JPS60233505A - Line width measuring method - Google Patents
Line width measuring methodInfo
- Publication number
- JPS60233505A JPS60233505A JP8968284A JP8968284A JPS60233505A JP S60233505 A JPS60233505 A JP S60233505A JP 8968284 A JP8968284 A JP 8968284A JP 8968284 A JP8968284 A JP 8968284A JP S60233505 A JPS60233505 A JP S60233505A
- Authority
- JP
- Japan
- Prior art keywords
- light
- prism
- refractive index
- film
- line width
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 7
- 239000000463 material Substances 0.000 claims description 4
- 230000010287 polarization Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 abstract description 4
- 239000007788 liquid Substances 0.000 abstract description 2
- 238000005259 measurement Methods 0.000 abstract 1
- 239000005331 crown glasses (windows) Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は微細加工によシ加工された・母ターンの線巾測
定方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for measuring the line width of a mother turn processed by micromachining.
（従来技術とその問題点）
従来、微細加工によシ得られた・９ターンの線巾を測定
するＫは、・９ターン上方から集光した光を照射し、・
クターン各部からの光の反射率を測定することによシ行
なわれてきた。しかし、光の反射率は・母ターンエツジ
において急峻には変化せず、このために１得られたパタ
ーン線巾の測定値が真のパターン線巾とは等しくならな
いという欠点があった。(Prior art and its problems) Conventionally, K to measure the line width of 9 turns obtained by microfabrication is to irradiate focused light from above the 9 turns.
This has been done by measuring the reflectance of light from each part of the pattern. However, the reflectance of light does not change sharply at the mother turn edge, and for this reason, there is a drawback that the obtained measured value of the pattern line width is not equal to the true pattern line width.
（発明の目的）
本発明の目的は、上記のような欠点を除去した線巾測定
方法を提供することにある。(Objective of the Invention) An object of the present invention is to provide a line width measuring method that eliminates the above-mentioned drawbacks.
（発明の構成）
すなわち、本発明は基板上の町透光性材質膜にプリズム
を通して導波せしめた光を該層からプリズムを通して出
射せしめ、偏光方向が同じで出射角が異なる光の出射角
の測定値から該層の屈折率と膜厚、とをめ、これらの値
と、該層を所望の形状に加工した後、加工された該層に
プリズムを通して光を導波せしめ、次に、該層からプリ
ズムを通して出射せしめた光の出射角の測定値とを演算
して加工された膜の加工線巾をめることを特徴とする線
巾測定方法である。(Structure of the Invention) That is, the present invention allows light to be guided through a prism in a light-transmitting material film on a substrate, and to be emitted from the layer through the prism, and to change the emission angle of the light having the same polarization direction but different emission angles. Determine the refractive index and film thickness of the layer from the measured values, process these values and the layer into a desired shape, guide light through a prism through the processed layer, and then This line width measurement method is characterized by calculating the processed line width of a processed film by calculating the measured value of the emission angle of light emitted from the layer through a prism.
（本発明の作用・原理） 以下に本発明の原理を図面を参照しながら説明する。(Operation/principle of the present invention) The principle of the present invention will be explained below with reference to the drawings.
第１図に示すように屈折率ｎｌ＋厚さｔの膜１が屈折率
ｎ２の物質２と屈折率ｎ０の物質（例えば空気・液体）
３との間にはさまれている場合において、まず、膜１上
に密着して置かれた屈折率ｎ′のプリズム４を通して波
長λの光５を膜１中にｍ次モードで導波させる。As shown in FIG. 1, a film 1 with a refractive index nl + thickness t is formed with a material 2 having a refractive index n2 and a material having a refractive index n0 (for example, air or liquid).
3, first, light 5 with a wavelength λ is guided in the m-th mode into the film 1 through a prism 4 with a refractive index n' placed in close contact with the film 1. .
次に、膜１上に置かれた屈折率ｎ、のプリズム６を通し
て光を出射させ、プリズム６からの光出射角θ１を測定
する。なお、ｎ ｐ Ｈｎ ｐ’はともにｎＱ ｌ ｎ
２よシ大きいことが必要である。この時、ｍ次のＴＥ波
について、各変数間には式（１）から（４）の関係／ｍ
＝ ｋｎｐ ｄｎθ、 ・・・（２）ｋ−２π／λ ・
・・（３）
ｎＱ ／ｎｐ ＝ｔｍ （θ、−α）／ｌｈθｉ ・・
・（４）但し、αはプリズムの光出射面とプリズムが膜
１と接する面とのなす角度。Next, light is emitted through a prism 6 with a refractive index of n placed on the film 1, and the light emission angle θ1 from the prism 6 is measured. In addition, n p Hn p' are both nQ l n
It needs to be larger than 2. At this time, for the m-th TE wave, the relationships between each variable are expressed by equations (1) to (4)/m
= knp dnθ, ... (2) k-2π/λ ・
・・(3) nQ /np =tm (θ, -α)/lhθi ・・
-(4) However, α is the angle formed between the light exit surface of the prism and the surface of the prism in contact with the film 1.
また、ｍ次のＴＭ波については式（２）から（５）の関
係が成シ立つ。Furthermore, the relationships expressed by equations (2) to (5) hold true for m-th TM waves.
従ってＴＩ波ｘｉＴＭ波についてｍ次及びｍ′次の導波
モード光の出射角θｈｎ、θ１ｍ’の測定を行ない、式
（１）から（４）又は式（２）から（５）を解くことに
よシ、膜１の屈折率ｎｌ及び厚さ請求める。Therefore, for the TI wave xiTM wave, the emission angles θhn and θ1m' of the m-th and m'-th guided mode lights are measured, and equations (1) to (4) or equations (2) to (5) are solved. Therefore, the refractive index nl and thickness of the film 1 can be determined.
次に第２図に示したように、線巾Ｗに加工された膜１に
プリズム４を通して光５を導波させると、プリズム６を
通して光が出射される。このプリズム６からの光出射角
θ、を測定する。この時、ＴＩ波につ！
いて、前記式（３） （４）及び式（６）から（８）が
成シ立つ。Next, as shown in FIG. 2, when the light 5 is guided through the prism 4 through the film 1 processed to have a line width W, the light is emitted through the prism 6. The light emission angle θ from this prism 6 is measured. At this time, TI wave! Therefore, the above formulas (3), (4) and formulas (6) to (8) hold true.
５３四瓶λＺフーｋｎ−〇、 ・・・（８）また、ＴＭ
波については前記式（３） （４）及び式（８）からα
Ｑが成）立つ。53 four bottles λZ Fu kn-〇, ...(8) Also, TM
Regarding the wave, α from the above equations (3), (4) and equation (8)
Q stands).
従って、式（３）＃（４）及び式（６）から（８）又は
式（３） （４）及び式（８）から（イ）を解くことに
よシ・９ターンの線巾Ｗをめることができる。Therefore, by solving equations (3) and (4) and equations (6) to (8) or equations (3) and (4) and equations (8) to (a), the line width W of 9 turns can be calculated. You can
（実施例） 以下、本発明の実施例を示す。(Example) Examples of the present invention will be shown below.
屈折率１．４５７の石英ガラス上にポリメチルメタアク
リル酸（ＰＭＭＡ ）を塗布し、空気（屈折率ｔ、ｏｏ
ｏ）中よシ、重クラウンガラスプリズムを通して波長６
３２８Ｘのヘリウムネオンレーデ光をＰＭＭＡ中に導波
させ、屈折率１．５８７の重クラウンガラスプリズム（
α−４５°、）から出光する光の出射角を測定したとこ
ろ、０次のＴＥ波の出射角状４０．４３度、１次の’ｒ
ｇ波の出射角は３６．３７度であり九。従９て式（１）
から（４）よシＰＭＭＡの膜厚は１．６μｍ、屈折率は
１．４９１となる。次にＰＭＭＡを線状・母ターンに加
工後、重クラウンガラスプリズムを通してヘリウムネオ
ンレーザ光をＰＭＭＡ中に導波させ、重クラウンガラス
プリズムから出光した光の出射角を測定したところ、Ｔ
Ｅ波の出射角は２５．３７度であった。従って、式（３
） 、 （４）及び式（６）から（８）よシＷをめるこ
とによって加工後のＰＭＭＡ・ヤターンの線巾は０．５
μｍであることが判った。Polymethyl methacrylic acid (PMMA) is coated on quartz glass with a refractive index of 1.457, and air (refractive index t, oo
o) Wavelength 6 through a heavy crown glass prism
A 328X helium neon led light is guided through PMMA, and a heavy crown glass prism (with a refractive index of 1.587) is used.
When the emission angle of the light emitted from α-45°, ) was measured, the emission angle of the zero-order TE wave was 40.43 degrees, and the output angle of the first-order 'r
The emission angle of the g-wave is 36.37 degrees, which is 9. 9th formula (1)
From (4), the film thickness of PMMA is 1.6 μm and the refractive index is 1.491. Next, after processing the PMMA into a linear/mother-turn shape, a helium neon laser beam was guided into the PMMA through a heavy crown glass prism, and the emission angle of the light emitted from the heavy crown glass prism was measured.
The emission angle of the E wave was 25.37 degrees. Therefore, the formula (3
), (4) and equations (6) to (8) by subtracting W, the line width of the PMMA yarn after processing is 0.5
It turned out to be μm.
（発明の効果）
したがって、本発明によれば、プリズムを用いて加工前
後のパターンに投影した光の出射角を測定するのみで、
パターンの線巾を正確にめることができる効果を有する
ものである。(Effects of the Invention) Therefore, according to the present invention, by simply measuring the emission angle of light projected onto a pattern before and after processing using a prism,
This has the effect that the line width of the pattern can be set accurately.
第１図は膜の屈折率及び厚さを測定する方法を表わす模
式図、第２図は膜の加工後の線巾を測定する方法を表わ
す模式図である。
１・・・膜、２・・・屈折率ｎ２の物質、３・・・屈折
率ｎＱの物質、４・・・入射プリズム、５・・・光、６
・・・出射プリズム。
第１図FIG. 1 is a schematic diagram showing a method of measuring the refractive index and thickness of a film, and FIG. 2 is a schematic diagram showing a method of measuring the line width after processing the film. DESCRIPTION OF SYMBOLS 1... Film, 2... Substance with refractive index n2, 3... Substance with refractive index nQ, 4... Incident prism, 5... Light, 6
...Emission prism. Figure 1
Claims (1)
導波せしめた光を該層からプリズムを通して出射せしめ
、偏光方向が同じで出射角が異なる光の出射角の測定値
から該層の屈折率と膜厚とをめ、ξれらの値と、該層を
所望の形状に加工した後、加工された該層にプリズムを
通して光を導波せしめ、次に該層からプリズムを通して
出射せしめた光の出射角の測定値とを演算して加工され
た膜の加工線巾をめることをｆＦ徴とする線巾測定方法
。(1) Light that is guided through a prism on a light-transmitting material film on the substrate is emitted from the layer through the prism, and the output angle of the light with the same polarization direction but different output angles is measured. After determining the refractive index and film thickness and processing the layer into a desired shape, the light is guided through the processed layer through a prism, and then emitted from the layer through the prism. A method of measuring line width in which the processed line width of a processed film is determined by calculating the measured value of the emission angle of light and the fF characteristic.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8968284A JPS60233505A (en) | 1984-05-04 | 1984-05-04 | Line width measuring method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8968284A JPS60233505A (en) | 1984-05-04 | 1984-05-04 | Line width measuring method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60233505A true JPS60233505A (en) | 1985-11-20 |
Family
ID=13977529
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8968284A Pending JPS60233505A (en) | 1984-05-04 | 1984-05-04 | Line width measuring method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60233505A (en) |
-
1984
- 1984-05-04 JP JP8968284A patent/JPS60233505A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0259639A (en) | Measurement of automatic collimation angle for grid coupler | |
| US3982816A (en) | Method for measuring the parameters of optical fibers | |
| JPH0694427A (en) | Machining groove depth detecting method and device therefor, and ion-milling device and manufacture of electronic/optical element | |
| JPH0432704A (en) | Gap measuring instrument and surface shape measuring instrument | |
| CN113403601A (en) | Optical control device and method for coating thickness | |
| JP2024054271A (en) | Optically-based verification of internal facet orientation | |
| CN108613949B (en) | Angle scanning refractive index sensor based on asymmetric metal-clad dielectric waveguide | |
| JPS60233505A (en) | Line width measuring method | |
| US6687015B1 (en) | Method and device for measuring the thickness of a layer | |
| Alexandrov et al. | Interference method for determination of the refractive index and thickness | |
| US11680791B2 (en) | Methods and systems for real-time, in-process measurement of coatings on substrates of aerospace components | |
| JPS614906A (en) | Measuring method of line width | |
| JPH08285545A (en) | Detection of change in diameter of optical fiber and manufacture of optical fiber | |
| JPS614905A (en) | Measuring method of line width | |
| JPS60233506A (en) | Line width measuring method | |
| JPS6435306A (en) | Incidence angle determining method for refractive index and film thickness measurement | |
| JPS60236006A (en) | Measuring method of line width | |
| JPH11173825A (en) | Prism squareness-measuring method | |
| JP2654366B2 (en) | Micro polarimeter and micro polarimeter system | |
| JP2617754B2 (en) | Method for measuring surface shape of transmission optical element and measuring jig used for the method | |
| JPS61265515A (en) | Method for measuring processing accuracy | |
| JPS6246821B2 (en) | ||
| JPS60236004A (en) | Measuring method of line width | |
| CN113933850A (en) | Single-source coaxial multidirectional laser ranging device and ranging method | |
| JPS61265514A (en) | Method for measuring processing accuracy |