplying the second liquid to the substrate while swinging independently of the fluctuation of the substrate. 27. The method of claim 26,
The substrate processing method in which the position of the substrate in the swinging step is downstream of the position of the substrate in the liquid supplying step. delete delete 27. The method of claim 26,
The first liquid is supplied in a dropwise manner, and the second liquid is supplied in a spray manner. delete 31. The method of claim 30,
The substrate processing method in which the first liquid and the second liquid are provided as the same liquid. 33. The method of claim 32,
The substrate processing method wherein the first solution and the second solution are provided as a developer.

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