KR100823181B1 - Exposure equipment with cooling device - Google Patents

Abstract

The exposure apparatus provided with the cooling apparatus of this invention is a chamber provided with the reflector which reflects the light emitted from the lamp below, and a pair of 1st and 2nd which reflects the light transmitted from the said reflector in both directions, respectively. A pair of lenses that agglomerate the light transmitted in a dispersed state through the second reflecting mirror and transmit the light to the edges of the substrate, and the chambers installed on both sides of the chamber and lifted by the lamp, respectively. A cooling pipe for maintaining a constant internal temperature is provided.

According to the exposure apparatus provided with the cooling apparatus of the present invention, the internal temperature of the chamber is increased due to the linear light source lamp, which can be reduced or kept constant due to the cooling pipe through which low temperature water is supplied and circulated.

In addition, the lamp and the reflector and the plurality of members may be prevented from being overheated by preventing overheating of the lamp and the reflector due to continuous light emission of the lamp.

Description

Exposure device with cooling apparatus {Exposure device with cooling apparatus}

1 is a combined perspective view of an exposure apparatus equipped with a cooling device of the present invention;

2 is an exploded perspective view of an exposure apparatus equipped with a cooling apparatus of the present invention;

3 is a perspective view of a chamber provided in an exposure apparatus equipped with a cooling apparatus of the present invention;

Figure 4 is an exploded perspective view of the auxiliary chamber provided in the exposure facility with a cooling device of the present invention,

5 is a perspective view of a mirror unit provided in the exposure apparatus with a cooling apparatus of the present invention;

FIG. 6 is a cross-sectional view of the A-A part shown in FIG. 1 of the exposure apparatus provided with the cooling apparatus of the present invention.

Explanation of symbols on the main parts of the drawings

100: chamber 101: space part

102: fastening portion 110: lamp

120: reflector 121a, 121b: condensing mirror

122a, 122b: heat sink 130: exhaust duct

140a: Inner Cover 140b: Outer Cover

141: insulation 150a, 150b: cooling pipe

151a-1,151b-1: Inlet 151a-2,151b-2: Outlet

200: auxiliary chamber 210a, 210b: water cooling circulation tube

220a, 220b: Lamp cooling unit 221a, 221b: Air hole

300: main body 310a, 310b: first reflection mirror

320a, 320b: second reflection mirror 330a, 330b: lens

340a, 340b: mirror cooling unit

The present invention relates to an exposure apparatus equipped with a cooling device, and more particularly, to a cooling device capable of cooling heat generated in an exposure facility during edge exposure of a large-area substrate or maintaining a constant internal temperature of a chamber. It relates to an exposure facility provided.

In general, a manufacturing process of a semiconductor device or a display panel substrate is a photoresist coating process (PR coating) in which a photoresist layer is uniformly applied to a desired thickness on a substrate to form a photoresist film, a pattern mask is placed on a substrate, and a pattern mask is placed. And a developing step of removing the photosensitive film cured by exposure with an etching solution. Here, the apparatus for performing the alignment and exposure process is called an exposure facility.

On the other hand, in the above-described photoresist coating step, a phenomenon in which the photoresist applied to the edge portion of the substrate is applied thicker than the average coating thickness by surface tension occurs. This problem occurs because the photosensitive film of the edge portion of the substrate thus applied is not sufficiently cured under ordinary exposure conditions.

In order to prevent this, after the application of the photosensitive liquid, an additional step of adding a step of removing only the photoresist film formed on the edge portion with the etching solution had to be performed. However, when the process time is reduced in order to increase productivity in the process, the residue of the non-uniform form of the edge portion of the substrate is left due to the evaporation of the etching solution. This residue also causes particles, and the etching solution flows backward, causing some patterns to disappear.

As described above, the removal process of the photosensitive film of the edge portion of the substrate may be omitted when considering the productivity of the substrate due to a separate additional process, and thus residues are present in the photosensitive film of the edge portion.

In order to solve this problem, recently, an edge exposure process for selectively exposing and curing only the photoresist film of the portion not related to the edge portion not related to the pattern portion has been performed before the photosensitive film development process.

However, if the edge portion irrelevant to the pattern is sufficiently exposed through the edge exposure process within a short time, the photosensitive film of the edge portion may be completely removed even under etching conditions such as an ordinary etching solution.

Therefore, in recent years, the method of exposing the edge of a board | substrate by rotating a board | substrate 90 degrees for such edge exposure is proposed. In order to apply such a method, a separate configuration such as a rotation driving device and a substrate aligning device for rotating the substrate must be further added, which makes it difficult to use the existing exposure apparatus. In particular, in the case of a large-area substrate, such an exposure apparatus requires a larger space and thus its effectiveness is weak.

In addition, in order to save time, the light source unit has a larger area than the width of the substrate so that the center region (80 to 90%) except the edge portion of the substrate is not used at all, and a very inefficient method is adopted. Was doing.

Therefore, a line light source lamp is provided instead of a point light source lamp to expose both edge portions of the substrate. When using a linear light source lamp, that is, a rod-shaped ultraviolet lamp, the light is emitted in a relatively wider area than the point light source lamp, which causes a problem in that the temperature rises inside the chamber.

When the temperature of the chamber increases, the life of the coating surface of the lens and the mirror is shortened, and each member constituting the same causes deformation. Therefore, the exposure focus of the edge portion of the substrate is out of the reference region, so that the exposure cannot be performed smoothly.

SUMMARY OF THE INVENTION An object of the present invention for solving the above problems is to provide an exposure apparatus equipped with a cooling device that can reduce or maintain a constant internal temperature of a chamber which is raised by heat generated from a line light source lamp. There is.

In particular, another object of the present invention is to provide an exposure apparatus equipped with a cooling apparatus that can be applied to a small exposure apparatus by maximizing the efficiency in a space inside a chamber of a device having a narrow space according to the width of the substrate.

In addition, it is possible to reduce the overheating of the lamp and the reflector to reflect the light generated by the lamp as parallel light, and to provide an exposure facility equipped with a cooling device that can reduce the temperature of the chamber in which the lamp and the reflector is installed. There is.

In addition, the present invention provides an exposure apparatus equipped with a cooling device that can prevent the coating surface of the lamp and the reflector from being damaged due to overheating.

Exposure apparatus equipped with a cooling device of the present invention for achieving the above object, the chamber provided with a reflector for reflecting the light generated from the lamp to the bottom; A pair of first and second reflecting mirrors respectively reflecting the light transmitted from the reflecting plate in both directions; A pair of lenses that aggregate the light transmitted in the dispersed state through the second reflection mirror and transmit the light to the edge of the substrate; And cooling pipes installed at both sides of the chamber to maintain a constant internal temperature of the chamber, which is raised due to the lamp.

An exposure apparatus equipped with a cooling apparatus of the present invention, the auxiliary chamber is provided between the lamp and the first reflecting mirror, and to ensure the path of parallel light transmitted to the first reflecting mirror through the reflecting plate; do.

In the exposure apparatus provided with the cooling apparatus of the present invention, the auxiliary chamber is provided with a water-cooled circulation tube for maintaining a constant temperature rising due to the lamp and the reflecting plate.

In the exposure apparatus equipped with a cooling device of the present invention, the chamber further comprises a lamp cooling unit for injecting low temperature air to the lamp.

In the exposure apparatus equipped with the cooling device of the present invention, the auxiliary chamber is installed in a position facing the first reflecting mirror, the mirror cooling unit for injecting low-temperature air; is further provided.

An exposure apparatus provided with a cooling apparatus of the present invention, wherein the reflecting plate, the reflecting mirror plate is provided on the outside of the lamp as a whole, the shape of an arc, bent at regular intervals to transmit light to the first reflecting mirror; It is coupled to the outer surface of the reflecting mirror plate, the heat sink for radiating heat radiated from the lamp to the outside; further includes.

In the exposure apparatus provided with the cooling apparatus of this invention, The said chamber is further provided with the inner and outer cover further provided with the duct which exhausts the heat | fever radiated | emitted from the said heat sink.

In the exposure apparatus provided with the cooling apparatus of this invention, the said lamp is a linear lamp which has a form of the rod provided in the longitudinal direction.

In the exposure apparatus provided with the cooling apparatus of this invention, the said inner and outer cover is equipped with the heat insulating material in either cover.

Meanwhile, a cooling system may be implemented in an exposure facility that collects light generated by a lamp installed in a chamber to expose a wafer or a substrate. That is, the cooling system, the lamp cooling unit for injecting low-temperature air to the lamp; A cooling pipe installed at a side of the chamber to supply and circulate low temperature water so as to maintain a constant internal temperature; And a mirror cooling unit injecting low-temperature air to the surface of the reflection mirror for reflecting the light collected through the reflection plate to the lens.

In the cooling system for exposure equipment of the present invention, the auxiliary chamber is connected to the lower side of the chamber, and secures a path of parallel light transmitted to the reflecting mirror through the reflecting plate; further comprising, installed on the side of the auxiliary chamber It is provided with a water-cooled circulation pipe that is supplied and circulated low temperature water to maintain a constant internal temperature.

Hereinafter, with reference to the accompanying drawings will be described the configuration and effect of the exposure apparatus equipped with a cooling apparatus of the present invention.

First, as shown in FIGS. 1 to 5, the exposure apparatus provided with the cooling apparatus is largely comprised of a chamber 100, an auxiliary chamber 200, and a main body 300. The chamber 100 includes a lamp 110 and a reflector 120, and the main body 300 includes first and second reflecting mirrors 320a and 320b, lenses 330a and 330b, and a light source controller 340. ) Is provided. In addition, the auxiliary chamber 200 connects the lower side of the chamber 100 and the upper side of the main body 300, and transmits light from the chamber 100 to the main body 300.

The chamber 100 has a substantially rectangular parallelepiped shape, and the upper and lower surfaces thereof are open, and a space 101 is formed in the longitudinal direction therein. In addition, the side of the chamber 100 may be provided with a fastening part 102 to open one surface thereof, thereby facilitating replacement of the lamp 110 and the reflecting plate 120.

In addition, the lamp 110 is provided with a linear lamp having a rod shape, the ultraviolet light emitted from the linear lamp serves to cure the photosensitive liquid applied to the substrate (not shown) to be described later.

In addition, the reflecting plate 120 is installed outside the lamp 110. That is, the lamp 110 is composed of a reflecting plate 120 made of an elliptic shape in order to obtain the maximum efficiency of the light by the light is spread in all directions. The reflector plate 120 includes condensing mirrors 121a and 121b and heat dissipation plates 122a and 122b, and the condensing mirrors 121a and 121b condense the light generated by the lamp 110 and reflect the light downward. Play a role.

That is, the condensing mirrors 121a and 121b are arranged to surround the outside of the lamp 110, and the shape of the condensing mirrors 121a and 121b has an arc shape as viewed from the side. In more detail, the condensing mirrors 121a and 121b are bent at regular intervals and condense the light generated in a dispersed form in the lamp 110 to transmit parallel light in a downward direction.

In addition, the heat sinks 122a and 122b are provided as thin plates protruding outward from the rear surfaces of the condensing mirrors 121a and 121b. That is, since the reflector 120 is disposed at the shortest distance of the lamp 110, it is subjected to considerable heat. Therefore, the heat sinks 122a and 122b are formed so as to be vertical at the boundary portions at which the condensing mirrors 121a and 121b are bent, respectively, and radiate heat radiated from the lamp 110 and the condensing mirrors 121a and 121b to the outside. It is to play a role.

On the other hand, the inner and the outer cover (140a, 140b) provided with the exhaust duct 130 is provided on the upper side of the reflecting plate 120, that is, the chamber 100. The inner and outer covers 140a and 140b serve to exhaust heat radiated through the heat dissipation plates 122a and 122b to an upper portion when the inner and outer covers 140a and 140b are fastened to the upper surface of the chamber 100. In addition, the cover of any one of the inner and outer cover (140a, 140b) is provided with a heat insulating material (141). More preferably, the heat insulating material 141 is installed between the inner cover 140a and the outer cover 140b to block heat resistance of the lamp 110.

In addition, cooling chambers 150a and 150b are installed in the chamber 100. The cooling pipes 150a and 150b are provided at both sides of the chamber 100 and serve to lower or maintain a constant temperature inside the chamber 100 by supplying and circulating low temperature water.

The cooling pipes 150a and 150b may be disposed in a shape of “c” when viewed from the side of the chamber 100 or may be arranged in a zigzag shape in which upper and lower ends are rounded and bent. One end of each of the cooling pipes 150a and 150b is provided with inlets 150a-1 and 150b-1, and the other end is provided with outlets 150a-2 and 150b-2. The inlets 150a-1 and 150b-1 are connected to a supply pipe (not shown) to which water is supplied or to a storage tank (not shown) to store water. The outlets 150a-2 and 150b-2 may be directly connected to the storage tank, or may be connected to the storage tank through a separate cooler.

In addition, the cooling pipes 150a and 150b provided at both sides of the chamber 100 may have inlets 150a-1 and 150b-1 and outlets 150a-2 and 150b-2 respectively connected to the storage tank. It is connected to only the inlet (150a-1) and the outlet 150b-2 of the other side provided in one cooling pipe (150a), the outlet (150a-2) and the inlet of the other side (150a) of the cooling pipe (150a) 150b-1) may be connected. In this case, water is supplied to one cooling pipe 150a, circulated to the other cooling pipe 150b, and then flows back into the storage tank.

The auxiliary chamber 200 is installed below the chamber 100 and communicates with a bottom surface of the chamber 100. The auxiliary chamber 200 is coupled to the fastening member by combining a plurality of frames, it is provided to have a height in the vertical direction. The height of the auxiliary chamber 200 is approximately half the height of the entire exposure equipment equipped with a substrate cooling device. The auxiliary chamber 200 serves to secure a path of light generated by the lamp 110 and transmitted downward through the condensing mirrors 121a and 121b. In addition, water cooling circulation pipes 210a and 210b are installed at both sides of the auxiliary chamber 200, respectively.

The water cooling circulation tubes 210a and 210b are supplied with low temperature water and circulated to maintain a constant temperature inside the auxiliary chamber 200. However, the water-cooled circulation pipes 210a and 210b are arranged in a zigzag-shaped tube by rounding or bending the upper and lower ends due to their height.

Like the cooling pipes 150a and 150b described above, the water cooling circulation pipes 210a and 210b may be connected to the storage tank or connected to a storage tank.

In addition, lamp cooling units 220a and 220b are installed above the auxiliary chamber 200. In the illustrated figure, the lamp cooling units 220a and 220b are provided in the auxiliary chamber 200, but the lamp cooling units 220a and 220b may be provided in the chamber 100. However, the lamp 110 is installed below the lamp 110 to inject air to the lamp 110 and the reflector plate 120.

The lamp cooling units 220a and 220b may be provided in parallel with the lamp 110 in the same direction as the length direction of the lamp 110. The lamp cooling units 220a and 220b are provided in pairs so as to be installed in the lower both directions of the lamp 110. In addition, the lamp cooling units 220a and 220b have air holes 221a and 221b formed at regular intervals, and low-temperature air passes through the air holes 221a and 221b. 120).

Accordingly, the aerosol sprayed directly to the lamp 110 and the reflector 120 may not only lower the elevated temperature inside the chamber 100 due to the lamp 110 and the reflector 120. Due to this, the temperature of the lamp 110 and the reflector 120 may be lowered. And, according to the process to keep the temperature of the chamber 100 constant.

On the other hand, the main body 300 is located on the lower side of the auxiliary chamber 200, a portion of which is in communication with the lower side of the auxiliary chamber 200. The main body 300 has a pair of first reflection mirrors 310a and 310b installed therein, and the first reflection mirrors 310a and 310b are installed in an area communicating with the auxiliary chamber 200. That is, as long as the lateral area of the condensing mirror (121a, 121b) provided in the chamber 100 described above. However, the areas of the first reflection mirrors 310a and 310b may be provided to have a larger area than the areas of the condensing mirrors 121a and 121b.

The pair of first reflecting mirrors 310a and 310b have upper ends adjacent to each other and lower ends are inclined in an outer lower direction. That is, the first reflection mirrors 310a and 310b positioned on the left side of the pair of first reflection mirrors 310a and 310b have an inclination of −45 ° in the counterclockwise direction in the horizontal state. The first reflection mirrors 310a and 310b positioned on the right side of the first reflection mirrors 310a and 310b have an inclination of 45 ° in the clockwise direction in the horizontal state. Therefore, the light transmitted in the vertical direction from the light collecting mirrors 121a and 121b is reflected in both horizontal directions.

In addition, the main body 300 is provided with a pair of second reflecting mirrors (320a, 320b), the second reflecting mirrors (320a, 320b) are located on both sides of the first reflecting mirrors (310a, 310b), respectively. do. The second reflecting mirrors 320a and 320b reflect the parallel light received from the first reflecting mirrors 310a and 310b in the downward direction again, and are provided on the left side of the second reflecting mirrors 320a and 320b. The second reflection mirrors 320a and 320b are provided in parallel with the first reflection mirrors 310a and 310b installed on the left side, and the second reflection mirrors 320a and 320b installed on the right side of the second reflection mirrors 320a and 320b. 320b) is provided in parallel with the first reflection mirrors 310a and 310b installed on the right side.

In addition, the surface of any one of the first reflecting mirror (310a, 310b) or the second reflecting mirror (320a, 320b) is coated. In other words, the wavelength band of the visible region is transmitted and only the wavelength band of the ultraviolet region is reflected.

On the other hand, the main body 300 is provided with a lens (330a, 330b), the lens (330a, 330b) is provided on the lower side of the second reflecting mirror (320a, 320b), respectively. The lenses 330a and 330b aggregate light reflected from the second reflection mirrors 320a and 320b and transmit the light reflected to the edge portion of the substrate. Accordingly, the lenses 330a and 330b are disposed at positions corresponding to edge portions of the substrate.

In addition, the main body 300 is provided with a pair of mirror cooling units 340a and 340b. Like the lamp cooling units 220a and 220b described above, the mirror cooling units 340a and 340b are sprayed with low-temperature air. The mirror cooling units 340a and 340b spray air to the first reflection mirrors 310a and 310b to protect the surface coating layers of the first reflection mirrors 310a and 310b. That is, the continuation of the lamp 110 prevents the surface coated on the surfaces of the first reflection mirrors 310a and 310b from peeling off due to the light source. Like the lamp cooling units 220a and 220b, the mirror cooling units 340a and 340b are installed in the longitudinal direction, and air holes (not shown) are formed at regular intervals. In addition, low temperature air is injected to the surfaces of the first reflection mirrors 310a and 310b through the air holes.

The reflecting plate 120, the first reflecting mirrors 310a and 310b, the second reflecting mirrors 320a and 320b, the lenses 330a and 330b and the mirror cooling units 340a and 340b described above are provided in the lamp 110. It is installed to have the same length in the longitudinal direction.

Meanwhile, as described above, in the exposure apparatus of the present invention, the cooling pipes 150a and 150b, the water cooling circulation tubes 210a and 210b, the lamp cooling units 220a and 220b, and the mirror cooling units 340a and 340b are exposure equipment. It has a configuration of the cooling system provided in.

Referring to FIG. 6, a state of use of the exposure apparatus equipped with the cooling apparatus of the present invention configured as described above is as follows.

First, power is applied to the lamp 110 from the power supply unit, and light is generated from the lamp 110. The light is distributed in the radial direction when viewed from the side of the lamp 110, and the light is condensed by the light collecting mirrors 121a and 121b installed outside the lamp 110. At this time, the heat radiated from the lamp 110 is emitted to the outside from the heat dissipation plate (122a, 122b) provided on the rear surface of the condensing mirror (121a, 121b). In addition, the exhaust duct 130 installed on the upper portion of the chamber 100 is completely discharged to the outside of the exposure apparatus equipped with a cooling device.

Here, in the lamp cooling units 220a and 220b provided in both lower sides of the lamp 110, low-temperature air is injected into the lamp 110. That is, the lamp 110 and the reflector 120 may be prevented from being overheated due to the continuous light emission of the lamp 110, thereby extending the life of the lamp 110.

In addition, low temperature water is circulated through the cooling pipes 150a and 150b provided at both sides of the chamber 100 to prevent or reduce the internal temperature of the chamber 100 from rising. Accordingly, the temperature inside the chamber 100 may be kept constant to prevent the lamp 110, the reflector 120, and the plurality of members from being overheated.

On the other hand, when the light generated from the lamp 110 is transmitted through the condensing mirrors 121a and 121b in a downward direction, the wavelength band of ultraviolet rays is reflected by the first reflecting mirrors 310a and 310b and visible light is emitted. The wavelength band of is transmitted. Thereafter, the light is reflected 90 ° in both directions through the first reflection mirrors 310a and 310b to be transmitted to the second reflection mirrors 320a and 320b.

Here, the path of the light transmitted from the condensing mirror (121a, 121b) to the first reflecting mirror (310a, 310b) is implemented while passing through the interior of the auxiliary chamber 200, by the continuous operation of the lamp 110 As a result, the internal temperature of the auxiliary chamber 200 is increased. The auxiliary chamber 200 is to maintain a constant temperature of the auxiliary chamber 200 by supplying and circulating low-temperature water to the water cooling circulation pipe (210a, 210b) installed on its side.

In addition, low temperature air is injected from the mirror cooling units 340a and 340b to the first reflection mirrors 310a and 310b to prevent the first reflection mirrors 310a and 310b from overheating. That is, the surface coated on the first reflection mirrors 310a and 310b is prevented from being peeled off or damaged to easily transmit ultraviolet rays to the second reflection mirrors 320a and 320b.

Meanwhile, the light transmitted to the second reflection mirrors 320a and 320b is reflected again in the downward direction and transmitted to the lenses 330a and 330b installed below the second reflection mirrors 320a and 320b. The lenses 330a and 330b transmit downward in a state in which light transmitted to the second reflection mirrors 320a and 320b is aggregated.

In addition, the aggregated light passing through the lenses 330a and 330b passes through a separate light source control unit (not shown) to adjust the area of light transmitted to the edge of the substrate, or to completely block or open the aggregated light. Will be.

Exposure apparatus equipped with a cooling apparatus of the substrate of the present invention made as described above is to supply to both edges of the substrate as a line light source of two regions in the lamp 110 provided in one rod shape.

In addition, the internal temperature of the chamber 100 that is raised due to the operation of the lamp 110 may be reduced or kept constant due to the cooling pipes 150a and 150b. In addition, not only the lamp 110 and the reflector 120 may be prevented from overheating by spraying air from the lamp cooling units 220a and 220b, and the auxiliary chamber that is raised due to the operation of the lamp 110 ( The internal temperature of 200 may be kept constant in the water cooling circulation pipes 210a and 210b.

In addition, the coating of the first reflection mirrors 310a and 310b is prevented from being peeled off or damaged due to the mirror cooling units 340a and 340b which spray low-temperature air on the surfaces of the first reflection mirrors 310a and 310b. You can do it.

The exposure apparatus equipped with the cooling device of the present invention made as described above can reduce or keep constant the internal temperature of the chamber due to the linear light source lamp due to the cooling pipe. That is, low temperature water is supplied and circulated to cooling pipes installed at both sides of the chamber to adjust the internal temperature of the chamber.

In addition, overheating of the lamp and the reflector may be eliminated by the lamp cooling unit due to the continuous light emission of the lamp. That is, low-temperature air is injected into the lamp and the reflector through the lamp cooling unit to prevent the lamp and the reflector from overheating, and extend the life of the lamp and the plurality of members.

In addition, both sides of the auxiliary chamber may be provided with a water cooling circulation pipe to maintain a constant temperature rising inside the auxiliary chamber.

In addition, the surface coated on the first reflection mirror may be prevented from being peeled off or damaged due to the mirror cooling unit injecting low temperature air to the first reflection mirror. Therefore, the ultraviolet rays reflected by the second reflection mirror through the first reflection mirror can be transmitted to near 100%.

Although the preferred embodiments of the present invention have been described above, the present invention is not limited thereto, and various modifications and changes can be made within the scope of the claims and the detailed description of the invention and the accompanying drawings. Naturally, it belongs to the range of.

Claims (11)

A chamber provided with a reflector for reflecting light generated from the lamp downward; A pair of first and second reflecting mirrors respectively reflecting the light transmitted from the reflecting plate in both directions; A pair of lenses that aggregate the light transmitted in the dispersed state through the second reflection mirror and transmit the light to the edge of the substrate; And And cooling pipes installed on both side surfaces of the chamber to maintain a constant internal temperature of the chamber, which is raised due to the lamps. The method of claim 1, Exposure equipment equipped with the cooling device, And an auxiliary chamber installed between the lamp and the first reflection mirror to secure a path of parallel light transmitted through the reflector to the first reflection mirror. . The method of claim 2, The auxiliary chamber, And a water-cooled circulation tube for maintaining a constant temperature rising due to the lamp and the reflecting plate. The method of claim 1, The chamber, And a lamp cooling unit for injecting low temperature air into the lamp. The method of claim 3, wherein The auxiliary chamber, And a mirror cooling unit installed at a position opposite to the first reflecting mirror and spraying low-temperature air. The method of claim 1, The reflector is, A reflection mirror plate installed outside the lamp to have an overall arc shape and bent at regular intervals to transmit light to the first reflection mirror; And a heat sink coupled to an outer surface of the reflective mirror plate and dissipating heat radiated from the lamp to the outside. The method according to claim 1 or 4, The chamber, And an inner and outer cover further provided with a duct for exhausting heat emitted from the heat sink to the outside. The method according to any one of claims 1 to 4, The lamp, Exposure apparatus with the cooling device, characterized in that the linear lamp having a form of a rod installed in the longitudinal direction. The method of claim 7, wherein The inner and outer cover, Exposure equipment provided with the cooling device, characterized in that any one cover is provided with a heat insulating material. In the cooling system for exposure equipment for condensing the light generated by the lamp installed in the chamber to expose the wafer or the substrate, Lamp cooling unit for injecting low-temperature air to the lamp; A cooling pipe installed at a side of the chamber to supply and circulate low temperature water so as to maintain a constant internal temperature; And And a mirror cooling unit for injecting low-temperature air to the surface of the reflecting mirror reflecting the light collected through the reflecting plate to the lens. The method of claim 10, The cooling system for exposure equipment, And an auxiliary chamber connected to the lower side of the chamber to secure a path of parallel light transmitted through the reflective plate to the reflective mirror. And a water cooling circulation tube installed at a side of the auxiliary chamber to supply and circulate low temperature water so as to maintain a constant internal temperature.

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