KR101399422B1 - 단층 PVdF 필름 및 이의 제조방법 - Google Patents
단층 PVdF 필름 및 이의 제조방법 Download PDFInfo
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- KR101399422B1 KR101399422B1 KR1020120153817A KR20120153817A KR101399422B1 KR 101399422 B1 KR101399422 B1 KR 101399422B1 KR 1020120153817 A KR1020120153817 A KR 1020120153817A KR 20120153817 A KR20120153817 A KR 20120153817A KR 101399422 B1 KR101399422 B1 KR 101399422B1
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- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08L27/16—Homopolymers or copolymers or vinylidene fluoride
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
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- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
- C08L33/12—Homopolymers or copolymers of methyl methacrylate
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
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- H10F19/85—Protective back sheets
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- C—CHEMISTRY; METALLURGY
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- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08J2327/16—Homopolymers or copolymers of vinylidene fluoride
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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Abstract
Description
Claims (11)
- (A) 폴리메틸메타크릴레이트(PMMA) 단일수지 또는 이의 공중합수지와 산화티탄(TiO2)을 컴파운딩하여 마스터배치를 제조하는 단계; 및
(B) 상기 마스터배치와 폴리비닐리덴플루오라이드(PVdF) 단일수지 또는 이의 공중합수지를 용융 혼련하여 시트로 압출하는 단계를 포함하고,
상기 PVdF 단일수지 또는 이의 공중합수지, PMMA 단일수지 또는 이의 공중합수지, 및 산화티탄의 함량은 필름 전체 중량을 기준으로 50 내지 90 중량%, 5 내지 25 중량%, 및 5 내지 25 중량%인 폴리비닐리덴플루오라이드 필름의 제조방법.
- 제 1 항에 있어서,
상기 단계 (B) 이후, (C) 상기 압출된 시트를 가열롤 및 양각처리(emboss)된 스퀴징롤 사이로 통과시키면서 권취하여 최종 필름을 얻는 단계를 추가로 포함하는 폴리비닐리덴플루오라이드 필름의 제조방법.
- 제 1 항에 있어서,
상기 단계 (B)에서, 상기 용융 혼련의 온도는 180 내지 240℃인 폴리비닐리덴플루오라이드 필름의 제조방법.
- 제 2 항에 있어서,
상기 단계 (C)에서, 상기 가열롤의 온도는 70 내지 110℃인 폴리비닐리덴플루오라이드 필름의 제조방법.
- 제 1 항에 있어서,
상기 PVdF의 공중합수지는, 비닐리덴플루오라이드(VF2) 및 공단량체가 50:50 내지 99:1의 중량비로 공중합된 수지이고, 상기 공단량체는 불화비닐, 트리플루오로에틸렌(VF3), 클로로플루오로에틸렌(CTFE), 1,2-디플루오로에틸렌, 테트라플루오로에틸렌(TFE), 헥사플루오로프로필렌(HFP), 퍼플루오로(알킬비닐)에테르, 퍼플루오로(1,3-디옥솔), 퍼플루오로(2,2-디메틸-1,3-디옥솔)(PDD) 또는 이들의 혼합물인 폴리비닐리덴플루오라이드 필름의 제조방법.
- 제 1 항에 있어서,
상기 PMMA의 공중합수지는, 메틸메타크릴레이트(MMA) 및 공단량체가 50:50 내지 99:1의 중량비로 공중합된 수지이고, 상기 공단량체는 알킬 (메타)아크릴레이트, 아크릴로니트릴, 부타디엔, 스티렌, 이소프렌 또는 이들의 혼합물인 폴리비닐리덴플루오라이드 필름의 제조방법.
- 제 1 항에 있어서,
상기 필름은, 한면의 표면조도(Ra)가 0.3㎛ 이상이고, 반대면의 표면조도가 0.3㎛ 미만인 폴리비닐리덴플루오라이드 필름의 제조방법.
- 제 1 항에 있어서,
상기 필름은, 550㎚의 파장에서의 반사율이 75% 이상인 폴리비닐리덴플루오라이드 필름의 제조방법.
- 제 1 항에 있어서,
상기 필름은, 150℃ 및 30분 조건의 열처리에 대한 길이방향 및 폭방향의 수축률이 각각 5% 이하인 폴리비닐리덴플루오라이드 필름의 제조방법.
- 제 1 항에 있어서,
상기 필름은, 길이방향 및 폭방향의 인장강도가 각각 3kgf/㎟ 이상이고 신도가 각각 100% 이상인 폴리비닐리덴플루오라이드 필름의 제조방법.
- 제 1 항의 방법으로 제조된 폴리비닐리덴플루오라이드 필름을 포함하는 태양전지용 백시트(back sheet).
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KR1020120153817A KR101399422B1 (ko) | 2012-12-26 | 2012-12-26 | 단층 PVdF 필름 및 이의 제조방법 |
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KR1020120153817A KR101399422B1 (ko) | 2012-12-26 | 2012-12-26 | 단층 PVdF 필름 및 이의 제조방법 |
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KR1020100039119A Division KR101275850B1 (ko) | 2010-04-27 | 2010-04-27 | 단층 PVdF 필름 및 이의 제조방법 |
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KR20130006410A KR20130006410A (ko) | 2013-01-16 |
KR101399422B1 true KR101399422B1 (ko) | 2014-05-30 |
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KR101521614B1 (ko) * | 2013-08-30 | 2015-05-20 | 에스케이씨 주식회사 | 내용매성 및 은폐력이 우수한 유색 폴리비닐리덴 플루오라이드계 필름 |
CN104151752B (zh) * | 2014-08-28 | 2016-06-01 | 东莞市长安东阳光铝业研发有限公司 | 一种聚偏氟乙烯薄膜用色母粒的制备方法及应用 |
CN108264738B (zh) * | 2018-01-19 | 2020-11-17 | 合肥宸翊商贸有限公司 | 用于高回收料添加的太阳能背板膜的母粒及其制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0228239A (ja) * | 1988-07-15 | 1990-01-30 | Denki Kagaku Kogyo Kk | 低光沢フツ素樹脂系屋外用フイルムまたはシート及びその製造方法 |
KR20090126331A (ko) * | 2006-01-25 | 2009-12-08 | 아르끄마 프랑스 | 플루오르화 중합체 기재 유연성 필름 |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0228239A (ja) * | 1988-07-15 | 1990-01-30 | Denki Kagaku Kogyo Kk | 低光沢フツ素樹脂系屋外用フイルムまたはシート及びその製造方法 |
KR20090126331A (ko) * | 2006-01-25 | 2009-12-08 | 아르끄마 프랑스 | 플루오르화 중합체 기재 유연성 필름 |
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