JPS6341151B2 - - Google Patents
Info
- Publication number
- JPS6341151B2 JPS6341151B2 JP56196510A JP19651081A JPS6341151B2 JP S6341151 B2 JPS6341151 B2 JP S6341151B2 JP 56196510 A JP56196510 A JP 56196510A JP 19651081 A JP19651081 A JP 19651081A JP S6341151 B2 JPS6341151 B2 JP S6341151B2
- Authority
- JP
- Japan
- Prior art keywords
- negative pressure
- magnetic head
- slider
- disk
- head slider
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 15
- 238000007667 floating Methods 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000000227 grinding Methods 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 230000000873 masking effect Effects 0.000 claims 1
- 239000010409 thin film Substances 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000000992 sputter etching Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
- G11B5/60—Fluid-dynamic spacing of heads from record-carriers
- G11B5/6005—Specially adapted for spacing from a rotating disc using a fluid cushion
Landscapes
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
Description
【発明の詳細な説明】
本発明は磁気ヘツドスライダーに関し、特に電
子計算機の大容量記憶装置として使用される磁気
ヘツドスライダーの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic head slider, and more particularly to a method for manufacturing a magnetic head slider used as a mass storage device of an electronic computer.
従来、磁気デイスク装置においては、磁気デイ
スク盤静止時には磁気ヘツドスライダが荷重ばね
によつて磁気デイスク盤上に押し付けられてお
り、磁気デイスク盤が回転すると磁気ヘツドスラ
イダと磁気デイスク盤の間に微少な空気膜が形成
され磁気ヘツドスライダが浮上するいわゆるCSS
方式(コンタクトスタートストツプ方式)が用い
られている。磁気ヘツドスライダの浮上量は低い
程磁気ヘツド特性上好ましく、現在広く実用化さ
れている磁気デイスク装置においては約0.5μm程
度であり、将来さらに高密度化する場合にはより
低い浮上量が必要となる。 Conventionally, in magnetic disk drives, when the magnetic disk disk is stationary, the magnetic head slider is pressed onto the magnetic disk disk by a load spring, and when the magnetic disk disk rotates, a small amount of air is generated between the magnetic head slider and the magnetic disk disk. So-called CSS where an air film is formed and the magnetic head slider floats
method (contact start-stop method) is used. The lower the flying height of the magnetic head slider, the better in terms of magnetic head characteristics, and in the magnetic disk devices currently in widespread use, it is approximately 0.5 μm, and if the density is to be further increased in the future, a lower flying height will be required. Become.
磁気ヘツドスライダの浮上量を下げる方法の一
つとしては前記荷重ばねの荷重を増す方法があ
る。しかしこの方法では磁気デイスク盤静止時に
磁気ヘツドスライダが磁気デイスク盤に強く押し
付けられるため、磁気ヘツドスライダと磁気デイ
スク盤の密着が生じやすく、磁気デイスク盤の回
転起動時に磁気ヘツドスライダおよび磁気デイス
ク盤の損傷が生じやすいという欠点がある。 One method of reducing the flying height of the magnetic head slider is to increase the load of the load spring. However, with this method, the magnetic head slider is strongly pressed against the magnetic disk disk when the magnetic disk disk is stationary, so the magnetic head slider and the magnetic disk disk tend to come into close contact, and when the magnetic disk disk starts rotating, the magnetic head slider and magnetic disk disk The disadvantage is that it is easily damaged.
上記問題点を解決する方法としては、負圧利用
磁気ヘツドスライダ(以下負圧スライダと略す
る)を用いる方法がある。第1図は負圧スライダ
を磁気デイスク盤に対向する浮揚面から見た平面
図で、磁気ヘツド1は磁気デイスク盤から信号を
読み出し電磁変換を行なう。 One way to solve the above problem is to use a negative pressure magnetic head slider (hereinafter abbreviated as negative pressure slider). FIG. 1 is a plan view of the negative pressure slider viewed from the floating surface facing the magnetic disk disk. A magnetic head 1 reads signals from the magnetic disk disk and performs electromagnetic conversion.
この磁気ヘツド1は第2図aに示す負圧スライ
ダにおける第1図の断面b−b′および断面a−
a′に沿つて加わる圧力分布(第2図b,c)のも
とで浮力作用が生ずる。第2図bに示すようにサ
イドレール2に加わる圧力は従来の磁気ヘツドス
ライダと同様に大気圧より高く、スライダに浮揚
力を発生させる。しかし第2図cに示すようにク
ロスレール3を通る断面a−a′に沿つての圧力分
布は大気圧より低くなるいわゆる負圧部分7を持
つ。負圧部分の発生により負圧スライダは磁気デ
イスク盤への吸着力を受ける。この吸着力は荷重
ばねの押し付け力を補充するため、荷重ばねの押
し付け力を小さくしても磁気ヘツドスライダの浮
上量を下げることができる。 This magnetic head 1 is connected to cross sections b-b' and a-a in FIG. 1 of the negative pressure slider shown in FIG. 2a.
A buoyancy effect occurs under the pressure distribution applied along a' (Fig. 2b, c). As shown in FIG. 2b, the pressure applied to the side rail 2 is higher than atmospheric pressure, similar to the conventional magnetic head slider, creating a levitation force on the slider. However, as shown in FIG. 2c, the pressure distribution along the cross section a-a' through the cross rail 3 has a so-called negative pressure portion 7 which is lower than atmospheric pressure. Due to the generation of a negative pressure portion, the negative pressure slider is subjected to an adsorption force to the magnetic disk disk. Since this adsorption force supplements the pressing force of the load spring, the flying height of the magnetic head slider can be lowered even if the pressing force of the load spring is reduced.
ところで、負圧スライダの負圧発生部分4の深
さは数μm程度であり第1図のような形に機械的
に加工するのはきわめて困難である。したがつて
従来負圧スライダを製作するにはスパツタエツチ
ングあるいはイオンミリング等のドライエツチン
グ法により負圧発生部分を形成する方法が行なわ
れている。しかしドライエツチング法による負圧
発生部分の形成の工程にはマスク形成のためのマ
スク用材料蒸着、フオトエツチング等多数の工程
があり、製造方法が複雑であつた。またドライエ
ツチングに要する時間も、材料によつては数μm
エツチングするのに10時間以上かかる場合があり
実用的ではなかつた。またドライエツチングによ
つて磁気ヘツド1がエツチングされるのを防ぐた
め、磁気ヘツド上にマスクを施す等の必要があつ
た。 By the way, the depth of the negative pressure generating portion 4 of the negative pressure slider is approximately several μm, and it is extremely difficult to mechanically process it into the shape shown in FIG. Therefore, conventional negative pressure sliders have been manufactured by forming negative pressure generating portions by dry etching methods such as sputter etching or ion milling. However, the process of forming the negative pressure generating portion by dry etching involves a number of steps such as vapor deposition of mask material for mask formation and photo etching, making the manufacturing method complicated. Also, the time required for dry etching may be several μm depending on the material.
Etching could take more than 10 hours, making it impractical. Furthermore, in order to prevent the magnetic head 1 from being etched by dry etching, it was necessary to apply a mask over the magnetic head.
本発明の目的は、簡単な工程でしかも短時間に
負圧利用ヘツドスライダを製造することができる
製造方法を提供することにある。 SUMMARY OF THE INVENTION An object of the present invention is to provide a manufacturing method that can manufacture a negative pressure head slider using simple steps and in a short period of time.
本発明によれば機械加工を施すことにより、磁
気記録媒体走行方向に長辺を有する長方形の浮揚
面を複数形成し、さらに該浮揚面の間に薄膜作成
技術によつて該浮揚面と同一高さもしくは該浮揚
面よりわずかに低い高さを有するクロスレール部
を作成することにより、負圧利用磁気ヘツドスラ
イダを製造する方法が得られる。 According to the present invention, by performing machining, a plurality of rectangular floating surfaces having long sides in the running direction of the magnetic recording medium are formed, and further, by using a thin film forming technique between the floating surfaces, the height is the same as that of the floating surfaces. A method of manufacturing a magnetic head slider utilizing negative pressure is obtained by creating a cross rail portion having a height slightly lower than or above the floating surface.
次に本発明の実施例について図面を参照して詳
細に説明する。 Next, embodiments of the present invention will be described in detail with reference to the drawings.
第3図は本発明の一実施例を示す。 FIG. 3 shows an embodiment of the invention.
まず第3図aに示すように複数個のスライダを
製造する。母材となる一本のブロツク8の表面に
負圧発生部となる深さ約4μmの溝9を研削盤で
形成する。斜線で示した研削残り部はサイドレー
ル10となり、鏡面研磨される。 First, as shown in FIG. 3a, a plurality of sliders are manufactured. A groove 9 with a depth of approximately 4 μm, which will serve as a negative pressure generating portion, is formed on the surface of a single block 8, which will serve as a base material, using a grinder. The remaining portion of the grinding indicated by diagonal lines becomes the side rail 10 and is mirror-polished.
次に第3図bに示すような形のマスク11をブ
ロツク上にのせクロスレールとなるAl2O3を蒸着
ないしスパツタリングする。マスクの外形寸法は
ブロツクの外形寸法と同一の寸法になつており、
マスク合わせは両者の外形を一致させることによ
り容易に行なうことができる。切欠き12を通し
て溝9の一部にAl2O3薄膜が蒸着ないしスパツタ
されることによりクロスレール13が形成され
る。Al2O3薄膜の厚さはクロスレールの欠けを防
ぐため、溝9の深さよりも若干薄い方が好まし
い。 Next, a mask 11 having a shape as shown in FIG. 3b is placed on the block, and Al 2 O 3 which will become the cross rail is vapor-deposited or sputtered. The external dimensions of the mask are the same as the external dimensions of the block.
Mask matching can be easily performed by matching the outer shapes of the two. A cross rail 13 is formed by depositing or sputtering an Al 2 O 3 thin film on a portion of the groove 9 through the notch 12 . The thickness of the Al 2 O 3 thin film is preferably slightly thinner than the depth of the groove 9 in order to prevent chipping of the cross rail.
以上のようにして加工されたブロツクを第3図
dのような形に切断することにより、負圧利用磁
気ヘツドスライダ14が作製される。電磁変換を
行なう磁気ヘツド15は第3図dの切断を行なう
前に通常の薄膜ヘツド製造方法で形成される。ま
た、本発明の他の実施例としては第4図aのよう
な単純な長方形状のマスク16を用いる方法があ
る。この方法では第4図bに示すようにサイドレ
ールの上にも、クロスレール形成用のAl2O3が付
着する。この出つぱつた部分17をラツピングに
よつて取り除くことにより、負圧スライダが作成
される。 The negative pressure magnetic head slider 14 is manufactured by cutting the block processed in the above manner into a shape as shown in FIG. 3d. The magnetic head 15 which performs electromagnetic conversion is formed by a conventional thin film head manufacturing method prior to the cutting shown in FIG. 3d. Further, as another embodiment of the present invention, there is a method using a simple rectangular mask 16 as shown in FIG. 4a. In this method, Al 2 O 3 for forming crossrails is also deposited on the side rails, as shown in FIG. 4b. By removing this protruding portion 17 by wrapping, a negative pressure slider is created.
なお磁気ヘツド15は必ずしも薄膜ヘツドであ
る必要はなく、バルクのフエライトからなるリン
グタイプヘツドでもかまわない。なお、クロスレ
ール13をヘツドスライダの浮揚面よりわずかに
低い高さに形成した場合には、媒体とスライダ間
に塵等が混入した場合にクロスレールの欠けを防
ぐことができる。 Note that the magnetic head 15 does not necessarily have to be a thin film head, but may be a ring type head made of bulk ferrite. Note that if the cross rail 13 is formed at a height slightly lower than the floating surface of the head slider, chipping of the cross rail can be prevented when dust or the like gets mixed in between the medium and the slider.
本発明は以上説明したように機械加工と薄膜作
成技術を併用することにより、従来のドライエツ
チング法に伴うマスク形成、磁気ヘツドのエツチ
ング防止等の複雑な工程を必要とすることのない
負圧スライダを製造する方法を提供する。 As explained above, the present invention combines machining and thin film forming technology to create a negative pressure slider that does not require complicated processes such as mask formation and prevention of magnetic head etching associated with conventional dry etching methods. Provides a method for manufacturing.
第1図は負圧スライダを示す平面図、第2図a
は負圧スライダを示す側面図第2図bは断面b−
b′に沿つての圧力分布図、第2図cは断面a−
b′に沿つての圧力分布図、第3図は本発明の一実
施例を示す図、第4図は本発明の他の実施例を示
す図である。
1…磁気ヘツド、2…サイドレール、3…クロ
スレール、4…負圧発生部分、5…磁気デイスク
盤、6…磁気デイスク盤回転方向、7…負圧部
分、8…ブロツク、9…溝、10…サイドレー
ル、11…マスク、12…切欠き、13…クロス
レール、14…負圧スライダ、15…磁気ヘツ
ド、16…マスク。
Figure 1 is a plan view showing the negative pressure slider, Figure 2a
is a side view showing the negative pressure slider. FIG. 2b is a cross section b-
Pressure distribution diagram along b′, Fig. 2c is cross section a-
FIG. 3 is a diagram showing one embodiment of the present invention, and FIG. 4 is a diagram showing another embodiment of the present invention. DESCRIPTION OF SYMBOLS 1...Magnetic head, 2...Side rail, 3...Cross rail, 4...Negative pressure generation part, 5...Magnetic disk disk, 6...Magnetic disk disk rotating direction, 7...Negative pressure part, 8...Block, 9...Groove, DESCRIPTION OF SYMBOLS 10... Side rail, 11... Mask, 12... Notch, 13... Cross rail, 14... Negative pressure slider, 15... Magnetic head, 16... Mask.
Claims (1)
延びる2本のサイドレールを両側部に残して予め
定められた深さで前記媒体走行方向における前記
スライダブロツクの長さと等しい長さの溝を研削
形成する工程と、前記2本のサイドレールを前記
媒体走行方向と垂直な方向に連通させる形状のウ
インド以外の部分において前記浮揚面をマスクす
る工程と、前記ウインド部分に蒸着またはスパツ
タリングを施こしてクロスレールを形成する工程
とを有することを特徴とする負圧利用磁気ヘツド
スライダのの製造方法。1. On the floating surface of the slider block, two side rails extending in the medium running direction are left on both sides, and a groove with a length equal to the length of the slider block in the medium running direction is formed at a predetermined depth by grinding. a step of masking the floating surface in a portion other than a window shaped to communicate the two side rails in a direction perpendicular to the medium running direction; and performing vapor deposition or sputtering on the window portion to form a cross rail. 1. A method for manufacturing a magnetic head slider using negative pressure, comprising the steps of: forming a magnetic head slider using negative pressure;
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19651081A JPS5898876A (en) | 1981-12-07 | 1981-12-07 | Production for magnetic head slider utilizing megative pressure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19651081A JPS5898876A (en) | 1981-12-07 | 1981-12-07 | Production for magnetic head slider utilizing megative pressure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5898876A JPS5898876A (en) | 1983-06-11 |
JPS6341151B2 true JPS6341151B2 (en) | 1988-08-16 |
Family
ID=16358946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19651081A Granted JPS5898876A (en) | 1981-12-07 | 1981-12-07 | Production for magnetic head slider utilizing megative pressure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5898876A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS629572A (en) * | 1985-07-05 | 1987-01-17 | Mitsubishi Electric Corp | Manufacture of negative pressure type floating head slider |
-
1981
- 1981-12-07 JP JP19651081A patent/JPS5898876A/en active Granted
Non-Patent Citations (1)
Title |
---|
IBM TECHNICAL DISCLOSURE BULLETIN * |
Also Published As
Publication number | Publication date |
---|---|
JPS5898876A (en) | 1983-06-11 |
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