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JPS57211733A - Detecting device for electron beam exposing marker - Google Patents

Detecting device for electron beam exposing marker

Info

Publication number
JPS57211733A
JPS57211733A JP9770781A JP9770781A JPS57211733A JP S57211733 A JPS57211733 A JP S57211733A JP 9770781 A JP9770781 A JP 9770781A JP 9770781 A JP9770781 A JP 9770781A JP S57211733 A JPS57211733 A JP S57211733A
Authority
JP
Japan
Prior art keywords
marker
pulses
values
electron beam
counters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9770781A
Other languages
Japanese (ja)
Inventor
Makoto Yoshimi
Masaki Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP9770781A priority Critical patent/JPS57211733A/en
Publication of JPS57211733A publication Critical patent/JPS57211733A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)

Abstract

PURPOSE:To easily detect positions at high accuracy, by arithmetically averaging side surface positions obtained from two differential wave forms for each side further with the average of these values, when detection wave forms for marker positions formed on a substrate are asymmetric. CONSTITUTION:When the detection signal detected 6 by irradiating an electron beam on the marker 8 formed on a substrate is differentiated 9, beam reciprocating scanning provides the wave-form having pulses R'1, Q'1 and R'2, Q'2. On the other hand, in case of the absence of a marker position directly under an electron gun, detection signal becomes asymmetric so that the values DELTA1 and DELTA2 which are the differences between true edges 8a, 8b according to slice levels E of counters 11, 12 differ from each other. Therefore, the outputs from the counters 11, 12 are transmitted into CPUs to obtain the position of the edge 8a from the arithmetical average of pulses R'1, Q'1 while the edge 8b is obtained from pulses R'2, Q'2 in the same manner. Then, both values are arithmetically averaged to obtain the marker position.
JP9770781A 1981-06-24 1981-06-24 Detecting device for electron beam exposing marker Pending JPS57211733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9770781A JPS57211733A (en) 1981-06-24 1981-06-24 Detecting device for electron beam exposing marker

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9770781A JPS57211733A (en) 1981-06-24 1981-06-24 Detecting device for electron beam exposing marker

Publications (1)

Publication Number Publication Date
JPS57211733A true JPS57211733A (en) 1982-12-25

Family

ID=14199382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9770781A Pending JPS57211733A (en) 1981-06-24 1981-06-24 Detecting device for electron beam exposing marker

Country Status (1)

Country Link
JP (1) JPS57211733A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5149976A (en) * 1990-08-31 1992-09-22 Hughes Aircraft Company Charged particle beam pattern generation apparatus and method
US5285075A (en) * 1991-10-21 1994-02-08 Hitachi, Ltd. Electron beam lithography method
JPH06160067A (en) * 1992-11-19 1994-06-07 Toshiba Corp Method for measuring size of circuit pattern
JP2015052573A (en) * 2013-09-09 2015-03-19 株式会社東芝 Pattern measuring device, and pattern measuring method
JP2021536014A (en) * 2018-09-11 2021-12-23 ベクトン・ディキンソン・アンド・カンパニーBecton, Dickinson And Company Robot sample creation system for diagnostic tests by automatic position learning

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5149976A (en) * 1990-08-31 1992-09-22 Hughes Aircraft Company Charged particle beam pattern generation apparatus and method
US5285075A (en) * 1991-10-21 1994-02-08 Hitachi, Ltd. Electron beam lithography method
JPH06160067A (en) * 1992-11-19 1994-06-07 Toshiba Corp Method for measuring size of circuit pattern
JP2015052573A (en) * 2013-09-09 2015-03-19 株式会社東芝 Pattern measuring device, and pattern measuring method
JP2021536014A (en) * 2018-09-11 2021-12-23 ベクトン・ディキンソン・アンド・カンパニーBecton, Dickinson And Company Robot sample creation system for diagnostic tests by automatic position learning
US11940456B2 (en) 2018-09-11 2024-03-26 Becton Dickinson And Company Robotic sample preparation system for diagnostic testing with automated position learning

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