KR101116999B1 - 광학 요소를 위한 교체 장치 - Google Patents
광학 요소를 위한 교체 장치 Download PDFInfo
- Publication number
- KR101116999B1 KR101116999B1 KR1020067012405A KR20067012405A KR101116999B1 KR 101116999 B1 KR101116999 B1 KR 101116999B1 KR 1020067012405 A KR1020067012405 A KR 1020067012405A KR 20067012405 A KR20067012405 A KR 20067012405A KR 101116999 B1 KR101116999 B1 KR 101116999B1
- Authority
- KR
- South Korea
- Prior art keywords
- optical element
- objective lens
- replacement device
- lithographic objective
- holder
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 124
- 238000000034 method Methods 0.000 claims description 16
- 230000003014 reinforcing effect Effects 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 4
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- 238000007906 compression Methods 0.000 claims 2
- 239000011343 solid material Substances 0.000 claims 1
- 238000001459 lithography Methods 0.000 abstract description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000005728 strengthening Methods 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 2
- 210000001747 pupil Anatomy 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920002449 FKM Polymers 0.000 description 1
- 229910000760 Hardened steel Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 239000011435 rock Substances 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/14—Mountings, adjusting means, or light-tight connections, for optical elements for lenses adapted to interchange lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lens Barrels (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Abstract
Description
Claims (22)
- 리소그래피 대물 렌즈 내의 두 개의 인접한 광학 요소 사이에 장착된 광학 요소를 위한 교체 장치이며,교체될 광학 요소를 위한 홀더를 포함하며, 상기 홀더는 하우징 내의 측면 개구를 통해 상기 리소그래피 대물 렌즈 내로 이동될 수 있고,광학 요소는 리소그래피 대물 렌즈 내의 별도의 수납부 상에 지지되고,별도의 수납부는 하나 이상의 액추에이터를 구비하는교체 장치.
- 리소그래피 대물 렌즈 내의 두 개의 인접한 광학 요소 사이에 장착된 광학 요소를 위한 교체 장치이며,교체될 광학 요소를 위한 홀더를 포함하며, 상기 홀더는 하우징 내의 측면 개구를 통해 상기 리소그래피 대물 렌즈 내로 이동될 수 있고,교체 가능한 광학 요소 상에서 광학 축 방향으로 작용하는 하나 이상의 스프링 요소가 리소그래피 대물 렌즈 내에 배치되는교체 장치.
- 제1항 또는 제2항에 있어서,교체될 광학 요소는 두 개의 교체될 수 없는 광학 요소 사이에 배치되는교체 장치.
- 제1항 또는 제2항에 있어서,광학 요소는 강화 요소와 결합되는교체 장치.
- 제4항에 있어서,강화 요소는 광학 요소와 동일한 광학 재료로 구성되는교체 장치.
- 제4항에 있어서,강화 요소는 광학 요소와 압착에 의해 결합되는교체 장치.
- 제4항에 있어서,강화 요소는 광학 요소와 접착 결합에 의해 결합되는교체 장치.
- 제1항 또는 제2항에 있어서,광학 요소는 장착부 내에 지지되는교체 장치.
- 제1항 또는 제2항에 있어서,광학 요소는 리소그래피 대물 렌즈 내에 등압 압축식 장착부에 의해 장착되는교체 장치.
- 제1항 또는 제2항에 있어서,광학 요소는 리소그래피 대물 렌즈 내에서 인접하는 광학 요소의 장착부 상에 위치하는교체 장치.
- 제1항에 있어서,수납부는 리소그래피 대물 렌즈 내의 장착부 내에 지지되는교체 장치.
- 제1항 또는 제2항에 있어서,하우징 내의 개구는 시일에 의해 폐쇄될 수 있는교체 장치.
- 제12항에 있어서,시일은 중실 물질의 밀봉재 또는 개스킷인교체 장치.
- 제12항에 있어서,시일은 기체 밀봉인교체 장치.
- 제1항 또는 제2항에 있어서,홀더는 교체 가능한 광학 요소를 위한 안내부를 구비하는교체 장치.
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Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10361441.9 | 2003-12-23 | ||
DE10361441 | 2003-12-23 | ||
PCT/EP2004/013576 WO2005064404A1 (en) | 2003-12-23 | 2004-11-30 | Replacement apparatus for an optical element |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060111597A KR20060111597A (ko) | 2006-10-27 |
KR101116999B1 true KR101116999B1 (ko) | 2012-03-15 |
Family
ID=34673078
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020067012405A KR101116999B1 (ko) | 2003-12-23 | 2004-11-30 | 광학 요소를 위한 교체 장치 |
Country Status (8)
Country | Link |
---|---|
US (8) | US7265917B2 (ko) |
EP (1) | EP1700167B1 (ko) |
JP (1) | JP4750043B2 (ko) |
KR (1) | KR101116999B1 (ko) |
CN (2) | CN101614967B (ko) |
AT (1) | ATE405866T1 (ko) |
DE (1) | DE602004016048D1 (ko) |
WO (1) | WO2005064404A1 (ko) |
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JP4747263B2 (ja) * | 2003-11-24 | 2011-08-17 | カール・ツァイス・エスエムティー・ゲーエムベーハー | オブジェクティブにおける光学素子のための保持装置 |
US7265917B2 (en) | 2003-12-23 | 2007-09-04 | Carl Zeiss Smt Ag | Replacement apparatus for an optical element |
US7986472B2 (en) * | 2005-05-31 | 2011-07-26 | Carl Zeiss SMT, AG. | Optical element module |
EP1922586B1 (de) * | 2005-08-23 | 2016-05-11 | Carl Zeiss SMT GmbH | Austauschvorrichtung für ein optisches element |
DE102005060622A1 (de) * | 2005-12-19 | 2007-04-19 | Carl Zeiss Smt Ag | Montagevorrichtung für eine optische Einrichtung |
US7724351B2 (en) * | 2006-01-30 | 2010-05-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and exchangeable optical element |
TWI439815B (zh) | 2006-07-03 | 2014-06-01 | Zeiss Carl Smt Gmbh | 校正/修復微影投影曝光裝置中之投影物鏡的方法與此投影物鏡 |
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DE102006050835A1 (de) * | 2006-10-27 | 2008-05-08 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zum Austausch von Objetkivteilen |
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WO2005064404A1 (en) | 2005-07-14 |
US20110255181A1 (en) | 2011-10-20 |
KR20060111597A (ko) | 2006-10-27 |
US7515363B2 (en) | 2009-04-07 |
CN1898610A (zh) | 2007-01-17 |
US7768723B2 (en) | 2010-08-03 |
US8902519B2 (en) | 2014-12-02 |
US9081296B2 (en) | 2015-07-14 |
US20130279029A1 (en) | 2013-10-24 |
US20070297074A1 (en) | 2007-12-27 |
CN101614967B (zh) | 2011-11-30 |
US7995296B2 (en) | 2011-08-09 |
JP4750043B2 (ja) | 2011-08-17 |
US20050134972A1 (en) | 2005-06-23 |
US20160041475A1 (en) | 2016-02-11 |
CN101614967A (zh) | 2009-12-30 |
US20150070789A1 (en) | 2015-03-12 |
CN100545754C (zh) | 2009-09-30 |
EP1700167B1 (en) | 2008-08-20 |
US20090168207A1 (en) | 2009-07-02 |
DE602004016048D1 (de) | 2008-10-02 |
JP2007515797A (ja) | 2007-06-14 |
ATE405866T1 (de) | 2008-09-15 |
US7265917B2 (en) | 2007-09-04 |
US8488261B2 (en) | 2013-07-16 |
EP1700167A1 (en) | 2006-09-13 |
US20100271716A1 (en) | 2010-10-28 |
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