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JPS5789753A - Formation of fluoroalkyl acrylate polymer film on substrate - Google Patents

Formation of fluoroalkyl acrylate polymer film on substrate

Info

Publication number
JPS5789753A
JPS5789753A JP14219880A JP14219880A JPS5789753A JP S5789753 A JPS5789753 A JP S5789753A JP 14219880 A JP14219880 A JP 14219880A JP 14219880 A JP14219880 A JP 14219880A JP S5789753 A JPS5789753 A JP S5789753A
Authority
JP
Japan
Prior art keywords
film
excited
substrate
fluoroalkyl acrylate
polymer film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14219880A
Other languages
Japanese (ja)
Inventor
Shuzo Hattori
Shinzo Morita
Tsuneo Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd, Daikin Kogyo Co Ltd filed Critical Daikin Industries Ltd
Priority to JP14219880A priority Critical patent/JPS5789753A/en
Priority to US06/310,407 priority patent/US4382985A/en
Priority to DE8181108158T priority patent/DE3173516D1/en
Priority to EP81108158A priority patent/EP0049884B1/en
Publication of JPS5789753A publication Critical patent/JPS5789753A/en
Priority to US06/455,909 priority patent/US4421842A/en
Priority to US06/455,910 priority patent/US4421843A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To improve the dry etching resistance of a film by polymerizing fluoroalkyl acrylate in an inert gas excited by glow discharge. CONSTITUTION:Fluoroalkyl acrylate represented by formula RfR<2>OCOCR<1>=CH2 (where Rf is 1-15 C perfluoroalkyl or a group having at least 1 fluorine atom, R<1> is H, methyl, ethyl or halogen, and R<2> is a bivalent hydrocarbon residue) is put in a container 8 and fed to a vacuum vessel 1 evacuated with a vacuum pump 11 through a trap 10. Ar is fed from an inert gas container 2 and excited by passing through a glow discharge zone formed with a dielectric coil 4. The acrylate joins the excited Ar and contacts with a substrate (not shown) on a sample holder 9 to form a polymer film. This film is superior as a resist to a film obtd. by coating a polymer.
JP14219880A 1980-10-11 1980-10-11 Formation of fluoroalkyl acrylate polymer film on substrate Pending JPS5789753A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP14219880A JPS5789753A (en) 1980-10-11 1980-10-11 Formation of fluoroalkyl acrylate polymer film on substrate
US06/310,407 US4382985A (en) 1980-10-11 1981-10-09 Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film
DE8181108158T DE3173516D1 (en) 1980-10-11 1981-10-10 Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film
EP81108158A EP0049884B1 (en) 1980-10-11 1981-10-10 Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film
US06/455,909 US4421842A (en) 1980-10-11 1983-01-06 Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film
US06/455,910 US4421843A (en) 1980-10-11 1983-01-06 Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14219880A JPS5789753A (en) 1980-10-11 1980-10-11 Formation of fluoroalkyl acrylate polymer film on substrate

Publications (1)

Publication Number Publication Date
JPS5789753A true JPS5789753A (en) 1982-06-04

Family

ID=15309667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14219880A Pending JPS5789753A (en) 1980-10-11 1980-10-11 Formation of fluoroalkyl acrylate polymer film on substrate

Country Status (1)

Country Link
JP (1) JPS5789753A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS585735A (en) * 1981-06-01 1983-01-13 Daikin Ind Ltd Method for manufacturing a resist film with a pattern formed on a substrate
JPS6224625A (en) * 1985-07-24 1987-02-02 Nippon Telegr & Teleph Corp <Ntt> Formation of pattern
JPS63157148A (en) * 1986-12-19 1988-06-30 Minolta Camera Co Ltd Resist film and its resist pattern forming method
US5157091A (en) * 1987-10-07 1992-10-20 Murahara Masataka Ultraviolet-absorbing polymer material and photoetching process
JP2002510363A (en) * 1997-06-14 2002-04-02 イギリス国 Surface coating

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53120527A (en) * 1977-03-30 1978-10-21 Toshiba Corp Forming method of positive type radiation sensitive material layer
JPS53135336A (en) * 1977-04-28 1978-11-25 Toppan Printing Co Ltd Pattern forming method
JPS54145127A (en) * 1978-05-04 1979-11-13 Nippon Telegr & Teleph Corp <Ntt> Pattern formation material
JPS55129345A (en) * 1979-03-29 1980-10-07 Ulvac Corp Electron beam plate making method by vapor phase film formation and vapor phase development

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53120527A (en) * 1977-03-30 1978-10-21 Toshiba Corp Forming method of positive type radiation sensitive material layer
JPS53135336A (en) * 1977-04-28 1978-11-25 Toppan Printing Co Ltd Pattern forming method
JPS54145127A (en) * 1978-05-04 1979-11-13 Nippon Telegr & Teleph Corp <Ntt> Pattern formation material
JPS55129345A (en) * 1979-03-29 1980-10-07 Ulvac Corp Electron beam plate making method by vapor phase film formation and vapor phase development

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS585735A (en) * 1981-06-01 1983-01-13 Daikin Ind Ltd Method for manufacturing a resist film with a pattern formed on a substrate
JPH0222371B2 (en) * 1981-06-01 1990-05-18 Daikin Ind Ltd
JPS6224625A (en) * 1985-07-24 1987-02-02 Nippon Telegr & Teleph Corp <Ntt> Formation of pattern
JPS63157148A (en) * 1986-12-19 1988-06-30 Minolta Camera Co Ltd Resist film and its resist pattern forming method
US5157091A (en) * 1987-10-07 1992-10-20 Murahara Masataka Ultraviolet-absorbing polymer material and photoetching process
JP2002510363A (en) * 1997-06-14 2002-04-02 イギリス国 Surface coating
JP2010058523A (en) * 1997-06-14 2010-03-18 Uk Government Surface-coated oil-repellent and water-repellent substrate

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