KR101584413B1 - 표면 처리 금속 및 이를 위한 금속재의 표면 처리 방법 - Google Patents
표면 처리 금속 및 이를 위한 금속재의 표면 처리 방법 Download PDFInfo
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- KR101584413B1 KR101584413B1 KR1020130164047A KR20130164047A KR101584413B1 KR 101584413 B1 KR101584413 B1 KR 101584413B1 KR 1020130164047 A KR1020130164047 A KR 1020130164047A KR 20130164047 A KR20130164047 A KR 20130164047A KR 101584413 B1 KR101584413 B1 KR 101584413B1
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- 238000000034 method Methods 0.000 title claims abstract description 38
- 239000007769 metal material Substances 0.000 title abstract description 56
- 238000004381 surface treatment Methods 0.000 title abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 124
- 239000002184 metal Substances 0.000 claims abstract description 124
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims abstract description 101
- 239000011777 magnesium Substances 0.000 claims description 62
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 58
- 229910052749 magnesium Inorganic materials 0.000 claims description 58
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 30
- 239000011159 matrix material Substances 0.000 claims description 30
- 238000007654 immersion Methods 0.000 claims description 13
- 229910052804 chromium Inorganic materials 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- 238000004140 cleaning Methods 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 8
- 238000007598 dipping method Methods 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 238000005238 degreasing Methods 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 238000007737 ion beam deposition Methods 0.000 claims description 2
- 238000007733 ion plating Methods 0.000 claims description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Substances [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 238000001771 vacuum deposition Methods 0.000 claims description 2
- 150000004679 hydroxides Chemical class 0.000 claims 1
- 239000003086 colorant Substances 0.000 abstract description 10
- 238000002845 discoloration Methods 0.000 abstract description 10
- 239000010410 layer Substances 0.000 description 90
- 239000000243 solution Substances 0.000 description 44
- 239000011651 chromium Substances 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 8
- 238000004040 coloring Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000004627 transmission electron microscopy Methods 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000001000 micrograph Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- SJCKRGFTWFGHGZ-UHFFFAOYSA-N magnesium silver Chemical compound [Mg].[Ag] SJCKRGFTWFGHGZ-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
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- C23C22/60—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using alkaline aqueous solutions with pH greater than 8
- C23C22/62—Treatment of iron or alloys based thereon
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Abstract
Description
도 2는 본 발명에 따른 금속재 매트릭스 양면에 표면 처리된 금속재의 구조를 도시한 이미지이다;
도 3은 하나의 실시예에서, 표면 처리된 마그네슘을 촬영한 이미지이다: 이때, A는 금속층 형성 전의 마그네슘 시편이고, B는 금속층 및 클리어층의 형성 후의 마그네슘 시편이다;
도 4는 하나의 실시예에서, 금속층을 포함하지 않은 마그네슘을 촬영한 이미지이다: 이때, A는 수산화 용액 침지 후의 마그네슘 시편이고, B는 수산화 피막 상에 클리어층을 형성한 마그네슘 시편이다;
도 5는 하나의 실시예에서, 마그네슘의 수산화 용액 침지시간에 따른 표면 처리되는 마그네슘의 색상변화를 나타낸 이미지다;
도 6은 하나의 실시예에서, 표면 처리되는 시간에 따른 마그네슘 표면에 형성되는 발색 피막의 두께 및 표면의 형태를 나타낸 이미지이다: 이때, A는 발색 피막의 두께를 투과전자현미경을 이용하여 측정한 이미지이고, B는 표면의 형태를 주사전자현미경을 이용하여 촬영한 이미지이다;
도 7은 본 발명에 따른 금속재의 표면 처리 방법을 도시한 공정도이다;
도 8은 하나의 실시예에서, 크롬(Cr)층을 포함하는 표면 처리된 금속의 구조를 투과전자현미경 촬영한 이미지이다: 이때, D1은 크롬(Cr)층 두께로서, 그 값은 약 10 nm이다;
도 9는 하나의 실시예에서, 알루미늄(Al)층을 포함하는 표면 처리된 금속의 구조를 투과전자현미경 촬영한 이미지이다: 이때, D2는 알루미늄(Al)층 두께로서, 그 값은 약 13 nm이다.
임의의 점 | L* | a* | b* | ΔL* | Δa* | Δb* | ΔE* |
실시예 2-A | 61.15 | -12.20 | 5.24 | - | - | - | - |
실시예 2-B | 61.01 | -12.18 | 5.64 | 0.14 | 0.02 | 0.40 | 0.424264 |
실시예 2-C | 60.80 | -12.52 | 5.58 | 0.34 | 0.32 | 0.34 | 0.577581 |
Claims (14)
- 금속재 매트릭스;
금속재 매트릭스의 일면 혹은 양면에 형성된 수산화 피막;
수산화 피막을 기준으로 금속재 매트릭스의 반대쪽 일면에 형성된 금속층; 및
금속층을 기준으로 외측에 형성된 클리어층을 포함하고,
상기 금속층은 Al, Cr, Ti 및 Au로 이루어진 군으로부터 선택되는 1종 이상의 금속을 포함하는 표면 처리 금속.
- 삭제
- 제 1 항에 있어서,
금속층의 두께는 10 nm 내지 50 nm의 조건을 만족하는 표면 처리 금속.
- 제 1 항에 있어서,
가로 1cm 및 세로 1cm의 금속재 시편에 대하여,
시편 상에 존재하는 임의의 3점에 대한 색좌표 편차(ΔL, Δa, Δb)는 ΔL는 0.5 이하, Δa는 0.7 이하 및 Δb는 0.6 이하 중 하나 이상의 조건을 만족하는 표면 처리 금속.
- 제 1 항에 있어서,
수산화 피막의 두께는 50 nm 내지 2 μm인 조건을 만족하는 표면 처리 금속.
- 제 1 항에 있어서,
금속재 매트릭스는 스테인레스강, 티탄(Ti) 및 마그네슘(Mg)으로 이루어진 군으로부터 선택되는 1종 이상인 표면 처리 금속.
- 금속재 매트릭스 표면에 수산화 피막을 형성하는 단계;
수산화 피막 상에 금속층을 형성하는 단계; 및
금속층 상에 클리어층을 형성하는 단계를 포함하고,
상기 금속층은 Al, Cr, Ti 및 Au으로 이루어진 군으로부터 선택되는 1종 이상 금속을 포함하는 금속재의 표면 처리 방법.
- 제 7 항에 있어서,
금속재 매트릭스 표면에 수산화 피막을 형성하는 단계에 있어서,
수산화 피막은 금속재 매트릭스를 수산화 용액에 침지하여 형성하는 금속재의 표면 처리 방법.
- 제 8 항에 있어서,
수산화 용액은 NaOH, KOH, Mg(OH)2, Ca(OH)2 및 Ba(OH)2로 이루어진 군으로부터 선택되는 1종 이상을 포함하는 금속재의 표면 처리 방법.
- 제 8 항에 있어서,
수산화 용액의 농도는 1% 내지 40%이고,
상기 농도 단위 %는 수산화 용액에 용해된 수산화물의 중량 백분율을 나타내는 금속재의 표면 처리 방법.
- 제 8 항에 있어서,
금속재 매트릭스 표면에 수산화 피막을 형성하는 단계는,
금속재 매트릭스를 M1 농도의 수산화 용액에서 침지하는 제1 침지 단계; 및
금속재 매트릭스를 Mn 농도의 수산화 용액에서 침지하는 제n 침지 단계를 포함하며,
제1 및 제n 침지단계에서, 수산화 용액의 농도는 각각 독립적으로 하기 수학식 1 및 2를 만족하고, n은 2 이상 6 이하의 정수인 금속재의 표면 처리 방법:
[수학식 1]
8≤M1≤25
[수학식 2]
Mn-1-Mn>3
수학식 1 및 2에서,
M1 및 Mn은 각 단계별 수산화 용액의 농도를 의미하며,
단위는 수산화 용액에 용해된 수산화물의 중량 백분율을 나타내는 %이다.
- 제 7 항에 있어서,
수산화 피막 상에 금속층을 형성하는 단계에서,
금속층은 진공증착법, 스퍼터링, 이온도금 및 이온 빔 증착으로 이루어진 군으로부터 선택되는 어느 하나의 방법으로 형성하는 금속재의 표면 처리 방법.
- 삭제
- 제 7 항에 있어서,
금속재 매트릭스 표면에 수산화 피막을 형성하는 단계 이전에,
알칼리 세정액을 이용하여 전해 탈지하는 단계; 및
금속재 매트릭스 표면에 수산화 피막을 형성하는 단계 이후에, 린싱하는 단계 중 어느 하나 이상의 단계를 더 포함하는 금속재의 표면 처리 방법.
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