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JPS6055534A - Production of optical recording medium - Google Patents

Production of optical recording medium

Info

Publication number
JPS6055534A
JPS6055534A JP16373983A JP16373983A JPS6055534A JP S6055534 A JPS6055534 A JP S6055534A JP 16373983 A JP16373983 A JP 16373983A JP 16373983 A JP16373983 A JP 16373983A JP S6055534 A JPS6055534 A JP S6055534A
Authority
JP
Japan
Prior art keywords
layer
optical recording
recording medium
photoresist layer
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16373983A
Other languages
Japanese (ja)
Inventor
Yasuki Rai
泰樹 頼
Noboru Iue
井植 登
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP16373983A priority Critical patent/JPS6055534A/en
Publication of JPS6055534A publication Critical patent/JPS6055534A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To simplify the production of an optical recording medium and at the same time to secure the accurate transcription by irradiating the light to a photoresist layer on a substrate via a mask matter containing an information pattern to transcribe this pattern and developing it. CONSTITUTION:A thin film layer 200 and a photoresist 300 are formed on a substrate 100. The light is irradiated to the resist 300 via a mask body 400 containing an information pattern to transcribe this pattern to the resist 300. Then the pattern is developed, and the layer 200 is etched. Furthermore the remaining resist is removed, and a reflecting film 500 is coated on the substrate 100 to form a protecting layer 600.

Description

【発明の詳細な説明】 (イ)産業上の利用分野 本発明は光学記録媒体の製造方法に関するものである。[Detailed description of the invention] (b) Industrial application field The present invention relates to a method for manufacturing an optical recording medium.

(ロ)従来技術 従来、光学記録媒体(例えばビデオディスク。(b) Conventional technology Conventionally, optical recording media (e.g. video discs).

コンパクトディスク等)の製造方法としては第1図に示
す方法が知られている。
The method shown in FIG. 1 is known as a method for manufacturing compact discs, etc.).

即ち、よく研磨されたガラス板[11上にホトレジスト
(2)を塗布する(第1図口)。このホトレジスト(2
)に対してオーディオ信号にて光変調したレーザ光(電
子線、紫外線等でも良い)を照射することにより、オー
ディオ信号を焼付け、更に現像処理する(第1図ハ)。
That is, a photoresist (2) is applied on a well-polished glass plate [11] (see Figure 1). This photoresist (2
) is irradiated with laser light (electron beam, ultraviolet light, etc.) modulated by the audio signal to print the audio signal and further develop it (FIG. 1C).

次に、スパッタリング若しくは蒸着等により銀(A P
 ) f31を4< 堆積させ(第1図二)、更にその
上にメッキ若しくはスパッタリング等によりエラグy(
Ni)層(4)を数μ程度ti積させる(第1図ホ)。
Next, silver (A P
) f31 of 4<
The Ni) layer (4) is stacked to a thickness of about several μm (FIG. 1(e)).

このニッケ膜層をエッチオフし、これを金型(スタンバ
−)とする(第1図へ)。この金型を利用し、アクリμ
・ポリカーボネート等の樹脂を、圧縮成形、インジェク
ション成形等の樹脂成形技術を用いて形成し、ディスク
f松製していた。
This nickel film layer is etched off and used as a mold (stambar) (see FIG. 1). Using this mold, Acryμ
・The disk was made of pine, made of resin such as polycarbonate, using resin molding techniques such as compression molding and injection molding.

祈る方法は、ディスクを安価に大量生産することが出来
るという利点を有17ている。
The prayer method has the advantage that discs can be mass-produced at low cost17.

然し乍ら、所る従来方法では次の様な間萌を有している
However, some conventional methods have the following disadvantages.

即ち、(1)ディスクを製造するまでの工程(特にスタ
ンバ−を作成するまでの工程)が多く、非常に複雑であ
る。
That is, (1) there are many steps to manufacturing a disc (especially steps to creating a stand bar) and it is very complicated.

(II) 金型(スタンバ−)の情報信号パターンを樹
脂成形にて転写する方法である為、樹脂の温度等の成形
条件をIlI密にする必要がある。何故なら、所る成形
条件を満たしていない場合、金型(スタンバ−)の情報
信号パターンを正確に転写することが出来ず(例えば、
ビットの深さ又は形状等を充分に転写出来ない)、不良
ディスクを生じる。又、金型(スタンバ−)K塵埃等が
付着l−ていた場合にも不良ディスクを発生する為、金
型(スタンバ−)の塵埃付着検査を入念に行う必要があ
る。
(II) Since this is a method of transferring the information signal pattern of the mold (stambar) by resin molding, it is necessary to keep the molding conditions such as the temperature of the resin very close. This is because if certain molding conditions are not met, the information signal pattern of the mold (stambar) cannot be accurately transferred (for example,
(The depth or shape of the bit cannot be transferred sufficiently), resulting in a defective disc. Also, if the mold (stambar) is contaminated with dust or the like, defective discs may occur, so it is necessary to carefully inspect the mold (stambar) for dust adhesion.

(IIIj 不良ディスクが発生1〜た場合、所る不良
ディスクは廃棄する外用途がなく、不経済であった。
(IIIj) When a defective disk occurs, it is uneconomical because there is no other use for discarding the defective disk.

(ハ)発明の目的 本発明は上記問題を解決する光学記録媒体の製造方法を
提供することを目的とする。
(c) Purpose of the Invention An object of the present invention is to provide a method for manufacturing an optical recording medium that solves the above-mentioned problems.

に)発明の要旨 上記目的を達成する為に、光学記録媒体の主体をなす基
板上に薄膜層を形成する過程と、この薄膜層上にホトレ
ジスト層を形成する過程と、このホトレジスト層上に記
録されるべき情報パターンが形成されたマスク体を介し
て光を照射することにより前記情報パターンを前記ホト
レジスト層上に転写する過程と、前記情報パターンが転
写されたホトレジスト層に対して現像処理を施こす過程
と、この現像処理にてホトレジスト層が除去された部分
の薄膜層を除去する過程と、すくなくとも保護層を形成
する過程とにより光学記録媒体を製造する。
B) Summary of the Invention In order to achieve the above object, a process of forming a thin film layer on a substrate forming the main body of an optical recording medium, a process of forming a photoresist layer on this thin film layer, and a process of recording on this photoresist layer are provided. A process of transferring the information pattern onto the photoresist layer by irradiating light through a mask body on which the information pattern to be printed is formed, and a process of developing the photoresist layer to which the information pattern has been transferred. An optical recording medium is manufactured by a rubbing process, a process of removing the thin film layer in the portion where the photoresist layer was removed by this development process, and a process of forming at least a protective layer.

(ホ)実施例 先ず、wJ2図を参照してマスク体の製造について説明
する。
(e) Example First, manufacturing of a mask body will be explained with reference to Fig. wJ2.

石英又はガラス基板(101上に例オ、ばクロム(Cr
)−を800A[積させる(第2図イ)。所るクロム(
Cr)薄膜層−上にホトレジスト−を塗布する12図口
)。所るホトレジスト■上にオーディオ信号で変調され
たV−ザ光等を照射することKよりオーディオ信号を焼
付け、更に現像処理する(第2図へ)。次に1例えば硝
酸第二セリウムアンモニウムを主成分とする水溶液中で
処理すると、レジスト−に覆われていない部分のクロム
翰は溶解し、その後レジスト−を除去すると、第2図二
に示すようなマスク体が形成される。
For example, on a quartz or glass substrate (101), chromium (Cr
) - is multiplied by 800A (Figure 2 A). Tokoru chrome (
Cr) thin film layer - coating photoresist on top (Figure 12). The audio signal is printed by irradiating V-za light modulated with an audio signal onto the photoresist (1), and then the photoresist (1) is further developed (see FIG. 2). Next, when treated in an aqueous solution containing, for example, ceric ammonium nitrate as the main component, the portions of the chrome film that are not covered by the resist will dissolve, and when the resist is then removed, the result will be as shown in Figure 2. A mask body is formed.

次に、斯るマスク体を用いた本発明について第3図を参
照して説明する。
Next, the present invention using such a mask body will be explained with reference to FIG.

光学記録媒体の主体をなす基板(100)上にこの基板
(100)とけ異なる材料よりなる薄膜層(200)を
蒸着、スパッタリング4IKて形成しく第3図イ)、祈
る薄膜層(200)上にホトレジスト(300)を塗布
する(第3図口)。このホトレジスト(300)上にマ
スク体(400)を介して光(レーザ光、紫外線等)を
照射することによりマスク体(400)に記録された情
報パターンをホトレジスト(300)に転写しく第3図
ハ)、その後現像処理を施こす(第3図二)。
On the substrate (100) which forms the main body of the optical recording medium, a thin film layer (200) made of a material different from that of the substrate (100) is formed by vapor deposition and sputtering (4IK). Apply photoresist (300) (Figure 3 opening). The information pattern recorded on the mask body (400) is transferred onto the photoresist (300) by irradiating light (laser light, ultraviolet light, etc.) onto the photoresist (300) through the mask body (400). c) Then, a development process is performed (Fig. 3-2).

然る後、薄膜層(200)を俗争的妃エツチング処理し
く例えば、薄膜層(200)がアルミニウム(AJ)で
形成されている場合、リン酸を主成分とする溶液中で処
理すると、レジスト(30゜)に覆われていない薄膜層
(200)はエツチングされる)、更に残存レジストを
除去する(第3図示)。その後、反射膜(SOO)を塗
布した後、保護層(600)を形成して光学記録媒体が
完成する0 尚、基板(100)として薄膜層(200)を構成する
金属の反射率よシも悪い反射率を有する金属を用いれば
、格別に反射膜(500)を形成する必要はない。
After that, the thin film layer (200) is subjected to a conventional etching process. For example, when the thin film layer (200) is formed of aluminum (AJ), the resist is etched when the thin film layer (200) is treated in a solution containing phosphoric acid as a main component. The thin film layer (200) not covered by (30°) is etched), and the remaining resist is further removed (as shown in the third figure). After that, after applying a reflective film (SOO), a protective layer (600) is formed to complete the optical recording medium. If a metal with poor reflectance is used, there is no need to form a special reflective film (500).

又、本発明における薄膜層はエツチング処理出来るもの
であれは何頭なる材料を用いてもよい。
Further, the thin film layer in the present invention may be made of any material as long as it can be etched.

(へ)発明の効果 本発明に依れば、簡単な方法で光学記録媒体を製造する
ことが出来る。又、樹脂による転写ではなく光学的転写
である為、形成−Eの制約を受けな合にも#膜層を除去
するだけで基板の再利用が出来るので、経済的である。
(f) Effects of the Invention According to the present invention, an optical recording medium can be manufactured by a simple method. In addition, since the transfer is optical transfer rather than transfer using a resin, the substrate can be reused by simply removing the # film layer even when there are no restrictions on formation-E, which is economical.

ス、薄膜層を例えばビット深さと対応する厚さとすれば
、ピット深さの制御が容易となる。
For example, if the thin film layer has a thickness corresponding to the bit depth, the pit depth can be easily controlled.

4、図面のWrI単身脱川 第用図は従来の製造方法を示す図、第2図はマスク体の
製造方法を示す図、第3図は零発す1の製造方法を示す
図である。
4. Figure 4 shows the conventional manufacturing method, Figure 2 shows the manufacturing method of the mask body, and Figure 3 shows the manufacturing method of 1.

(100)・・・基板、(200)・・・薄膜層、(3
00)・・・ホトレジスト、(400)・・・マスク体
、(a OO) −・・保@Nii。
(100)...Substrate, (200)...Thin film layer, (3
00)...Photoresist, (400)...Mask body, (a OO) -...Ho@Nii.

第1図 3Figure 1 3

Claims (1)

【特許請求の範囲】[Claims] (1)光学記録媒体の主体をなす基板」1に薄膜層を形
成する過程と、この薄膜層上にホトレジスト層を形成す
る過程と、このホトレジスト層−Fに記録されるべき情
報パターンが形成されたマスク体を介して光を照射する
ことにより前記情報パターンを前記ホトレジスト層上に
転写する過程と、前記情報パターンが転写されたホI・
レジス)・層に対して現像処理1を施こす過程と、この
現像処理J1にてホトレジスト層が除去された部分の薄
膜層を除去する過程と、残存ホトレジスト層を除去する
過程と、すくなくとも保讃層を形成する過程とよりなる
光学記録媒体の製造方法。 T21 l/膜層を記録されるべき情報パターンのピッ
ト深さに対応する厚さ形成する特許請求の範囲第1項記
載の光学記録媒体の製造方法。
(1) A process of forming a thin film layer on the substrate 1 which forms the main body of the optical recording medium, a process of forming a photoresist layer on this thin film layer, and an information pattern to be recorded on this photoresist layer-F is formed. a process of transferring the information pattern onto the photoresist layer by irradiating light through a mask body; and a process of transferring the information pattern onto the photoresist layer;
A process of performing development treatment 1 on the photoresist layer, a process of removing the thin film layer in the area where the photoresist layer was removed in this development process J1, a process of removing the remaining photoresist layer, and at least a process of preserving the photoresist layer. A method for manufacturing an optical recording medium, comprising a process of forming a layer. 2. The method of manufacturing an optical recording medium according to claim 1, wherein the T21/film layer is formed to a thickness corresponding to the pit depth of the information pattern to be recorded.
JP16373983A 1983-09-05 1983-09-05 Production of optical recording medium Pending JPS6055534A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16373983A JPS6055534A (en) 1983-09-05 1983-09-05 Production of optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16373983A JPS6055534A (en) 1983-09-05 1983-09-05 Production of optical recording medium

Publications (1)

Publication Number Publication Date
JPS6055534A true JPS6055534A (en) 1985-03-30

Family

ID=15779753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16373983A Pending JPS6055534A (en) 1983-09-05 1983-09-05 Production of optical recording medium

Country Status (1)

Country Link
JP (1) JPS6055534A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61188757A (en) * 1985-02-18 1986-08-22 Dainippon Printing Co Ltd Manufacture of optical recording body
JPS6276039A (en) * 1985-09-30 1987-04-08 Hoya Corp Manufacture of optical information recording medium
JPS62110636A (en) * 1985-11-08 1987-05-21 Kyodo Printing Co Ltd Optical recording medium and its manufacture
JPS62117152A (en) * 1985-11-18 1987-05-28 Yasuyoshi Sato Cylinder record
EP0239188A2 (en) * 1986-01-21 1987-09-30 Kyodo Printing Co., Ltd. Preformatted optical recording medium and method of producing the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61188757A (en) * 1985-02-18 1986-08-22 Dainippon Printing Co Ltd Manufacture of optical recording body
JPS6276039A (en) * 1985-09-30 1987-04-08 Hoya Corp Manufacture of optical information recording medium
JPH0348581B2 (en) * 1985-09-30 1991-07-24 Hoya Corp
JPS62110636A (en) * 1985-11-08 1987-05-21 Kyodo Printing Co Ltd Optical recording medium and its manufacture
JPS62117152A (en) * 1985-11-18 1987-05-28 Yasuyoshi Sato Cylinder record
EP0239188A2 (en) * 1986-01-21 1987-09-30 Kyodo Printing Co., Ltd. Preformatted optical recording medium and method of producing the same

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