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KR100659412B1 - 웨이퍼이송시스템, 웨이퍼이송방법 및 무인운반차시스템 - Google Patents

웨이퍼이송시스템, 웨이퍼이송방법 및 무인운반차시스템 Download PDF

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Publication number
KR100659412B1
KR100659412B1 KR1020020009527A KR20020009527A KR100659412B1 KR 100659412 B1 KR100659412 B1 KR 100659412B1 KR 1020020009527 A KR1020020009527 A KR 1020020009527A KR 20020009527 A KR20020009527 A KR 20020009527A KR 100659412 B1 KR100659412 B1 KR 100659412B1
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KR
South Korea
Prior art keywords
wafer
mounting table
mark
transfer
turntable
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Expired - Fee Related
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KR1020020009527A
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English (en)
Korean (ko)
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KR20030010478A (ko
Inventor
토미타마사루
아키야마슈지
Original Assignee
도쿄 엘렉트론 가부시키가이샤
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Publication of KR20030010478A publication Critical patent/KR20030010478A/ko
Application granted granted Critical
Publication of KR100659412B1 publication Critical patent/KR100659412B1/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67294—Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Position, Course, Altitude, Or Attitude Of Moving Bodies (AREA)
KR1020020009527A 2001-07-24 2002-02-22 웨이퍼이송시스템, 웨이퍼이송방법 및 무인운반차시스템 Expired - Fee Related KR100659412B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2001-00223059 2001-07-24
JP2001223059A JP4219579B2 (ja) 2001-07-24 2001-07-24 ウエハ移載システム及びウエハ移載方法、並びに無人搬送車システム

Publications (2)

Publication Number Publication Date
KR20030010478A KR20030010478A (ko) 2003-02-05
KR100659412B1 true KR100659412B1 (ko) 2006-12-18

Family

ID=19056452

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020009527A Expired - Fee Related KR100659412B1 (ko) 2001-07-24 2002-02-22 웨이퍼이송시스템, 웨이퍼이송방법 및 무인운반차시스템

Country Status (5)

Country Link
US (1) US6721626B2 (ja)
EP (1) EP1280186A3 (ja)
JP (1) JP4219579B2 (ja)
KR (1) KR100659412B1 (ja)
TW (1) TW544381B (ja)

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* Cited by examiner, † Cited by third party
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TWI256372B (en) * 2001-12-27 2006-06-11 Tokyo Electron Ltd Carrier system of polishing processing body and conveying method of polishing processing body
KR20040062137A (ko) * 2002-12-31 2004-07-07 엘지.필립스 엘시디 주식회사 기판 반송 시스템
JP2004281475A (ja) * 2003-03-12 2004-10-07 Seiko Epson Corp 枚葉搬送装置および枚葉搬送方法
TWI282047B (en) * 2003-07-23 2007-06-01 Murata Machinery Ltd Carrying vehicle system and carrying vehicle
JP4647197B2 (ja) * 2003-09-17 2011-03-09 東京エレクトロン株式会社 被処理体の搬送方法及びコンピュータ読取可能な記憶媒体
TWI290272B (en) * 2004-03-12 2007-11-21 Murata Machinery Ltd Moving body system
JP4128973B2 (ja) * 2004-03-30 2008-07-30 株式会社日立ハイテクノロジーズ 真空処理装置及び真空処理方法
US7342642B2 (en) * 2005-06-20 2008-03-11 Asml Netherlands B.V. Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method
US8233696B2 (en) 2007-09-22 2012-07-31 Dynamic Micro System Semiconductor Equipment GmbH Simultaneous wafer ID reading
US20090319653A1 (en) * 2008-06-20 2009-12-24 International Business Machines Corporation Server configuration management method
JP5115363B2 (ja) * 2008-07-02 2013-01-09 株式会社安川電機 ウェハのアライメント装置、それを備えた搬送装置、半導体製造装置、および半導体ウェハのアライメント方法
TWI469902B (zh) 2011-04-11 2015-01-21 Univ Nat Kaohsiung Applied Sci 無人無軌式搬運車
JP5756032B2 (ja) * 2012-01-24 2015-07-29 株式会社安川電機 ロボットシステム
CN107742613B (zh) * 2012-04-25 2021-03-09 应用材料公司 晶片边缘的测量和控制
JP6316082B2 (ja) * 2014-04-30 2018-04-25 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP6285275B2 (ja) * 2014-04-30 2018-02-28 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
FR3034410B1 (fr) * 2015-04-02 2020-10-23 Gebo Packaging Solutions France Dispositif de convoyage par chariot autonome
US10515834B2 (en) * 2015-10-12 2019-12-24 Lam Research Corporation Multi-station tool with wafer transfer microclimate systems
CN110517980B (zh) * 2019-09-25 2024-04-26 沈阳芯达半导体设备有限公司 一种半导体行业用晶圆自动传送机构
CN115064464A (zh) * 2022-05-25 2022-09-16 深圳市轴心自控技术有限公司 一种晶圆中心位置对正及身份识别设备及校正方法
CN114975185A (zh) * 2022-06-07 2022-08-30 深圳市轴心自控技术有限公司 一种晶圆平面位置校正及字符识别设备

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308222A (en) * 1991-05-17 1994-05-03 Kensington Laboratories, Inc. Noncentering specimen prealigner
US5387067A (en) * 1993-01-14 1995-02-07 Applied Materials, Inc. Direct load/unload semiconductor wafer cassette apparatus and transfer system
JPH07117847A (ja) 1993-10-21 1995-05-09 Ebara Corp 搬送装置
US6366830B2 (en) * 1995-07-10 2002-04-02 Newport Corporation Self-teaching robot arm position method to compensate for support structure component alignment offset
JPH0969477A (ja) * 1995-08-30 1997-03-11 Hitachi Ltd 半導体ウエハ分類装置
KR100264312B1 (ko) * 1995-10-13 2000-08-16 디지래드 개선된 전하 수집능력을 갖는 반도체 방사선 검출기
US5870488A (en) * 1996-05-07 1999-02-09 Fortrend Engineering Corporation Method and apparatus for prealigning wafers in a wafer sorting system
US5928389A (en) * 1996-10-21 1999-07-27 Applied Materials, Inc. Method and apparatus for priority based scheduling of wafer processing within a multiple chamber semiconductor wafer processing tool
US5944476A (en) * 1997-03-26 1999-08-31 Kensington Laboratories, Inc. Unitary specimen prealigner and continuously rotatable multiple link robot arm mechanism
KR19990027324A (ko) * 1997-09-29 1999-04-15 윤종용 웨이퍼 인식 시스템을 구비하는 멀티 챔버 시스템과 이를 이용한 웨이퍼 가공방법
US6146077A (en) * 1998-01-13 2000-11-14 Samsung Electronics Co., Ltd. Wafer transfer system of semiconductor fabricating equipment using a serial number detecting device
US6478532B1 (en) * 1999-11-30 2002-11-12 Asyst Technologies, Inc. Wafer orienting and reading mechanism

Also Published As

Publication number Publication date
US6721626B2 (en) 2004-04-13
JP4219579B2 (ja) 2009-02-04
US20030023343A1 (en) 2003-01-30
KR20030010478A (ko) 2003-02-05
EP1280186A2 (en) 2003-01-29
JP2003037152A (ja) 2003-02-07
EP1280186A3 (en) 2010-02-24
TW544381B (en) 2003-08-01

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