KR100743512B1 - 표면처리 동박의 제조방법 - Google Patents
표면처리 동박의 제조방법 Download PDFInfo
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- KR100743512B1 KR100743512B1 KR1020017011509A KR20017011509A KR100743512B1 KR 100743512 B1 KR100743512 B1 KR 100743512B1 KR 1020017011509 A KR1020017011509 A KR 1020017011509A KR 20017011509 A KR20017011509 A KR 20017011509A KR 100743512 B1 KR100743512 B1 KR 100743512B1
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- copper foil
- copper
- silane coupling
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/20—Use of solutions containing silanes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0307—Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12431—Foil or filament smaller than 6 mils
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Laminated Bodies (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Chemical Treatment Of Metals (AREA)
Abstract
Description
(3)표면처리 동박의 제조방법은, 동박의 표면에 조화(粗化)처리면을 형성하고, 방청처리를 실시하여, 조화처리면에 실레인 커플링제를 흡착시켜, 건조하는 프린트 배선판용 동박의 표면처리 방법에 있어서, 방청처리는 아연-동-니켈의 3원합금 도금을 하고, 이어서 전해 크로메이트도금을 하는 것 으로, 전해 크로메이트도금후에 동박표면을 건조시켜, 실레인 커플링제를 흡착시키고, 전해동박 자체의 온도가 105℃∼180℃의 범위가 되는 고온 분위기 내에서 2~6초간 유지하는 것에 의해 건조하는 것으로 표면처리 동박을 얻는 것이다.
(5)표면처리 동박의 제조방법은, 동박의 표면에 조화처리면을 형성하여, 방청처리를 실시하고, 조화처리면에 실레인 커플링제를 흡착시켜, 건조하는 것인 전해동박의 표면처리 방법에 있어서, 조화처리면의 형성은, 동박의 표면에 미세 동입자를 석출시키고, 미세 동입자의 탈락을 방지하기 위한 피복도금을 하여, 극미세 동입자를 석출 부착시키고, 방청처리는 아연-동-니켈의 3원합금 도금을 하고, 이어서 전해 크로메이트도금을 하는 것이며, 전해 크로메이트도금후에 동박표면을 건조시키고, 실레인 커플링제를 흡착시켜, 전해동박 자체의 온도가 105℃~180℃ 범위가 되는 고온 분위기 내에서 2~6초간 유지하여 건조하는 것에 의해 표면처리 동박을 얻는 것이다.
Claims (10)
- 삭제
- 삭제
- 삭제
- 삭제
- 동박의 표면에 조화처리면을 형성하고, 방청처리를 실시하며, 조화처리면에 실레인 커플링제를 흡착시키고, 건조하는 것인 프린트 배선판용 동박의 표면처리 방법에 있어서,방청처리는 아연-동-니켈의 3원합금 도금을 하고, 이어서 전해 크로메이트도금을 하는 것이고,전해 크로메이트도금 후에 동박표면을 건조시키고, 실레인 커플링제를 흡착시키며, 전해동박자체의 온도가 105℃∼180℃범위로 되는 고온 분위기 내에서 2∼6초간 유지하여 건조하는 것을 특징으로 하는 표면처리동박의 제조방법.
- 삭제
- 동박의 표면에 조화처리면을 형성하고, 방청처리를 실시하며, 조화처리면에 실레인 커플링제를 흡착시키고, 건조하는 전해동박의 표면처리 방법에 있어서,조화처리면의 형성은 동박의 표면에 미세 동입자를 석출시켜, 미세 동입자의 탈락을 방지하기 위한 피복도금을 하고, 극 미세 동입자를 석출부착시키며,방청처리는 아연-동-니켈의 3원합금 도금을 하여, 계속하여 전해 크로메이트도금을 하는 것으로서,전해 크로메이트도금 후에 동박표면을 건조시키고, 실레인 커플링제를 흡착시키며, 전해동박 자체의 온도가 105℃∼180℃의 온도가 되는 고온 분위기 내에서 2∼6초간 유지하여 건조하는 것을 특징으로 하는 표면처리동박의 제조방법.
- 동박의 표면에 조화처리면을 형성하고, 방청처리를 실시하며, 조화처리면에 실레인 커플링제를 흡착시키고, 건조하는 전해동박의 표면처리방법에 있어서,조화처리면의 형성은, 동박의 표면에 미세 동입자를 석출시켜, 미세 동입자의 탈락을 방지하기 위한 피복도금을 하고, 극 미세 동입자를 석출부착시키며,방청처리는 아연-동-니켈의 3원합금 도금을 하고, 계속하여 전해 크로메이트도금을 하는 것으로서,상기 전해 크로메이트도금을 한 표면을 건조시키지 않고, 실레인 커플링제를 흡착시키고, 그 후에 전해동박 자체의 온도가 110℃∼200℃ 범위가 되는 고온 분위기 내에서 2∼6초간 유지하여 건조하는 것을 특징으로 하는 표면처리 동박의 제조방법.
- 제 7항 또는 제 8항에 있어서,극 미세 동입자는 9 - 페닐아크리딘(phenylacridine)을 첨가한 동 전해액을 사용하여 형성하는 것을 특징으로 하는 표면처리 동박의 제조방법.
- 삭제
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2000-00020884 | 2000-01-28 | ||
JP2000020884A JP3670185B2 (ja) | 2000-01-28 | 2000-01-28 | プリント配線板用表面処理銅箔の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010102562A KR20010102562A (ko) | 2001-11-15 |
KR100743512B1 true KR100743512B1 (ko) | 2007-07-27 |
Family
ID=18547373
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020017011509A Expired - Fee Related KR100743512B1 (ko) | 2000-01-28 | 2001-01-24 | 표면처리 동박의 제조방법 |
Country Status (10)
Country | Link |
---|---|
US (1) | US6531045B2 (ko) |
EP (1) | EP1185152B1 (ko) |
JP (1) | JP3670185B2 (ko) |
KR (1) | KR100743512B1 (ko) |
CN (1) | CN1213645C (ko) |
AT (1) | ATE402594T1 (ko) |
DE (1) | DE60134926D1 (ko) |
MY (1) | MY128582A (ko) |
TW (1) | TW511407B (ko) |
WO (1) | WO2001056343A1 (ko) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4144711B2 (ja) * | 2002-06-04 | 2008-09-03 | 三井金属鉱業株式会社 | 低誘電性基材用表面処理銅箔及びそれを用いた銅張積層板並びにプリント配線板 |
KR101065758B1 (ko) * | 2003-02-27 | 2011-09-19 | 후루카와 덴키 고교 가부시키가이샤 | 전자파 실드용 동박, 그 제조방법 및 전자파 실드체 |
TW200721932A (en) | 2004-01-30 | 2007-06-01 | Hitachi Chemical Co Ltd | Adhesion assisting agent-bearing metal foil, printed wiring board, and production method of printed wiring board |
JP4913328B2 (ja) * | 2004-01-30 | 2012-04-11 | 日立化成工業株式会社 | 接着補助剤付金属箔及びそれを用いたプリント配線板 |
JP4567360B2 (ja) * | 2004-04-02 | 2010-10-20 | 三井金属鉱業株式会社 | 銅箔の製造方法及びその製造方法で得られる銅箔 |
WO2009041292A1 (ja) * | 2007-09-28 | 2009-04-02 | Nippon Mining & Metals Co., Ltd. | 印刷回路用銅箔及び銅張積層板 |
CN101556846B (zh) * | 2009-05-19 | 2010-11-03 | 丹凤县永鑫电子材料有限责任公司 | 镀镍铈合金软铜线生产工艺 |
JP5254491B2 (ja) * | 2010-02-24 | 2013-08-07 | Jx日鉱日石金属株式会社 | 印刷回路基板用銅箔及び印刷回路基板用銅張積層板 |
CN103924269B (zh) * | 2013-12-26 | 2016-04-13 | 苏州昕皓新材料科技有限公司 | 一种非染料系整平剂的应用 |
CN103924268B (zh) * | 2013-12-26 | 2016-04-13 | 苏州昕皓新材料科技有限公司 | 一种酸铜整平剂的应用 |
JP6570430B2 (ja) * | 2015-11-12 | 2019-09-04 | Jx金属株式会社 | キャリア付銅箔の製造方法、プリント配線板の製造方法及び電子機器の製造方法 |
JP7033905B2 (ja) * | 2017-02-07 | 2022-03-11 | Jx金属株式会社 | 表面処理銅箔、キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
JP7366436B2 (ja) | 2021-05-31 | 2023-10-23 | 古河電気工業株式会社 | 表面処理銅箔、銅張積層板、及びプリント配線板 |
CN117181676A (zh) * | 2023-09-11 | 2023-12-08 | 昆山先捷精密电子有限公司 | 一种提高电解铜性能的表面处理装置和方法 |
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JPH07231161A (ja) * | 1994-02-15 | 1995-08-29 | Mitsui Mining & Smelting Co Ltd | プリント配線板用銅箔およびその製造方法 |
JPH07258870A (ja) * | 1994-03-24 | 1995-10-09 | Mitsui Mining & Smelting Co Ltd | 有機防錆処理銅箔およびその製造方法 |
Family Cites Families (9)
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JPS5515216A (en) * | 1978-07-20 | 1980-02-02 | Mitsui Anakonda Dohaku Kk | Printed circut copper foil and method of manufacturing same |
KR930006103B1 (ko) * | 1991-03-11 | 1993-07-07 | 덕산금속 주식회사 | 인쇄회로용 전해동박 및 그 제조방법 |
US5215646A (en) * | 1992-05-06 | 1993-06-01 | Circuit Foil Usa, Inc. | Low profile copper foil and process and apparatus for making bondable metal foils |
JP2717911B2 (ja) * | 1992-11-19 | 1998-02-25 | 日鉱グールド・フォイル株式会社 | 印刷回路用銅箔及びその製造方法 |
US5482784A (en) * | 1993-12-24 | 1996-01-09 | Mitsui Mining And Smelting Co., Ltd. | Printed circuit inner-layer copper foil and process for producing the same |
JP2684164B2 (ja) * | 1995-03-17 | 1997-12-03 | 福田金属箔粉工業株式会社 | 印刷回路用銅箔の表面処理方法 |
JPH0974273A (ja) * | 1995-06-27 | 1997-03-18 | Nippon Denkai Kk | プリント回路用銅張積層板とその接着剤 |
MY138743A (en) * | 1996-05-13 | 2009-07-31 | Mitsui Mining & Smelting Co | High tensile strength electrodeposited copper foil and the production process of the same |
JPH10341066A (ja) * | 1997-06-10 | 1998-12-22 | Furukawa Electric Co Ltd:The | 印刷回路用銅箔、前記銅箔を用いた印刷回路用樹脂接着剤付銅箔、および前記銅箔を用いた印刷回路用銅張り積層板 |
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2000
- 2000-01-28 JP JP2000020884A patent/JP3670185B2/ja not_active Expired - Lifetime
-
2001
- 2001-01-16 TW TW090100897A patent/TW511407B/zh not_active IP Right Cessation
- 2001-01-23 MY MYPI20010316A patent/MY128582A/en unknown
- 2001-01-24 AT AT01947018T patent/ATE402594T1/de not_active IP Right Cessation
- 2001-01-24 KR KR1020017011509A patent/KR100743512B1/ko not_active Expired - Fee Related
- 2001-01-24 DE DE60134926T patent/DE60134926D1/de not_active Expired - Lifetime
- 2001-01-24 WO PCT/JP2001/000432 patent/WO2001056343A1/ja active IP Right Grant
- 2001-01-24 EP EP01947018A patent/EP1185152B1/en not_active Expired - Lifetime
- 2001-01-24 CN CNB018001106A patent/CN1213645C/zh not_active Expired - Lifetime
- 2001-01-26 US US09/769,244 patent/US6531045B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07231161A (ja) * | 1994-02-15 | 1995-08-29 | Mitsui Mining & Smelting Co Ltd | プリント配線板用銅箔およびその製造方法 |
JPH07258870A (ja) * | 1994-03-24 | 1995-10-09 | Mitsui Mining & Smelting Co Ltd | 有機防錆処理銅箔およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20010102562A (ko) | 2001-11-15 |
EP1185152A4 (en) | 2006-11-22 |
WO2001056343A1 (fr) | 2001-08-02 |
TW511407B (en) | 2002-11-21 |
US6531045B2 (en) | 2003-03-11 |
CN1213645C (zh) | 2005-08-03 |
JP3670185B2 (ja) | 2005-07-13 |
MY128582A (en) | 2007-02-28 |
EP1185152A1 (en) | 2002-03-06 |
ATE402594T1 (de) | 2008-08-15 |
DE60134926D1 (de) | 2008-09-04 |
US20010014406A1 (en) | 2001-08-16 |
CN1358407A (zh) | 2002-07-10 |
JP2001214298A (ja) | 2001-08-07 |
EP1185152B1 (en) | 2008-07-23 |
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