JPS60226008A - Thin film magnetic head and its production - Google Patents
Thin film magnetic head and its productionInfo
- Publication number
- JPS60226008A JPS60226008A JP8114484A JP8114484A JPS60226008A JP S60226008 A JPS60226008 A JP S60226008A JP 8114484 A JP8114484 A JP 8114484A JP 8114484 A JP8114484 A JP 8114484A JP S60226008 A JPS60226008 A JP S60226008A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- layer
- magnetic layer
- thin film
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 239000010409 thin film Substances 0.000 title claims description 23
- 239000000696 magnetic material Substances 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 12
- 239000004020 conductor Substances 0.000 claims abstract description 10
- 238000010030 laminating Methods 0.000 claims description 10
- 238000000992 sputter etching Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 16
- 239000011810 insulating material Substances 0.000 abstract description 4
- 229910000702 sendust Inorganic materials 0.000 abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052593 corundum Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 85
- 239000010408 film Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 238000005530 etching Methods 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】 〔発明の利用分野〕 本発明は薄膜磁気ヘッド及びその製造方法に関する。[Detailed description of the invention] [Field of application of the invention] The present invention relates to a thin film magnetic head and a method for manufacturing the same.
従来の薄膜ヘッドは、基板面上に２〜２０μｍ程度の軟
磁性膜をスＡ’ツタ又は蒸着の手法を用いて形成シ、ソ
ノ上ニギャッゾ材としての非磁＠ 肱ｙ介在させ、さら
にその上に磁性膜をたい積してヘッドの磁気ギャップを
形成したものが殆んどであり＊０
ヘッドのトラック幅はエツチング又は機械加工等の手法
によシ磁性膜を寸断することで得るものである。この場
合ヘッドのギャップ近傍の磁気コアの形状はギャップに
平行してその左右にコアのエツジ部があるために、この
エツジ部分でもテープ上の信号を拾ういわゆるコンタ効
果が発生し、忠実な信号再生を行う場合支障となるもの
であった。Conventional thin-film heads are made by forming a soft magnetic film of about 2 to 20 μm on the substrate surface using a spool or vapor deposition method, interposing a non-magnetic film as a magnetic material on top of the film, and then depositing a non-magnetic film on top of the film. In most cases, a magnetic film is deposited on the head to form the magnetic gap of the head.*0 The track width of the head is obtained by cutting the magnetic film into pieces using techniques such as etching or machining. In this case, the shape of the magnetic core near the gap of the head is parallel to the gap, and there are edges of the core on the left and right sides of the gap, so a so-called contour effect occurs in which the signal on the tape is picked up even at these edges, making it difficult to reproduce faithful signals. It was a hindrance when doing so.
本来コンタ効果は、磁気ヘッドのギャップ以外のコアの
エツジ部等と磁気記録媒体に記録された信号とが磁気的
にカップルしヘッド巻線を通過することによってギャッ
プの読信号と時間的にずれた信号をｉ′むもので、この
場合もヘッドのいわゆるアジマスロスの効果があること
は良く知られている。この効果を利用しギャップと平行
でないコアエラジン形成せしめコアエツジ部での信号読
取能力を著しく低減せしめんとするものである。Originally, the contour effect is a phenomenon in which signals recorded on the magnetic recording medium are magnetically coupled to the edges of the core other than the gap of the magnetic head and passed through the head winding, resulting in a temporal shift from the read signal of the gap. It is well known that there is a so-called azimuth loss effect of the head in this case as well. By utilizing this effect, the core eragin is formed not parallel to the gap, thereby significantly reducing the signal reading ability at the core edge portion.
本出願に係る第１発明の目的は、コンタ効果の発生しな
い薄膜磁気ヘッドを提供することにある。An object of the first invention according to the present application is to provide a thin film magnetic head in which no contour effect occurs.
本出願に係る第２発明の目的は、コンタ効果の発生しな
い薄膜磁気ヘッドの製造方法を提供することにある。A second object of the present invention is to provide a method for manufacturing a thin film magnetic head in which no contour effect occurs.
本出願に係る第１発明は、
非磁性基板表面又は非磁性基板上に形成された非磁性層
表面に下部磁性層を埋設し、該下部磁性層上に、絶縁層
、コイル導体層、上部磁性層を順次積層してなる薄膜磁
気ヘッドにおいて、該下部磁性層又は上部磁性層のうち
の少なくとも一方の膜厚が、トラック幅方向の一部又は
全部において変化していることを特徴とする薄膜磁気ヘ
ッドでおる。A first invention according to the present application includes a lower magnetic layer embedded in the surface of a non-magnetic substrate or a surface of a non-magnetic layer formed on the non-magnetic substrate, and an insulating layer, a coil conductor layer, and an upper magnetic layer on the lower magnetic layer. A thin film magnetic head formed by sequentially laminating layers, characterized in that the thickness of at least one of the lower magnetic layer and the upper magnetic layer changes in part or all of the track width direction. Head.
かかる構成のため、第１発明に係る薄膜磁気ヘッドはコ
ンタ効果が発生しない。Because of this configuration, the thin film magnetic head according to the first invention does not produce a contour effect.
一方、本出願に係る第２発明は、
非磁性基板表面又は非磁性基板上に形成した非磁性層表
面に、下部磁性層を埋設するための溝を形成する工程、
該表面に該溝の深さと略同じ厚さに磁性材料を積層する
工程、
該溝以外に積層した磁性材料を除去し下部磁性層を形成
する工程
該下部磁性層上に、絶縁層、コイル導体層、を積層する
工程、
磁性材料を、上部磁性層の最大厚さに積層する工程、
積層した磁性材料上に、所望の上部磁性層の形状にホト
レジヌトノやターンを形成し、熱処理する工程、
イオンエツチング法によシ所望形状の上部磁性層を形成
する工程からなる薄膜磁気ヘッドの製造方法であり、か
かる構成にょシ、コンタ効果の発生しない薄膜磁気ヘラ
ドラ製造するむとができる。On the other hand, a second invention according to the present application includes: forming a groove for embedding a lower magnetic layer on the surface of a non-magnetic substrate or a surface of a non-magnetic layer formed on the non-magnetic substrate; a step of laminating a magnetic material to approximately the same thickness as the groove; a step of removing the magnetic material laminated outside the groove to form a lower magnetic layer; a step of laminating an insulating layer and a coil conductor layer on the lower magnetic layer; A step of laminating the magnetic material to the maximum thickness of the upper magnetic layer. A step of forming photoresist holes or turns in the desired shape of the upper magnetic layer on the laminated magnetic material and heat-treating the layer. A step of forming the desired shape using an ion etching method. This method of manufacturing a thin film magnetic head includes the step of forming an upper magnetic layer, and with this structure, it is possible to manufacture a thin film magnetic head without causing the contour effect.
以下に本出願に係る第１発明及び第２発明の実施例を図
面に基づいて説明するー
Ｍ１発明の実施例においては、
非磁性基板１表面又は非磁性基板１上に形成された非磁
性層表面に下部磁性層２を埋設し、該下部磁性層２上に
、絶縁層３、コイル導体層４、上部磁性層６ｙ！ｌ−順
次積層してなる薄膜磁気ヘッドにおいて、該下部磁性層
２又は上部磁性層６のうちの少なくとも一方の膜厚が、
トラック幅方向の一部又は全部において変化している。Examples of the first invention and the second invention according to the present application will be described below based on the drawings - In the example of the M1 invention, a nonmagnetic layer formed on the surface of the nonmagnetic substrate 1 or on the nonmagnetic substrate 1 A lower magnetic layer 2 is buried in the surface, and on the lower magnetic layer 2, an insulating layer 3, a coil conductor layer 4, and an upper magnetic layer 6y! In a thin film magnetic head formed by sequentially laminating layers, the thickness of at least one of the lower magnetic layer 2 and the upper magnetic layer 6 is
It changes in part or all in the track width direction.
このため、この薄膜磁気ヘッドにはコンタ効果が発生し
ない。Therefore, no contour effect occurs in this thin film magnetic head.
また、第２発明の実施例においては、
非磁性基板１表面又は非磁性基板１上に形成した非磁性
層表面に、下部磁性層２を埋設するための溝１１を形成
する工程、
該表面に該溝１１の深さと略同じ厚さに磁性材料を積層
する工程、
該溝１１以外に積層した磁性材料を除去し下部磁性層２
を形成する工程、
該下部磁性層２上に、絶縁層３、コイル導体層４、を積
層する工程、
磁性材料を、ト傾庸桁騙６箇番十ｍ者ｒｙ証駐工る工程
、
積層した磁性材料上に、所望の上部磁性層６の形状にホ
トレジス） ｉ４ターンを形成し、熱処理する工程、
イオンエツチング法によシ所望形状の上部磁性層４を形
成する工程からなる。Further, in the embodiment of the second invention, the step of forming a groove 11 for embedding the lower magnetic layer 2 on the surface of the non-magnetic substrate 1 or the surface of the non-magnetic layer formed on the non-magnetic substrate 1; A step of laminating a magnetic material to a thickness that is approximately the same as the depth of the groove 11, and removing the magnetic material laminated other than the groove 11 to form the lower magnetic layer 2.
a step of laminating an insulating layer 3 and a coil conductor layer 4 on the lower magnetic layer 2; a step of placing a magnetic material on the lower magnetic layer 2; The process consists of the following steps: forming a photoresist (i4) turn in the desired shape of the upper magnetic layer 6 on the magnetic material and heat-treating the same, and forming the upper magnetic layer 4 in the desired shape by ion etching.
これにより、コンタ効果の発生しない薄膜磁気ヘッドを
製造することができる。Thereby, it is possible to manufacture a thin film magnetic head that does not cause contour effects.
以下に、よシ具体的な実施例を図面に基づいて説明する
。Below, more specific embodiments will be described based on the drawings.
第１図は第１発明の第１実施例である薄膜磁気ヘッドの
摺動面よシ見た図、第２図は第１図の磁路方向の断面図
である。１は非磁性基板、２は下部磁性層、３は〜ラド
ギャップを規定する絶縁層、４は１ターンのコイル導体
層、５は絶縁層、６は上部磁性層、７は接着層、８は保
護板である。FIG. 1 is a view from the sliding surface of a thin film magnetic head according to a first embodiment of the first invention, and FIG. 2 is a sectional view in the magnetic path direction of FIG. 1 is a non-magnetic substrate, 2 is a lower magnetic layer, 3 is an insulating layer that defines ~rad gap, 4 is a 1-turn coil conductor layer, 5 is an insulating layer, 6 is an upper magnetic layer, 7 is an adhesive layer, 8 is an adhesive layer It is a protective plate.
本例では、下部磁性層２と上部磁性層６の両方ともその
膜厚はトラック幅方向において変化している。また下部
磁性層２及び上部磁性層６はともに多層構造である。下
部磁性層２の膜厚は円弧上に変化している。一方正部磁
性層６は略台形をしておシ、ただその上辺は半円弧であ
る。In this example, the film thicknesses of both the lower magnetic layer 2 and the upper magnetic layer 6 vary in the track width direction. Further, both the lower magnetic layer 2 and the upper magnetic layer 6 have a multilayer structure. The thickness of the lower magnetic layer 2 changes along an arc. On the other hand, the positive magnetic layer 6 has a substantially trapezoidal shape, but its upper side is a semicircular arc.
第３図は、第１発明の第２．第３．第４実−施例である
薄膜磁気ヘッドの摺動面正面図で、符号は第１図及び第
２図に同じである。、 〜２−第１実施例とは、上部磁
性層６の上辺のみが異なる。第２実施例（第３図（ａ）
）では、上部磁性層６の上辺は、図面上左側で右上がシ
、中央部で水平、右側で右下がシとなっている。FIG. 3 shows the second aspect of the first invention. Third. 2 is a front view of a sliding surface of a thin film magnetic head according to a fourth embodiment, and the reference numerals are the same as in FIGS. 1 and 2. FIG. , ~2- Only the upper side of the upper magnetic layer 6 differs from the first embodiment. Second embodiment (Fig. 3(a)
), the upper side of the upper magnetic layer 6 is horizontal on the left side and upper right in the drawing, horizontal on the center, and horizontal on the right side and lower right.
第３実施例（第３図（ｂ））では、上部磁性層６の上辺
は、図面上左側及び右側で水平、中央部で半円弧状であ
る。In the third embodiment (FIG. 3(b)), the upper side of the upper magnetic layer 6 is horizontal on the left and right sides of the drawing, and semicircular in the center.
第４実施例（第３図（Ｃ））では、上部磁性層６の上辺
は、図面上左側から中央まで右上が９、中央から右側ま
で右下がシである。In the fourth embodiment (FIG. 3(C)), the upper side of the upper magnetic layer 6 is 9 at the upper right from the left side to the center in the drawing, and 9 at the lower right from the center to the right side.
いずれの実施例も上部磁性層６は、非磁性層を間に挿入
した多層構造であるが、非磁性層は上部磁性層６の上辺
に沿った形状をしている。In each of the examples, the upper magnetic layer 6 has a multilayer structure with a nonmagnetic layer inserted therebetween, and the nonmagnetic layer has a shape along the upper side of the upper magnetic layer 6.
次に第２発明の具体的な実施例を第４図及び第５図に基
づいて説明する。Next, a specific embodiment of the second invention will be described based on FIGS. 4 and 5.
第４図及び第５図はそれぞれ下部磁性層２の形成方法及
び上部磁性層６の形成方法を説明するための、摺動面側
から見たそれぞれ斜視図及び正面図である。4 and 5 are a perspective view and a front view, respectively, viewed from the sliding surface side, for explaining the method of forming the lower magnetic layer 2 and the method of forming the upper magnetic layer 6, respectively.
本実施例の工程を順に述べる。The steps of this example will be described in order.
（１） 非磁性基板１に機械加工やホトエツチング技術
によシ、下部磁性層を埋込むための溝１１を掘る（第４
図（ａ））。(1) A groove 11 for embedding the lower magnetic layer is dug in the non-magnetic substrate 1 by machining or photoetching (fourth groove).
Figure (a)).
（２） センダストやアモルファスなどの磁性材料と５
ｉ０２やＡ７２０３などの絶縁材料を交互にス・母ツタ
リングで積層し、溝１１の深さと略同等厚さの多層磁性
層２を形成する（同図（ｂ））。(2) Magnetic materials such as sendust and amorphous
Insulating materials such as i02 and A7203 are alternately laminated by stacking and stacking to form a multilayer magnetic layer 2 having a thickness substantially equal to the depth of the groove 11 (FIG. 2(b)).
（３） ラッピングによシ、溝１１以外の磁性層の除去
および平坦化を行い、溝１１に埋込んだ下部磁性層２を
作る（同図（Ｃ））。(3) By lapping, the magnetic layer other than the grooves 11 is removed and planarized to form the lower magnetic layer 2 embedded in the grooves 11 (FIG. 3(C)).
（４） この上に、従来と同様に、５ｉ０２ 、 Ａｊ
！０３などをスパッタリングで、ギャップを規定する所
の厚さに形成後、コイル導体層４、コイル導体層４と上
部磁性層６との間の絶縁層５を所定形状に積層する（第
２図参照）。(4) On top of this, as before, 5i02, Aj
! 03 etc. by sputtering to a thickness that defines the gap, a coil conductor layer 4 and an insulating layer 5 between the coil conductor layer 4 and the upper magnetic layer 6 are laminated in a predetermined shape (see Fig. 2). ).
（５） 次にセンダストやアモルファスなどの磁性材料
を上部磁性層の１層６８程度の厚さにスパッタリングで
形成後上部磁性層の形状にホトレジストノやターンを作
る。(5) Next, a magnetic material such as sendust or amorphous is formed by sputtering to a thickness of about 68 mm per layer of the upper magnetic layer, and then photoresist holes and turns are formed in the shape of the upper magnetic layer.
この後、１４０〜２００℃程度に加熱し、ホトレジスト
ハターンの稜線を滑らかな曲線にする（第５図（ａ））
。After this, it is heated to about 140 to 200°C to make the ridgeline of the photoresist pattern into a smooth curve (Fig. 5 (a)).
.
（６） このように形成したホトレジストノ母ターンを
マスクに、イオンエツチング法で、磁性層６ａをエツチ
ングし、ホトレジストノ母ターンの滑らかな稜線を磁性
層６ａに転写する（同図（ｂ））。(6) Using the photoresist mother turn thus formed as a mask, the magnetic layer 6a is etched by ion etching to transfer the smooth ridgeline of the photoresist mother turn to the magnetic layer 6a (FIG. 6(b)). .
この時、ホトレジストと磁性層のエッチ速度の大小およ
び、エツチング停止時期によって、種々の形状が得られ
、その例として第３図のようなものができる。At this time, various shapes can be obtained depending on the etching rate of the photoresist and the magnetic layer and the time when etching is stopped, an example of which is shown in FIG. 3.
（７） この上に再び５ｉＯｚやＡＡ！２０ｓなどの絶
縁材料と＼センダスト、アモルファスなどの磁性材料６
ｂ 、 ６ｃとを交互に積層し、所定厚さの多層磁性層
を形成する（同図（Ｃ））。(7) On top of this, 5iOz and AA again! Insulating materials such as 20S and magnetic materials such as sendust and amorphous6
b and 6c are alternately stacked to form a multilayer magnetic layer with a predetermined thickness (FIG. 6(C)).
（８） 上部磁性層形状のホトレジストパターン１０を
形成し、これをマスクとして、イオンエツチング法で、
エツチングして、上部磁性層６をつくる（同図（ｄｌ
、 （ｅｌ ）。(8) Form a photoresist pattern 10 in the shape of the upper magnetic layer, and use this as a mask to perform etching by ion etching.
The upper magnetic layer 6 is formed by etching (see figure (dl)
, (el).
（９） この後、チップカット、保護板接着、研摩工程
をへて、第１図から第３図に示した薄膜磁気ヘッドがで
きる。(9) Thereafter, the thin film magnetic head shown in FIGS. 1 to 3 is completed through chip cutting, protection plate adhesion, and polishing steps.
以上、本実施例によれば、摺動面の上部、下部磁性層の
エツジおよび多層磁性層の眉間絶縁膜をギャップ線と非
平行ならしむることかでき、アジマスロスの効果によっ
てコンタ−を低減できる。As described above, according to this embodiment, the upper part of the sliding surface, the edge of the lower magnetic layer, and the glabellar insulating film of the multilayer magnetic layer can be made non-parallel to the gap line, and the contour can be reduced by the effect of azimuth loss. .
なお、当然のことではあるが、本発明の範囲は以上の実
施例に限定されるものではない。Note that, as a matter of course, the scope of the present invention is not limited to the above embodiments.
本出願に係る第１発明によれば、薄膜磁気ヘッドにコン
タ効果が発生しないようにできる。According to the first aspect of the present application, it is possible to prevent the contour effect from occurring in the thin film magnetic head.
本出願に係る第２発明によれば、コンタ効果の発生しな
い薄膜磁気ヘッドを製造することができる。According to the second aspect of the present application, it is possible to manufacture a thin film magnetic head in which no contour effect occurs.
第１図及び第２図は第１発明の実施例である薄膜磁気ヘ
ッドの摺動面正面図および断面図である。
第３図は第１発明の他の実施例である薄膜磁気ヘッドの
摺動面正面図、第４図及び第５図は第２発明の一実施例
に係る薄膜磁気ヘッドの製造方法を説明するための、そ
れぞれ、斜視図及び正面図である。
ｌ・・・非磁性基板、２・・・下部磁性層、３・・・絶
縁層、６・・・上部磁性層、６ａ、６ｂ、６ｃ・・・多
層上部磁性層の第１層、第２層、第３層。
代理人弁理士 秋 本 正 実
第１図
第２図
第３図
ど
（ｂ）
ど
（Ｃ）1 and 2 are a front view and a sectional view of a sliding surface of a thin film magnetic head according to an embodiment of the first invention. FIG. 3 is a front view of the sliding surface of a thin film magnetic head according to another embodiment of the first invention, and FIGS. 4 and 5 illustrate a method of manufacturing a thin film magnetic head according to an embodiment of the second invention. FIG. 2 is a perspective view and a front view, respectively. l...Nonmagnetic substrate, 2...Lower magnetic layer, 3...Insulating layer, 6...Upper magnetic layer, 6a, 6b, 6c...First layer, second layer of multilayer upper magnetic layer Layer, third layer. Representative Patent Attorney Tadashi Akimoto Figure 1 Figure 2 Figure 3 Do(b) Do(C)
Claims (1)
性層表面に下部磁性層を埋設し、該下部磁性層上に、絶
縁層、コイル導体層、上部磁性層を順次積層してなる薄
膜磁気ヘッドにおいて、該下部磁性層又は上部磁性層の
うち少なくとも一方の膜厚が、トラック幅方向の一部又
は全部において変化していることを特徴とする薄膜磁気
ヘッド。 ２、下部磁性層及び／又は上部磁性層は非磁性絶縁層を
間に挿入した多層構造であシ、該非磁性絶縁層はトラッ
ク幅方向の絶縁層に対し非平行になっている特許請求の
範囲第１項記載の薄膜磁気ヘッド。 ３、非磁性基板表面又は非磁性基板上に形成した非磁性
層表面に、下部磁性層を埋設するための溝を形成する工
程、 該表面に該溝の深さと略同じ厚さに磁性材料を積層する
工程、 該溝以外に積層した磁性材料を除去し下部磁性層を形成
する工程 該下部磁性層上に、絶縁層、コイル導体層、を積層する
工程、 磁性材料を、上部磁性層の最大厚さに積層する工程、 積層した磁性材料上に、所望の上部磁性層の形状にホト
レジストノ４ターンを形成し、熱処理する工程、 イオンエツチング法によシ所望形状の上部磁性層を形成
する工程からなる薄膜磁気ヘッドの製造方法。[Claims] 1. A lower magnetic layer is embedded in the surface of a non-magnetic substrate or a surface of a non-magnetic layer formed on a non-magnetic substrate, and an insulating layer, a coil conductor layer, and an upper magnetic layer are formed on the lower magnetic layer. 1. A thin film magnetic head formed by sequentially laminating layers, wherein the thickness of at least one of the lower magnetic layer and the upper magnetic layer changes partially or entirely in the track width direction. 2. The lower magnetic layer and/or the upper magnetic layer have a multilayer structure with a non-magnetic insulating layer inserted therebetween, and the non-magnetic insulating layer is non-parallel to the insulating layer in the track width direction. 2. The thin film magnetic head according to item 1. 3. Forming a groove for embedding the lower magnetic layer on the surface of the non-magnetic substrate or the surface of the non-magnetic layer formed on the non-magnetic substrate, and applying a magnetic material to the surface to a thickness that is approximately the same as the depth of the groove. a step of laminating, a step of removing the magnetic material laminated outside the groove to form a lower magnetic layer; a step of laminating an insulating layer and a coil conductor layer on the lower magnetic layer; A step of forming four turns of photoresist in the desired shape of the upper magnetic layer on the laminated magnetic material, a step of heat treatment, and a step of forming the upper magnetic layer of the desired shape by ion etching. A method of manufacturing a thin film magnetic head comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8114484A JPS60226008A (en) | 1984-04-24 | 1984-04-24 | Thin film magnetic head and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8114484A JPS60226008A (en) | 1984-04-24 | 1984-04-24 | Thin film magnetic head and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60226008A true JPS60226008A (en) | 1985-11-11 |
Family
ID=13738218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8114484A Pending JPS60226008A (en) | 1984-04-24 | 1984-04-24 | Thin film magnetic head and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60226008A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0222183A2 (en) * | 1985-10-14 | 1987-05-20 | Hitachi, Ltd. | Thin film magnetic head |
| JPH02132617A (en) * | 1988-11-11 | 1990-05-22 | Sumitomo Special Metals Co Ltd | Groove structure magnetic substrate for perpendicular magnetic recording/reproducing head |
| JPH02132615A (en) * | 1988-11-11 | 1990-05-22 | Sumitomo Special Metals Co Ltd | Perpendicular magnetic recording/reproducing thin film head |
-
1984
- 1984-04-24 JP JP8114484A patent/JPS60226008A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0222183A2 (en) * | 1985-10-14 | 1987-05-20 | Hitachi, Ltd. | Thin film magnetic head |
| JPH02132617A (en) * | 1988-11-11 | 1990-05-22 | Sumitomo Special Metals Co Ltd | Groove structure magnetic substrate for perpendicular magnetic recording/reproducing head |
| JPH02132615A (en) * | 1988-11-11 | 1990-05-22 | Sumitomo Special Metals Co Ltd | Perpendicular magnetic recording/reproducing thin film head |
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