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JPS62204420A - Manufacturing method of thin film magnetic head - Google Patents

Manufacturing method of thin film magnetic head

Info

Publication number
JPS62204420A
JPS62204420A JP4698686A JP4698686A JPS62204420A JP S62204420 A JPS62204420 A JP S62204420A JP 4698686 A JP4698686 A JP 4698686A JP 4698686 A JP4698686 A JP 4698686A JP S62204420 A JPS62204420 A JP S62204420A
Authority
JP
Japan
Prior art keywords
magnetic pole
tip
thin film
magnetic
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4698686A
Other languages
Japanese (ja)
Inventor
Yoshio Takahashi
良夫 高橋
Kunio Hata
畑 邦夫
Kazuki Hosono
細野 和貴
Hitoshi Kanai
均 金井
Masaaki Kanemine
金峰 理明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4698686A priority Critical patent/JPS62204420A/en
Publication of JPS62204420A publication Critical patent/JPS62204420A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • G11B5/3106Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔概要〕 この発明は浮上型薄膜磁気ヘッドにおける一対の磁極の
先端部構造において、空気流入端側の第1の磁極を形成
後それを無a絶縁層で完全に覆い、その表面をエツチン
グまたは研磨して平坦化することにより、第1の磁極の
上にそれよりも磁極先端部の幅が広い空気流出端側の第
2の磁極を容易に形成できるようにしたものである。
[Detailed Description of the Invention] [Summary] The present invention relates to the tip structure of a pair of magnetic poles in a floating thin film magnetic head, in which the first magnetic pole on the air inflow end side is formed and then completely covered with an a-free insulating layer. By etching or polishing the surface to make it flat, it is possible to easily form a second magnetic pole on the air outflow end side, where the tip of the magnetic pole is wider than the first magnetic pole. It is.

〔産業上の利用分野〕[Industrial application field]

この発明は、浮上型薄膜磁気ヘッド、特にスライダの空
気流出端側に位置する第2の磁極の先端部が空気流入端
側に位置する第1の磁極の先端部よりも幅広い構造の薄
膜磁気ヘッドの製造方法に関するものである。
The present invention relates to a floating thin film magnetic head, particularly a thin film magnetic head having a structure in which the tip of a second magnetic pole located on the air outflow end side of a slider is wider than the tip of a first magnetic pole located on the air inflow end side. The present invention relates to a manufacturing method.

近年、磁気記録の高密度化に伴い、小型で高精度形状の
形成が可能な薄膜磁気ヘッドが有望視されている。が、
特にトランク密度を向上させるためには隣接するトラッ
クからの雑音の混入、いわゆるサイド・クロストークが
少なく、またオフトラックした場合の再生信号出力の低
下が少ない薄膜磁気ヘッドが必要とされている。
In recent years, with the increase in the density of magnetic recording, thin-film magnetic heads that are compact and capable of forming highly accurate shapes are viewed as promising. but,
In particular, in order to improve trunk density, a thin film magnetic head is required that has less noise contamination from adjacent tracks, so-called side crosstalk, and less decreases in reproduction signal output when off-track.

このような要求を満たす新しい薄膜磁気ヘッドとして、
本発明者らは特願昭60−233856号によりスライ
ダの空気流出端側に位置する第1の磁極の先端部を空気
流入端側に位置する第2の磁極の先端部よりも幅広くし
た薄膜磁気ヘッドを提案した。
As a new thin film magnetic head that meets these requirements,
The present inventors proposed a thin film magnetic field in which the tip of the first magnetic pole located on the air outflow end side of the slider was made wider than the tip of the second magnetic pole located on the air inflow end. I suggested the head.

なお、ここで云う磁極の先端部とは磁極間に存在する層
間絶縁層の端縁よりヘッド浮上面側に延びた磁極部分を
意味する。
Note that the tip of the magnetic pole referred to herein means a portion of the magnetic pole extending toward the head air bearing surface from the edge of the interlayer insulating layer existing between the magnetic poles.

〔従来の技術〕[Conventional technology]

第2図は従来の薄膜磁気ヘッドの要部断面図、第3図は
それを搭載したスライダの概略図、第4図は記録媒体側
から見たヘッドの磁極先端形状をそれぞれ示す。これら
の図において薄膜ヘッドは、セラミックスより成る基板
11上に、第1および第2の磁極12.13としてNi
Fe等の磁性体を、Si 02 、A 1203等で形
成したギャップ層14、さらにコイル導体層15および
層間絶縁層を両側から挟んで形成し、さらにそれらの上
から同酸化物系物質の保護1模16を厚く設けている。
FIG. 2 is a sectional view of a main part of a conventional thin film magnetic head, FIG. 3 is a schematic diagram of a slider equipped with the same, and FIG. 4 is a diagram showing the shape of the magnetic pole tip of the head as viewed from the recording medium side. In these figures, the thin film head has Ni as first and second magnetic poles 12 and 13 on a substrate 11 made of ceramics.
A magnetic material such as Fe is formed by sandwiching a gap layer 14 made of Si 02 , A 1203, etc., a coil conductor layer 15 and an interlayer insulating layer from both sides, and then a protective layer 1 made of the same oxide material is formed over them. A thick pattern 16 is provided.

しかしてこのへ・/ドでは、前記第1の磁極12の先端
部の幅が第2の磁極13のそれよりも広く形成されてい
る。
However, at the end of the lever, the width of the tip of the first magnetic pole 12 is wider than that of the second magnetic pole 13.

なお、スライダは前記基板11を加工することにより形
成する。また図中、17は記録媒体、18はその媒体面
に対向する浮上面を示す。
Note that the slider is formed by processing the substrate 11. Further, in the figure, 17 indicates a recording medium, and 18 indicates an air bearing surface opposite to the surface of the medium.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところが、従来の製造技術では、第1の磁極上にギャッ
プ層を介してそのまま第2の磁極を形成するようになっ
ているため、第2の磁極の先端部を第1の磁極のそれよ
りも広くすることができず、前述した特願昭60−23
3856号に提示の薄膜磁気ヘッドの製造が困難である
However, in conventional manufacturing technology, the second magnetic pole is directly formed on the first magnetic pole with a gap layer interposed therebetween, so the tip of the second magnetic pole is made smaller than that of the first magnetic pole. Unable to widen the area, the aforementioned patent application was filed in 1986-23.
It is difficult to manufacture the thin film magnetic head proposed in No. 3856.

この発明は以上のような従来の状況から、空気流出端側
に位置する第2の磁極の先端部を空気流入端側に位置す
る第1の磁極の先端部よりも幅広くした薄膜磁気ヘッド
の、磁極先端部構造を高精度かつ再現性良く形成できる
方法の提供を目的とするものである。
In view of the above-mentioned conventional situation, the present invention provides a thin film magnetic head in which the tip of the second magnetic pole located on the air outflow end is wider than the tip of the first magnetic pole located on the air inflow end. The object of the present invention is to provide a method that can form a magnetic pole tip structure with high precision and good reproducibility.

〔問題点を解決するための手段〕[Means for solving problems]

この発明の薄膜磁気ヘッドの磁極先端部形成法は、基板
上に第1の磁極を形成する工程、該第1の磁極を含む基
板上に磁極の1¥さ以上の無機絶縁層を成膜する工程、
該無機絶縁層の表面をエツチングまたは研磨加工して前
記第1の磁極の先端部を露出させ両者を面一にする工程
、この面一化された面上にギャップ層を形成する工程、
該ギャップ層上に前記第1の磁極の先端部より幅の広い
第2の磁極の先端部を形成する工程から構成されること
を特徴とする。
The method for forming a magnetic pole tip of a thin film magnetic head according to the present invention includes the step of forming a first magnetic pole on a substrate, and forming an inorganic insulating layer having a thickness of at least 1 centimeter of the magnetic pole on the substrate including the first magnetic pole. process,
a step of etching or polishing the surface of the inorganic insulating layer to expose the tip of the first magnetic pole and making them flush; a step of forming a gap layer on the flush surface;
The present invention is characterized in that it comprises a step of forming a tip portion of a second magnetic pole wider than a tip portion of the first magnetic pole on the gap layer.

〔作用〕[Effect]

第1の磁極の先端部をそれの膜厚以上の厚さの無機絶縁
層で完全に被覆し、該無機絶縁層をエツチングまたは研
磨により第1の磁極先端部が露出するまで表面加工する
と、当該磁極先端部の周辺にはそれと面一の無i絶縁層
が形成される。つまり第1の磁極の先端部の周りにそれ
と同じ高さの絶縁性スペーサが形成されるので、この上
にはギャップ層を介して当該第1の磁極より先端部の幅
が広い第2の磁極を容易に形成することが可能である。
The tip of the first magnetic pole is completely covered with an inorganic insulating layer having a thickness equal to or greater than that of the first magnetic pole, and the surface of the inorganic insulating layer is processed by etching or polishing until the tip of the first magnetic pole is exposed. An i-free insulating layer flush with the tip of the magnetic pole is formed around the tip of the magnetic pole. In other words, an insulating spacer having the same height as the tip of the first magnetic pole is formed around the tip of the first magnetic pole, and a second magnetic pole whose tip is wider than the first magnetic pole is placed on top of this with a gap layer interposed therebetween. can be easily formed.

〔実施例〕〔Example〕

以下、この発明の一実施例につき磁極先端部を拡大した
断面図を参照して詳細に説明する。なお、この第1図の
断面図において前記第2〜4図と同一部分には同一符号
を記している。
Hereinafter, one embodiment of the present invention will be described in detail with reference to an enlarged sectional view of a magnetic pole tip. In the sectional view of FIG. 1, the same parts as in FIGS. 2 to 4 are designated by the same reference numerals.

第1図(a)に示す工程において、セラミック等より成
る基板11上にスパッタリング、蒸着、メッキ法で磁性
体、例えばNiFeを膜厚2〜3μm被着形成した後、
ケミカルエツチング、イオンエツチング等の技法により
パターニングし第1の磁極12を形成する。なお、図示
の磁極先端部の幅は10μmである。
In the step shown in FIG. 1(a), a magnetic material such as NiFe is deposited to a thickness of 2 to 3 μm on a substrate 11 made of ceramic or the like by sputtering, vapor deposition, or plating, and then
The first magnetic pole 12 is formed by patterning using techniques such as chemical etching and ion etching. Note that the width of the illustrated magnetic pole tip is 10 μm.

第1図(b)に示す工程において、第1の磁極12を含
む基板ll上にスパッタリングによりS + 02、A
l2O3等の無i絶縁層31を膜厚3〜5μm被着形成
する。
In the step shown in FIG. 1(b), S + 02, A is deposited on the substrate 11 including the first magnetic pole 12 by sputtering.
An i-free insulating layer 31 of 12O3 or the like is deposited to a thickness of 3 to 5 μm.

第1図(c)に示す工程において、無機絶縁層31の表
面を下層の第1の磁極12が露出するまで研磨加工して
両者を面一にする。なお、この研磨には例えばダイヤモ
ンド粒子を塗布した表面精度の良いアルミニウム板が使
用される。
In the step shown in FIG. 1(c), the surface of the inorganic insulating layer 31 is polished until the lower first magnetic pole 12 is exposed, so that they are flush with each other. Note that for this polishing, for example, an aluminum plate coated with diamond particles and having a high surface precision is used.

第1図+d)に示す工程において、而−化された第1の
磁極12と無機絶縁層31の上にスパッタリングでS 
i 02 、A 1203等より成るギヤ・ノブ層14
を膜厚0.5μm被着形成する。しかる後、図示しない
が従来と同様に第1の磁極の先端部上を除(このギャッ
プ層上に層間絶縁層、コイル導体層、層間絶縁層を順次
積層形成する。
In the process shown in FIG. 1+d), S
Gear knob layer 14 consisting of i 02, A 1203, etc.
A film of 0.5 μm thick is formed. Thereafter, although not shown, the top of the tip of the first magnetic pole is removed in the same manner as in the prior art (an interlayer insulating layer, a coil conductor layer, and an interlayer insulating layer are sequentially laminated on this gap layer).

第1図(e)に示す工程において、まずギャップ層14
の上に前記第1の磁極12と同じようにしてNiF’ 
eをn2厚2〜3μm被着形成する。次いでこのNiF
e膜をケミカルエツチング、イオンエツチング等の技法
によりパターニングし第2の磁極13を形成するが、そ
の磁極先端幅は前記第1の磁極12の先端部の幅よりも
1〜2μm広く形成する。
In the step shown in FIG. 1(e), first the gap layer 14
NiF' is placed on top of the first magnetic pole 12 in the same way as the first magnetic pole 12.
E is formed by adhering n2 to a thickness of 2 to 3 μm. Next, this NiF
The second magnetic pole 13 is formed by patterning the e-film by a technique such as chemical etching or ion etching, and the width of the tip of the magnetic pole is set to be 1 to 2 μm wider than the width of the tip of the first magnetic pole 12.

この後、図示しないがS j 02 、A 1203等
より成る保護層が被着形成され、基板11をスライダ形
状に加工あるいはスライダ組立体に接着して浮上型の薄
膜磁気ヘッドを完成する。
Thereafter, although not shown, a protective layer made of S j 02, A 1203, etc. is deposited, and the substrate 11 is processed into a slider shape or bonded to a slider assembly to complete a floating thin film magnetic head.

〔効果〕〔effect〕

以上の説明から明らかなように、この発明によれば、空
気流出端側に位置する第2の磁極の先端部の幅が空気流
入端側に位置する第1の磁極の先端部の幅より広い薄膜
磁気ヘッドを高精度でかつ容易に製造することができる
。従って、サイド・クロストークが少なくオフトラック
による再生出力低下の少ない浮上型の薄膜磁気ヘッドを
提供できる効果がある。
As is clear from the above description, according to the present invention, the width of the tip of the second magnetic pole located on the air outflow end is wider than the width of the tip of the first magnetic pole located on the air inflow end. A thin film magnetic head can be easily manufactured with high precision. Therefore, it is possible to provide a flying type thin film magnetic head with less side crosstalk and less reduction in reproduction output due to off-track.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明に係る薄膜磁気ヘッドの製造方法の一
実施例を工程順に示す要部拡大断面図、第2図は従来の
薄ll!i!磁気ヘッドの構造を示す要部断面図、 第3図は同ヘッドを搭載したスライダの概略図、第4図
は同ヘッドを記録媒体側から見た磁極先端形状を示す図
である。 、第1図において、 11は基板、     I2は第1の磁極、13は第2
の磁極、  14はギヤツブ層、31は無a ′4f!
A縁層をそれぞれ示す。 滲T冷fIJ/1社鍮見坏部形へ゛ゴの第 1 図
FIG. 1 is an enlarged cross-sectional view of essential parts showing the process order of an embodiment of a method for manufacturing a thin film magnetic head according to the present invention, and FIG. 2 is a conventional thin film magnetic head manufacturing method. i! FIG. 3 is a schematic diagram of a slider on which the magnetic head is mounted, and FIG. 4 is a diagram showing the shape of the magnetic pole tip when the head is viewed from the recording medium side. , In Fig. 1, 11 is the substrate, I2 is the first magnetic pole, and 13 is the second magnetic pole.
magnetic pole, 14 is gear layer, 31 is no a '4f!
The A-rim layer is shown respectively. Figure 1 of the shape of the brass fitting part of the company T-cooled fIJ/1.

Claims (1)

【特許請求の範囲】 浮上面を有するスライダ組立体上に設置されており、ギ
ャップ層を介在した第1および第2の磁極の先端部が、
空気流入端側に位置する当該第1の磁極よりも空気流出
端側に位置する当該第2の磁極の方を幅広く形成した薄
膜磁気ヘッドにおいて、 前記第1および第2の磁極の先端部を下記の工程により
形成することを特徴とする薄膜磁気ヘッドの製造方法。 (a)基板(11)の上に第1の磁極(12)を所定の
膜厚で形成する工程と、 (b)前記第1の磁極(12)を含む基板上に、該磁極
の膜厚と等しいか、それ以上の厚さの無機絶縁層(31
)を成膜する工程と、 (c)前記無機絶縁層(31)の表面をエッチングまた
は研磨加工して前記第1の磁極(12)の先端部を露出
させ両者を面一にする工程と、 (d)面一化されたこの面上にギャップ層(14)を形
成する工程と、 (e)前記ギャップ層(14)の上に、前記第1の磁極
(12)の先端部より幅の広い第2の磁極(13)の先
端部を所定の膜厚で形成する工程。
[Claims] The tip portions of the first and second magnetic poles, which are installed on a slider assembly having an air bearing surface, with a gap layer interposed therebetween,
In a thin film magnetic head in which the second magnetic pole located on the air outflow end side is formed wider than the first magnetic pole located on the air inflow end side, the tips of the first and second magnetic poles are as follows. A method of manufacturing a thin film magnetic head, characterized in that it is formed by the steps of: (a) forming a first magnetic pole (12) with a predetermined thickness on the substrate (11); (b) forming a first magnetic pole (12) with a predetermined thickness on the substrate including the first magnetic pole (12); An inorganic insulating layer (31
), and (c) etching or polishing the surface of the inorganic insulating layer (31) to expose the tip of the first magnetic pole (12) so that they are flush with each other; (d) forming a gap layer (14) on this flush surface; (e) forming a gap layer (14) on the gap layer (14) with a width smaller than the tip of the first magnetic pole (12); Step of forming the tip of the wide second magnetic pole (13) with a predetermined thickness.
JP4698686A 1986-03-03 1986-03-03 Manufacturing method of thin film magnetic head Pending JPS62204420A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4698686A JPS62204420A (en) 1986-03-03 1986-03-03 Manufacturing method of thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4698686A JPS62204420A (en) 1986-03-03 1986-03-03 Manufacturing method of thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS62204420A true JPS62204420A (en) 1987-09-09

Family

ID=12762529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4698686A Pending JPS62204420A (en) 1986-03-03 1986-03-03 Manufacturing method of thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS62204420A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0390347A2 (en) * 1989-03-28 1990-10-03 Quantum Corporation Recording head to optimize high density recording
JPH06274823A (en) * 1993-10-20 1994-09-30 Yamaha Corp Production of thin-film magnetic head for magnetized recording medium
JP2005086056A (en) * 2003-09-10 2005-03-31 Tdk Corp Lamination chip forming member and method for manufacturing lamination chip electronic component
JP2005277385A (en) * 2004-02-27 2005-10-06 Tdk Corp Laminate chip inductor forming member and method of manufacturing laminate chip inductor comonent
US7429493B2 (en) 2005-07-18 2008-09-30 Hitachi Global Storage Technologies Netherlands B.V. Method for fabricating a magnetic head for perpendicular recording using a CMP lift-off and resistant layer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60171612A (en) * 1984-02-17 1985-09-05 Hitachi Ltd Multi-element thin film magnetic head

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60171612A (en) * 1984-02-17 1985-09-05 Hitachi Ltd Multi-element thin film magnetic head

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0390347A2 (en) * 1989-03-28 1990-10-03 Quantum Corporation Recording head to optimize high density recording
JPH02285503A (en) * 1989-03-28 1990-11-22 Digital Equip Corp <Dec> Recording head for optimizing high density record
JPH06274823A (en) * 1993-10-20 1994-09-30 Yamaha Corp Production of thin-film magnetic head for magnetized recording medium
JP2005086056A (en) * 2003-09-10 2005-03-31 Tdk Corp Lamination chip forming member and method for manufacturing lamination chip electronic component
JP2005277385A (en) * 2004-02-27 2005-10-06 Tdk Corp Laminate chip inductor forming member and method of manufacturing laminate chip inductor comonent
US7429493B2 (en) 2005-07-18 2008-09-30 Hitachi Global Storage Technologies Netherlands B.V. Method for fabricating a magnetic head for perpendicular recording using a CMP lift-off and resistant layer

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