KR102329391B1 - 광경화성 수지 조성물, 이 조성물로 형성되는 경화 피막 및 피막을 갖는 기재와, 경화 피막 및 피막을 갖는 기재의 제조방법 - Google Patents
광경화성 수지 조성물, 이 조성물로 형성되는 경화 피막 및 피막을 갖는 기재와, 경화 피막 및 피막을 갖는 기재의 제조방법 Download PDFInfo
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- KR102329391B1 KR102329391B1 KR1020170084058A KR20170084058A KR102329391B1 KR 102329391 B1 KR102329391 B1 KR 102329391B1 KR 1020170084058 A KR1020170084058 A KR 1020170084058A KR 20170084058 A KR20170084058 A KR 20170084058A KR 102329391 B1 KR102329391 B1 KR 102329391B1
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- South Korea
- Prior art keywords
- photocurable resin
- resin composition
- meth
- acrylate
- cured film
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 77
- 239000002245 particle Substances 0.000 claims abstract description 75
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- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 15
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- 230000005764 inhibitory process Effects 0.000 description 1
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- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 1
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- 229940116351 sebacate Drugs 0.000 description 1
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- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
- C08F290/147—Polyurethanes; Polyureas
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08F2/00—Processes of polymerisation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/74—Polyisocyanates or polyisothiocyanates cyclic
- C08G18/76—Polyisocyanates or polyisothiocyanates cyclic aromatic
- C08G18/7657—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings
- C08G18/7664—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups
- C08G18/7671—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups containing only one alkylene bisphenyl group
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- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
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- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
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- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
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- C—CHEMISTRY; METALLURGY
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Abstract
Description
Claims (17)
- 지방족 우레탄 (메타)아크릴레이트(A)와,
(메타)아크릴레이트 모노머(B)와,
구상 실리카 입자(C)와,
자외선 흡수제(D)와,
광중합성 불포화 기를 갖는 불소계 화합물(E)과,
광중합 개시제(F)를 함유하고,
상기 구상 실리카 입자(C)는, 체적 기준의 입도 분포에 있어서 누적 10% 및 누적 90%의 입경을 각각 D10 및 D90으로 했을 때, D90/D10이 2.0이하인 광경화성 수지 조성물.
- 제 1항에 있어서,
상기 구상 실리카 입자(C)의 평균 입자 직경이 1㎛ 이상 10㎛ 이하인 광경화성 수지 조성물.
- 제 1항 또는 제 2항에 있어서,
광경화성 수지 조성물의 고형분 100질량부에 대하여, 상기 구상 실리카 입자(C)를 0.5질량부 이상 15질량부 이하의 범위에서 함유하는 광경화성 수지 조성물.
- 제 1항 또는 제 2항에 있어서,
상기 지방족 우레탄 (메타)아크릴레이트(A)가 지환식 골격을 갖는 광경화성 수지 조성물.
- 제 4항에 있어서,
상기 지방족 우레탄 (메타)아크릴레이트(A)는, 이소시아네이트 화합물(a1)과 수산기를 갖는 (메타)아크릴레이트 모노머(a2)를 중합시켜 이루어지고, 상기 이소시아네이트 화합물(a1)이 지환식 골격에, 이소시아네이트 기를 갖는 반응성 기가 적어도 2개 결합되고, 상기 반응성 기가 동일한 화학구조를 갖는 지환식 이소시아네이트인 광경화성 수지 조성물.
- 제 5항에 있어서,
상기 이소시아네이트 화합물(a1)이 수소 첨가 디페닐메탄 디이소시아네이트인 광경화성 수지 조성물. - 제 1항 또는 제 2항에 있어서,
상기 지방족 우레탄 (메타)아크릴레이트(A)의 중량 평균 분자량이 800 이상 30,000 이하인 광경화성 수지 조성물.
- 제 1항 또는 제 2항에 있어서,
상기 (메타)아크릴레이트 모노머(B)가 1분자 중에 3개 이상의 광중합성 불포화 기를 갖는 광경화성 수지 조성물.
- 제 1항 또는 제 2항에 있어서,
상기 지방족 우레탄 (메타)아크릴레이트(A)에 대한 상기 (메타)아크릴레이트 모노머(B)의 배합 비율이 0.5 이상 10 이하인 광경화성 수지 조성물.
- 제 1항 또는 제 2항에 있어서,
상기 자외선 흡수제(D)가 트리아진 골격을 갖는 자외선 흡수제(d1) 및 벤조트리아졸 골격을 갖는 자외선 흡수제(d2)의 적어도 1개를 함유하는 광경화성 수지 조성물. - 제 10항에 있어서,
상기 벤조트리아졸 골격을 갖는 자외선 흡수제(d2)가 광중합성 불포화 기를 갖는 광경화성 수지 조성물.
- 제 1항 또는 제 2항에 있어서,
상기 불소계 화합물(E)이 퍼플루오로 폴리에테르 골격을 갖는 광경화성 수지 조성물.
- 청구항 1 또는 2에 기재된 광경화성 수지 조성물로 형성되는 경화 피막.
- 기재와 상기 기재 위에 설치되는 청구항 13에 기재된 경화 피막을 구비한 피막을 갖는 기재.
- 청구항 1 또는 2에 기재된 광경화성 수지 조성물을 광조사에 의해 경화시키는 경화 공정을 갖는 경화 피막의 제조방법.
- 청구항 1 또는 2에 기재된 광경화성 수지 조성물을 기재의 적어도 한쪽의 주면에 도포하는 도포 공정과,
상기 도포 공정 후, 광조사에 의해 상기 광경화성 수지 조성물을 경화시켜서 경화 피막을 형성하는 경화 공정을 갖는, 피막을 갖는 기재의 제조방법. - 삭제
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US12012509B2 (en) * | 2018-05-30 | 2024-06-18 | Threebond Co., Ltd. | Photocurable composition and cured material thereof |
JP6811215B2 (ja) * | 2018-08-08 | 2021-01-13 | パーカーアサヒ株式会社 | アクリルゾル組成物 |
CN113423749B (zh) * | 2019-02-06 | 2024-10-29 | 日产化学株式会社 | 防眩性硬涂用固化性组合物 |
KR102584186B1 (ko) * | 2019-02-06 | 2023-10-05 | 닛산 가가쿠 가부시키가이샤 | 내광성 하드코트용 경화성 조성물 |
JP7420595B2 (ja) * | 2020-03-03 | 2024-01-23 | アイカ工業株式会社 | 光硬化性塗料組成物 |
CN115135727B (zh) * | 2020-04-28 | 2023-07-18 | 东曹硅化工株式会社 | 能量射线固化型涂料消光用疏水性硅胶 |
JP7530979B2 (ja) * | 2020-07-30 | 2024-08-08 | 中国塗料株式会社 | 光硬化性樹脂組成物、硬化被膜、および硬化被膜付き成形品 |
JP7530259B2 (ja) | 2020-09-29 | 2024-08-07 | アイカ工業株式会社 | 光硬化性トップコート樹脂組成物 |
JP7428668B2 (ja) * | 2021-01-20 | 2024-02-06 | 株式会社豊田自動織機 | 樹脂ガラス用コーティング剤および樹脂ガラス |
US12116490B2 (en) * | 2021-04-08 | 2024-10-15 | Sun Chemical Corporation | Low migration EB curable inks with bio-renewable content |
CN114591639B (zh) * | 2022-03-10 | 2023-04-18 | 宁波惠之星新材料科技股份有限公司 | 用于制备uv阻隔膜的原料组合物、涂液、uv阻隔膜及光学膜组件 |
WO2024070996A1 (ja) | 2022-09-30 | 2024-04-04 | 大日本印刷株式会社 | 光学フィルム、並びに、前記光学フィルムを用いた偏光板、表面板、画像表示パネル及び画像表示装置、並びに、前記光学フィルムの製造方法、並びに、光学フィルムの選定方法、並びに、指紋拭き取り性の評価方法 |
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CN118033794A (zh) * | 2022-09-30 | 2024-05-14 | 大日本印刷株式会社 | 光学膜及使用所述光学膜的偏光板、表面板、图像显示面板和图像显示装置、所述光学膜的制造方法及选定方法、指纹擦拭性的评价方法 |
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