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JPS57146247A - Water-soluble photoresist - Google Patents

Water-soluble photoresist

Info

Publication number
JPS57146247A
JPS57146247A JP19054481A JP19054481A JPS57146247A JP S57146247 A JPS57146247 A JP S57146247A JP 19054481 A JP19054481 A JP 19054481A JP 19054481 A JP19054481 A JP 19054481A JP S57146247 A JPS57146247 A JP S57146247A
Authority
JP
Japan
Prior art keywords
water
soluble
linking agent
adhesion
cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19054481A
Other languages
Japanese (ja)
Other versions
JPH0113092B2 (en
Inventor
Shingo Watabe
Takeo Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP19054481A priority Critical patent/JPS57146247A/en
Publication of JPS57146247A publication Critical patent/JPS57146247A/en
Publication of JPH0113092B2 publication Critical patent/JPH0113092B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To enhance ultraviolet photosensitivity of a resist, and sharpness and adhesion of a pattern film, by adding a water-soluble bisazide compound and a diazo compound as a cross-linking agent to a water-soluble polymer material. CONSTITUTION:A water-soluble bisazide compound and a water-soluble diazo compound are both used for a water-soluble polymer material as a cross-linking agent to solve both problems: the problem of an azide type photoresist, adhesion, and that of a diazo type photoresist, photosensitivity and heat stability of a photosensitive liquid. The high sensitivity to ultraviolet rays that has never been obtained in the case of using a single cross-linking agent can be obtained by the synergistic effect of said agents, thus permitting the obtained water-soluble photoresist to be high in ultraviolet sensitivity and a pattern film formed to have sharpness and strong adhesion.
JP19054481A 1981-11-30 1981-11-30 Water-soluble photoresist Granted JPS57146247A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19054481A JPS57146247A (en) 1981-11-30 1981-11-30 Water-soluble photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19054481A JPS57146247A (en) 1981-11-30 1981-11-30 Water-soluble photoresist

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP13979880A Division JPS5765644A (en) 1980-10-08 1980-10-08 Forming method for pattern

Publications (2)

Publication Number Publication Date
JPS57146247A true JPS57146247A (en) 1982-09-09
JPH0113092B2 JPH0113092B2 (en) 1989-03-03

Family

ID=16259842

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19054481A Granted JPS57146247A (en) 1981-11-30 1981-11-30 Water-soluble photoresist

Country Status (1)

Country Link
JP (1) JPS57146247A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5134057A (en) * 1988-10-10 1992-07-28 501 Ppg Biomedical Systems, Inc. Method of providing a substrate with a layer comprising a polyvinyl based hydrogel and a biochemically active material
EP0819983A1 (en) * 1996-07-16 1998-01-21 Samsung Display Devices Co., Ltd. Photoresist composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5134057A (en) * 1988-10-10 1992-07-28 501 Ppg Biomedical Systems, Inc. Method of providing a substrate with a layer comprising a polyvinyl based hydrogel and a biochemically active material
EP0819983A1 (en) * 1996-07-16 1998-01-21 Samsung Display Devices Co., Ltd. Photoresist composition

Also Published As

Publication number Publication date
JPH0113092B2 (en) 1989-03-03

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