KR100537138B1 - 올가노폴리실록산 조성물 - Google Patents
올가노폴리실록산 조성물 Download PDFInfo
- Publication number
- KR100537138B1 KR100537138B1 KR10-1999-7005430A KR19997005430A KR100537138B1 KR 100537138 B1 KR100537138 B1 KR 100537138B1 KR 19997005430 A KR19997005430 A KR 19997005430A KR 100537138 B1 KR100537138 B1 KR 100537138B1
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- South Korea
- Prior art keywords
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- compound
- polymer
- platinum
- addition reaction
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 46
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 128
- -1 thiophene compound Chemical class 0.000 claims abstract description 100
- 229920000642 polymer Polymers 0.000 claims abstract description 78
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 61
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Divinylene sulfide Natural products C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000003054 catalyst Substances 0.000 claims abstract description 25
- 238000007259 addition reaction Methods 0.000 claims abstract description 20
- 125000000524 functional group Chemical group 0.000 claims abstract description 19
- 229930192474 thiophene Natural products 0.000 claims abstract description 18
- 150000001875 compounds Chemical class 0.000 claims abstract description 16
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 13
- 239000002683 reaction inhibitor Substances 0.000 claims abstract description 13
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 claims abstract description 9
- 150000004294 cyclic thioethers Chemical class 0.000 claims abstract description 6
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 4
- 150000002430 hydrocarbons Chemical group 0.000 claims description 19
- 125000000101 thioether group Chemical group 0.000 claims description 19
- 125000003118 aryl group Chemical group 0.000 claims description 15
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
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- 238000003860 storage Methods 0.000 abstract description 10
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- 238000004321 preservation Methods 0.000 abstract description 2
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
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- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000000753 cycloalkyl group Chemical group 0.000 description 6
- 125000000732 arylene group Chemical group 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 5
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- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 3
- QMMFVYPAHWMCMS-UHFFFAOYSA-N Dimethyl sulfide Chemical compound CSC QMMFVYPAHWMCMS-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
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- 239000007810 chemical reaction solvent Substances 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
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- 125000005843 halogen group Chemical group 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 150000004687 hexahydrates Chemical class 0.000 description 3
- 230000002401 inhibitory effect Effects 0.000 description 3
- 150000002527 isonitriles Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- RCIBIGQXGCBBCT-UHFFFAOYSA-N phenyl isocyanide Chemical compound [C-]#[N+]C1=CC=CC=C1 RCIBIGQXGCBBCT-UHFFFAOYSA-N 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 150000003577 thiophenes Chemical class 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- BLZKSRBAQDZAIX-UHFFFAOYSA-N 2-methyl-1-benzothiophene Chemical compound C1=CC=C2SC(C)=CC2=C1 BLZKSRBAQDZAIX-UHFFFAOYSA-N 0.000 description 2
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- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
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- 238000000354 decomposition reaction Methods 0.000 description 2
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 2
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- 238000001035 drying Methods 0.000 description 2
- RJUVPCYAOBNZAX-VOTSOKGWSA-N ethyl (e)-3-(dimethylamino)-2-methylprop-2-enoate Chemical compound CCOC(=O)C(\C)=C\N(C)C RJUVPCYAOBNZAX-VOTSOKGWSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
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- 238000001879 gelation Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
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- IWVKTOUOPHGZRX-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C IWVKTOUOPHGZRX-UHFFFAOYSA-N 0.000 description 2
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- HGHZICGHCZFYNX-UHFFFAOYSA-N 1-isocyano-2-methylbenzene Chemical compound CC1=CC=CC=C1[N+]#[C-] HGHZICGHCZFYNX-UHFFFAOYSA-N 0.000 description 1
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- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
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- 230000001771 impaired effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- RIWNFZUWWRVGEU-UHFFFAOYSA-N isocyanomethylbenzene Chemical compound [C-]#[N+]CC1=CC=CC=C1 RIWNFZUWWRVGEU-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical compound [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- XVPVLVKWFUYVGT-UHFFFAOYSA-N n,1,1-triphenylmethanimine Chemical compound C1=CC=CC=C1N=C(C=1C=CC=CC=1)C1=CC=CC=C1 XVPVLVKWFUYVGT-UHFFFAOYSA-N 0.000 description 1
- CBXWICRJSHEQJT-UHFFFAOYSA-N n,1-diphenylethanimine Chemical compound C=1C=CC=CC=1C(C)=NC1=CC=CC=C1 CBXWICRJSHEQJT-UHFFFAOYSA-N 0.000 description 1
- UVEWQKMPXAHFST-UHFFFAOYSA-N n,1-diphenylmethanimine Chemical compound C=1C=CC=CC=1C=NC1=CC=CC=C1 UVEWQKMPXAHFST-UHFFFAOYSA-N 0.000 description 1
- ZFKWRXUWOWXNMZ-UHFFFAOYSA-N n-(1,2-diphenylethenyl)aniline Chemical compound C=1C=CC=CC=1NC(C=1C=CC=CC=1)=CC1=CC=CC=C1 ZFKWRXUWOWXNMZ-UHFFFAOYSA-N 0.000 description 1
- HXTGGPKOEKKUQO-UHFFFAOYSA-N n-methyl-1-phenylmethanimine Chemical compound CN=CC1=CC=CC=C1 HXTGGPKOEKKUQO-UHFFFAOYSA-N 0.000 description 1
- BHGHXAOHFWSPNE-UHFFFAOYSA-N n-phenylethanimine Chemical compound CC=NC1=CC=CC=C1 BHGHXAOHFWSPNE-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229940117953 phenylisothiocyanate Drugs 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000028327 secretion Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- FAGLEPBREOXSAC-UHFFFAOYSA-N tert-butyl isocyanide Chemical compound CC(C)(C)[N+]#[C-] FAGLEPBREOXSAC-UHFFFAOYSA-N 0.000 description 1
- SLIOYUPLNYLSSR-UHFFFAOYSA-J tetrachloroplatinum;hydrate;dihydrochloride Chemical compound O.Cl.Cl.Cl[Pt](Cl)(Cl)Cl SLIOYUPLNYLSSR-UHFFFAOYSA-J 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/45—Heterocyclic compounds having sulfur in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/315—Compounds containing carbon-to-nitrogen triple bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
Abstract
Description
Claims (8)
- 알케닐기함유 올가노폴리실록산 중의 알케닐기 1개에 대해 올가노하이드로젠 폴리실록산 중의 규소원자에 직접 결합한 수소원자가 0.2~5개로 되는 양, 백금촉매 가 가열경화성 올가노실록산 조성물의 중량을 기준으로 하여 10ppm~1000ppm 및 반응억제제가 백금화합물 1~5당량으로 이루어지는 부가반응경화형 올가노폴리실록산 조성물에 있어서, 그 반응억제제가 티오펜화합물, 이소시아니드 화합물, 일반식단 R5는 탄소수 3-18의 2가의 탄화수소기이며, n은 3-8의 정수이다,로 표시되는 환상티오에테르화합물, 환상아조에테르화합물, 이미노화합물 및 백금원자와 착체를 형성할 수 있는 황원자, 질소원자 또는 인원자함유 관능기를 1분자 중에 복수갖는 평균분자량 1,000∼200,000의 폴리머로 이루어지는 군으로부터 선택되는 1의 멤버인 것을 특징으로 하는 부가반응경화형 올가노폴리실록산 조성물.
- 제1항에 있어서 티오펜화합물이 일반식[T] n 또는 Ar-T-Ar'단 T은 티오펜분자 골격이며, Ar는 아릴기 또는 아릴알킬기이며, Ar' 는 아릴기, 아릴알킬기 또는 수소원자이다, 로 표시되는 것을 특징으로 하는 부가반응경화형 올가노폴리실록산 조성물.
- 제1항에 있어서 이소시아니드 화합물이 일반식R1 - NC단 R1은 탄소수 1-18의 탄화수소기이다,로 표시되는 것을 특징으로 하는 부가반응경화형 올가노폴리실록산 조성물.
- 제1항에 있어서 환상아조에테르 화합물이 일반식단 R5 는 탄소수 3-18의 2가의 탄화수소기이며, n은 3∼8의 정수이다,로 표시되는 것을 특징으로 하는 부가반응경화형 올가노폴리실록산 조성물.
- 제1항에 있어서 이미노화합물이 일반식R2 - N = C (R3, R4)단 R2 는 탄소수 1-12의 비치환 또는 치환탄화수소기이며, R3 및 R4 는 각각 독립으로 수소원자, 또는 탄소수 1-12의 비치환 또는 치환탄화수소이다,로 표시되는 것을 특징으로 하는 부가반응경화형 올가노폴리실록산 조성물.
- 제1항에 있어서 폴리머에 결합하고 있는 관능기가 설피드기, 2급 혹은 3급 아미노기, 호스핀기, 티오펜기 또는 이미노기인 것을 특징으로 하는 부가반응경화형 올가노폴리실록산 조성물.
- 제6항에 있어서 폴리머가 아크릴계 폴리머, 비닐알코올계 폴리머, 스틸렌계 폴리머 또는 페놀수지인 것을 특징으로 하는 부가반응경화형 올가노폴리실록산 조성물.
- 삭제
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34110496 | 1996-12-20 | ||
JP1996-341103 | 1996-12-20 | ||
JP34110396 | 1996-12-20 | ||
JP1996-341104 | 1996-12-20 | ||
JP1997-209574 | 1997-06-30 | ||
JP20957497 | 1997-06-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20000057632A KR20000057632A (ko) | 2000-09-25 |
KR100537138B1 true KR100537138B1 (ko) | 2005-12-16 |
Family
ID=27329013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-1999-7005430A Expired - Fee Related KR100537138B1 (ko) | 1996-12-20 | 1997-12-19 | 올가노폴리실록산 조성물 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6235861B1 (ko) |
EP (1) | EP0947561B1 (ko) |
JP (1) | JP3528969B2 (ko) |
KR (1) | KR100537138B1 (ko) |
CN (1) | CN1140587C (ko) |
DE (1) | DE69711921T2 (ko) |
WO (1) | WO1998028366A1 (ko) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100758316B1 (ko) * | 2001-12-29 | 2007-09-13 | 주식회사 케이씨씨 | 자기소화성을 가지는 2액형 부가형 상온경화형 실리콘고무의 조성물 |
US20030234172A1 (en) * | 2002-06-25 | 2003-12-25 | Arthur Alan R. | Method of facilitating a chemical reaction by applying radio frequency energy |
US7687587B2 (en) * | 2004-11-19 | 2010-03-30 | Dow Corning Corporation | Silicone composition and cured silicone resin |
FR2913688A1 (fr) * | 2007-03-15 | 2008-09-19 | Bluestar Silicones France Soc | Article comprenant un gel silicone additive d'un principe actif anti-odeur |
CN101045819B (zh) * | 2007-04-30 | 2011-03-09 | 东莞市贝特利新材料有限公司 | 一种有机硅树脂组合物 |
US8513323B2 (en) * | 2007-06-22 | 2013-08-20 | Kimbery-Clark Worldwide, Inc. | Multifunctional silicone blends |
WO2009066608A1 (ja) * | 2007-11-19 | 2009-05-28 | Toagosei Co., Ltd. | ポリシロキサンおよびその製造方法ならびに硬化物の製造方法 |
US11392037B2 (en) | 2008-02-18 | 2022-07-19 | Nissan Chemical Industries, Ltd. | Resist underlayer film forming composition containing silicone having cyclic amino group |
CN102124064B (zh) | 2008-08-18 | 2014-09-03 | 日产化学工业株式会社 | 具有*基的含硅的抗蚀剂下层膜形成用组合物 |
US8835093B2 (en) | 2008-12-19 | 2014-09-16 | Nissan Chemical Industries, Ltd. | Resist underlayer film forming composition containing silicon having anion group |
US9217921B2 (en) | 2009-06-02 | 2015-12-22 | Nissan Chemical Industries, Ltd. | Resist underlayer film forming composition containing silicon having sulfide bond |
WO2011102470A1 (ja) | 2010-02-19 | 2011-08-25 | 日産化学工業株式会社 | 窒素含有環を有するシリコン含有レジスト下層膜形成組成物 |
CN102093581A (zh) * | 2010-12-24 | 2011-06-15 | 东莞市贝特利新材料有限公司 | Led封装用噻吩基苯基硅树脂的合成方法 |
KR102534344B1 (ko) * | 2015-07-09 | 2023-05-22 | 모멘티브 퍼포먼스 머티리얼즈 인크. | 황 화합물 및 백금 촉매를 사용하는 실록산 가교 방법 |
JP6656045B2 (ja) | 2016-03-29 | 2020-03-04 | 信越化学工業株式会社 | 担持白金触媒を含有する樹脂組成物、及びそれを用いた熱硬化性オルガノポリシロキサン組成物ならびにその硬化方法 |
HRP20240504T1 (hr) | 2017-02-08 | 2024-07-05 | Elkem Silicones USA Corp. | Sekundarni paket baterija s poboljšanim toplinskim upravljanjem |
KR20200052872A (ko) * | 2017-07-19 | 2020-05-15 | 아반토 퍼포먼스 머티리얼즈, 엘엘씨 | 동적 공유 폴리실록산을 포함하는 경화성 유기폴리실록산 조성물. |
JP7103371B2 (ja) * | 2017-11-15 | 2022-07-20 | 信越化学工業株式会社 | オルガノポリシロキサン組成物 |
KR20210104800A (ko) * | 2018-12-18 | 2021-08-25 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 부가 경화성 실리콘 고무 조성물 및 그 제조 방법 |
JP7306313B2 (ja) * | 2020-04-21 | 2023-07-11 | 信越化学工業株式会社 | (ポリ)チオフェン-(ポリ)シロキサンブロックコポリマー及びその製造方法 |
JP6997834B1 (ja) * | 2020-06-26 | 2022-01-24 | デクセリアルズ株式会社 | 熱伝導性樹脂組成物及びこれを用いた熱伝導性シート |
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US5122585A (en) * | 1990-12-10 | 1992-06-16 | General Electric Company | One part heat curable organopolysiloxane compositions |
EP0654497B1 (en) * | 1993-11-18 | 1999-02-10 | Shin-Etsu Chemical Co., Ltd. | Cure control of silicone rubber compositions |
JP3111804B2 (ja) * | 1994-04-25 | 2000-11-27 | 信越化学工業株式会社 | シリコーンゴム組成物 |
DE19634971A1 (de) * | 1996-08-29 | 1998-03-05 | Wacker Chemie Gmbh | Flüssigsiliconkautschuk mit verbessertem Druckverformungsrest |
US6010646A (en) * | 1997-04-11 | 2000-01-04 | Potters Industries, Inc. | Electroconductive composition and methods for producing such composition |
DE19735813A1 (de) * | 1997-08-18 | 1999-02-25 | Wacker Chemie Gmbh | Kompressiblen Schwefel enthaltender Siliconkautschuk |
-
1997
- 1997-12-19 DE DE69711921T patent/DE69711921T2/de not_active Expired - Lifetime
- 1997-12-19 US US09/331,142 patent/US6235861B1/en not_active Expired - Lifetime
- 1997-12-19 KR KR10-1999-7005430A patent/KR100537138B1/ko not_active Expired - Fee Related
- 1997-12-19 EP EP97949186A patent/EP0947561B1/en not_active Expired - Lifetime
- 1997-12-19 JP JP52862998A patent/JP3528969B2/ja not_active Expired - Fee Related
- 1997-12-19 WO PCT/JP1997/004729 patent/WO1998028366A1/ja active IP Right Grant
- 1997-12-19 CN CNB971818770A patent/CN1140587C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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JP3528969B2 (ja) | 2004-05-24 |
WO1998028366A1 (fr) | 1998-07-02 |
EP0947561A4 (en) | 2000-07-19 |
CN1140587C (zh) | 2004-03-03 |
CN1247554A (zh) | 2000-03-15 |
DE69711921D1 (de) | 2002-05-16 |
EP0947561B1 (en) | 2002-04-10 |
KR20000057632A (ko) | 2000-09-25 |
EP0947561A1 (en) | 1999-10-06 |
US6235861B1 (en) | 2001-05-22 |
DE69711921T2 (de) | 2002-11-07 |
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