JPS6218713A - Developing device - Google Patents

Abstract

PURPOSE:To prevent the sensitivity of a resist from decreasing due to the treating solution and the temperature drop of a substrate by providing a substrate heating mechanism at a chuck for rotating the substrate. CONSTITUTION:A vacuum chuck 2 mounted in a chamber 1 of a developing device is rotated by a motor, coated with a resist, and rotated around a vertical shaft while holding a selectively exposed substrate 3. A layer 4 is developed by spraying a developer 6 and contacting the developer with the substrate 3. At this time a voltage is applied by a power source 8 to a heater 7 contained in the chuck 2 to heat the substrate 3. Thus, it prevents a treating solution produced when spray-developing a positive type radiation sensitive resist with a developing solution of an organic solvent type and the substrate from decreasing, thereby performing the high sensitivity of the resist.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a developing device used for pattern formation of semiconductor integrated circuits, and in particular, the present invention relates to a developing device used for forming patterns of semiconductor integrated circuits. This invention relates to improvement of a developing device for spray developing.

[Conventional technology]

Conventionally, this type of developing device has the advantage of ease of automation.

Due to its low defect level and high dimensional accuracy of the resist pattern, the development process is carried out by spraying developer and rinsing liquid from a nozzle onto a rotating substrate, so-called spray development. It was a device.

[Problem that the invention seeks to solve]

In recent years, radiation sensitive resists such as D UV resist, electron beam resist EP T-,
% is being put into practical use. Many of these resists generally use organic solvents, such as ketone alcohols, as the developing solution. However, developers using these organic solvents.

The rinsing liquid is generally highly volatile, and when used in the above-mentioned spray one-type developing device, the temperature of the processing liquid and the temperature of the substrate to be processed are significantly lowered because the heat of vaporization is taken away when the rinsing liquid becomes a spray. When the resist is a positive radiation-sensitive resist, this temperature drop causes a significant decrease in sensitivity and causes a decrease in productivity in the manufacture of semiconductor integrated circuits.

[Means for solving problems]

The developing device of the present invention has a chuck that completely rotates the substrate to be processed and a mechanism for heating the substrate.

〔Example〕

Next, the present invention will be explained with reference to the drawings.

FIG. 1 is a schematic diagram showing an embodiment of a developing device according to the present invention.

A vacuum chuck 2 installed inside the chamber 1 of the developing device
is rotated by a motor, and while the substrate 3 coated with the resist 4 and then selectively exposed is held horizontally, it is rotated around a vertical axis at a predetermined rotational speed during the development process. The resist layer is developed by spraying a developer 6 from a nozzle 5 and hitting the rotating substrate.

At this time, an arbitrary voltage is applied from an AC or DC power supply 8 to a heater 7 built into the rotating vacuum chuck through a terminal 9 provided on the rotating shaft of the vacuum chuck, and the substrate is heated to an arbitrary temperature. deceive The heater built into the vacuum chuck is arranged to uniformly heat the substrate, as shown in FIG.

When the developing device according to the present invention is used, for example, the sensitivity of the positive-type electron beam sensitive resistor EBR-9 manufactured by Toshishiki Co., Ltd. is determined by the mixing ratio [volume ratio] of methyl isobutyl ketone and isopropyl alcohol as the developing solution: 8:2. When spray development was carried out for 3 minutes using a
V), the Metta value was 5 μC/c rn as above.

Although the above-mentioned embodiment has fully explained in detail the mechanism in which the chuck has a built-in heater, the present invention is not limited to this, and the substrate heating mechanism of the chuck includes a heat pump built in the chuck, A method can also be applied in which this is heated by the rotating shaft of the chuck and the heat is conducted to the substrate.

〔Effect of the invention〕

As explained above, the present invention provides a mechanism for heating the substrate in a chuck that rotates the substrate completely, thereby improving the processing that occurs when spray developing a positive radiation-sensitive resist using an organic solvent-based developing solution. This prevents a significant drop in resist sensitivity due to a drop in the temperature of the liquid and substrate, making it possible to achieve high sensitivity of the resist, and making it possible to manufacture semiconductor integrated circuits with high productivity.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram showing an embodiment of a developing device according to the present invention, and FIG. 2 is a diagram showing the arrangement of a heater built into a vacuum chuck. 1...Chamber, 2...Vacuum chuck, 3...Substrate, 4...Resist, 5
...Spray nozzle, 6...Developer,
7... Heater, 8... Alternating current (DC)
Power supply, 9...terminal. 2nd Attorney Patent Attorney Uchihara Yoto Figure 1 Figure 2

Claims (1)

[Claims] In a spray developing device that sprays an organic solvent-based developer and a rinse solution while rotating the substrate, which is used for development processing in pattern formation using a positive radiation-sensitive resist, a chuck that rotates the substrate is A developing device characterized by having a substrate heating mechanism.