KR101525803B1 - 액정표시장치의 제조방법 - Google Patents
액정표시장치의 제조방법 Download PDFInfo
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- KR101525803B1 KR101525803B1 KR1020080132430A KR20080132430A KR101525803B1 KR 101525803 B1 KR101525803 B1 KR 101525803B1 KR 1020080132430 A KR1020080132430 A KR 1020080132430A KR 20080132430 A KR20080132430 A KR 20080132430A KR 101525803 B1 KR101525803 B1 KR 101525803B1
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- forming
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- liquid crystal
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- 238000000034 method Methods 0.000 title claims abstract description 81
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000004973 liquid crystal related substance Substances 0.000 title abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 238000007646 gravure printing Methods 0.000 claims abstract description 25
- 239000000976 ink Substances 0.000 claims description 63
- 230000008569 process Effects 0.000 claims description 29
- 238000007639 printing Methods 0.000 claims description 12
- 239000010949 copper Substances 0.000 claims description 10
- 239000010931 gold Substances 0.000 claims description 10
- 238000003825 pressing Methods 0.000 claims description 8
- 238000007645 offset printing Methods 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- 239000003086 colorant Substances 0.000 claims description 4
- 239000002105 nanoparticle Substances 0.000 claims description 4
- 239000010408 film Substances 0.000 description 15
- 239000011159 matrix material Substances 0.000 description 5
- 239000010410 layer Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 230000007480 spreading Effects 0.000 description 3
- 238000003892 spreading Methods 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000932 sedative agent Substances 0.000 description 1
- 230000001624 sedative effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements
- G02F1/133565—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements inside the LC elements, i.e. between the cell substrates
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements
- G02F1/133567—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements on the back side
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Optical Filters (AREA)
Abstract
Description
Claims (13)
- 복수의 화소영역을 갖는 제1 절연기판 상에 게이트라인, 데이터라인 및 스위칭 소자를 형성하는 단계,상기 각 화소영역에 컬러필터용 잉크와 상기 컬러 필터용 잉크와 공간을 두고 분리되어 있고, 상기 스위칭 소자의 연결부 위에 위치하는 콘택 부재용 전도성 잉크를 그라비아 인쇄하는 단계,프레스 공정에 의하여 상기 컬러필터용 잉크와 상기 콘택 부재용 전도성 잉크 사이의 상기 공간을 줄이고 평탄화하여, 복수의 컬러 필터와 상기 콘택 부재를 형성하는 단계, 및상기 콘택 부재 및 상기 컬러필터 위에 화소전극을 형성하는 단계를 포함하고,상기 콘택 부재용 전도성 잉크의 퍼짐성이 상기 컬러필터용 잉크의 퍼짐성보다 작은 액정표시장치의 제조방법.
- 삭제
- 제1항에 있어서,상기 전도성 잉크는 은(Ag), 구리(Cu), 금(Au), 및 ITO(Indium Tin Oxide)를 포함하는 나노입자들 중 적어도 하나를 포함하는 액정표시장치의 제조방법.
- 제1항에 있어서,상기 화소전극과 상기 컬러필터 사이에 유기막을 형성하는 단계를 더 포함하는 액정표시장치의 제조방법.
- 제1항에 있어서,상기 복수의 컬러필터는 레드(Red), 그린(Green) 및 블루(Blue) 컬러필터를 포함하며,상기 제1 절연기판을 제조하는 단계에서의 상기 복수 색상의 컬러필터를 그라비아 인쇄방식에 의해 형성하는 단계는 상기 각 화소영역에 상기 레드, 그린 및 블루 컬러필터를 동시에 형성하는 것을 특징으로 하는 액정표시장치의 제조방법.
- 제1항에 있어서,상기 콘택 부재를 그라비아(Gravure) 인쇄방식에 의해 형성하는 단계에서 인쇄방식은 그라비아오프(Gravure Off)-셋프린팅(Set printing) 방법에 의하여 인쇄하는 액정표시장치의 제조방법.
- 제1항에 있어서,상기 콘택 부재를 그라비아(Gravure) 인쇄방식에 의해 형성하는 단계에서 인쇄방식은 리버스오프(Reverse Off)-셋프린팅(Set printing) 방법에 의하여 인쇄하는 액정표시장치의 제조방법.
- 삭제
- 삭제
- 제1항에 있어서,상기 컬러필터용 잉크는 상기 프레스(Press) 공정에 의하여 다른 색의 컬러필터용 잉크가 서로 만나거나 중첩하는 액정표시장치의 제조방법.
- 삭제
- 삭제
- 삭제
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080132430A KR101525803B1 (ko) | 2008-12-23 | 2008-12-23 | 액정표시장치의 제조방법 |
US12/579,816 US8576359B2 (en) | 2008-12-23 | 2009-10-15 | Liquid crystal display device and method for manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080132430A KR101525803B1 (ko) | 2008-12-23 | 2008-12-23 | 액정표시장치의 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20100073692A KR20100073692A (ko) | 2010-07-01 |
KR101525803B1 true KR101525803B1 (ko) | 2015-06-10 |
Family
ID=42265533
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080132430A Expired - Fee Related KR101525803B1 (ko) | 2008-12-23 | 2008-12-23 | 액정표시장치의 제조방법 |
Country Status (2)
Country | Link |
---|---|
US (1) | US8576359B2 (ko) |
KR (1) | KR101525803B1 (ko) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101073200B1 (ko) * | 2010-01-28 | 2011-10-12 | 삼성모바일디스플레이주식회사 | 액정표시장치 및 그 제조방법 |
KR20120014501A (ko) * | 2010-08-09 | 2012-02-17 | 삼성전자주식회사 | 패턴 형성 방법 및 액정 표시 장치의 제조방법 |
KR101144610B1 (ko) * | 2011-08-02 | 2012-05-11 | 한국기계연구원 | 투명 전극의 전도성 메쉬 매설 방법 |
CN102810571B (zh) * | 2012-08-13 | 2015-03-11 | 京东方科技集团股份有限公司 | 一种基板、显示装置及该基板的制备方法 |
CN103325732B (zh) * | 2013-06-28 | 2016-03-30 | 京东方科技集团股份有限公司 | 一种coa基板及其制造方法、显示装置 |
CN103744223B (zh) * | 2013-12-23 | 2016-07-06 | 北京京东方光电科技有限公司 | 一种显示装置、彩膜基板及其制作方法 |
KR102272422B1 (ko) * | 2015-01-14 | 2021-07-02 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 그 제조 방법 |
CN106597770B (zh) * | 2016-12-28 | 2019-12-03 | 京东方科技集团股份有限公司 | 一种阵列基板及其制作方法、显示装置 |
CN111610660B (zh) * | 2020-05-29 | 2021-08-06 | 厦门天马微电子有限公司 | 一种阵列基板、显示面板及显示装置 |
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JP2006099016A (ja) * | 2004-09-30 | 2006-04-13 | Sumitomo Bakelite Co Ltd | 表示装置用カラーフィルタ、カラーフィルタ部材および表示装置用カラーフィルタの製造方法 |
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2008
- 2008-12-23 KR KR1020080132430A patent/KR101525803B1/ko not_active Expired - Fee Related
-
2009
- 2009-10-15 US US12/579,816 patent/US8576359B2/en not_active Expired - Fee Related
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JP2006099016A (ja) * | 2004-09-30 | 2006-04-13 | Sumitomo Bakelite Co Ltd | 表示装置用カラーフィルタ、カラーフィルタ部材および表示装置用カラーフィルタの製造方法 |
KR20060116109A (ko) * | 2005-05-09 | 2006-11-14 | 삼성전자주식회사 | 컬러 필터 형성 장치 및 방법과 이에 의해 형성된 컬러필터를 구비하는 액정표시장치 |
JP2008251814A (ja) * | 2007-03-30 | 2008-10-16 | Nec Lcd Technologies Ltd | 埋込配線の形成方法、表示装置用基板及び当該基板を有する表示装置 |
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US8576359B2 (en) | 2013-11-05 |
US20100157211A1 (en) | 2010-06-24 |
KR20100073692A (ko) | 2010-07-01 |
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