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JPS60115011A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS60115011A
JPS60115011A JP22499183A JP22499183A JPS60115011A JP S60115011 A JPS60115011 A JP S60115011A JP 22499183 A JP22499183 A JP 22499183A JP 22499183 A JP22499183 A JP 22499183A JP S60115011 A JPS60115011 A JP S60115011A
Authority
JP
Japan
Prior art keywords
thin film
substrate
magnetic head
film
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22499183A
Other languages
Japanese (ja)
Inventor
Shigeru Shinkai
新海 茂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP22499183A priority Critical patent/JPS60115011A/en
Publication of JPS60115011A publication Critical patent/JPS60115011A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To eliminate recesses and projections of an upper core and to improve the characteristics of a thin film magnetic head, by burying a conduction coil pattern into a substrate with no protrusion over the substrate and setting an insulated layer completely flat. CONSTITUTION:Recess grooves 11 are formed at the expected areas for formation of conduction patterns on a ferromagnetic substrate 10 serving as a lower core. Then the area over a rear part 12 of the lower core is removed to form a nonmagnetic thin film 13, and conduction coil patterns 14 are formed on the film 13 in the groove 11. A flat insulated layer 15 is formed on the conduction coil 14 and the film 13 at the side of a tip part 10' of the substrate 10. Then a ferromagnetic thin film 16 which interlinks over the pattern 14 is formed up to the part on the film 13 of the part 10' from the part 12 via the area over the layer 15. Thus a thin film magnetic head contains a completely flat upper core part 18.

Description

【発明の詳細な説明】 技術分野 この発明は、薄膜磁気ヘッドの導電コイルと上部コアの
形成技術に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a technique for forming a conductive coil and an upper core of a thin film magnetic head.

背景技術 最近D A、T、(デジタル−オーダイオ・テープレコ
ーダ)全初め磁気記録装置は、高記録密度化が要求され
ているが、線記録密度は限界に近づきつつあり、今後こ
れ全飛躍的に改善することは期待できないため、トラッ
ク密度全土げることによって高記録密度化全達成するこ
とが考えられている。そこで、従来のバルク ヘッドに
代り、高トラツク密度化の容易な薄膜ヘッドが賞月され
始めた。しかしながら、薄膜ヘッドにおけるフィル形成
技術は、未だ確立しておらず、次に述べる上部コアの磁
束の伝達効率低下全惹起する欠点があった。すなわち、
薄膜ヘッドは、一般に第1図に示すように、下部コアと
なる基板1上に、磁気ギャップ全形成5するための非磁
性体薄膜2全形成しておき、その薄!2上に数回巻回す
る導電コイルパターン3と、薄膜2以外で基板1と直接
接合し、かつ絶縁層4全介して導電フィルパターン3上
へ乗り上げて鎖交する上部コアとなる強磁性体薄膜5と
全設けている。
BACKGROUND TECHNOLOGY Recently, high recording density has been required for magnetic recording devices such as DA, T (digital audio tape recorder), but linear recording density is approaching its limit, and this will dramatically increase in the future. Since no improvement can be expected, the idea is to achieve a higher recording density by increasing the overall track density. Therefore, thin-film heads, which can easily achieve high track density, have begun to be used in place of conventional bulk heads. However, the fill forming technology for thin film heads has not yet been established, and has the drawback of causing a decrease in the magnetic flux transmission efficiency of the upper core, which will be described below. That is,
As shown in FIG. 1, a thin film head generally has a non-magnetic thin film 2 formed on a substrate 1 serving as a lower core to form the entire magnetic gap 5, and then the thin film 2 is completely formed on the substrate 1 which becomes the lower core. A conductive coil pattern 3 is wound several times on the conductive fill pattern 2, and a ferromagnetic material serves as an upper core that is directly connected to the substrate 1 other than the thin film 2 and rides on and interlinks with the conductive fill pattern 3 through the entire insulating layer 4. A thin film 5 is provided.

ところが、強磁性体i@5に一形成する場合にけ、第1
図に示されている通り、導電フィル3,3.・・・・・
が有る所と無い所では、そのパターン膜厚たけ段差音生
じるので、絶縁層40表面もこれに倣って凹凸となって
いる。したがって、強磁性体基板5の導電コイル上へ乗
り上げたフロント部6もまた凹凸?形成してしまい、フ
ロント部6は、四面傾斜部分7,7.・・・・・・で磁
気抵抗が、平坦な部分よりも太きくなり、磁束の伝達効
率低下7招いていた。
However, when forming one on the ferromagnetic material i@5, the first
As shown in the figure, conductive films 3, 3.・・・・・・
Since the difference in the thickness of the pattern causes a step sound in places where there is and where there is not, the surface of the insulating layer 40 is also uneven in accordance with this. Therefore, is the front part 6 that rides on the conductive coil of the ferromagnetic substrate 5 also uneven? The front portion 6 has four sloped portions 7, 7 . . . ., the magnetic resistance becomes thicker than that of the flat portion, leading to a decrease in magnetic flux transmission efficiency7.

この問題は、リア部8全通る磁束が設定値通りであった
としても、肝心なフロントギャップ9まで正W(IK伝
搬し得ないことになり、薄膜ヘッドの記録・再生特性全
悪する原因となっていた。
This problem is caused by the fact that even if the magnetic flux passing through the entire rear section 8 is as set, positive W (IK) propagation will not be possible up to the important front gap 9, which will cause the recording/reproducing characteristics of the thin-film head to deteriorate completely. It had become.

発明の開示 発明の目的 この発明は、上記の上部コアにおける凹凸?解消して薄
膜ヘッドの特性改善全図ること全目的として提案された
ものである。
DISCLOSURE OF THE INVENTION Purpose of the Invention This invention relates to the above-mentioned irregularities in the upper core. This was proposed with the sole purpose of solving this problem and improving the characteristics of the thin film head.

発明の構成 □ この発明は、目的全速1.成するために、次の構成手段
全採用したものである。fなわち、この発明は、下部コ
アとなる平坦な強磁性体基板上に、非磁性体薄膜、導電
フィルパターン、絶縁層を積層形成し、リア部で強磁性
体基板と直接接合し、フロント部では導電フィルパター
ン上へ乗り上げて鎖交し、先端部で下部コアである強磁
性体基板とフロントギャップ、つまり磁気ギャップを形
成1fる上部コアの形成に関して、次の構造にするもの
である。まず、この発明では、導電コイルパターンは、
基板より突出させないように埋設させ、よって絶縁層全
完全な平坦状に設定させて、平坦なフロント部全有する
上部コアとするものである。
Structure of the invention □ This invention has the following objectives: 1. In order to achieve this, all of the following configuration means were adopted. In other words, in this invention, a non-magnetic thin film, a conductive fill pattern, and an insulating layer are laminated on a flat ferromagnetic substrate serving as the lower core, and are directly bonded to the ferromagnetic substrate at the rear, and the front Regarding the formation of the upper core which rides on and interlinks with the conductive fill pattern in the part and forms a front gap, that is, a magnetic gap 1f with the ferromagnetic substrate which is the lower core at the tip part, the following structure is adopted. First, in this invention, the conductive coil pattern is
The insulating layer is buried so as not to protrude from the substrate, and the entire insulating layer is set completely flat, thereby forming an upper core having a flat front portion.

発明の作用効果 この発明全実施すれば、上部コアにおける凹凸が解消さ
れ、薄膜ヘッドの記録 再生特性が向上する。さらに、
この発明によれば、導電コイルは。
Effects of the Invention If this invention is fully implemented, the unevenness in the upper core will be eliminated and the recording and reproducing characteristics of the thin film head will be improved. moreover,
According to this invention, the conductive coil is.

基板への埋設によって寸法形状が設定されるので、基板
の加工精度に合致して設計できる。またこの発明では、
絶縁層が容易に完全な平坦状に設定できるから、導電コ
イルと上部コアの確実な絶縁処理も行える優れた長所が
ある。尚、以上のこの発明の作用効果は、後述する実施
からより明確となるであろう。
Since the dimensions and shape are set by embedding it in the substrate, it can be designed to match the processing accuracy of the substrate. Also, in this invention,
Since the insulating layer can be easily set to a completely flat shape, it has an excellent advantage that the conductive coil and the upper core can be reliably insulated. The effects of the present invention described above will become clearer from the implementation described below.

発明全実施するための最良の形態 第2図〜第6図は、この発明の一実施例に関する薄膜磁
気ヘッドの断面図である。この実施例全紹介するに際し
ては、説明の都合上第2図〜第5図に亘り製造工程?示
し、完成した磁気ヘッドを第6図に示す。まず第2図に
示すように、Mn−2n単結晶フエライト基板10全用
意しておき、導電コイルパターン形成予定sにスパイラ
ル状の凹溝11全形成する。この凹溝11形成1には、
ホット隣酸液?用いるウェットエツチング処理又は、予
定部以外にレジスト塗布によるマスキング全行ってイオ
ンミリング法によるドライエツチング処理音節せばよい
。つぎに、第3図の通りに下部コアのリア部12上?除
き、凹溝11の内面全含む全面に、磁気ギャップスペー
サ兼用で、絶縁性かつ非磁性の5i02膜13i反応性
スパッタリング手段により形成する。それから第4図に
示すように。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIGS. 2 to 6 are cross-sectional views of a thin film magnetic head according to an embodiment of the present invention. When introducing this embodiment in its entirety, for convenience of explanation, the manufacturing process will be shown in Figures 2 to 5. The completed magnetic head is shown in FIG. First, as shown in FIG. 2, the entire Mn-2n single crystal ferrite substrate 10 is prepared, and the entire spiral groove 11 is formed in the area where the conductive coil pattern is to be formed. In this groove 11 formation 1,
Hot phosphoric acid solution? Either wet etching may be used, or all areas other than the intended areas may be masked by resist coating and then dry etching may be performed using ion milling. Next, as shown in Figure 3, on the rear part 12 of the lower core? An insulating and non-magnetic 5i02 film 13i, which also serves as a magnetic gap spacer, is formed on the entire surface including the entire inner surface of the groove 11, except for the above, by reactive sputtering means. Then as shown in Figure 4.

AJ又はOuiスパッタリング手段によって、凹溝11
内面の8102膜13へ付着させて、導電フィルパター
ン14を形成イる。このIIJ11Eコイルパターン1
4の表面14/は、平坦な5i02WA13と同一平面
に揃うように設定する必要がある。そして第5図の通り
に、基板10の先端部10’側のi!フィル14及び5
102膜13の大部分、つまり先端部10’上のSiO
2膜13全13て、上部コアのフロント部形成予定面の
ほぼ全面に、平坦な絶縁層15全設ける。この場合には
、絶縁層15の濁質としては、5in2やA71203
等の酸化物なら反応性スパッタリング手段により、レジ
ストやポリイミド等のゴム・樹脂類ならゾル状のもの全
塗布して設ける。その後、下部コアのリア部12から絶
縁層15上全経て先端部10’のS’1021113上
まで、?e80部、Ni2O部合金或いはセンダスト合
金等の強磁性体全スパッタリング手段又はメッキなどに
よりM N J19成して、フロント部16及びリア部
ニアからなる上部コア18全形成でると、所望の薄膜磁
気ヘッドが得られる。
Groove 11 is formed by AJ or Oui sputtering means.
The conductive fill pattern 14 is formed by adhering to the 8102 film 13 on the inner surface. This IIJ11E coil pattern 1
The surface 14/ of 4 must be set to be flush with the flat 5i02WA13. As shown in FIG. 5, i! on the tip 10' side of the substrate 10! Phil 14 and 5
102 SiO on most of the film 13, that is, on the tip 10'
A flat insulating layer 15 is provided on almost the entire surface of the upper core where the front portion is to be formed. In this case, the turbidity of the insulating layer 15 is 5in2 or A71203.
In the case of oxides such as oxides, a reactive sputtering method is used, and in the case of resists and rubbers/resins such as polyimide, a sol-like material is applied. After that, from the rear part 12 of the lower core through the entire top of the insulating layer 15 to the top of S'1021113 of the tip part 10', ? When the upper core 18 consisting of the front part 16 and rear part Nia is completely formed by sputtering or plating the entire ferromagnetic material such as e80 part, Ni2O part alloy or Sendust alloy, the desired thin film magnetic head is formed. is obtained.

以上説明した薄膜磁気ヘッドは、完全に平坦な絶M層1
5上に上部コア18のフロン) 部16 カ形成される
ので、従来のような凹凸が解消され、しかもフロント部
16とリア部17との段差も他力小さくできるので、上
部ファ18の磁束伝辻効率が大幅に改善される。さらに
またこの薄膜磁気ヘッドけ、その導電コイル14が凹r
tlj l l内に埋設されることにより、寸法形状が
決まるので、現在技術革新が顕著な、フォトリソグラフ
ィ技術全利用して、凹溝11のエツチング加工精度全高
めることにより、精密な導電コイル14が作れる。
The thin film magnetic head described above has a completely flat absolute M layer 1.
Since the front part 16 of the upper core 18 is formed on top of the front part 16 of the upper core 18, the unevenness of the conventional part is eliminated, and the difference in level between the front part 16 and the rear part 17 can also be reduced, which improves the magnetic flux transmission of the upper part 18. Tsuji efficiency is greatly improved. Furthermore, in this thin film magnetic head, the conductive coil 14 has a concave r.
Since the dimensions and shape are determined by being buried in the tlj l l, a precise conductive coil 14 can be created by fully utilizing photolithography technology, which is currently undergoing remarkable technological innovation, and improving the etching accuracy of the concave groove 11. I can make it.

尚、絶縁層15が平坦状に形成できるから、導電コイル
14と上部コア18のフロント部16との絶縁距離は、
絶縁N15の膜厚となり確実な絶縁処理が行えることは
言うまでもない。
Note that since the insulating layer 15 can be formed in a flat shape, the insulating distance between the conductive coil 14 and the front part 16 of the upper core 18 is as follows.
Needless to say, the thickness of the insulation N15 allows reliable insulation treatment.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来の一般的な薄膜磁気4ヘッド全示す断面
図、第2図〜第5図は、この発明の一実施例の薄膜磁気
ヘッドの各製造工程における断面図、第6図は、この発
明の一実施例に示f薄膜磁気ヘッドの断面図である。 10・・・強磁性体基板(下部コア)、11・・・凹溝
、 13・・・非磁性体薄膜(5i02膜)、14・・・導
電コイルパターン、 15・・・絶縁層、 16・・・フロント部、 17・・・リア部、 18・・・上部コア。
FIG. 1 is a cross-sectional view showing the entire conventional general thin-film magnetic 4 head, FIGS. 2 to 5 are cross-sectional views showing each manufacturing process of a thin-film magnetic head according to an embodiment of the present invention, and FIG. FIG. 1 is a sectional view of a thin film magnetic head shown in an embodiment of the present invention. 10... Ferromagnetic substrate (lower core), 11... Groove, 13... Non-magnetic thin film (5i02 film), 14... Conductive coil pattern, 15... Insulating layer, 16. ...Front part, 17...Rear part, 18...Upper core.

Claims (1)

【特許請求の範囲】[Claims] 下部コアとなる強磁性体基板上に、磁気ギャップ形成用
の非磁性体薄膜以外成し、上記非磁性体薄膜上に導電コ
イルパターン全役け、ざらに非磁性体薄膜以外で基板と
直接接合し、かつ絶縁層上−介シて導電コイルパターン
上へ乗り上げて鎖交する上部コアとなる強磁性体薄膜全
形成するものにおいて、前記導電コイルパターン全基鈑
に埋設づ−ることにより、前記絶縁層を完全な平坦状に
設定することに特徴とする薄膜磁気ヘッド。
On the ferromagnetic substrate that becomes the lower core, there is no non-magnetic thin film for forming a magnetic gap, and all the conductive coil patterns are formed on the non-magnetic thin film, and it is directly bonded to the substrate using other than the non-magnetic thin film. In a device in which the entire ferromagnetic thin film is formed as an upper core that rides on and interlinks with the conductive coil pattern through the insulating layer, the conductive coil pattern is entirely buried in the base plate. A thin-film magnetic head characterized by a completely flat insulating layer.
JP22499183A 1983-11-28 1983-11-28 Thin film magnetic head Pending JPS60115011A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22499183A JPS60115011A (en) 1983-11-28 1983-11-28 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22499183A JPS60115011A (en) 1983-11-28 1983-11-28 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS60115011A true JPS60115011A (en) 1985-06-21

Family

ID=16822375

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22499183A Pending JPS60115011A (en) 1983-11-28 1983-11-28 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS60115011A (en)

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