KR100466418B1 - 내유화변색성, 내식성 및 도장성이 우수한 주석도금강판및 그 제조방법 - Google Patents
내유화변색성, 내식성 및 도장성이 우수한 주석도금강판및 그 제조방법 Download PDFInfo
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- KR100466418B1 KR100466418B1 KR10-2000-0070746A KR20000070746A KR100466418B1 KR 100466418 B1 KR100466418 B1 KR 100466418B1 KR 20000070746 A KR20000070746 A KR 20000070746A KR 100466418 B1 KR100466418 B1 KR 100466418B1
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- South Korea
- Prior art keywords
- steel sheet
- tin
- paintability
- layer
- corrosion resistance
- Prior art date
Links
- 238000005260 corrosion Methods 0.000 title claims abstract description 28
- 230000007797 corrosion Effects 0.000 title claims abstract description 28
- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 239000005028 tinplate Substances 0.000 title claims description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 title description 3
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 82
- 239000010959 steel Substances 0.000 claims abstract description 82
- 229910000077 silane Inorganic materials 0.000 claims abstract description 39
- -1 silane compound Chemical class 0.000 claims abstract description 32
- 239000007864 aqueous solution Substances 0.000 claims abstract description 21
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 18
- 150000001875 compounds Chemical class 0.000 claims abstract description 17
- 238000002845 discoloration Methods 0.000 claims abstract description 17
- 238000004945 emulsification Methods 0.000 claims abstract description 15
- 238000001035 drying Methods 0.000 claims abstract description 13
- 238000001816 cooling Methods 0.000 claims abstract description 11
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 19
- 229910052726 zirconium Inorganic materials 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 8
- OERNJTNJEZOPIA-UHFFFAOYSA-N zirconium nitrate Chemical compound [Zr+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O OERNJTNJEZOPIA-UHFFFAOYSA-N 0.000 claims description 8
- VVXLFFIFNVKFBD-UHFFFAOYSA-N 4,4,4-trifluoro-1-phenylbutane-1,3-dione Chemical compound FC(F)(F)C(=O)CC(=O)C1=CC=CC=C1 VVXLFFIFNVKFBD-UHFFFAOYSA-N 0.000 claims description 4
- 229910008326 Si-Y Inorganic materials 0.000 claims description 4
- 229910006773 Si—Y Inorganic materials 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 230000001804 emulsifying effect Effects 0.000 claims description 4
- 229910021645 metal ion Inorganic materials 0.000 claims description 4
- 239000004094 surface-active agent Substances 0.000 claims description 4
- DUFCMRCMPHIFTR-UHFFFAOYSA-N 5-(dimethylsulfamoyl)-2-methylfuran-3-carboxylic acid Chemical compound CN(C)S(=O)(=O)C1=CC(C(O)=O)=C(C)O1 DUFCMRCMPHIFTR-UHFFFAOYSA-N 0.000 claims description 3
- WRAGBEWQGHCDDU-UHFFFAOYSA-M C([O-])([O-])=O.[NH4+].[Zr+] Chemical compound C([O-])([O-])=O.[NH4+].[Zr+] WRAGBEWQGHCDDU-UHFFFAOYSA-M 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 3
- KSYURTCLCUKLSF-UHFFFAOYSA-H disodium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[Na+].[Na+].[Zr+4] KSYURTCLCUKLSF-UHFFFAOYSA-H 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 125000003277 amino group Chemical group 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 125000000524 functional group Chemical group 0.000 claims description 2
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims description 2
- 125000004965 chloroalkyl group Chemical group 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 10
- 238000000576 coating method Methods 0.000 abstract description 10
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 abstract description 8
- 238000004806 packaging method and process Methods 0.000 abstract description 3
- 230000001747 exhibiting effect Effects 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 30
- 238000011282 treatment Methods 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 229910002651 NO3 Inorganic materials 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 150000003755 zirconium compounds Chemical class 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical class [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 235000013305 food Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- DHEQXMRUPNDRPG-UHFFFAOYSA-N strontium nitrate Chemical compound [Sr+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O DHEQXMRUPNDRPG-UHFFFAOYSA-N 0.000 description 2
- ZXAUZSQITFJWPS-UHFFFAOYSA-J zirconium(4+);disulfate Chemical compound [Zr+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O ZXAUZSQITFJWPS-UHFFFAOYSA-J 0.000 description 2
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 1
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 1
- MBMLMWLHJBBADN-UHFFFAOYSA-N Ferrous sulfide Chemical compound [Fe]=S MBMLMWLHJBBADN-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- 235000010582 Pisum sativum Nutrition 0.000 description 1
- 240000004713 Pisum sativum Species 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- SFBLKWGYRDDITM-UHFFFAOYSA-J [Ti+4].[O-]S([O-])=O.[O-]S([O-])=O Chemical compound [Ti+4].[O-]S([O-])=O.[O-]S([O-])=O SFBLKWGYRDDITM-UHFFFAOYSA-J 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010835 comparative analysis Methods 0.000 description 1
- UHWHMHPXHWHWPX-UHFFFAOYSA-J dipotassium;oxalate;oxotitanium(2+) Chemical compound [K+].[K+].[Ti+2]=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O UHWHMHPXHWHWPX-UHFFFAOYSA-J 0.000 description 1
- YTUPSNLWAAEFPL-UHFFFAOYSA-N ethenyl(ethoxy)silane Chemical compound CCO[SiH2]C=C YTUPSNLWAAEFPL-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- KCWYOFZQRFCIIE-UHFFFAOYSA-N ethylsilane Chemical compound CC[SiH3] KCWYOFZQRFCIIE-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Chemical class 0.000 description 1
- 239000002184 metal Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N mono-n-propyl amine Natural products CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000010428 oil painting Methods 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- ZSKHIXQABNIDHY-UHFFFAOYSA-J zirconium(4+) disulfite Chemical compound [Zr+4].[O-]S([O-])=O.[O-]S([O-])=O ZSKHIXQABNIDHY-UHFFFAOYSA-J 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/82—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/20—Use of solutions containing silanes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- Chemical Treatment Of Metals (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
구분 | 지르코늄 화합물 | 실란 화합물 | 특성 | ||||
종류 | 함량(g/ℓ) | 종류 | 함량(M) | 내식성(SST) | 내유화변색 | 도장성 | |
비교재1 | Zr-나이트레이트 | 3 | γ-GPS | 0.1 | X | X | ◎ |
발명재1 | 5 | 0.1 | O | O | |||
발명재2 | 10 | 0.1 | ◎ | ||||
발명재3 | Zr-카보네이트 | 20 | BTSE | 0.08 | ◎ | ||
발명재4 | 30 | 0.06 | |||||
발명재5 | Zr-나이트레이트 | 40 | VS | 0.04 | O | O | |
비교재2 | 42 | γ-GPS | 0.08 | X | |||
발명재6 | Zr-알루미네이트 | 20 | γ-MPS | 0.15 | O | ||
발명재7 | 30 | BTSE+γ-GPS(1:1로) | 0.13 | ◎ | ◎ | ||
발명재8 | Zr-아세테이트 | 35 | BTSE+γ-GPS(1:2로) | 0.08 | |||
발명재9 | Zr-나이트레이트+Zr-아세테이트, (1:1로) | 30 | VS+γ-GPS(1:1로) | 0.1 | |||
발명재10 | Zr-나이트레이트+Zr-아세테이트, (1:2로) | 35 | VS | 0.08 | |||
발명재11 | Zr-알루미네이트+Zr-아세테이트, (1:1로) | 35 | VS | 0.08 | |||
비교재3 | Zr-나이트레이트 | 25 | γ-GPS | 0.01 | O | X | |
발명재12 | 0.02 | O | |||||
발명재13 | 0.05 | ◎ | |||||
발명재14 | Zr-카보네이트 | 0.08 | ◎ | ||||
발명재15 | 0.13 | ||||||
발명재16 | Zr-나이트레이트 | VS | 0.15 | O | O | ||
비교재4 | 0.16 | X | |||||
* γ-GPS: γ-글리시독시 프로필 트리메톡시 실란γ-MPS: 3-트리메톡시 실일 프로필 메타크릴레이트VS: 트리에톡시 비닐 실란,BTSE: 1,2-비스-트리(메)에톡시 실일 에탄 |
구분 | 지르코늄처리시건조온도(강판온도기준)(℃) | 실란처리시건조온도(강판온도기준)(℃) | 내식성 | 도장성 | 내유화흑변성 |
비교재a | 80 | 170 | X | X | O |
발명재a | 100 | O | O | ◎ | |
발명재b | 130 | ◎ | |||
발명재c | 160 | ◎ | |||
발명재d | 180 | ||||
발명재e | 200 | O | |||
비교재b | 220 | O | |||
비교재c | 180 | 120 | X | O | |
발명재f | 140 | O | ◎ | ||
발명재g | 160 | ◎ | ◎ | ||
발명재h | 180 | ||||
발명재i | 200 | O | |||
비교재d | 220 | O | X | O |
Claims (6)
- 주석도금강판을 Zr화합물이 5~40g/ℓ함유된 수용액에 침지하여 Zr층을 형성하는 단계,상기 Zr층이 형성된 강판을 강판온도를 기준으로 100~200℃로 건조한 다음 공냉 또는 수냉하는 단계,건조 및 냉각된 강판을 실란화합물이 0.02~0.15M 함유된 수용액에 침지하여 실란 층을 형성하는 단계, 그리고상기 실란 층이 형성된 강판을 강판온도를 기준으로 140~200℃로 건조한 다음 수냉 또는 공냉하는 단계를 포함하여 이루어지는 내유화변색성, 내식성 및 도장성이 우수한 주석도금강판의 제조방법
- 제 1항에 있어서, 상기 Zr화합물은, 암모늄지르코늄 카보네이트(ammonium zirconium carbonate), 지르코늄 o-설페이트(zirconium orthosulphate), 지르코늄 옥시클로라이드(zirconium oxychloride), 지르코늄 나이트레이트(zirconium nitrate), 지르코늄 아세테이트(zirconium acetate), 포타슘 헥사플루오로 지르코네이트(potassium hexafluorozirconate), 소듐 헥사플루오로 지르코네이트(sodium hexafluorozirconate), 지르코늄 알루미네이트(zirconium aluminate)로 구성되는 그룹으로부터 선택된 1종 또는 2종 이상인 것을 특징으로 하는 내유화변색성, 내식성 및 도장성이 우수한 주석도금강판의 제조방법
- 제 1항 또는 제 2항에 있어서,상기 실란화합물은, X-Si-Y 또는 X'(-Si-Y)n 형태의 알콕시계 실란화합물로서, X는 에폭시, 비닐, 하나 이상의 아민기, 아크릴, 머캡토, 클로로알킬, 페닐, 및 카르복실로 이루어진 관능기 중 하나와 알킬고리로 구성되며,Y는 에톡시, 메톡시, 또는 에톡시메톡시가 2개 또는 3개인 것이며,X'는 아민 또는 알킬이고, n은 2 또는 3이며, 그리고상기 알콕시계 실란화합물은 1종 또는 2종 이상이 사용되는 것을 특징으로 하는 내유화변색성, 내식성 및 도장성이 우수한 주석도금강판의 제조방법
- 제 1항 또는 제 2항에 있어서, 상기 Zr화합물 함유수용액은 표면활성제를 추가로 함유되고, 그 pH는 1~6인 것을 특징으로 하는 내유화변색성, 내식성 및 도장성이 우수한 주석도금강판의 제조방법
- 제 3항에 있어서, 상기 Zr화합물 함유수용액은 표면활성제를 추가로 함유되고, 그 pH는 1~6인 것을 특징으로 하는 내유화변색성, 내식성 및 도장성이 우수한 주석도금강판의 제조방법
- 강판상에 주석도금층, Zr이 금속이온을 기준으로 0.5~3mg/㎡인 Zr층, 그 부착량이 0.1~2mg/㎡인 실란 층이 형성된 내유화변색성, 내식성 및 도장성이 우수한주석도금강판
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KR100843904B1 (ko) * | 2006-12-21 | 2008-07-03 | 주식회사 포스코 | 내식성과 내유화흑변성이 우수한 크롬 프리 후처리 용액을 이용한 전기주석도금 강판의 후처리 방법 및 후처리된 주석도금강판 |
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CN105331966B (zh) * | 2015-11-30 | 2018-04-27 | 宝山钢铁股份有限公司 | 一种无铬表面处理镀锡板、其生产方法及表面处理剂 |
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KR100843904B1 (ko) * | 2006-12-21 | 2008-07-03 | 주식회사 포스코 | 내식성과 내유화흑변성이 우수한 크롬 프리 후처리 용액을 이용한 전기주석도금 강판의 후처리 방법 및 후처리된 주석도금강판 |
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