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JPS60183709A - Substrate for thin film magnetic head - Google Patents

Substrate for thin film magnetic head

Info

Publication number
JPS60183709A
JPS60183709A JP59039818A JP3981884A JPS60183709A JP S60183709 A JPS60183709 A JP S60183709A JP 59039818 A JP59039818 A JP 59039818A JP 3981884 A JP3981884 A JP 3981884A JP S60183709 A JPS60183709 A JP S60183709A
Authority
JP
Japan
Prior art keywords
tic
weight
al2o3
total weight
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59039818A
Other languages
Japanese (ja)
Inventor
Takehiko Yoneda
米田 毅彦
Yoshihiko Miyata
宮田 芳彦
Hiromitsu Tagi
多木 宏光
Minoru Sugimura
杉村 実
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59039818A priority Critical patent/JPS60183709A/en
Publication of JPS60183709A publication Critical patent/JPS60183709A/en
Pending legal-status Critical Current

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  • Ceramic Products (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To obtain a fine substrate which is mechanically strong and excellent in machining by adding specific quantity of a reducing oxide in a composition consisting of TiC-Al2O3. CONSTITUTION:A material consisting of 70-98% of the total weight TiC and Al2O3 and 30-2% of the total weight reducing oxide and the content of TiC being 5-50% of the total weight is used. If the content of TiC and AlO3 exceeds 98% of the total weight, the sintering temperature rises and cannot be sintered under a temperature of 1,700 deg.C and if the content is 70% or less of the total weight, the phases of TiC and Al2O3 are reduced and the Vickers hardness is lowered. If the content is 5% or less of the total weight, the resistance against abrasion is reduced. If the weight of the reducing oxide exceeds 30% of the total weight, rich phases of TiC and Al2O3 rapidly grow into grains and if the content is 2% or less of the total weight, holes increase rapidly.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は硬度が高くかつ機械加工性の優れた薄膜磁気ヘ
ッド用基板に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a substrate for a thin film magnetic head that has high hardness and excellent machinability.

従来例の構成とその問題点 従来より、TiC系のセラミック材料はその高い耐摩耗
性により広く普及している。特にTiC−Al2O3系
セラミックは、薄膜用基板として最近特に注目されてい
る。しかしながら、TiC−Al2O3基板は切削工具
として使用される程、機械的強度が高く、機械加工が困
難である。この原因は、Tic,Al2O3成分間に存
在する中間相(例:TiCO3を媒介としたTiC−A
lO3−酸化物系添加物の化合物)の性質だと熱膨張係
数,機械的強度に起因している。
Conventional Structure and Problems TiC-based ceramic materials have been widely used due to their high wear resistance. In particular, TiC--Al2O3-based ceramics have recently attracted particular attention as substrates for thin films. However, the mechanical strength of the TiC-Al2O3 substrate is so high that it is used as a cutting tool, and it is difficult to machine it. The cause of this is an intermediate phase existing between Tic and Al2O3 components (e.g. TiC-A mediated by TiCO3).
The properties of lO3 (compounds of oxide-based additives) are due to the coefficient of thermal expansion and mechanical strength.

発明の目的 本発明は従来の欠点を除去し、耐摩耗性が高く、機械加
工性の優れた薄膜磁気ヘッド用基板組成物を提供するも
のである。
OBJECTS OF THE INVENTION The present invention provides a substrate composition for a thin film magnetic head which eliminates the conventional drawbacks and has high wear resistance and excellent machinability.

発明の構成 上記目的を達成するために、本発明はTiC−Al2O
3,Al2O3の焼結助剤より成る組成に、TiC−A
l2O3間に中間相を形成することが可能な還元性酸化
物を加えるものである。
Structure of the Invention In order to achieve the above object, the present invention provides TiC-Al2O
3. In the composition consisting of Al2O3 sintering aid, TiC-A
A reducing oxide capable of forming an intermediate phase between 12O3 is added.

実施例の説明 以下本発明について、実施例とともに説明する。Description of examples The present invention will be described below along with examples.

試料の調整工程としては市販の工業用原料(純度99%
以上)のTiC,Al2O2,MgO,SiO2,Ni
O,CoO,MnO2,Cr2O3,Nb2O5,Ou
Oを準備し、高純度Al2O3ポット、高純度Al2O
3ボールを用い、48時間混合粉砕後、アクリル系バイ
ンダを加え、スプレードライヤにて造粒粉末を作った。
For the sample preparation process, commercially available industrial raw materials (99% purity) were used.
(above) TiC, Al2O2, MgO, SiO2, Ni
O, CoO, MnO2, Cr2O3, Nb2O5, Ou
Prepare O, high purity Al2O3 pot, high purity Al2O
After mixing and pulverizing for 48 hours using 3 balls, an acrylic binder was added and a granulated powder was produced using a spray dryer.

造粒粉末を用い、50mm×50mm×10mmの角形
に1トン/cm2の加圧力で成形し、バインダアウト後
にAr雰囲気中1600℃〜1700℃の範囲内の温度
で2時間焼成した。
The granulated powder was molded into a rectangular shape of 50 mm x 50 mm x 10 mm with a pressing force of 1 ton/cm 2 , and after the binder was removed, it was fired in an Ar atmosphere at a temperature within the range of 1600° C. to 1700° C. for 2 hours.

焼結体をAr雰囲気中1400℃,1000気圧にて熱
間静水圧プレス(H.I.P.)し、、その後Ar雰囲
気中1000℃〜1100℃の範囲内の温度でアニール
処理を行なった。基板について第1図〜第5図のような
各諸特性を調べた。
The sintered body was hot isostatically pressed (H.I.P.) at 1400°C and 1000 atm in an Ar atmosphere, and then annealed at a temperature within the range of 1000°C to 1100°C in an Ar atmosphere. . Various characteristics of the substrate as shown in FIGS. 1 to 5 were investigated.

第1図はTiC,Al2O3含有量とビッカース硬度の
関係を示している。TiC,Al2O3の含有量が70
〜98重量%では、ビッカース硬度は1900kg/m
m2以上あり、薄膜磁気ヘッド用基板の要望値(≧18
00kg/mm2)を十分満足している。
FIG. 1 shows the relationship between TiC and Al2O3 contents and Vickers hardness. TiC, Al2O3 content is 70
At ~98% by weight, the Vickers hardness is 1900 kg/m
m2 or more, the desired value for thin film magnetic head substrates (≧18
00kg/mm2).

98重量%を越えると、焼結温度が上昇し、1700℃
以下では焼結しない。70重量%未満ではTiC,Al
2O3相が減少するため、ビッカース硬度は低下する。
When it exceeds 98% by weight, the sintering temperature increases to 1700℃.
It will not sinter below. If less than 70% by weight, TiC, Al
The Vickers hardness decreases because the 2O3 phase decreases.

またTiC含有量が50重量%を越えると焼結性が低下
しビッカース硬度は下がる。5重量%未満では、耐摩耗
性が低下する傾向がある。
Furthermore, if the TiC content exceeds 50% by weight, the sinterability decreases and the Vickers hardness decreases. If it is less than 5% by weight, wear resistance tends to decrease.

第2図は還元性酸化物と平均結晶粒子径の関係を示す。FIG. 2 shows the relationship between reducing oxides and average crystal particle size.

還元性酸化物が30重量%を越えると急激にTiCリッ
チ相,Al2O3リッチ相が粒成長する。
When the content of the reducing oxide exceeds 30% by weight, grains of TiC-rich phase and Al2O3-rich phase rapidly grow.

粒成長を起こす成分順位は、 CuO>Nb2O5>Cr2O3>MnO2,NiO,
CoOである。第2図はこれら還元性酸化物による結晶
粒子径を平均した値を用いている。
The order of components that cause grain growth is CuO>Nb2O5>Cr2O3>MnO2, NiO,
It is CoO. FIG. 2 uses the average value of the crystal particle diameters of these reducing oxides.

第3図はTiC(27重量部)−Al2O3(63重量
部)−MnO2(8重量部)−CuO(2重量部)の組
成物にSiO2,MgOを添加した時のAl2O3リッ
チ相の平均結晶粒子径の関係を示す。
Figure 3 shows the average crystal grains of the Al2O3 rich phase when SiO2 and MgO are added to a composition of TiC (27 parts by weight) - Al2O3 (63 parts by weight) - MnO2 (8 parts by weight) - CuO (2 parts by weight). Shows the relationship between diameters.

SiO2,MgOが10重量部を越えると、ともにAl
2O3の粒成長が促進される。MgOが10重量部以下
ではAl2O3の粒成長が抑制される傾向にある。Si
O2を加えると、液晶が発生し焼結温度が低下するが、
異常粒成長を誘発しやすくなるのでMgOを加え適度に
コントロールする必要がある。
When SiO2 and MgO exceed 10 parts by weight, both Al
Grain growth of 2O3 is promoted. When MgO is 10 parts by weight or less, grain growth of Al2O3 tends to be suppressed. Si
When O2 is added, liquid crystals are generated and the sintering temperature decreases, but
Since it tends to induce abnormal grain growth, it is necessary to add MgO and control it appropriately.

第4図は、本発明品と市販のTiC−Al2O3系薄膜
磁気ヘッド用基板を機械加工した時のチッピング発生数
を示す。本発明は非常に機械加工性に優れていることが
わかる。切断は、ダイヤモンド外周刃高速切断機を用い
、外周刃回転数3000r.p.mにて行なった。
FIG. 4 shows the number of chippings that occurred when machining the product of the present invention and a commercially available TiC-Al2O3 thin film magnetic head substrate. It can be seen that the present invention has excellent machinability. The cutting was performed using a diamond peripheral blade high-speed cutting machine at a peripheral blade rotation speed of 3000 r. p. It was held at m.

第3図はAl2O3,TiCの重量比がAl2O3/T
iC=7/3である組成物に、還元性酸化物であるNi
O,CoO,MnO2,Cr2O3,Nb2O5,Cu
Oを加えた時の単位面積当たりの空孔数を示す。本発明
品は従来品に比較し、全般的に空孔数が少なく、緻密で
あることがわかる。還元性酸化物が2重量%未満では急
激に空孔が増加している。
Figure 3 shows that the weight ratio of Al2O3 and TiC is Al2O3/T.
Ni, which is a reducing oxide, is added to the composition where iC = 7/3.
O, CoO, MnO2, Cr2O3, Nb2O5, Cu
It shows the number of pores per unit area when O is added. It can be seen that the products of the present invention generally have fewer pores and are denser than conventional products. When the reducing oxide content is less than 2% by weight, the number of vacancies increases rapidly.

還元性酸化物の中で空孔発生数の多い順に並記すると、 CuO>Cr2O3>MnO2>CoO>NiO>Nb
2O5このようになる。
Listed in descending order of the number of vacancies among reducing oxides: CuO>Cr2O3>MnO2>CoO>NiO>Nb
2O5 It will look like this.

ここでAl2O3系の焼結助剤としてMgOを用いたが
他のアルカリ土類酸化物を用いても同等の結果が得られ
る。
Although MgO was used here as the Al2O3-based sintering aid, similar results can be obtained using other alkaline earth oxides.

発明の効果 本発明により、機械的強度が高く、且つ機械加工性に優
れた緻密な薄膜磁気ヘッド用基板を得ることが可能とな
った。
Effects of the Invention According to the present invention, it has become possible to obtain a dense substrate for a thin film magnetic head that has high mechanical strength and excellent machinability.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はTiC,Al2O3の含有量とビッカース硬度
の関係を示す図、第2図は還元性酸化物と平均結晶粒子
径の関係を示す図、第3図はAl2O3用焼結助剤の添
加量とAl2O3リッチ相の結晶粒子径の関係を示す図
、第4図は切断速度とチッピング数の関係を示す図、第
5図は還元性酸化物の添加量と空孔数の関係を示す図で
ある。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図 TζG、/+1,03のt (皇量詞 第2図 色元株畝侘物量(■〉) 第3図 第 4 図 F’J R1/i (mm7にシ・) 第5図 4ノtOs/Tic =’A 1 ty*i元%’fI
I(と字h%>711111i (tii、 %)手続
補正書 11:i 、li 5 9 Il’、 7 ノ」 Z 
目!I55.V、庁長官1、 発明の名称 薄膜磁気ヘッド用ノ、I;、仮 3浦正をするに 副・(1との:↓−詐 415!、・ 出 1:’t′
1 人件 p’jr 大阪府門真市大字門真]0o61
1′r地イ′1 イJ・ (582)松丁電器産業((
、式会と1代・□・バ 111 下 1隻 ノエ 4代理人 〒571 住 所 大阪府門真市大字門真] o 06番地伝下電
器産業体式会社内 6、補正の内容 明細Ij、j’ >′巳2ページ第131j目の「この
原因は、1より同第17行目の「している。Jまてを次
のとおり(lこ袖市し1す。
Figure 1 shows the relationship between TiC and Al2O3 contents and Vickers hardness, Figure 2 shows the relationship between reducing oxides and average crystal particle size, and Figure 3 shows the addition of sintering aid for Al2O3. Figure 4 shows the relationship between cutting speed and chipping number; Figure 5 shows the relationship between the amount of reducing oxide added and the number of pores. It is. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure TζG, /+1,03 t (Imperial measure Figure 2 Color original stock ridge wail amount (■〉) Figure 3 Figure 4 Figure F'J R1/i (Shi in mm7) Figure 5 4 notOs/ Tic ='A 1 ty*i original%'fI
I (H%>711111i (tii, %) Procedural Amendment 11: i, li 5 9 Il', 7 ノ'' Z
eye! I55. V, Director General 1, Title of invention for thin-film magnetic heads, I;, Provisional 3 Ura Masa, Vice-(1: ↓-Fraud 415!, Output 1: 't'
1 Personnel p'jr Oaza Kadoma, Kadoma City, Osaka Prefecture] 0o61
1'rjii'1 Lee J. (582) Matsucho Electric Industry ((
, Ceremony and 1st Generation・□・Ba 111 Lower 1 Boat Noe 4 Agent 〒571 Address Oaza Kadoma, Kadoma City, Osaka Prefecture] o No. 06, Electrical Appliance Industry System Company 6, Details of Amendment Ij, j'> ``The cause of this is from 1 to 17th line of the same page 131j.

Claims (4)

【特許請求の範囲】[Claims] (1)合計量が全体の70〜98重量%を占めるTic
およびAl2O3と、全体の30〜2重量%の還元性酸
化物とより成り、かつ前記TiCの全体に占める含有率
は5〜50重量%であることを特徴とする薄膜磁気ヘッ
ド用基板。
(1) Tic whose total amount accounts for 70 to 98% by weight of the whole
and Al2O3, and 30 to 2% by weight of a reducing oxide based on the total weight, and the TiC content is 5 to 50% by weight based on the total weight of the TiC substrate.
(2)還元性酸化物が、NiO,CaO,MnO2,C
r2O3,Nb2O5,およびCuOのうち1種又は2
種以上より成ることを特徴とする特許請求の範囲第1項
記載の薄膜磁気ヘッド用基板。
(2) The reducing oxide is NiO, CaO, MnO2, C
One or two of r2O3, Nb2O5, and CuO
The thin film magnetic head substrate according to claim 1, characterized in that the thin film magnetic head substrate comprises at least one species.
(3)合計量が全体の70〜98重量%を占めるTiC
およびAl2O3と、全体の30〜2重量%の還元酸化
物とより成り、かつ前記TiCの全体に占める含有率は
5〜50重量%である組成物100重量部と10重量部
以下の焼結助剤とより成る薄膜磁気ヘッド用基板。
(3) TiC whose total amount accounts for 70 to 98% by weight of the whole
and 100 parts by weight of a composition comprising Al2O3 and a reduced oxide of 30 to 2% by weight of the total, and the content of TiC in the total is 5 to 50% by weight, and 10 parts by weight or less of a sintering aid. A thin film magnetic head substrate made of a thin film magnetic head.
(4)焼結助剤は、アルカリ土類酸化物及びSiO2の
1種又は2種以上より成ることを特徴とする特許請求の
範囲第3項記載の薄膜磁気ヘッド用基板。
(4) The substrate for a thin film magnetic head according to claim 3, wherein the sintering aid comprises one or more of alkaline earth oxides and SiO2.
JP59039818A 1984-03-01 1984-03-01 Substrate for thin film magnetic head Pending JPS60183709A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59039818A JPS60183709A (en) 1984-03-01 1984-03-01 Substrate for thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59039818A JPS60183709A (en) 1984-03-01 1984-03-01 Substrate for thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS60183709A true JPS60183709A (en) 1985-09-19

Family

ID=12563545

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59039818A Pending JPS60183709A (en) 1984-03-01 1984-03-01 Substrate for thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS60183709A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5060098A (en) * 1988-04-18 1991-10-22 Hitachi, Ltd. Magnetic recorder provided with a magnetic head slider having a non-magnetic oxide of spinel structure
CN108530066A (en) * 2018-04-10 2018-09-14 九江有色金属冶炼有限公司 A kind of manufacturing method of high purity niobium oxide ontology crucible

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5782172A (en) * 1980-11-12 1982-05-22 Matsushita Electric Ind Co Ltd Substrate ceramic for thin film magnetic head
JPS57135772A (en) * 1981-01-09 1982-08-21 Nippon Tungsten Material for alumina magnetic head

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5782172A (en) * 1980-11-12 1982-05-22 Matsushita Electric Ind Co Ltd Substrate ceramic for thin film magnetic head
JPS57135772A (en) * 1981-01-09 1982-08-21 Nippon Tungsten Material for alumina magnetic head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5060098A (en) * 1988-04-18 1991-10-22 Hitachi, Ltd. Magnetic recorder provided with a magnetic head slider having a non-magnetic oxide of spinel structure
CN108530066A (en) * 2018-04-10 2018-09-14 九江有色金属冶炼有限公司 A kind of manufacturing method of high purity niobium oxide ontology crucible

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