JPS5790975A - Composite type power transistor - Google Patents
Composite type power transistorInfo
- Publication number
- JPS5790975A JPS5790975A JP55167614A JP16761480A JPS5790975A JP S5790975 A JPS5790975 A JP S5790975A JP 55167614 A JP55167614 A JP 55167614A JP 16761480 A JP16761480 A JP 16761480A JP S5790975 A JPS5790975 A JP S5790975A
- Authority
- JP
- Japan
- Prior art keywords
- transistor
- layer
- diode
- composite type
- prepared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002131 composite material Substances 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 238000011084 recovery Methods 0.000 abstract 1
- 238000007493 shaping process Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/641—Combinations of only vertical BJTs
- H10D84/642—Combinations of non-inverted vertical BJTs of the same conductivity type having different characteristics, e.g. Darlington transistors
Landscapes
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
- Control Of Amplification And Gain Control (AREA)
Abstract
PURPOSE:To manufacture the composite type transistor for an amplitude control circuit easily, and to decrease the variance of characteristics by separating a transistor and a diode formed on a chip by shaping a separating groove reaching a collector layer of the substrate. CONSTITUTION:The triple diffusion NPN transistor is prepared to the N type substrate, one part of a P base layer 3 is etched chemically and the groove reaching the collector high resistance layer 1 is shaped, and the layer 3 is separated from the second base region 4. A film such as a glass protective film 6 is formed in the groove, a substance such as Al is evaporated and each electrode 7-9 of the transistor and a diode electrode 10 are shaped, and the composite type transistor is molded. Accordingly, the transistors having uniform inverse recovery characteristics can be prepared while connecting wiring can be unnecessitated because the transistor and the diode are formed simultaneously on the same chip. The structure can also apply easily to a Darlington connection type transistor for high power.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55167614A JPS5790975A (en) | 1980-11-27 | 1980-11-27 | Composite type power transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55167614A JPS5790975A (en) | 1980-11-27 | 1980-11-27 | Composite type power transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5790975A true JPS5790975A (en) | 1982-06-05 |
Family
ID=15853042
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55167614A Pending JPS5790975A (en) | 1980-11-27 | 1980-11-27 | Composite type power transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5790975A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5136354A (en) * | 1989-04-13 | 1992-08-04 | Seiko Epson Corporation | Semiconductor device wafer with interlayer insulating film covering the scribe lines |
US5414297A (en) * | 1989-04-13 | 1995-05-09 | Seiko Epson Corporation | Semiconductor device chip with interlayer insulating film covering the scribe lines |
CN106783982A (en) * | 2016-12-29 | 2017-05-31 | 西安电子科技大学 | A kind of integrated form high pressure carbon SiClx Darlington transistor and preparation method thereof |
-
1980
- 1980-11-27 JP JP55167614A patent/JPS5790975A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5136354A (en) * | 1989-04-13 | 1992-08-04 | Seiko Epson Corporation | Semiconductor device wafer with interlayer insulating film covering the scribe lines |
US5414297A (en) * | 1989-04-13 | 1995-05-09 | Seiko Epson Corporation | Semiconductor device chip with interlayer insulating film covering the scribe lines |
CN106783982A (en) * | 2016-12-29 | 2017-05-31 | 西安电子科技大学 | A kind of integrated form high pressure carbon SiClx Darlington transistor and preparation method thereof |
CN106783982B (en) * | 2016-12-29 | 2019-12-06 | 西安电子科技大学 | Integrated high-pressure silicon carbide Darlington tube and manufacturing method thereof |
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