KR100523765B1 - 유기초분자의 나노패턴을 이용한 탄소나노튜브 어레이의제작방법 - Google Patents
유기초분자의 나노패턴을 이용한 탄소나노튜브 어레이의제작방법 Download PDFInfo
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- KR100523765B1 KR100523765B1 KR10-2003-0037753A KR20030037753A KR100523765B1 KR 100523765 B1 KR100523765 B1 KR 100523765B1 KR 20030037753 A KR20030037753 A KR 20030037753A KR 100523765 B1 KR100523765 B1 KR 100523765B1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02606—Nanotubes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/221—Carbon nanotubes
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
Claims (24)
- 하기의 단계를 포함하는 것을 특징으로 하는 탄소나노튜브(CNT) 어레이의 제작방법:(a) 기판 상에 자기조립을 유발하는 유기 초분자의 박막을 형성하는 단계;(b) 열처리(annealing)에 의해 상기 유기초분자들을 자기조립시켜 원기둥 모양의 규칙적인 구조를 형성하는 단계;(c) 상기 유기초분자들의 자기조립에 의해 형성된 원기둥 모양의 구조에 UV를 조사하여 탄소사슬이 모여 있는 중심부분을 분해하여 유기초분자의 나노패턴을 형성하는 단계; 및(d) 상기 유기초분자의 나노패턴에 CNT를 배열하는 단계.
- 제1항에 있어서, (a) 단계 이전에 기판 상에 금속, 비금속 또는 유기물의 중간층 박막을 형성시키는 것을 특징으로 하는 방법.
- 하기의 단계를 포함하는 것을 특징으로 하는 CNT 어레이의 제작 방법:(a) 기판 상에 자기조립을 유발하는 유기 초분자의 박막을 형성하는 단계;(b) 열처리(annealing)에 의해 상기 유기초분자들을 자기조립시켜 원기둥 모양의 규칙적인 구조를 형성하는 단계;(c) 상기 유기초분자들의 자기조립에 의해 형성된 원기둥 모양의 구조에 UV를 조사하여 탄소사슬이 모여 있는 중심부분을 분해하여 유기초분자의 나노패턴을 형성하는 단계;(d) 상기 유기초분자의 나노패턴을 마스크로 하여 기판을 식각하여 기판에 나노패턴을 형성하는 단계; 및(e) 상기 기판의 나노패턴에 CNT를 배열하는 단계.
- 제3항에 있어서, (a) 단계 이전에 기판 상에 금속, 비금속 또는 유기물의 중간층 박막을 형성시키는 것을 특징으로 하는 방법.
- 제1항 또는 제3항에 있어서, 유기 초분자는 디스크형 또는 덴드리머 쐐기형(fan-shaped) 유기 초분자인 것을 특징으로 하는 방법.
- 제5항에 있어서, 유기 초분자는 [화학식 6] 또는 [화학식 7]의 화합물인 것을 특징으로 하는 방법.[화학식 6] [화학식 7]
- 제1항 또는 제3항에 있어서, (b) 단계는 액정 상변이온도 이상으로 올린 후에 서냉하는 것을 특징으로 하는 방법.
- 제1항에 있어서, (d) 단계는 나노패턴의 기질상에 금속촉매를 증착시킨 후 CNT를 배열하는 것을 특징으로 하는 방법.
- 제8항에 있어서, 촉매는 철, 코발트 또는 니켈인 것을 특징으로 하는 방법.
- 제3항에 있어서, (e) 단계는 아민기를 노출시킨 기판에 카르복실기를 갖는 CNT를 아미드 결합으로 기판에 배열하고, 두 개의 아민기를 갖는 화학물질을 링커로 사용하여 CNT를 적층시키는 것을 특징으로 하는 방법.
- 제1항 또는 제2항의 방법에 의해 얻어진 CNT 어레이에 핵산, 단백질, 펩티드, 아미노산, 효소기질, 리간드, 아미노산, 코펙터, 탄수화물, 지질, 올리고뉴클레오티드 및 RNA로 구성된 군에서 선택된 바이오물질 또는 바이오 리셉터를 부착하는 것을 특징으로 하는 CNT-바이오 나노어레이의 제조방법.
- 제11항에 있어서, CNT에 전기장을 인가하여 바이오물질 또는 바이오 리셉터를 부착시키는 것을 특징으로 하는 방법.
- 제12항에 있어서, CNT에 바이오물질 또는 바이오 리셉터의 순 전하(net charge)와 반대되는 극성의 전하를 인가하는 것을 특징으로 하는 방법.
- 제11항에 있어서, 결합보조제를 이용하여 CNT와 바이오물질 또는 바이오 리셉터를 부착시키는 것을 특징으로 하는 방법.
- 제14항에 있어서, 결합 보조제는 카본기 말단에 알데히드, 아민 또는 이민기가 붙어 있는 화학물질인 것을 특징으로 하는 방법.
- 제3항 또는 제4항의 방법에 의해 얻어진 CNT 어레이에 핵산, 단백질, 펩티드, 아미노산, 효소기질, 리간드, 아미노산, 코펙터, 탄수화물, 지질, 올리고뉴클레오티드 및 RNA로 구성된 군에서 선택된 바이오물질 또는 바이오 리셉터를 부착하는 것을 특징으로 하는 CNT-바이오 나노어레이의 제조방법.
- 제16항에 있어서, CNT에 전기장을 인가하여 바이오물질 또는 바이오 리셉터를 결합시키는 것을 특징으로 하는 방법.
- 제17항에 있어서, CNT에 바이오물질 또는 바이오 리셉터의 순 전하(net charge)와 반대되는 극성의 전하를 인가하는 것을 특징으로 하는 방법.
- 제16항에 있어서, 결합보조제를 이용하여 CNT와 바이오물질 또는 바이오 리셉터를 결합시키는 것을 특징으로 하는 방법.
- 제19항에 있어서, 결합 보조제는 카본기 말단에 알데히드, 아민 또는 이민기가 붙어 있는 화학물질인 것을 특징으로 하는 방법.
- 제11항의 방법에 의해 얻어지고, 유기초분자의 나노패턴에 배열된 CNT 어레이에 핵산, 단백질, 펩티드, 아미노산, 효소기질, 리간드, 아미노산, 코펙터, 탄수화물, 지질, 올리고뉴클레오티드 및 RNA로 구성된 군에서 선택된 바이오물질 또는 바이오 리셉터가 부착되어 있는 것을 특징으로 하는 CNT-바이오 나노어레이.
- 제16항의 방법에 의해 얻어지고, 기판 또는 기판상에 형성된 박막의 나노패턴에 배열된 CNT 어레이에 핵산, 단백질, 펩티드, 아미노산, 효소기질, 리간드, 아미노산, 코펙터, 탄수화물, 지질, 올리고뉴클레오티드 및 RNA로 구성된 군에서 선택된 바이오물질 또는 바이오 리셉터를 부착되어 있는 것을 특징으로 하는 CNT-바이오 나노어레이.
- 제21항의 CNT-바이오 나노어레이를 이용하는 것을 특징을 하는 바이오물질과 바이오 리셉터간의 반응 검출방법.
- 제22항의 CNT-바이오 나노어레이를 이용하는 것을 특징을 하는 바이오물질과 바이오 리셉터간의 반응 검출방법.
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