KR100283711B1 - 헥사플루오로에탄의 제조방법 - Google Patents
헥사플루오로에탄의 제조방법 Download PDFInfo
- Publication number
- KR100283711B1 KR100283711B1 KR1019960067179A KR19960067179A KR100283711B1 KR 100283711 B1 KR100283711 B1 KR 100283711B1 KR 1019960067179 A KR1019960067179 A KR 1019960067179A KR 19960067179 A KR19960067179 A KR 19960067179A KR 100283711 B1 KR100283711 B1 KR 100283711B1
- Authority
- KR
- South Korea
- Prior art keywords
- reaction
- gas
- tetrafluoroethane
- fluorine
- hydrofluorocarbons
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 title claims abstract description 9
- 238000000034 method Methods 0.000 title claims description 25
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 12
- 238000010574 gas phase reaction Methods 0.000 claims abstract description 3
- 239000007789 gas Substances 0.000 claims description 70
- 238000006243 chemical reaction Methods 0.000 claims description 65
- LVGUZGTVOIAKKC-UHFFFAOYSA-N 1,1,1,2-tetrafluoroethane Chemical compound FCC(F)(F)F LVGUZGTVOIAKKC-UHFFFAOYSA-N 0.000 claims description 25
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 18
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 14
- GTLACDSXYULKMZ-UHFFFAOYSA-N pentafluoroethane Chemical compound FC(F)C(F)(F)F GTLACDSXYULKMZ-UHFFFAOYSA-N 0.000 claims description 13
- WXGNWUVNYMJENI-UHFFFAOYSA-N 1,1,2,2-tetrafluoroethane Chemical compound FC(F)C(F)F WXGNWUVNYMJENI-UHFFFAOYSA-N 0.000 claims description 6
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 5
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 238000010790 dilution Methods 0.000 claims description 3
- 239000012895 dilution Substances 0.000 claims description 3
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 claims description 3
- 229960004065 perflutren Drugs 0.000 claims description 3
- LTVOKYUPTHZZQH-UHFFFAOYSA-N difluoromethane Chemical compound F[C]F LTVOKYUPTHZZQH-UHFFFAOYSA-N 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 abstract description 57
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract description 56
- 239000011737 fluorine Substances 0.000 abstract description 56
- 239000003085 diluting agent Substances 0.000 abstract description 20
- 150000001875 compounds Chemical class 0.000 description 12
- 239000000758 substrate Substances 0.000 description 11
- 238000004880 explosion Methods 0.000 description 10
- 238000003682 fluorination reaction Methods 0.000 description 10
- 150000002894 organic compounds Chemical class 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 8
- 238000009835 boiling Methods 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- RFCAUADVODFSLZ-UHFFFAOYSA-N 1-Chloro-1,1,2,2,2-pentafluoroethane Chemical compound FC(F)(F)C(F)(F)Cl RFCAUADVODFSLZ-UHFFFAOYSA-N 0.000 description 4
- 239000004340 Chloropentafluoroethane Substances 0.000 description 4
- 235000019406 chloropentafluoroethane Nutrition 0.000 description 4
- 238000003776 cleavage reaction Methods 0.000 description 4
- 150000002430 hydrocarbons Chemical class 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 230000007017 scission Effects 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- UJPMYEOUBPIPHQ-UHFFFAOYSA-N 1,1,1-trifluoroethane Chemical compound CC(F)(F)F UJPMYEOUBPIPHQ-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- OMRRUNXAWXNVFW-UHFFFAOYSA-N fluoridochlorine Chemical compound ClF OMRRUNXAWXNVFW-UHFFFAOYSA-N 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910001512 metal fluoride Inorganic materials 0.000 description 2
- -1 perfluoro compound Chemical class 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- WGZYQOSEVSXDNI-UHFFFAOYSA-N 1,1,2-trifluoroethane Chemical compound FCC(F)F WGZYQOSEVSXDNI-UHFFFAOYSA-N 0.000 description 1
- NPNPZTNLOVBDOC-UHFFFAOYSA-N 1,1-difluoroethane Chemical compound CC(F)F NPNPZTNLOVBDOC-UHFFFAOYSA-N 0.000 description 1
- DDMOUSALMHHKOS-UHFFFAOYSA-N 1,2-dichloro-1,1,2,2-tetrafluoroethane Chemical compound FC(F)(Cl)C(F)(F)Cl DDMOUSALMHHKOS-UHFFFAOYSA-N 0.000 description 1
- AHFMSNDOYCFEPH-UHFFFAOYSA-N 1,2-difluoroethane Chemical compound FCCF AHFMSNDOYCFEPH-UHFFFAOYSA-N 0.000 description 1
- BOUGCJDAQLKBQH-UHFFFAOYSA-N 1-chloro-1,2,2,2-tetrafluoroethane Chemical compound FC(Cl)C(F)(F)F BOUGCJDAQLKBQH-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 1
- PYVHTIWHNXTVPF-UHFFFAOYSA-N F.F.F.F.C=C Chemical compound F.F.F.F.C=C PYVHTIWHNXTVPF-UHFFFAOYSA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
- 125000004773 chlorofluoromethyl group Chemical group [H]C(F)(Cl)* 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 229940087091 dichlorotetrafluoroethane Drugs 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- UHCBBWUQDAVSMS-UHFFFAOYSA-N fluoroethane Chemical compound CCF UHCBBWUQDAVSMS-UHFFFAOYSA-N 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 229910001055 inconels 600 Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/093—Preparation of halogenated hydrocarbons by replacement by halogens
- C07C17/10—Preparation of halogenated hydrocarbons by replacement by halogens of hydrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C19/00—Acyclic saturated compounds containing halogen atoms
- C07C19/08—Acyclic saturated compounds containing halogen atoms containing fluorine
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5032396A JP2947158B2 (ja) | 1996-03-07 | 1996-03-07 | ヘキサフルオロエタンの製造方法 |
| JP96-050323 | 1996-03-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR970065491A KR970065491A (ko) | 1997-10-13 |
| KR100283711B1 true KR100283711B1 (ko) | 2001-03-02 |
Family
ID=12855706
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960067179A Expired - Fee Related KR100283711B1 (ko) | 1996-03-07 | 1996-12-18 | 헥사플루오로에탄의 제조방법 |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR100283711B1 (zh) |
| CN (1) | CN1076333C (zh) |
| SG (1) | SG48501A1 (zh) |
| TW (1) | TW409114B (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6958596B2 (ja) * | 2019-07-01 | 2021-11-02 | ダイキン工業株式会社 | アルカンの製造方法 |
| CN111484389A (zh) * | 2020-04-16 | 2020-08-04 | 山东重山光电材料股份有限公司 | 一种联产高纯电子级氟化氢与氟化碳的生产工艺 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02131438A (ja) * | 1988-11-11 | 1990-05-21 | Asahi Glass Co Ltd | ヘキサフルオロエタンの製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0031519A1 (en) * | 1979-12-26 | 1981-07-08 | Allied Corporation | Preparation of fluorinated organic compounds with elemental fluorine and fused alumina reactor |
-
1996
- 1996-12-12 SG SG1996011695A patent/SG48501A1/en unknown
- 1996-12-18 KR KR1019960067179A patent/KR100283711B1/ko not_active Expired - Fee Related
- 1996-12-23 TW TW085115908A patent/TW409114B/zh not_active IP Right Cessation
-
1997
- 1997-01-15 CN CN97102133A patent/CN1076333C/zh not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02131438A (ja) * | 1988-11-11 | 1990-05-21 | Asahi Glass Co Ltd | ヘキサフルオロエタンの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| SG48501A1 (en) | 1998-04-17 |
| CN1076333C (zh) | 2001-12-19 |
| KR970065491A (ko) | 1997-10-13 |
| TW409114B (en) | 2000-10-21 |
| CN1165803A (zh) | 1997-11-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5675046A (en) | Process for producing perfluorocarbon | |
| KR100294570B1 (ko) | 퍼플루오로카본의제조방법 | |
| EP3109225B1 (en) | Method for purifying fluid that includes trifluoroethylene, and method for producing trifluoroethylene | |
| JP2947158B2 (ja) | ヘキサフルオロエタンの製造方法 | |
| US6720464B2 (en) | Production and use of octafluoropropane | |
| KR101002164B1 (ko) | 불화 카르보닐의 제조 방법 | |
| JP4378779B2 (ja) | 含フッ素エタンの製造方法 | |
| JP4539793B2 (ja) | オクタフルオロプロパンの製造方法及びその用途 | |
| RU2024474C1 (ru) | Способ получения 1,1-дихлор-1-фторэтана и способ снижения содержания 1,1-дихлорэтилена | |
| KR100309364B1 (ko) | 테트라플루오로메탄의제조방법 | |
| KR100286793B1 (ko) | 하이드로플루오로알칸 제조방법 | |
| KR100283711B1 (ko) | 헥사플루오로에탄의 제조방법 | |
| KR100854982B1 (ko) | 1,1,1,2-테트라플루오로에탄 및/또는 펜타플루오로에탄의제조방법 및 그 용도 | |
| KR100543253B1 (ko) | 헥사플루오로에탄의 제조 방법 및 용도 | |
| JPWO2005026090A1 (ja) | ハイドロフルオロカーボンの製造方法、その製品およびその用途 | |
| US5672788A (en) | Two-step process for manufacturing 1,1-difluoroethane | |
| KR100570802B1 (ko) | 플루오로에탄의 제조 방법 및 제조된 플루오로에탄의 용도 | |
| JP2005097245A (ja) | ヘキサフルオロエタンの製造方法およびその用途 | |
| KR20020019589A (ko) | 헥사플루오로에탄 제조방법 및 그것의 용도 | |
| JP4463385B2 (ja) | ヘキサフルオロエタンの製造方法及びその用途 | |
| WO2003080549A1 (en) | Process for the production of fluoroethane and use of the produced fluoroethane |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19961218 |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19980330 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 19961218 Comment text: Patent Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20000428 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20000923 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20001212 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20001213 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration | ||
| PR1001 | Payment of annual fee |
Payment date: 20031204 Start annual number: 4 End annual number: 4 |
|
| PR1001 | Payment of annual fee |
Payment date: 20041210 Start annual number: 5 End annual number: 5 |
|
| PR1001 | Payment of annual fee |
Payment date: 20051208 Start annual number: 6 End annual number: 6 |
|
| PR1001 | Payment of annual fee |
Payment date: 20061211 Start annual number: 7 End annual number: 7 |
|
| PR1001 | Payment of annual fee |
Payment date: 20071207 Start annual number: 8 End annual number: 8 |
|
| PR1001 | Payment of annual fee |
Payment date: 20081202 Start annual number: 9 End annual number: 9 |
|
| PR1001 | Payment of annual fee |
Payment date: 20091210 Start annual number: 10 End annual number: 10 |
|
| PR1001 | Payment of annual fee |
Payment date: 20101124 Start annual number: 11 End annual number: 11 |
|
| PR1001 | Payment of annual fee |
Payment date: 20111118 Start annual number: 12 End annual number: 12 |
|
| PR1001 | Payment of annual fee |
Payment date: 20121121 Start annual number: 13 End annual number: 13 |
|
| FPAY | Annual fee payment |
Payment date: 20131118 Year of fee payment: 14 |
|
| PR1001 | Payment of annual fee |
Payment date: 20131118 Start annual number: 14 End annual number: 14 |
|
| FPAY | Annual fee payment |
Payment date: 20141120 Year of fee payment: 15 |
|
| PR1001 | Payment of annual fee |
Payment date: 20141120 Start annual number: 15 End annual number: 15 |
|
| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |