KR100433594B1 - 액정표시장치 - Google Patents
액정표시장치 Download PDFInfo
- Publication number
- KR100433594B1 KR100433594B1 KR10-2002-0036643A KR20020036643A KR100433594B1 KR 100433594 B1 KR100433594 B1 KR 100433594B1 KR 20020036643 A KR20020036643 A KR 20020036643A KR 100433594 B1 KR100433594 B1 KR 100433594B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- liquid crystal
- reflecting plate
- less
- interval
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 59
- 239000000758 substrate Substances 0.000 claims abstract description 77
- 238000009826 distribution Methods 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 12
- 239000007769 metal material Substances 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 238000001579 optical reflectometry Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 60
- 239000010410 layer Substances 0.000 description 39
- 239000004065 semiconductor Substances 0.000 description 10
- 239000011229 interlayer Substances 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000013035 low temperature curing Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (10)
- 한쌍의 제 1 기판과 제 2 기판 사이에 끼워진 액정층을 구비하고,상기 제 1 기판은 상기 제 2 기판 및 상기 액정층을 통해 입사된 광을 반사하는 반사판을 포함하고,상기 반사판은 각 화소영역에 복수의 요철부를 갖고,상기 화소영역 내에 있어서 서로 인접하는 볼록부의 정부(頂部)간격이 5 내지 15㎛ 범위 내에서 분포하고, 이 중 가장 존재율이 높은 정부간격을 중심으로 하여 ±0.5㎛ 범위의 정점간격의 존재율이 40% 이상 80% 이하이며,상기 화소영역 내에 있어서 상기 제 1 기판 주면에 대한 경사각이 4.5°이하가 되는 상기 반사판의 정반사면이 상기 화소영역에 대해 면적비 35% 이하인 것을 특징으로 하는 액정표시장치.
- 제 1 항에 있어서,상기 반사판은 광반사성을 갖는 금속재료에 의해 형성된 상기 복수의 화소전극을 포함하는 것을 특징으로 하는 액정표시장치.
- 제 1 항에 있어서,상기 제 1 기판은 상기 반사판의 하지로서 절연층을 갖는 것을 특징으로 하는 액정표시장치.
- 제 3 항에 있어서,상기 절연층은 유기절연층을 포함하는 것을 특징으로 하는 액정표시장치.
- 제 4 항에 있어서,상기 유기절연층은 감광성 수지에 의해 형성된 것을 특징으로 하는 액정표시장치.
- 제 1 항에 있어서,상기 제 1 기판은 상기 제 2 기판 및 상기 액정층을 통해 입사되는 광을 산란시키는 반사판이 형성된 반사기능을 갖는 영역과, 상기 제 1 기판을 통해 입사되는 광을 투과하는 투과기능을 갖는 영역을 구비한 것을 특징으로 하는 액정표시장치.
- 제 1 항에 있어서,상기 요철부에 있어서 오목부의 바닥부에서 볼록부의 정부까지의 평균 높이는 1.2㎛ 이하인 것을 특징으로 하는 액정표시장치.
- 제 7 항에 있어서,상기 요철부에 있어서 평균 높이는 0.1㎛ 이상인 것을 특징으로 하는 액정표시장치.
- 제 1 항에 있어서,상기 정부간격분포에 있어서, 상기 요철부에 있어서 볼록부의 정부간격이 7.5 내지 12.5㎛ 범위 내에 존재하는 것을 특징으로 하는 액정표시장치.
- 한쌍의 제 1 기판과 제 2 기판 사이에 끼워진 액정층을 구비하고,상기 제 1 기판은 상기 제 2 기판 및 상기 액정층을 통해 입사한 광을 반사하는 반사판을 포함하고,상기 반사판은 각 화소영역에 복수의 요철부를 갖고,상기 화소영역 내에 있어서 서로 인접하는 볼록부의 정부간격이 5 내지 15㎛ 범위 내에서 분포하고, 이 중 가장 존재율이 높은 정부간격을 중심으로 하여 ±0.5㎛ 범위의 정점간격의 존재율이 40% 이상 80% 이하이고,상기 요철부에 있어서 오목부의 바닥부에서 볼록부의 정부까지의 평균 높이는 0.1㎛ 이상 1.2㎛ 이하인 것을 특징으로 하는 액정표시장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001206927 | 2001-07-06 | ||
JPJP-P-2001-00206927 | 2001-07-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030005003A KR20030005003A (ko) | 2003-01-15 |
KR100433594B1 true KR100433594B1 (ko) | 2004-05-31 |
Family
ID=19042987
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2002-0036643A Expired - Fee Related KR100433594B1 (ko) | 2001-07-06 | 2002-06-28 | 액정표시장치 |
Country Status (3)
Country | Link |
---|---|
US (1) | US6924858B2 (ko) |
KR (1) | KR100433594B1 (ko) |
TW (1) | TW574557B (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI250332B (en) * | 2002-12-12 | 2006-03-01 | Seiko Epson Corp | Substrate for optoelectronic device, manufacturing method of substrate for optoelectronic device, optoelectronic device, manufacturing method of optoelectronic device, electronic machine and mask |
US7414683B2 (en) * | 2003-10-21 | 2008-08-19 | Alps Electric Co., Ltd | Transflective film and liquid crystal display device using the same |
KR101005355B1 (ko) * | 2003-12-29 | 2011-01-05 | 엘지디스플레이 주식회사 | 반사투과형 액정표시장치와 그 제조방법 |
JP4817718B2 (ja) * | 2005-05-27 | 2011-11-16 | シャープ株式会社 | 表示装置用基板及びそれを備えた液晶表示装置 |
WO2023206161A1 (zh) * | 2022-04-27 | 2023-11-02 | 京东方科技集团股份有限公司 | 阵列基板、显示面板和显示装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990085274A (ko) * | 1998-05-15 | 1999-12-06 | 구본준, 론 위라하디락사 | 반사형 액정표시소자 및 그 반사판 |
JPH11337935A (ja) * | 1998-05-29 | 1999-12-10 | Matsushita Electric Ind Co Ltd | 反射型液晶表示装置 |
JP2000047206A (ja) * | 1999-08-02 | 2000-02-18 | Seiko Epson Corp | 電気光学装置 |
KR20000031459A (ko) * | 1998-11-06 | 2000-06-05 | 윤종용 | 반사형 액정표시장치 및 그의 제조방법 |
KR20000039777A (ko) * | 1998-12-16 | 2000-07-05 | 구본준 | 반사형 액정표시장치의 반사판 |
JP2001004984A (ja) * | 1999-06-18 | 2001-01-12 | Seiko Epson Corp | 液晶装置用基板、ならびにこれを用いた液晶装置、電子機器 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5691791A (en) * | 1993-07-30 | 1997-11-25 | Sharp Kabushiki Kaisha | Reflective liquid crystal display device and reflector |
JP3376308B2 (ja) * | 1998-03-16 | 2003-02-10 | 株式会社東芝 | 反射板および液晶表示装置 |
JP3187369B2 (ja) | 1998-05-19 | 2001-07-11 | シャープ株式会社 | 反射板及び反射型液晶表示装置 |
-
2002
- 2002-06-28 KR KR10-2002-0036643A patent/KR100433594B1/ko not_active Expired - Fee Related
- 2002-07-03 US US10/188,053 patent/US6924858B2/en not_active Expired - Lifetime
- 2002-07-05 TW TW91114981A patent/TW574557B/zh not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990085274A (ko) * | 1998-05-15 | 1999-12-06 | 구본준, 론 위라하디락사 | 반사형 액정표시소자 및 그 반사판 |
JPH11337935A (ja) * | 1998-05-29 | 1999-12-10 | Matsushita Electric Ind Co Ltd | 反射型液晶表示装置 |
KR20000031459A (ko) * | 1998-11-06 | 2000-06-05 | 윤종용 | 반사형 액정표시장치 및 그의 제조방법 |
KR20000039777A (ko) * | 1998-12-16 | 2000-07-05 | 구본준 | 반사형 액정표시장치의 반사판 |
JP2001004984A (ja) * | 1999-06-18 | 2001-01-12 | Seiko Epson Corp | 液晶装置用基板、ならびにこれを用いた液晶装置、電子機器 |
JP2000047206A (ja) * | 1999-08-02 | 2000-02-18 | Seiko Epson Corp | 電気光学装置 |
Also Published As
Publication number | Publication date |
---|---|
US20030007115A1 (en) | 2003-01-09 |
US6924858B2 (en) | 2005-08-02 |
TW574557B (en) | 2004-02-01 |
KR20030005003A (ko) | 2003-01-15 |
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